JP5491698B2 - パターン物質を転写するための方法及びシステム - Google Patents

パターン物質を転写するための方法及びシステム Download PDF

Info

Publication number
JP5491698B2
JP5491698B2 JP2007538031A JP2007538031A JP5491698B2 JP 5491698 B2 JP5491698 B2 JP 5491698B2 JP 2007538031 A JP2007538031 A JP 2007538031A JP 2007538031 A JP2007538031 A JP 2007538031A JP 5491698 B2 JP5491698 B2 JP 5491698B2
Authority
JP
Japan
Prior art keywords
substrate
stamp
applicator
nanocrystal
nanocrystals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2007538031A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008517743A (ja
JP2008517743A5 (cg-RX-API-DMAC7.html
Inventor
コエ−スルリバン セトフ
ジー． バウェンディ モウンギ
ブロビク ブラディミル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Massachusetts Institute of Technology
Original Assignee
Massachusetts Institute of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Institute of Technology filed Critical Massachusetts Institute of Technology
Publication of JP2008517743A publication Critical patent/JP2008517743A/ja
Publication of JP2008517743A5 publication Critical patent/JP2008517743A5/ja
Application granted granted Critical
Publication of JP5491698B2 publication Critical patent/JP5491698B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/0057—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material where an intermediate transfer member receives the ink before transferring it on the printing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/003—Printing processes to produce particular kinds of printed work, e.g. patterns on optical devices, e.g. lens elements; for the production of optical devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B41M5/0256—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet the transferable ink pattern being obtained by means of a computer driven printer, e.g. an ink jet or laser printer, or by electrographic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • H05B33/145—Arrangements of the electroluminescent material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/115—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Composite Materials (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Biophysics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Thin Film Transistor (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Led Devices (AREA)
  • Led Device Packages (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2007538031A 2004-10-22 2005-10-21 パターン物質を転写するための方法及びシステム Expired - Lifetime JP5491698B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US62096704P 2004-10-22 2004-10-22
US60/620,967 2004-10-22
US62957904P 2004-11-22 2004-11-22
US60/629,579 2004-11-22
PCT/US2005/037741 WO2006047215A2 (en) 2004-10-22 2005-10-21 Method and system for transferring a patterned material

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012002706A Division JP2012134506A (ja) 2004-10-22 2012-01-11 パターン物質を転写するための方法及びシステム

Publications (3)

Publication Number Publication Date
JP2008517743A JP2008517743A (ja) 2008-05-29
JP2008517743A5 JP2008517743A5 (cg-RX-API-DMAC7.html) 2008-12-04
JP5491698B2 true JP5491698B2 (ja) 2014-05-14

Family

ID=36118185

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2007538031A Expired - Lifetime JP5491698B2 (ja) 2004-10-22 2005-10-21 パターン物質を転写するための方法及びシステム
JP2007538032A Pending JP2008518401A (ja) 2004-10-22 2005-10-21 半導体ナノクリスタルを含む発光デバイス
JP2012002706A Pending JP2012134506A (ja) 2004-10-22 2012-01-11 パターン物質を転写するための方法及びシステム
JP2012052496A Expired - Lifetime JP5689842B2 (ja) 2004-10-22 2012-03-09 半導体ナノクリスタルを含む発光デバイス

Family Applications After (3)

Application Number Title Priority Date Filing Date
JP2007538032A Pending JP2008518401A (ja) 2004-10-22 2005-10-21 半導体ナノクリスタルを含む発光デバイス
JP2012002706A Pending JP2012134506A (ja) 2004-10-22 2012-01-11 パターン物質を転写するための方法及びシステム
JP2012052496A Expired - Lifetime JP5689842B2 (ja) 2004-10-22 2012-03-09 半導体ナノクリスタルを含む発光デバイス

Country Status (8)

Country Link
US (2) US20060196375A1 (cg-RX-API-DMAC7.html)
EP (4) EP2254393B1 (cg-RX-API-DMAC7.html)
JP (4) JP5491698B2 (cg-RX-API-DMAC7.html)
KR (3) KR101184300B1 (cg-RX-API-DMAC7.html)
AT (1) ATE470959T1 (cg-RX-API-DMAC7.html)
DE (1) DE602005021808D1 (cg-RX-API-DMAC7.html)
TW (2) TWI440205B (cg-RX-API-DMAC7.html)
WO (2) WO2006135435A2 (cg-RX-API-DMAC7.html)

