JP5453378B2 - 半導体材料から構成された基板を研磨する方法 - Google Patents
半導体材料から構成された基板を研磨する方法 Download PDFInfo
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- JP5453378B2 JP5453378B2 JP2011248831A JP2011248831A JP5453378B2 JP 5453378 B2 JP5453378 B2 JP 5453378B2 JP 2011248831 A JP2011248831 A JP 2011248831A JP 2011248831 A JP2011248831 A JP 2011248831A JP 5453378 B2 JP5453378 B2 JP 5453378B2
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- polishing
- substrate
- abrasive
- silicon
- polishing pad
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- 238000005498 polishing Methods 0.000 title claims description 129
- 239000000758 substrate Substances 0.000 title claims description 57
- 238000000034 method Methods 0.000 title claims description 31
- 239000004065 semiconductor Substances 0.000 title description 32
- 239000000463 material Substances 0.000 title description 15
- 239000010703 silicon Substances 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 18
- 239000002002 slurry Substances 0.000 claims description 16
- 238000007517 polishing process Methods 0.000 claims description 15
- 239000006260 foam Substances 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 239000003082 abrasive agent Substances 0.000 claims description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 6
- 239000012459 cleaning agent Substances 0.000 claims description 5
- 239000007800 oxidant agent Substances 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052684 Cerium Inorganic materials 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 229910000927 Ge alloy Inorganic materials 0.000 claims 3
- 229910000676 Si alloy Inorganic materials 0.000 claims 3
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 26
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000010410 layer Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000000654 additive Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 229910052732 germanium Inorganic materials 0.000 description 4
- -1 Si x Ge 1 -x Substances 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000007494 plate polishing Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 239000003899 bactericide agent Substances 0.000 description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000013067 intermediate product Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 229920002323 Silicone foam Polymers 0.000 description 1
- 229910020751 SixGe1-x Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 description 1
- 238000004630 atomic force microscopy Methods 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000002984 plastic foam Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- ODGAOXROABLFNM-UHFFFAOYSA-N polynoxylin Chemical compound O=C.NC(N)=O ODGAOXROABLFNM-UHFFFAOYSA-N 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920006327 polystyrene foam Polymers 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000013514 silicone foam Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- DVUVKWLUHXXIHK-UHFFFAOYSA-N tetraazanium;tetrahydroxide Chemical compound [NH4+].[NH4+].[NH4+].[NH4+].[OH-].[OH-].[OH-].[OH-] DVUVKWLUHXXIHK-UHFFFAOYSA-N 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000004639 urea-formaldehyde foam Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02024—Mirror polishing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
