JP5505667B2 - 交流駆動静電チャック - Google Patents

交流駆動静電チャック Download PDF

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Publication number
JP5505667B2
JP5505667B2 JP2012207606A JP2012207606A JP5505667B2 JP 5505667 B2 JP5505667 B2 JP 5505667B2 JP 2012207606 A JP2012207606 A JP 2012207606A JP 2012207606 A JP2012207606 A JP 2012207606A JP 5505667 B2 JP5505667 B2 JP 5505667B2
Authority
JP
Japan
Prior art keywords
main surface
electrode
electrostatic chuck
protrusion
electrode elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012207606A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013084935A (ja
JP2013084935A5 (https=
Inventor
和輝 穴田
佳津子 石川
雄一 吉井
順治 米澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Priority to JP2012207606A priority Critical patent/JP5505667B2/ja
Priority to TW101135221A priority patent/TW201316448A/zh
Priority to CN201280046775.1A priority patent/CN103890927A/zh
Priority to US14/344,736 priority patent/US9093488B2/en
Priority to KR1020147006021A priority patent/KR101429593B1/ko
Priority to PCT/JP2012/074866 priority patent/WO2013047647A1/ja
Publication of JP2013084935A publication Critical patent/JP2013084935A/ja
Publication of JP2013084935A5 publication Critical patent/JP2013084935A5/ja
Application granted granted Critical
Publication of JP5505667B2 publication Critical patent/JP5505667B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7614—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
JP2012207606A 2011-09-30 2012-09-20 交流駆動静電チャック Expired - Fee Related JP5505667B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2012207606A JP5505667B2 (ja) 2011-09-30 2012-09-20 交流駆動静電チャック
TW101135221A TW201316448A (zh) 2011-09-30 2012-09-26 交流驅動靜電吸盤
US14/344,736 US9093488B2 (en) 2011-09-30 2012-09-27 AC-driven electrostatic chuck
KR1020147006021A KR101429593B1 (ko) 2011-09-30 2012-09-27 교류구동 정전 척
CN201280046775.1A CN103890927A (zh) 2011-09-30 2012-09-27 交流驱动静电吸盘
PCT/JP2012/074866 WO2013047647A1 (ja) 2011-09-30 2012-09-27 交流駆動静電チャック

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011217622 2011-09-30
JP2011217622 2011-09-30
JP2012207606A JP5505667B2 (ja) 2011-09-30 2012-09-20 交流駆動静電チャック

Publications (3)

Publication Number Publication Date
JP2013084935A JP2013084935A (ja) 2013-05-09
JP2013084935A5 JP2013084935A5 (https=) 2013-08-22
JP5505667B2 true JP5505667B2 (ja) 2014-05-28

Family

ID=47995675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012207606A Expired - Fee Related JP5505667B2 (ja) 2011-09-30 2012-09-20 交流駆動静電チャック

Country Status (6)