Families Citing this family (102)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060196375A1 (en) * 2004-10-22 2006-09-07 Seth Coe-Sullivan Method and system for transferring a patterned material
US7799422B2 (en) * 2004-11-03 2010-09-21 Massachusetts Institute Of Technology Absorbing film
US7649196B2 (en) 2004-11-03 2010-01-19 Massachusetts Institute Of Technology Light emitting device
US8891575B2 (en) * 2004-11-30 2014-11-18 Massachusetts Institute Of Technology Optical feedback structures and methods of making
US20070153362A1 (en) * 2004-12-27 2007-07-05 Regents Of The University Of California Fabric having nanostructured thin-film networks
EP2546192B1 (en) 2005-02-16 2019-12-18 Massachusetts Institute Of Technology Light emitting device including semiconductor nanocrystals
US8845927B2 (en) * 2006-06-02 2014-09-30 Qd Vision, Inc. Functionalized nanoparticles and method
US9297092B2 (en) 2005-06-05 2016-03-29 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
US8718437B2 (en) * 2006-03-07 2014-05-06 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
US20080023067A1 (en) * 2005-12-27 2008-01-31 Liangbing Hu Solar cell with nanostructure electrode
US20070236138A1 (en) * 2005-12-27 2007-10-11 Liangbing Hu Organic light-emitting diodes with nanostructure film electrode(s)
US8138075B1 (en) 2006-02-06 2012-03-20 Eberlein Dietmar C Systems and methods for the manufacture of flat panel devices
KR101625224B1 (ko) * 2006-02-09 2016-05-27 큐디 비젼, 인크. 반도체 나노결정 및 도핑된 유기 물질을 포함하는 층을 포함하는 소자 및 방법
WO2007092606A2 (en) * 2006-02-09 2007-08-16 Qd Vision, Inc. Displays including semiconductor nanocrystals and methods of making same
US9093657B2 (en) 2006-02-14 2015-07-28 Massachusetts Institute Of Technology White light emitting devices
WO2007143197A2 (en) 2006-06-02 2007-12-13 Qd Vision, Inc. Light-emitting devices and displays with improved performance
US9874674B2 (en) 2006-03-07 2018-01-23 Samsung Electronics Co., Ltd. Compositions, optical component, system including an optical component, devices, and other products
WO2008070028A2 (en) * 2006-12-01 2008-06-12 Qd Vision, Inc. Improved composites and devices including nanoparticles
EP2041478B1 (en) 2006-03-07 2014-08-06 QD Vision, Inc. An article including semiconductor nanocrystals
US9951438B2 (en) 2006-03-07 2018-04-24 Samsung Electronics Co., Ltd. Compositions, optical component, system including an optical component, devices, and other products
US8849087B2 (en) 2006-03-07 2014-09-30 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
WO2007112088A2 (en) * 2006-03-24 2007-10-04 Qd Vision, Inc. Hyperspectral imaging device
WO2007117698A2 (en) * 2006-04-07 2007-10-18 Qd Vision, Inc. Composition including material, methods of depositing material, articles including same and systems for depositing material
WO2007120877A2 (en) * 2006-04-14 2007-10-25 Qd Vision, Inc. Transfer surface for manufacturing a light emitting device
US8941299B2 (en) * 2006-05-21 2015-01-27 Massachusetts Institute Of Technology Light emitting device including semiconductor nanocrystals
US9212056B2 (en) * 2006-06-02 2015-12-15 Qd Vision, Inc. Nanoparticle including multi-functional ligand and method
WO2007143227A2 (en) * 2006-06-10 2007-12-13 Qd Vision, Inc. Materials,thin films,optical filters, and devices including same
WO2008111947A1 (en) 2006-06-24 2008-09-18 Qd Vision, Inc. Methods and articles including nanomaterial
WO2008108798A2 (en) 2006-06-24 2008-09-12 Qd Vision, Inc. Methods for depositing nanomaterial, methods for fabricating a device, and methods for fabricating an array of devices
WO2008105792A2 (en) 2006-06-24 2008-09-04 Qd Vision, Inc. Methods for depositing nanomaterial, methods for fabricating a device, methods for fabricating an array of devices and compositions
US8643058B2 (en) * 2006-07-31 2014-02-04 Massachusetts Institute Of Technology Electro-optical device including nanocrystals
US8084101B2 (en) * 2006-08-01 2011-12-27 The Board of Regents of the Nevada Systems of Higher Education on behalf of the University of Nevada, Las Vegas Fabrication of patterned and ordered nanoparticles