研磨パッド中に結合された研磨材を含有する研磨パッド上で基板を研磨し、研磨剤溶液が研磨工程中に基板と研磨パッドとの間に導入される、タイプAの少なくとも1つの研磨工程;および
研磨パッド中に結合された研磨材を含有する研磨パッド上で基板を研磨し、結合されていない研磨材を含有する研磨剤スラリーが研磨工程中に基板と研磨パッドとの間に導入される、タイプBの少なくとも1つの研磨工程を有する、半導体材料から構成された基板を研磨する方法により達成される。
Claims (9)
- ケイ素から構成された基板又はケイ素とゲルマニウムの合金から構成された層を有するケイ素から構成された基板を研磨する方法であって、
結合された研磨材を含有する研磨パッド上で基板を研磨し、固体を含有しない研磨剤溶液が研磨工程A中に基板と研磨パッドとの間に導入される、少なくとも1つの研磨工程A、および
結合された研磨材を含有する研磨パッド上で研磨工程Aに供された基板を研磨し、研磨工程B中に基板と研磨パッドとの間に研磨材を含有する研磨剤スラリーが導入される、少なくとも1つの研磨工程B
によって基板を研磨することを含み、
基板を結合された研磨材を含有しない研磨パッドを用いて研磨する少なくとも1つの研磨工程Cをさらに有し、研磨材を含有する研磨剤スラリーを研磨工程C中に基板と研磨パッドとの間に導入する、方法。 - 研磨工程Aおよび研磨工程Bを同じ研磨板上で実施する、請求項1記載の方法。
- 研磨工程Aおよび研磨工程Bを異なる研磨板上で実施する、請求項1記載の方法。
- 研磨剤スラリーは、元素のアルミニウム、セリウムまたはケイ素の1つ以上の酸化物を研磨材として含有する、請求項1から3までのいずれか1項に記載の方法。
- 研磨剤スラリーは、0.25〜20質量%の固体量を有する、請求項4記載の方法。
- 研磨剤スラリーは酸化剤を含有し、基板はケイ素とゲルマニウムの合金から構成された層を有するケイ素基板である、請求項4または5記載の方法。
- 固体を含有しない研磨剤溶液は酸化剤を含有し、基板はケイ素とゲルマニウムの合金から構成された層を有するケイ素基板である、請求項1記載の方法。
- 清浄剤を研磨パッド上に開放気泡フォーム体を利用して分布させることにより、研磨パッドを研磨工程中に清浄化する、請求項1から7までのいずれか1項に記載の方法。
- 研磨工程Aまたは研磨工程Bの後、またはこれら双方の研磨工程後に基板をエッチングするかまたは清浄化する、請求項1から8までのいずれか1項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007035266A DE102007035266B4 (de) | 2007-07-27 | 2007-07-27 | Verfahren zum Polieren eines Substrates aus Silicium oder einer Legierung aus Silicium und Germanium |
DE102007035266.4 | 2007-07-27 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008184841A Division JP5121612B2 (ja) | 2007-07-27 | 2008-07-16 | 半導体材料から構成された基板を研磨する方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012060149A JP2012060149A (ja) | 2012-03-22 |
JP5453378B2 true JP5453378B2 (ja) | 2014-03-26 |
Family
ID=40157304
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008184841A Expired - Fee Related JP5121612B2 (ja) | 2007-07-27 | 2008-07-16 | 半導体材料から構成された基板を研磨する方法 |
JP2011248831A Expired - Fee Related JP5453378B2 (ja) | 2007-07-27 | 2011-11-14 | 半導体材料から構成された基板を研磨する方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008184841A Expired - Fee Related JP5121612B2 (ja) | 2007-07-27 | 2008-07-16 | 半導体材料から構成された基板を研磨する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8647985B2 (ja) |
JP (2) | JP5121612B2 (ja) |
KR (1) | KR100979737B1 (ja) |
CN (1) | CN101355032B (ja) |
DE (1) | DE102007035266B4 (ja) |
SG (1) | SG149772A1 (ja) |
TW (1) | TWI470684B (ja) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008053610B4 (de) | 2008-10-29 | 2011-03-31 | Siltronic Ag | Verfahren zum beidseitigen Polieren einer Halbleiterscheibe |
US8338301B1 (en) * | 2008-11-06 | 2012-12-25 | Stc.Unm | Slurry-free chemical mechanical planarization (CMP) of engineered germanium-on-silicon wafers |
