JP5493328B2 - 積層型電子部品の製造方法 - Google Patents
積層型電子部品の製造方法 Download PDFInfo
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- JP5493328B2 JP5493328B2 JP2008262731A JP2008262731A JP5493328B2 JP 5493328 B2 JP5493328 B2 JP 5493328B2 JP 2008262731 A JP2008262731 A JP 2008262731A JP 2008262731 A JP2008262731 A JP 2008262731A JP 5493328 B2 JP5493328 B2 JP 5493328B2
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- JP
- Japan
- Prior art keywords
- plating
- electronic component
- internal electrode
- multilayer electronic
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
- H01G4/232—Terminals electrically connecting two or more layers of a stacked or rolled capacitor
- H01G4/2325—Terminals electrically connecting two or more layers of a stacked or rolled capacitor characterised by the material of the terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C1/00—Details
- H01C1/14—Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors
- H01C1/148—Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors the terminals embracing or surrounding the resistive element
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/18—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material comprising a plurality of layers stacked between terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
Description
ホルムアルデヒド: 0.16mol/L
酒石酸ナトリウムカリウム4水和物: 0.1mol/L
ポリエチレングリコール: 1.0g/L
水酸化ナトリウム: 0.125mol/L
エアレーション: 0.5L/min
第1のめっき層の形成された積層チップコンデンサの試料100個において、端面6または7を光学顕微鏡にて観察した。これにより、Cuめっき層で被覆されていない箇所の面積比率が5%以上であった試料を不良とし、その個数を計数した。結果を表1に示す。
2 積層体
3 絶縁体層
4,5 内部電極
6,7 端面
8,9 第1のめっき層
10,11 第2のめっき層
12,13 第3のめっき層
21 金属膜
31 めっき析出物
Claims (2)
- 積層された複数の絶縁体層および前記絶縁体層間の界面に沿って形成された卑金属を主成分とする複数の内部電極を含み、前記内部電極の各端部が所定の面に露出している、積層体を用意する工程と、
前記積層体を、金属イオンまたは金属錯体を含む液体に浸漬することにより、前記内部電極の各端部をPd、Au、PtおよびAgから選ばれる少なくとも一種を主成分とする厚み0.1μm以上の金属膜で被覆する工程と、
前記積層体の前記所定の面に露出した複数の前記内部電極の各端部にめっき析出物を析出させ、かつ前記めっき析出物が相互に接続されるように前記めっき析出物をめっき成長させ、それによって、連続しためっき層を形成するよう、前記内部電極の各端部を互いに電気的に接続するめっき層を形成する工程と、
を備える、積層型電子部品の製造方法。 - 前記内部電極を構成する主成分金属がNiまたはCuであることを特徴とする、請求項1に記載の積層型電子部品の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008262731A JP5493328B2 (ja) | 2008-10-09 | 2008-10-09 | 積層型電子部品の製造方法 |
US12/543,549 US9111690B2 (en) | 2008-10-09 | 2009-08-19 | Multilayer electronic component |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008262731A JP5493328B2 (ja) | 2008-10-09 | 2008-10-09 | 積層型電子部品の製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013269833A Division JP5783242B2 (ja) | 2013-12-26 | 2013-12-26 | 積層型電子部品 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010093112A JP2010093112A (ja) | 2010-04-22 |
JP5493328B2 true JP5493328B2 (ja) | 2014-05-14 |
Family
ID=42098641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008262731A Active JP5493328B2 (ja) | 2008-10-09 | 2008-10-09 | 積層型電子部品の製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US9111690B2 (ja) |
JP (1) | JP5493328B2 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102543438B (zh) * | 2011-12-07 | 2014-04-16 | 厦门法拉电子股份有限公司 | 一种叠片式金属化薄膜电容器的电极结构 |