US20080047930A1 (en) 2006-08-23 2008-02-28 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate
JP2010508620A (ja) 2006-09-12 2010-03-18 キユーデイー・ビジヨン・インコーポレーテツド 所定のパターンを表示するために有用なエレクトロルミネセントディスプレイ
WO2008033388A2 (en) * 2006-09-12 2008-03-20 Qd Vision, Inc. A composite including nanoparticles, methods, and products including a composite
US8219170B2 (en) * 2006-09-20 2012-07-10 Nellcor Puritan Bennett Llc System and method for practicing spectrophotometry using light emitting nanostructure devices
US20080083484A1 (en) * 2006-09-28 2008-04-10 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate
US20080110363A1 (en) * 2006-11-14 2008-05-15 National Chung Cheng University Physisorption-based microcontact printing process capable of controlling film thickness
WO2008063657A2 (en) * 2006-11-21 2008-05-29 Qd Vision, Inc. Light emitting devices and displays with improved performance
WO2008063653A1 (en) 2006-11-21 2008-05-29 Qd Vision, Inc. Semiconductor nanocrystals and compositions and devices including same
WO2008063658A2 (en) 2006-11-21 2008-05-29 Qd Vision, Inc. Semiconductor nanocrystals and compositions and devices including same
WO2008133660A2 (en) * 2006-11-21 2008-11-06 Qd Vision, Inc. Nanocrystals including a group iiia element and a group va element, method, composition, device and other prodcucts
WO2008063652A1 (en) 2006-11-21 2008-05-29 Qd Vision, Inc. Blue emitting semiconductor nanocrystals and compositions and devices including same
KR100850717B1 (ko) * 2006-12-06 2008-08-06 삼성전자주식회사 이미지형성체와 그 제조장치 및 방법
KR101391807B1 (ko) * 2007-01-03 2014-05-08 삼성디스플레이 주식회사 잉크젯 프린팅과 나노 임프린팅을 이용한 패턴 형성 방법
US8836212B2 (en) 2007-01-11 2014-09-16 Qd Vision, Inc. Light emissive printed article printed with quantum dot ink
US20080172197A1 (en) * 2007-01-11 2008-07-17 Motorola, Inc. Single laser multi-color projection display with quantum dot screen
US20080233489A1 (en) * 2007-03-22 2008-09-25 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material
US8222061B2 (en) * 2007-03-30 2012-07-17 The Penn State Research Foundation Mist fabrication of quantum dot devices
US7875313B2 (en) * 2007-04-05 2011-01-25 E. I. Du Pont De Nemours And Company Method to form a pattern of functional material on a substrate using a mask material
WO2009014590A2 (en) * 2007-06-25 2009-01-29 Qd Vision, Inc. Compositions and methods including depositing nanomaterial
US10043993B2 (en) * 2007-06-25 2018-08-07 Massachusetts Institute Of Technology Electro-optical device
WO2009002551A1 (en) * 2007-06-26 2008-12-31 Qd Vision, Inc. Photovoltaic devices including quantum dot down-conversion materials useful for solar cells and materials including quantum dots
US7989153B2 (en) * 2007-07-11 2011-08-02 Qd Vision, Inc. Method and apparatus for selectively patterning free standing quantum DOT (FSQDT) polymer composites
WO2009014707A2 (en) 2007-07-23 2009-01-29 Qd Vision, Inc. Quantum dot light enhancement substrate and lighting device including same
US20110079273A1 (en) * 2008-01-10 2011-04-07 Massachusetts Institute Of Technology Photovoltaic devices
WO2009089470A2 (en) * 2008-01-11 2009-07-16 Massachusetts Institute Of Technology Photovoltaic devices
WO2009099425A2 (en) * 2008-02-07 2009-08-13 Qd Vision, Inc. Flexible devices including semiconductor nanocrystals, arrays, and methods
KR101995369B1 (ko) 2008-04-03 2019-07-02 삼성 리서치 아메리카 인코포레이티드 양자점들을 포함하는 발광 소자
US9525148B2 (en) 2008-04-03 2016-12-20 Qd Vision, Inc. Device including quantum dots
JP2011524064A (ja) 2008-05-06 2011-08-25 キユーデイー・ビジヨン・インコーポレーテツド 量子閉じ込め半導体ナノ粒子を含有する固体照明装置
WO2009137053A1 (en) 2008-05-06 2009-11-12 Qd Vision, Inc. Optical components, systems including an optical component, and devices
US9207385B2 (en) 2008-05-06 2015-12-08 Qd Vision, Inc. Lighting systems and devices including same
US8507040B2 (en) 2008-05-08 2013-08-13 Air Products And Chemicals, Inc. Binary and ternary metal chalcogenide materials and method of making and using same
US8765223B2 (en) * 2008-05-08 2014-07-01 Air Products And Chemicals, Inc. Binary and ternary metal chalcogenide materials and method of making and using same