DE102008059044B4 (de) | 2008-11-26 | 2013-08-22 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe mit einer verspannt-relaxierten Si1-xGex-Schicht |
DE102009025243B4 (de) | 2009-06-17 | 2011-11-17 | Siltronic Ag | Verfahren zur Herstellung und Verfahren zur Bearbeitung einer Halbleiterscheibe aus Silicium |
DE102009025242B4 (de) * | 2009-06-17 | 2013-05-23 | Siltronic Ag | Verfahren zum beidseitigen chemischen Schleifen einer Halbleiterscheibe |
DE102009030298B4 (de) | 2009-06-24 | 2012-07-12 | Siltronic Ag | Verfahren zur lokalen Politur einer Halbleiterscheibe |
DE102009030294B4 (de) * | 2009-06-24 | 2013-04-25 | Siltronic Ag | Verfahren zur Politur der Kante einer Halbleiterscheibe |
DE102009030292B4 (de) * | 2009-06-24 | 2011-12-01 | Siltronic Ag | Verfahren zum beidseitigen Polieren einer Halbleiterscheibe |
DE102009030296B4 (de) * | 2009-06-24 | 2013-05-08 | Siltronic Ag | Verfahren zur Herstellung einer epitaxierten Siliciumscheibe |
DE102009030297B3 (de) | 2009-06-24 | 2011-01-20 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
DE102009030295B4 (de) * | 2009-06-24 | 2014-05-08 | Siltronic Ag | Verfahren zur Herstellung einer Halbleiterscheibe |
JP5795461B2 (ja) | 2009-08-19 | 2015-10-14 | 株式会社Sumco | エピタキシャルシリコンウェーハの製造方法 |
DE102009038941B4 (de) | 2009-08-26 | 2013-03-21 | Siltronic Ag | Verfahren zur Herstellung einer Halbleiterscheibe |
DE102009047926A1 (de) * | 2009-10-01 | 2011-04-14 | Siltronic Ag | Verfahren zum Polieren von Halbleiterscheiben |
DE102009051007B4 (de) * | 2009-10-28 | 2011-12-22 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
DE102009051008B4 (de) | 2009-10-28 | 2013-05-23 | Siltronic Ag | Verfahren zur Herstellung einer Halbleiterscheibe |
DE102009052744B4 (de) * | 2009-11-11 | 2013-08-29 | Siltronic Ag | Verfahren zur Politur einer Halbleiterscheibe |
DE102009057593A1 (de) * | 2009-12-09 | 2011-06-16 | Siltronic Ag | Verfahren zur Herstellung einer Halbleiterscheibe |
DE102010005904B4 (de) | 2010-01-27 | 2012-11-22 | Siltronic Ag | Verfahren zur Herstellung einer Halbleiterscheibe |
DE102010010885B4 (de) | 2010-03-10 | 2017-06-08 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
DE102010013519B4 (de) | 2010-03-31 | 2012-12-27 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
DE102010013520B4 (de) * | 2010-03-31 | 2013-02-07 | Siltronic Ag | Verfahren zur beidseitigen Politur einer Halbleiterscheibe |
DE102010014874A1 (de) | 2010-04-14 | 2011-10-20 | Siltronic Ag | Verfahren zur Herstellung einer Halbleiterscheibe |
JP5919189B2 (ja) * | 2010-04-28 | 2016-05-18 | 株式会社バイコウスキージャパン | サファイア研磨用スラリー、及びサファイアの研磨方法 |
DE102010026352A1 (de) * | 2010-05-05 | 2011-11-10 | Siltronic Ag | Verfahren zur gleichzeitigen beidseitigen Material abtragenden Bearbeitung einer Halbleiterscheibe |
DE102010024040A1 (de) | 2010-06-16 | 2011-12-22 | Siltronic Ag | Verfahren zur Politur einer Halbleiterscheibe |
DE102011082777A1 (de) | 2011-09-15 | 2012-02-09 | Siltronic Ag | Verfahren zum beidseitigen Polieren einer Halbleiterscheibe |
