JP5518900B2 - 水又はアルカリ金属化合物の水溶液の電気分解用の陰極、アルカリ金属塩化物の電気分解用電解槽、及び水又はアルカリ金属化合物の水溶液の電気分解用の陰極の製造方法 - Google Patents

水又はアルカリ金属化合物の水溶液の電気分解用の陰極、アルカリ金属塩化物の電気分解用電解槽、及び水又はアルカリ金属化合物の水溶液の電気分解用の陰極の製造方法 Download PDF

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JP5518900B2
JP5518900B2 JP2011547663A JP2011547663A JP5518900B2 JP 5518900 B2 JP5518900 B2 JP 5518900B2 JP 2011547663 A JP2011547663 A JP 2011547663A JP 2011547663 A JP2011547663 A JP 2011547663A JP 5518900 B2 JP5518900 B2 JP 5518900B2
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cathode
layer
platinum
electrolysis
coating
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JPWO2011078353A1 (ja
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明恭 船川
敏徳 蜂谷
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Asahi Kasei Chemicals Corp
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/097—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds comprising two or more noble metals or noble metal alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C25B1/04—Hydrogen or oxygen by electrolysis of water
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
    • C25B1/46—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis in diaphragm cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C25B9/23—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1651—Two or more layers only obtained by electroless plating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
JP2011547663A 2009-12-25 2010-12-24 水又はアルカリ金属化合物の水溶液の電気分解用の陰極、アルカリ金属塩化物の電気分解用電解槽、及び水又はアルカリ金属化合物の水溶液の電気分解用の陰極の製造方法 Expired - Fee Related JP5518900B2 (ja)

Priority Applications (1)

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JP2011547663A JP5518900B2 (ja) 2009-12-25 2010-12-24 水又はアルカリ金属化合物の水溶液の電気分解用の陰極、アルカリ金属塩化物の電気分解用電解槽、及び水又はアルカリ金属化合物の水溶液の電気分解用の陰極の製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009295846 2009-12-25
JP2009295846 2009-12-25
PCT/JP2010/073410 WO2011078353A1 (ja) 2009-12-25 2010-12-24 陰極、アルカリ金属塩化物の電気分解用電解槽、及び陰極の製造方法
JP2011547663A JP5518900B2 (ja) 2009-12-25 2010-12-24 水又はアルカリ金属化合物の水溶液の電気分解用の陰極、アルカリ金属塩化物の電気分解用電解槽、及び水又はアルカリ金属化合物の水溶液の電気分解用の陰極の製造方法

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JPWO2011078353A1 JPWO2011078353A1 (ja) 2013-05-09
JP5518900B2 true JP5518900B2 (ja) 2014-06-11

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Country Status (7)

Country Link
US (1) US20120279853A1 (en:Method)
EP (1) EP2518185B1 (en:Method)
JP (1) JP5518900B2 (en:Method)
CN (1) CN102666932B (en:Method)
NO (1) NO2518185T3 (en:Method)
TW (1) TWI432608B (en:Method)
WO (1) WO2011078353A1 (en:Method)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5686457B2 (ja) * 2011-12-26 2015-03-18 ペルメレック電極株式会社 酸素発生用陽極の製造方法
JP5686455B2 (ja) * 2011-12-26 2015-03-18 ペルメレック電極株式会社 耐高負荷用酸素発生用陽極の製造方法
JP5686456B2 (ja) * 2011-12-26 2015-03-18 ペルメレック電極株式会社 酸素発生用陽極の製造方法
ES2593354T3 (es) * 2012-03-19 2016-12-07 Asahi Kasei Kabushiki Kaisha Celda de electrólisis y cuba electrolítica
GB2508795A (en) * 2012-09-21 2014-06-18 Ucl Business Plc Electrolysis electrocatalyst comprising palladium and iridium
ITMI20122030A1 (it) * 2012-11-29 2014-05-30 Industrie De Nora Spa Catodo per evoluzione elettrolitica di idrogeno
JP6734920B2 (ja) * 2017-02-15 2020-08-05 旭化成株式会社 陰極、その製造方法、およびそれを用いた電解槽、水素製造方法
JP6831451B2 (ja) * 2017-03-13 2021-02-17 旭化成株式会社 電解セル及び電解槽
IT201900009753A1 (it) * 2019-06-21 2020-12-21 Fondazione St Italiano Tecnologia STABLE HYDROGEN EVOLUTION ELECTROCATALYST BASED ON 3D METAL NANOSTRUCTURES ON A Ti SUBSTRATE
JP7218263B2 (ja) * 2019-09-18 2023-02-06 株式会社東芝 積層触媒、電極、膜電極複合体、電気化学セル、スタック、燃料電池及び水電解の可逆装置、車両及び飛翔体
CN114959767B (zh) * 2021-02-26 2024-03-19 蓝星(北京)化工机械有限公司 镍基活性阴极及其制备方法
JP7706693B2 (ja) * 2021-08-31 2025-07-14 株式会社大阪ソーダ 塩素発生用電極およびその製造方法
WO2024091510A1 (en) * 2022-10-24 2024-05-02 West Virginia University Board of Governors on behalf of West Virginia University Methods and compositions for nanocomposites on electrode surfaces

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JPS5713189A (en) * 1980-06-26 1982-01-23 Osaka Soda Co Ltd Cathode for electrolysis
JPS6017087A (ja) * 1983-06-21 1985-01-28 インペリアル・ケミカル・インダストリ−ズ・ピ−エルシ− 電解槽用カソ−ド
JPS61136691A (ja) * 1984-11-07 1986-06-24 オロンジオ・ド・ノラ・イムピアンチ・エレツトロキミシ・ソシエタ・ペル・アジオニ 電気化学プロセス用電極、その製法およびその電解槽への使用
WO2008043766A2 (en) * 2006-10-11 2008-04-17 Industrie De Nora S.P.A. Cathode for electrolytic processes

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JPS5713189A (en) * 1980-06-26 1982-01-23 Osaka Soda Co Ltd Cathode for electrolysis
JPS6017087A (ja) * 1983-06-21 1985-01-28 インペリアル・ケミカル・インダストリ−ズ・ピ−エルシ− 電解槽用カソ−ド
JPS61136691A (ja) * 1984-11-07 1986-06-24 オロンジオ・ド・ノラ・イムピアンチ・エレツトロキミシ・ソシエタ・ペル・アジオニ 電気化学プロセス用電極、その製法およびその電解槽への使用
WO2008043766A2 (en) * 2006-10-11 2008-04-17 Industrie De Nora S.P.A. Cathode for electrolytic processes

Also Published As

Publication number Publication date
WO2011078353A1 (ja) 2011-06-30
JPWO2011078353A1 (ja) 2013-05-09
TWI432608B (zh) 2014-04-01
TW201131022A (en) 2011-09-16
US20120279853A1 (en) 2012-11-08
EP2518185B1 (en) 2017-09-13
CN102666932A (zh) 2012-09-12
EP2518185A1 (en) 2012-10-31
EP2518185A4 (en) 2016-04-06
CN102666932B (zh) 2015-08-05
NO2518185T3 (en:Method) 2018-02-10

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