US8269985B2 (en) * 2009-05-26 2012-09-18 Zena Technologies, Inc. Determination of optimal diameters for nanowires
US20100330367A1 (en) * 2009-02-03 2010-12-30 Ut-Battelle, Llc Microbially-mediated method for synthesis of non-oxide semiconductor nanoparticles
CN102803129B (zh) 2009-04-28 2016-08-03 Qd视光有限公司 光学材料、光学部件和方法
US8536776B2 (en) * 2009-05-07 2013-09-17 Massachusetts Institute Of Technology Light emitting device including semiconductor nanocrystals
WO2010129889A2 (en) 2009-05-07 2010-11-11 Massachusetts Institute Of Technology Light emitting device including semiconductor nanocrystals
US8106420B2 (en) 2009-06-05 2012-01-31 Massachusetts Institute Of Technology Light emitting device including semiconductor nanocrystals
US9340697B2 (en) * 2009-08-14 2016-05-17 Nano-C, Inc. Solvent-based and water-based carbon nanotube inks with removable additives
EP2465147B1 (en) 2009-08-14 2019-02-27 Samsung Electronics Co., Ltd. Lighting devices, an optical component for a lighting device, and methods
CN102482457B (zh) 2009-09-09 2015-04-15 Qd视光有限公司 包含纳米颗粒的颗粒、其应用和方法
WO2011031876A1 (en) 2009-09-09 2011-03-17 Qd Vision, Inc. Formulations including nanoparticles
KR101791580B1 (ko) 2009-10-17 2017-10-30 삼성전자주식회사 광학 요소, 이를 포함한 제품, 및 그 제조 방법
KR101924080B1 (ko) 2009-11-11 2018-11-30 삼성 리서치 아메리카 인코포레이티드 양자점을 포함하는 디바이스
WO2011123786A2 (en) 2010-04-02 2011-10-06 Rhodia Operations Selective nanoparticle assembly systems and methods
TW201225370A (en) * 2010-12-15 2012-06-16 Nat Univ Tsing Hua Method for manufacturing high-quality organic light-emitting diode (OLED)
WO2012134629A1 (en) 2011-04-01 2012-10-04 Qd Vision, Inc. Quantum dots, method, and devices
WO2013019299A2 (en) 2011-05-11 2013-02-07 Qd Vision, Inc. Method for processing devices including quantum dots and devices
WO2012158832A2 (en) 2011-05-16 2012-11-22 Qd Vision, Inc. Method for preparing semiconductor nanocrystals
US9520573B2 (en) 2011-05-16 2016-12-13 Qd Vision, Inc. Device including quantum dots and method for making same
WO2013028253A1 (en) 2011-08-19 2013-02-28 Qd Vision, Inc. Semiconductor nanocrystals and methods
US9202993B2 (en) * 2011-09-21 2015-12-01 Ev Group E. Thallner Gmbh Method for producing a polychromatizing layer and substrate and also light-emitting diode having a polychromatizing layer
JP2013138179A (ja) * 2011-11-30 2013-07-11 Central Glass Co Ltd 光重合性組成物並びにそれを用いたパターン形成方法
WO2013103440A1 (en) 2012-01-06 2013-07-11 Qd Vision, Inc. Light emitting device including blue emitting quantum dots and method
US9929325B2 (en) 2012-06-05 2018-03-27 Samsung Electronics Co., Ltd. Lighting device including quantum dots
WO2014088667A2 (en) 2012-09-14 2014-06-12 Qd Vision, Inc. Light emitting device including tandem structure
KR101429118B1 (ko) * 2013-02-04 2014-08-14 한국과학기술연구원 자기조립 나노 구조물을 이용한 반사 방지막 및 그 제조방법
US9574135B2 (en) * 2013-08-22 2017-02-21 Nanoco Technologies Ltd. Gas phase enhancement of emission color quality in solid state LEDs
US20160365478A1 (en) 2013-12-27 2016-12-15 The Board Of Trustee Of The University Of Illinois Nanostructure material stack-transfer methods and devices
KR101651872B1 (ko) * 2015-04-23 2016-08-29 경북대학교 산학협력단 나노 결정 발광 다이오드 및 그 제조 방법
CN108400251B (zh) * 2018-04-23 2024-09-10 华南理工大学 一种高分辨率的钙钛矿电致发光器件及其制备方法
US11152536B2 (en) 2018-09-17 2021-10-19 The Board Of Trustees Of The University Of Illinois Photoresist contact patterning of quantum dot films
CN109301093B (zh) * 2018-09-30 2024-06-07 华南理工大学 一种导电可透光钙钛矿量子点薄膜的制备方法
KR102806941B1 (ko) * 2019-10-23 2025-05-12 엘지디스플레이 주식회사 무기발광다이오드 및 무기발광장치
WO2021083477A1 (de) * 2019-10-28 2021-05-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur herstellung einer polarisiert emittierenden leuchtdiode
IT201900020138A1 (it) * 2019-10-31 2021-05-01 Fabio Fontana Dispositivo terapeutico per patologia infiammatoria, dolorosa e una rimodulazione neuro-muscolare e posturale
US12105417B2 (en) 2021-10-05 2024-10-01 Canon Kabushiki Kaisha Method of forming a photo-cured layer
FR3149999B1 (fr) * 2023-06-16 2025-06-13 Aeroprotec Services Procede de marquage 3d
EP4523918A1 (en) * 2023-09-12 2025-03-19 FononTech Holding B.V. Deposition method and device