US9238755B2 (en) | 2011-11-25 | 2016-01-19 | Fujima Incorporated | Polishing composition |
DE102011089362B4 (de) | 2011-12-21 | 2014-01-16 | Siltronic Ag | Verfahren zum Polieren eines Substrates aus Halbleitermaterial |
DE102012201516A1 (de) | 2012-02-02 | 2013-08-08 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
JP6132315B2 (ja) * | 2012-04-18 | 2017-05-24 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
DE102012214998B4 (de) | 2012-08-23 | 2014-07-24 | Siltronic Ag | Verfahren zum beidseitigen Bearbeiten einer Halbleiterscheibe |
DE102012218745A1 (de) | 2012-10-15 | 2014-04-17 | Siltronic Ag | Verfahren zum beidseitigen Bearbeiten einer Halbleiterscheibe |
DE102013204839A1 (de) | 2013-03-19 | 2014-09-25 | Siltronic Ag | Verfahren zum Polieren einer Scheibe aus Halbleitermaterial |
DE102013205448A1 (de) | 2013-03-27 | 2014-10-16 | Siltronic Ag | Verfahren zum Polieren eines Substrates aus Halbleitermaterial |
DE102013213838A1 (de) | 2013-07-15 | 2014-09-25 | Siltronic Ag | Verfahren zum Polieren eines Substrates aus Halbleitermaterial |
JP6259723B2 (ja) * | 2014-06-18 | 2018-01-10 | 株式会社フジミインコーポレーテッド | シリコンウェーハの研磨方法、研磨用組成物および研磨用組成物セット |
CN107014653A (zh) * | 2017-04-18 | 2017-08-04 | 西华大学 | 检测用高硅铝合金样品及其制备方法 |
CN109689946B (zh) * | 2017-04-28 | 2021-03-12 | Jx金属株式会社 | 半导体晶圆及半导体晶圆的研磨方法 |
US11415971B2 (en) | 2020-02-10 | 2022-08-16 | Globalwafers Co., Ltd. | Systems and methods for enhanced wafer manufacturing |
CN117431013B (zh) * | 2023-12-21 | 2024-04-26 | 芯越微电子材料(嘉兴)有限公司 | 一种化学机械抛光液及抛光方法 |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5152917B1 (en) | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
EP0779655A3 (en) * | 1995-12-14 | 1997-07-16 | International Business Machines Corporation | A method of chemically-mechanically polishing an electronic component |
US5624303A (en) * | 1996-01-22 | 1997-04-29 | Micron Technology, Inc. | Polishing pad and a method for making a polishing pad with covalently bonded particles |
JP2000315665A (ja) | 1999-04-29 | 2000-11-14 | Ebara Corp | 研磨方法及び装置 |
JPH1052816A (ja) * | 1996-08-13 | 1998-02-24 | M Ii M C Kk | ワイヤ式切断方法 |
US5876268A (en) * | 1997-01-03 | 1999-03-02 | Minnesota Mining And Manufacturing Company | Method and article for the production of optical quality surfaces on glass |
US5897426A (en) * | 1998-04-24 | 1999-04-27 | Applied Materials, Inc. | Chemical mechanical polishing with multiple polishing pads |
KR20010039590A (ko) * | 1999-04-29 | 2001-05-15 | 마에다 시게루 | 작업대상물을 폴리싱하는 방법 및 장치 |
US6261157B1 (en) | 1999-05-25 | 2001-07-17 | Applied Materials, Inc. | Selective damascene chemical mechanical polishing |
US6509269B2 (en) * | 1999-10-19 | 2003-01-21 | Applied Materials, Inc. | Elimination of pad glazing for Al CMP |
JP3439402B2 (ja) | 1999-11-05 | 2003-08-25 | Necエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP3841995B2 (ja) * | 1999-12-28 | 2006-11-08 | Necエレクトロニクス株式会社 | 化学的機械的研磨用スラリー |
JP3869608B2 (ja) * | 2000-01-25 | 2007-01-17 | Necエレクトロニクス株式会社 | 防食剤 |