JP2016012689A (ja) * | 2014-06-30 | 2016-01-21 | 株式会社村田製作所 | セラミック電子部品 |
JP6628007B2 (ja) | 2017-06-01 | 2020-01-08 | 株式会社村田製作所 | 電子部品 |
KR102463330B1 (ko) * | 2017-10-17 | 2022-11-04 | 삼성전기주식회사 | 코일 전자 부품 |
JP7102256B2 (ja) * | 2018-06-27 | 2022-07-19 | 株式会社村田製作所 | 積層セラミック電子部品 |
KR102527705B1 (ko) * | 2018-10-10 | 2023-05-02 | 삼성전기주식회사 | 적층 세라믹 전자부품 |
JP7003889B2 (ja) | 2018-10-10 | 2022-01-21 | 株式会社村田製作所 | 積層セラミック電子部品およびその実装構造 |
JP2022090195A (ja) * | 2020-12-07 | 2022-06-17 | 太陽誘電株式会社 | セラミック電子部品、実装基板およびセラミック電子部品の製造方法 |
KR20230103495A (ko) * | 2021-12-31 | 2023-07-07 | 삼성전기주식회사 | 적층형 커패시터 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63169014A (ja) * | 1987-01-06 | 1988-07-13 | 松下電器産業株式会社 | チツプコンデンサ−の外部電極端子の形成方法 |
JP3330836B2 (ja) * | 1997-01-22 | 2002-09-30 | 太陽誘電株式会社 | 積層電子部品の製造方法 |
JP3477089B2 (ja) * | 1998-10-30 | 2003-12-10 | 京セラ株式会社 | 積層セラミックコンデンサおよびその製造方法 |
JP2000306763A (ja) | 1999-04-19 | 2000-11-02 | Matsushita Electric Ind Co Ltd | 積層セラミックコンデンサとその製造方法 |
JP2002008938A (ja) * | 2000-06-23 | 2002-01-11 | Kyocera Corp | 積層型電子部品およびその製法 |
US7177137B2 (en) * | 2002-04-15 | 2007-02-13 | Avx Corporation | Plated terminations |
US7463474B2 (en) * | 2002-04-15 | 2008-12-09 | Avx Corporation | System and method of plating ball grid array and isolation features for electronic components |
US6982863B2 (en) * | 2002-04-15 | 2006-01-03 | Avx Corporation | Component formation via plating technology |
US7152291B2 (en) * | 2002-04-15 | 2006-12-26 | Avx Corporation | Method for forming plated terminations |
TWI260657B (en) * | 2002-04-15 | 2006-08-21 | Avx Corp | Plated terminations |
US6960366B2 (en) * | 2002-04-15 | 2005-11-01 | Avx Corporation | Plated terminations |
US7576968B2 (en) * | 2002-04-15 | 2009-08-18 | Avx Corporation | Plated terminations and method of forming using electrolytic plating |
US7345868B2 (en) * | 2002-10-07 | 2008-03-18 | Presidio Components, Inc. | Multilayer ceramic capacitor with terminal formed by electroless plating |
US7329976B2 (en) * | 2005-04-27 | 2008-02-12 | Kyocera Corporation | Laminated electronic component |
JP2006332601A (ja) | 2005-04-27 | 2006-12-07 | Kyocera Corp | 積層電子部品 |
CN101248499B (zh) * | 2005-10-28 | 2011-02-02 | 株式会社村田制作所 | 层叠型电子部件及其制造方法 |
CN101346785B (zh) * | 2006-02-27 | 2012-06-27 | 株式会社村田制作所 | 层叠型电子部件及其制造方法 |
WO2007105395A1 (ja) * | 2006-03-14 | 2007-09-20 | Murata Manufacturing Co., Ltd. | 積層型電子部品の製造方法 |
JP5127703B2 (ja) * | 2006-11-15 | 2013-01-23 | 株式会社村田製作所 | 積層型電子部品およびその製造方法 |
CN101356605B (zh) * | 2006-11-22 | 2012-05-23 | 株式会社村田制作所 | 叠层型电子部件及其制造方法 |
-
2008
- 2008-10-09 JP JP2008262731A patent/JP5493328B2/ja active Active
-
2009
- 2009-08-19 US US12/543,549 patent/US9111690B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2010093112A (ja) | 2010-04-22 |
US9111690B2 (en) | 2015-08-18 |
US20100091426A1 (en) | 2010-04-15 |
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