Family Cites Families (108)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US400908A (en) 1889-04-09 Gustav fuchs
US550314A (en) 1895-11-26 Combined ferrule and bushing
US3998573A (en) * 1972-01-17 1976-12-21 Abex Corporation Manufacture of friction elements
DE3830775A1 (de) * 1987-09-11 1989-03-23 Ricoh Kk Thermisches mimeograph-schablonenpapier
KR920007701A (ko) * 1990-10-05 1992-05-27 이시다 아키라 균일한 두께의 박막을 형성하기 위한 롤 코팅장치
US5099256A (en) * 1990-11-23 1992-03-24 Xerox Corporation Ink jet printer with intermediate drum
JP3125332B2 (ja) * 1991-06-21 2001-01-15 ソニー株式会社 量子ドットトンネル素子とそれを用いた情報処理装置及び情報処理方法
JPH05116475A (ja) 1991-10-29 1993-05-14 Kimoto & Co Ltd 表面改質孔版およびその表面改質方法
JPH07502479A (ja) * 1991-11-22 1995-03-16 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア 自己集合性単一層を使って固体無機表面に共有結合した半導体微少結晶
US5505928A (en) * 1991-11-22 1996-04-09 The Regents Of University Of California Preparation of III-V semiconductor nanocrystals
US5260957A (en) * 1992-10-29 1993-11-09 The Charles Stark Draper Laboratory, Inc. Quantum dot Laser
US5293050A (en) * 1993-03-25 1994-03-08 International Business Machines Corporation Semiconductor quantum dot light emitting/detecting devices
US6048616A (en) * 1993-04-21 2000-04-11 Philips Electronics N.A. Corp. Encapsulated quantum sized doped semiconductor particles and method of manufacturing same
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US5900160A (en) * 1993-10-04 1999-05-04 President And Fellows Of Harvard College Methods of etching articles via microcontact printing
US6180239B1 (en) * 1993-10-04 2001-01-30 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles
US5422489A (en) * 1994-01-24 1995-06-06 Bhargava; Rameshwar N. Light emitting device
US5537000A (en) * 1994-04-29 1996-07-16 The Regents, University Of California Electroluminescent devices formed using semiconductor nanocrystals as an electron transport media and method of making such electroluminescent devices
JPH0834116A (ja) * 1994-07-22 1996-02-06 Fuji Xerox Co Ltd インクジェット記録装置
US5677545A (en) * 1994-09-12 1997-10-14 Motorola Organic light emitting diodes with molecular alignment and method of fabrication
KR970706628A (ko) 1994-09-29 1997-11-03 로버츠 사이먼 크리스토퍼 양자 도트가 있는 광섬유(optical fibre with quantum dots)
FR2726185B1 (fr) * 1994-11-02 1997-04-25 Oreal Composition tinctoriale a base de colorants d'oxydation et procede de teinture mettant en oeuvre cette composition
US5585640A (en) * 1995-01-11 1996-12-17 Huston; Alan L. Glass matrix doped with activated luminescent nanocrystalline particles
AU6774996A (en) * 1995-08-18 1997-03-12 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
GB9518910D0 (en) 1995-09-15 1995-11-15 Imperial College Process
US5853446A (en) * 1996-04-16 1998-12-29 Corning Incorporated Method for forming glass rib structures
KR100457148B1 (ko) * 1996-10-10 2004-11-16 알제이알폴리머스,인코포레이티드 역 스탬핑 방법
US6103868A (en) * 1996-12-27 2000-08-15 The Regents Of The University Of California Organically-functionalized monodisperse nanocrystals of metals
US5958573A (en) 1997-02-10 1999-09-28 Quantum Energy Technologies Electroluminescent device having a structured particle electron conductor
JP4071360B2 (ja) * 1997-08-29 2008-04-02 株式会社東芝 半導体装置
JPH11135838A (ja) * 1997-10-20 1999-05-21 Ind Technol Res Inst 白色発光ダイオード及びその製造方法
US6322901B1 (en) 1997-11-13 2001-11-27 Massachusetts Institute Of Technology Highly luminescent color-selective nano-crystalline materials
US6607829B1 (en) * 1997-11-13 2003-08-19 Massachusetts Institute Of Technology Tellurium-containing nanocrystalline materials
US6236060B1 (en) * 1997-11-19 2001-05-22 International Business Machines Corporation Light emitting structures in back-end of line silicon technology
DE19812258A1 (de) * 1998-03-20 1999-09-23 Bayer Ag Elektrolumineszierende Anordnungen unter Verwendung von Blendsystemen
JPH11273859A (ja) 1998-03-24 1999-10-08 Sony Corp 有機電界発光素子及びその製造方法
US6501091B1 (en) * 1998-04-01 2002-12-31 Massachusetts Institute Of Technology Quantum dot white and colored light emitting diodes
JP4126751B2 (ja) 1998-05-26 2008-07-30 ソニー株式会社 表示装置および照明装置
