JP5506147B2 - 成膜装置及び成膜方法 - Google Patents

成膜装置及び成膜方法 Download PDF

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Publication number
JP5506147B2
JP5506147B2 JP2007270867A JP2007270867A JP5506147B2 JP 5506147 B2 JP5506147 B2 JP 5506147B2 JP 2007270867 A JP2007270867 A JP 2007270867A JP 2007270867 A JP2007270867 A JP 2007270867A JP 5506147 B2 JP5506147 B2 JP 5506147B2
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film forming
film
film formation
substrate
flow rate
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Expired - Fee Related
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JP2007270867A
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English (en)
Japanese (ja)
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JP2009097044A5 (enrdf_load_stackoverflow
JP2009097044A (ja
Inventor
信貴 浮ケ谷
岳彦 曽田
恭英 小沼
清 倉持
友和 須志原
直広 中根
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Canon Inc
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Canon Inc
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Priority to JP2007270867A priority Critical patent/JP5506147B2/ja
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JP2007270867A 2007-10-18 2007-10-18 成膜装置及び成膜方法 Expired - Fee Related JP5506147B2 (ja)

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JP2007270867A JP5506147B2 (ja) 2007-10-18 2007-10-18 成膜装置及び成膜方法

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JP2007270867A JP5506147B2 (ja) 2007-10-18 2007-10-18 成膜装置及び成膜方法

Related Child Applications (1)

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JP2012097539A Division JP5460773B2 (ja) 2012-04-23 2012-04-23 成膜装置及び成膜方法

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JP2009097044A JP2009097044A (ja) 2009-05-07
JP2009097044A5 JP2009097044A5 (enrdf_load_stackoverflow) 2010-12-02
JP5506147B2 true JP5506147B2 (ja) 2014-05-28

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Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2168643A1 (en) * 2008-09-29 2010-03-31 Applied Materials, Inc. Evaporator for organic materials
JP5298189B2 (ja) * 2009-12-18 2013-09-25 平田機工株式会社 真空蒸着方法及び装置
JP5473675B2 (ja) * 2010-03-01 2014-04-16 株式会社アルバック 薄膜形成装置
KR101232910B1 (ko) 2010-10-06 2013-02-13 엘아이지에이디피 주식회사 유기물 공급장치, 이를 이용한 유기물 증착장치 및 방법
CN103270189B (zh) * 2010-12-24 2015-09-23 夏普株式会社 蒸镀装置、蒸镀方法和有机电致发光显示装置的制造方法
KR20130045432A (ko) * 2011-10-26 2013-05-06 주식회사 탑 엔지니어링 회전식 증착 장치
JP5936394B2 (ja) * 2012-03-14 2016-06-22 日立造船株式会社 蒸着装置
JP5985302B2 (ja) * 2012-08-13 2016-09-06 株式会社カネカ 真空蒸着装置及び有機ｅｌ装置の製造方法
JP6222929B2 (ja) * 2013-01-15 2017-11-01 日立造船株式会社 真空蒸着装置
CN104099571A (zh) * 2013-04-01 2014-10-15 上海和辉光电有限公司 蒸发源组件和薄膜沉积装置和薄膜沉积方法
JP6348790B2 (ja) * 2014-07-08 2018-06-27 長州産業株式会社 リング型蒸着源
JP6490435B2 (ja) * 2014-12-26 2019-03-27 株式会社オプトラン 成膜方法及び成膜装置
CN107893212B (zh) * 2017-12-18 2019-12-20 信利（惠州）智能显示有限公司 一种连续蒸镀设备
KR102609612B1 (ko) * 2018-07-30 2023-12-05 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3264096B2 (ja) * 1994-05-20 2002-03-11 ソニー株式会社 横型気相成長装置および横型熱処理装置
JP2002184571A (ja) * 2000-12-15 2002-06-28 Denso Corp 有機ｅｌ素子の製造方法
JP2003155555A (ja) * 2001-11-15 2003-05-30 Eiko Engineering Co Ltd 薄膜堆積用複合分子線源セル
JP2005154262A (ja) * 2003-10-30 2005-06-16 Kyocera Corp 放電発生部材
JP4366226B2 (ja) * 2004-03-30 2009-11-18 東北パイオニア株式会社 有機ｅｌパネルの製造方法、有機ｅｌパネルの成膜装置
JP4476019B2 (ja) * 2004-05-20 2010-06-09 東北パイオニア株式会社 成膜源、真空成膜装置、有機ｅｌ素子の製造方法
JP2006111926A (ja) * 2004-10-15 2006-04-27 Hitachi Zosen Corp 蒸着装置
JP2006120822A (ja) * 2004-10-21 2006-05-11 Tokyo Electron Ltd 基板処理装置及び基板処理装置の圧力制御方法
JP4620537B2 (ja) * 2005-07-21 2011-01-26 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理装置の制御方法

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