Country Link
US (1) US9093488B2 (https=)
JP (1) JP5505667B2 (https=)
KR (1) KR101429593B1 (https=)
CN (1) CN103890927A (https=)
TW (1) TW201316448A (https=)
WO (1) WO2013047647A1 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6224428B2 (ja) 2013-11-19 2017-11-01 東京エレクトロン株式会社 載置台にフォーカスリングを吸着する方法
US9633885B2 (en) * 2014-02-12 2017-04-25 Axcelis Technologies, Inc. Variable electrode pattern for versatile electrostatic clamp operation
JP6469985B2 (ja) * 2014-07-28 2019-02-13 株式会社日立ハイテクノロジーズ プラズマ処理装置
US10068790B2 (en) * 2014-09-30 2018-09-04 Sumitomo Osaka Cement Co., Ltd. Electrostatic chuck device
WO2016159342A1 (ja) * 2015-04-02 2016-10-06 株式会社アルバック 吸着装置、吸着装置の製造方法、及び真空処理装置
JP2018518055A (ja) * 2015-06-04 2018-07-05 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 透明な静電キャリア
TWI734739B (zh) * 2016-02-10 2021-08-01 美商恩特葛瑞斯股份有限公司 具有改善粒子效能的晶圓接觸表面突出輪廓
CN105575872B (zh) * 2016-02-26 2019-05-03 上海华力微电子有限公司 改善静电吸附盘树脂保护环损伤的结构及方法
US11289355B2 (en) 2017-06-02 2022-03-29 Lam Research Corporation Electrostatic chuck for use in semiconductor processing
CN110861113A (zh) * 2018-08-28 2020-03-06 吸力奇迹（北京）科技有限公司 静电吸附装置及其制备方法
KR102048162B1 (ko) * 2018-12-17 2019-12-02 엄홍국 정전척
KR102048161B1 (ko) * 2018-12-17 2019-11-22 엄홍국 정전척용 플레이트 및 이의 제조방법
US11145532B2 (en) * 2018-12-21 2021-10-12 Toto Ltd. Electrostatic chuck
JP7110482B2 (ja) * 2019-03-18 2022-08-01 日本碍子株式会社 静電チャック
KR102705400B1 (ko) 2019-08-07 2024-09-12 주식회사 엘지에너지솔루션 자동차용 언더 바디
US12174552B2 (en) 2019-10-29 2024-12-24 Asml Holding N.V. Lithographic apparatus and electrostatic clamp designs
JP7610345B2 (ja) * 2019-10-30 2025-01-08 日本碍子株式会社 複合焼結体および複合焼結体の製造方法
KR20210089375A (ko) * 2020-01-08 2021-07-16 주식회사 미코세라믹스 정전척
JP2022048089A (ja) * 2020-09-14 2022-03-25 東京エレクトロン株式会社 載置台、基板処理装置及び吸着方法
US20220084800A1 (en) * 2020-09-14 2022-03-17 Tokyo Electron Limited Stage, substrate processing apparatus and substrate attraction method
USD1067394S1 (en) * 2020-09-30 2025-03-18 Toto Ltd. Toilet seat
CN112234015B (zh) * 2020-10-12 2022-05-13 烟台睿瓷新材料技术有限公司 一种同心圆结构的静电吸盘电极图形结构
US11417557B2 (en) * 2020-12-15 2022-08-16 Entegris, Inc. Spiraling polyphase electrodes for electrostatic chuck
JP7528038B2 (ja) * 2021-08-24 2024-08-05 東京エレクトロン株式会社 静電チャック、基板支持器、プラズマ処理装置及び静電チャックの製造方法
JP2023130043A (ja) 2022-03-07 2023-09-20 東京エレクトロン株式会社 載置台及び基板処理装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01313954A (ja) * 1988-06-14 1989-12-19 Fujitsu Ltd 静電チャック
JPH03292753A (ja) * 1990-04-10 1991-12-24 Toto Ltd 静電チャック
JP4079992B2 (ja) * 1994-10-17 2008-04-23 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド 導電性被処理体を載置部材に締め付けるための装置及び静電クランピング方法
JPH11233600A (ja) * 1997-12-08 1999-08-27 Ulvac Corp 静電吸着装置、及びその静電吸着装置を用いた真空処理装置
US6538873B1 (en) * 1999-11-02 2003-03-25 Varian Semiconductor Equipment Associates, Inc. Active electrostatic seal and electrostatic vacuum pump
JP4328003B2 (ja) 2000-10-19 2009-09-09 日本碍子株式会社 セラミックヒーター
JP3974475B2 (ja) * 2002-03-04 2007-09-12 株式会社日立ハイテクノロジーズ 静電チャック装置及びその装置を用いた基板の処理方法
US6760213B2 (en) 2002-03-04 2004-07-06 Hitachi High-Technologies Corporation Electrostatic chuck and method of treating substrate using electrostatic chuck
KR100511854B1 (ko) 2002-06-18 2005-09-02 아네르바 가부시키가이샤 정전 흡착 장치
JP4061131B2 (ja) * 2002-06-18 2008-03-12 キヤノンアネルバ株式会社 静電吸着装置
US7357115B2 (en) * 2003-03-31 2008-04-15 Lam Research Corporation Wafer clamping apparatus and method for operating the same
US7151658B2 (en) * 2003-04-22 2006-12-19 Axcelis Technologies, Inc. High-performance electrostatic clamp comprising a resistive layer, micro-grooves, and dielectric layer
JP4409373B2 (ja) * 2004-06-29 2010-02-03 日本碍子株式会社 基板載置装置及び基板温度調整方法
US7352554B2 (en) * 2004-06-30 2008-04-01 Axcelis Technologies, Inc. Method for fabricating a Johnsen-Rahbek electrostatic wafer clamp
US7126091B1 (en) * 2005-03-23 2006-10-24 Eclipse Energy Systems, Inc. Workpiece holder for vacuum processing
JP4929150B2 (ja) * 2007-12-27 2012-05-09 新光電気工業株式会社 静電チャック及び基板温調固定装置
CN102089875B (zh) * 2008-07-08 2012-08-08 创意科技股份有限公司 双极型静电吸盘
TWI467691B (zh) 2008-10-15 2015-01-01 創意科技股份有限公司 Electrostatic chuck and its manufacturing method
US8004817B2 (en) * 2009-06-18 2011-08-23 Varian Semiconductor Equipment Associates, Inc. Method of platen fabrication to allow electrode pattern and gas cooling optimization

Also Published As

Publication number Publication date
TW201316448A (zh) 2013-04-16
JP2013084935A (ja) 2013-05-09
WO2013047647A1 (ja) 2013-04-04
US20140340813A1 (en) 2014-11-20
US9093488B2 (en) 2015-07-28
KR20140050709A (ko) 2014-04-29
CN103890927A (zh) 2014-06-25
KR101429593B1 (ko) 2014-08-12

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