US6864626B1 (en) * 1998-06-03 2005-03-08 The Regents Of The University Of California Electronic displays using optically pumped luminescent semiconductor nanocrystals
KR100809562B1 (ko) 1998-07-29 2008-03-04 더블유.에이. 샌더스 페이피어패브리크 콜덴호브 비.브이. 잉크젯 인쇄용 전사지
US6294401B1 (en) * 1998-08-19 2001-09-25 Massachusetts Institute Of Technology Nanoparticle-based electrical, chemical, and mechanical structures and methods of making same
US6617583B1 (en) * 1998-09-18 2003-09-09 Massachusetts Institute Of Technology Inventory control
US6251303B1 (en) * 1998-09-18 2001-06-26 Massachusetts Institute Of Technology Water-soluble fluorescent nanocrystals
WO2000017903A2 (en) * 1998-09-22 2000-03-30 Fed Corporation Inorganic-based color conversion matrix element for organic color display devices and method of fabrication
JP2000104058A (ja) * 1998-09-28 2000-04-11 Sony Corp 発光体の製造方法
US6506438B2 (en) * 1998-12-15 2003-01-14 E Ink Corporation Method for printing of transistor arrays on plastic substrates
JP3988309B2 (ja) * 1999-01-14 2007-10-10 ソニー株式会社 蛍光体及びその製造方法
US6348295B1 (en) * 1999-03-26 2002-02-19 Massachusetts Institute Of Technology Methods for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging
TW556357B (en) 1999-06-28 2003-10-01 Semiconductor Energy Lab Method of manufacturing an electro-optical device
JP4877675B2 (ja) * 1999-06-28 2012-02-15 株式会社半導体エネルギー研究所 電気光学装置の作製方法
US6249104B1 (en) * 1999-07-01 2001-06-19 General Electric Company Cutout start switch heating
JP2001113772A (ja) * 1999-08-11 2001-04-24 Canon Inc 画像形成装置
JP2001274528A (ja) * 2000-01-21 2001-10-05 Fujitsu Ltd 薄膜デバイスの基板間転写方法
US6797412B1 (en) * 2000-04-11 2004-09-28 University Of Connecticut Full color display structures using pseudomorphic cladded quantum dot nanophosphor thin films
US6380101B1 (en) * 2000-04-18 2002-04-30 International Business Machines Corporation Method of forming patterned indium zinc oxide and indium tin oxide films via microcontact printing and uses thereof
US7491286B2 (en) * 2000-04-21 2009-02-17 International Business Machines Corporation Patterning solution deposited thin films with self-assembled monolayers
US6887332B1 (en) * 2000-04-21 2005-05-03 International Business Machines Corporation Patterning solution deposited thin films with self-assembled monolayers
US7323143B2 (en) * 2000-05-25 2008-01-29 President And Fellows Of Harvard College Microfluidic systems including three-dimensionally arrayed channel networks
AU2001289859A1 (en) * 2000-09-05 2002-03-22 Zeptosens Ag Method for precipitating mono and multiple layers of organophosphoric and organophosphonic acids and the salts thereof in addition to use thereof
US6576291B2 (en) * 2000-12-08 2003-06-10 Massachusetts Institute Of Technology Preparation of nanocrystallites
JP2002192540A (ja) * 2000-12-22 2002-07-10 Mitsubishi Rayon Co Ltd 転写ロールおよびその加工方法、それを用いた光学シートの製造方法
EP1386523A1 (en) 2001-05-09 2004-02-04 Gakoreatech Manufacturing process of self-luminous and flexible fabric
US6896872B2 (en) 2001-06-27 2005-05-24 Svetlana A. Dambinova Rapid multiple panel of biomarkers in laboratory blood tests for TIA/stroke
US6846565B2 (en) * 2001-07-02 2005-01-25 Board Of Regents, The University Of Texas System Light-emitting nanoparticles and method of making same
JP2005512783A (ja) * 2001-07-12 2005-05-12 イーストマン コダック カンパニー 界面活性剤利用ナノ材料生成方法
WO2003092043A2 (en) * 2001-07-20 2003-11-06 Quantum Dot Corporation Luminescent nanoparticles and methods for their preparation
JP5055672B2 (ja) 2001-07-31 2012-10-24 大日本印刷株式会社 薄膜パターン形成用スタンプ
JP4340405B2 (ja) * 2001-08-09 2009-10-07 富士フイルム株式会社 有機ｅｌ素子の製造方法及び有機ｅｌ素子
EP1430549A2 (en) * 2001-09-04 2004-06-23 Koninklijke Philips Electronics N.V. Electroluminescent device comprising quantum dots
AU2002337793A1 (en) * 2001-10-02 2003-05-12 Northwestern University Protein and peptide nanoarrays
US6682189B2 (en) * 2001-10-09 2004-01-27 Nexpress Solutions Llc Ink jet imaging via coagulation on an intermediate member
US20030152703A1 (en) * 2001-10-31 2003-08-14 Hammond Paula T. Production of chemically patterned surfaces using polymer-on-polymer stamping
US7220452B2 (en) * 2001-10-31 2007-05-22 Massachusetts Institute Of Technology Multilayer transfer patterning using polymer-on-polymer stamping
KR100492729B1 (ko) * 2001-11-07 2005-06-07 엘지.필립스 엘시디 주식회사 인쇄방식에 의한 패턴형성방법
US6639527B2 (en) * 2001-11-19 2003-10-28 Hewlett-Packard Development Company, L.P. Inkjet printing system with an intermediate transfer member between the print engine and print medium
US20030103123A1 (en) * 2001-12-04 2003-06-05 Xerox Corporation Continuous transfer and fusing application system
US6494570B1 (en) * 2001-12-04 2002-12-17 Xerox Corporation Controlling gloss in an offset ink jet printer
JP2003173878A (ja) * 2001-12-05 2003-06-20 Mitsubishi Chemicals Corp 交流印可型エレクトロルミネッセンス素子
US6682872B2 (en) * 2002-01-22 2004-01-27 International Business Machines Corporation UV-curable compositions and method of use thereof in microelectronics
JP3962862B2 (ja) * 2002-02-27 2007-08-22 日立造船株式会社 カーボンナノチューブを用いた導電性材料およびその製造方法
FI20020614A7 (fi) * 2002-03-28 2003-09-29 Nokia Corp Henkilökohtainen viestinlaite, jossa on kaksi osaa ja korostuneet mahdollisuudet itseilmaisuun
AU2003218452C1 (en) 2002-03-29 2009-07-23 Massachusetts Institute Of Technology Light emitting device including semiconductor nanocrystals
US6972516B2 (en) * 2002-06-14 2005-12-06 University Of Cincinnati Photopump-enhanced electroluminescent devices
KR100864758B1 (ko) * 2002-06-19 2008-10-22 오리온오엘이디 주식회사 풀 컬러 유기 전기 발광 소자
DE10229118A1 (de) * 2002-06-28 2004-01-29 Infineon Technologies Ag Verfahren zur kostengünstigen Strukturierung von leitfähigen Polymeren mittels Definition von hydrophilen und hydrophoben Bereichen
US7319709B2 (en) * 2002-07-23 2008-01-15 Massachusetts Institute Of Technology Creating photon atoms
WO2004013697A2 (en) 2002-07-26 2004-02-12 Koninklijke Philips Electronics N.V. Micro-contact printing method
AU2003304433A1 (en) 2002-08-02 2005-03-07 Ultradots, Inc. Quantum dots, nanocomposite materials with quantum dots, optical devices with quantum dots, and related fabrication methods
EP1529317A2 (en) * 2002-08-06 2005-05-11 Avecia Limited Organic electronic devices
JP4197109B2 (ja) 2002-08-06 2008-12-17 静雄 藤田 照明装置
US7390568B2 (en) * 2002-08-13 2008-06-24 Massachusetts Institute Of Technology Semiconductor nanocrystal heterostructures having specific charge carrier confinement
JP2004178930A (ja) * 2002-11-26 2004-06-24 Sony Corp 発光素子およびこれを用いた表示装置
US6902269B2 (en) * 2002-12-09 2005-06-07 Xerox Corporation Process for curing marking component with nano-size zinc oxide filler
US7183146B2 (en) * 2003-01-17 2007-02-27 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US6918338B2 (en) * 2003-01-30 2005-07-19 Hewlett-Packard Development Company, L.P. Printing system
JP2004237545A (ja) * 2003-02-05 2004-08-26 Komuratekku:Kk 層形成用凸版
JP2004253175A (ja) * 2003-02-18 2004-09-09 Mitsubishi Chemicals Corp 電界発光素子
US20050118338A1 (en) * 2003-05-02 2005-06-02 Johns Hopkins University Control of the spatial distribution and sorting of micro-or nano-meter or molecular scale objects on patterned surfaces
US7265037B2 (en) * 2003-06-20 2007-09-04 The Regents Of The University Of California Nanowire array and nanowire solar cells and methods for forming the same
US20040265622A1 (en) 2003-06-24 2004-12-30 Eastman Kodak Company Light emitting display
US6998008B2 (en) * 2003-07-15 2006-02-14 Lexmark International, Inc. Method and apparatus for attaching an ink jet filter to an ink cartridge
US7065285B2 (en) * 2003-12-01 2006-06-20 Lucent Technologies Inc. Polymeric compositions comprising quantum dots, optical devices comprising these compositions and methods for preparing same
US7253452B2 (en) * 2004-03-08 2007-08-07 Massachusetts Institute Of Technology Blue light emitting semiconductor nanocrystal materials
US20060081557A1 (en) * 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US20060196375A1 (en) * 2004-10-22 2006-09-07 Seth Coe-Sullivan Method and system for transferring a patterned material
US7799422B2 (en) * 2004-11-03 2010-09-21 Massachusetts Institute Of Technology Absorbing film
EP2546192B1 (en) 2005-02-16 2019-12-18 Massachusetts Institute Of Technology Light emitting device including semiconductor nanocrystals
ITUB20152644A1 (it) 2015-07-30 2017-01-30 Metal Work Spa Sistema di elettrovalvole a portata maggiorata.

Also Published As

Publication number Publication date
EP2254393A1 (en) 2010-11-24
JP2008518401A (ja) 2008-05-29
DE602005021808D1 (de) 2010-07-22
JP2008517743A (ja) 2008-05-29
WO2006135435A2 (en) 2006-12-21
WO2006047215A3 (en) 2006-06-15
KR101184300B1 (ko) 2012-09-21
TWI462781B (zh) 2014-12-01
JP2012134506A (ja) 2012-07-12
EP2498274B1 (en) 2014-09-17
TWI440205B (zh) 2014-06-01
TW200621382A (en) 2006-07-01
EP1807863A2 (en) 2007-07-18
WO2006135435A3 (en) 2007-02-08
KR20070085282A (ko) 2007-08-27
ATE470959T1 (de) 2010-06-15
WO2006047215A2 (en) 2006-05-04
EP2498274A1 (en) 2012-09-12
TW200620713A (en) 2006-06-16
KR101484508B1 (ko) 2015-01-21
EP1803174A2 (en) 2007-07-04
KR20070088623A (ko) 2007-08-29
US20060196375A1 (en) 2006-09-07
KR101369205B1 (ko) 2014-03-04
US10225906B2 (en) 2019-03-05
EP2254393B1 (en) 2016-05-11
JP5689842B2 (ja) 2015-03-25
US20080001167A1 (en) 2008-01-03
EP1807863B1 (en) 2015-12-23
EP1803174B1 (en) 2010-06-09
KR20130133081A (ko) 2013-12-05
JP2012142296A (ja) 2012-07-26

Similar Documents

Publication Publication Date Title
JP5491698B2 (ja) パターン物質を転写するための方法及びシステム
US10770619B2 (en) Light-emitting devices and displays with improved performance
CN101490785B (zh) 包含半导体纳米晶体的发光器件
US9034669B2 (en) Methods of depositing nanomaterial and methods of making a device
US20100051901A1 (en) Light emitting devices and displays with improved performance
US20100068468A1 (en) Composites and devices including nanoparticles
JP2010508620A (ja) 所定のパターンを表示するために有用なエレクトロルミネセントディスプレイ
CN101088143B (zh) 用于转移图案化的材料的方法和系统

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081017

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20081017

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110620

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110712

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20111005

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20111013

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120110

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121030

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20130123

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20130130

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130430

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140204

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140228

R150 Certificate of patent or registration of utility model

Ref document number: 5491698

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250