DE10004578C1 (de) | 2000-02-03 | 2001-07-26 | Wacker Siltronic Halbleitermat | Verfahren zur Herstellung einer Halbleiterscheibe mit polierter Kante |
JP2001291720A (ja) | 2000-04-05 | 2001-10-19 | Hitachi Ltd | 半導体集積回路装置および半導体集積回路装置の製造方法 |
US6387289B1 (en) * | 2000-05-04 | 2002-05-14 | Micron Technology, Inc. | Planarizing machines and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies |
JP3993369B2 (ja) * | 2000-07-14 | 2007-10-17 | 株式会社東芝 | 半導体装置の製造方法 |
JP3617665B2 (ja) * | 2001-01-29 | 2005-02-09 | 三菱住友シリコン株式会社 | 半導体ウェーハ用研磨布 |
US7104869B2 (en) * | 2001-07-13 | 2006-09-12 | Applied Materials, Inc. | Barrier removal at low polish pressure |
DE10159833C1 (de) | 2001-12-06 | 2003-06-18 | Wacker Siltronic Halbleitermat | Verfahren zur Herstellung einer Vielzahl von Halbleiterscheiben |
EP1472047A1 (en) * | 2002-01-17 | 2004-11-03 | Nutool, Inc. | Advanced chemical mechanical polishing system with smart endpoint detection |
JP2003260663A (ja) | 2002-03-07 | 2003-09-16 | Ebara Corp | ポリッシング装置及びポリッシング方法 |
US20040127045A1 (en) * | 2002-09-12 | 2004-07-01 | Gorantla Venkata R. K. | Chemical mechanical planarization of wafers or films using fixed polishing pads and a nanoparticle composition |
JP4345357B2 (ja) * | 2003-05-27 | 2009-10-14 | 株式会社Sumco | 半導体ウェーハの製造方法 |
JP2004356336A (ja) * | 2003-05-28 | 2004-12-16 | Sumitomo Mitsubishi Silicon Corp | 半導体ウェーハの両面研磨方法 |
US7968465B2 (en) * | 2003-08-14 | 2011-06-28 | Dupont Air Products Nanomaterials Llc | Periodic acid compositions for polishing ruthenium/low K substrates |
US20050227590A1 (en) | 2004-04-09 | 2005-10-13 | Chien-Min Sung | Fixed abrasive tools and associated methods |
US7210988B2 (en) * | 2004-08-24 | 2007-05-01 | Applied Materials, Inc. | Method and apparatus for reduced wear polishing pad conditioning |
JP4759298B2 (ja) | 2005-03-30 | 2011-08-31 | 株式会社フジミインコーポレーテッド | 単結晶表面用の研磨剤及び研磨方法 |
JP4820108B2 (ja) * | 2005-04-25 | 2011-11-24 | コマツNtc株式会社 | 半導体ウエーハの製造方法およびワークのスライス方法ならびにそれらに用いられるワイヤソー |
US7229873B2 (en) * | 2005-08-10 | 2007-06-12 | Texas Instruments Incorporated | Process for manufacturing dual work function metal gates in a microelectronics device |
JP2007095840A (ja) | 2005-09-27 | 2007-04-12 | Fujifilm Corp | 化学的機械的研磨方法 |
JP2007103515A (ja) * | 2005-09-30 | 2007-04-19 | Fujimi Inc | 研磨方法 |
DE102007019565A1 (de) * | 2007-04-25 | 2008-09-04 | Siltronic Ag | Verfahren zum einseitigen Polieren von Halbleiterscheiben und Halbleiterscheibe mit einer verspannt-relaxierten Si1-xGex-Schicht |
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KR100979737B1 (ko) | 2010-09-07 |
DE102007035266A1 (de) | 2009-01-29 |
US20090029552A1 (en) | 2009-01-29 |
TWI470684B (zh) | 2015-01-21 |
JP5121612B2 (ja) | 2013-01-16 |
CN101355032B (zh) | 2010-12-01 |
CN101355032A (zh) | 2009-01-28 |
SG149772A1 (en) | 2009-02-27 |
US8647985B2 (en) | 2014-02-11 |
JP2012060149A (ja) | 2012-03-22 |
KR20090012053A (ko) | 2009-02-02 |
JP2009033159A (ja) | 2009-02-12 |
TW200905737A (en) | 2009-02-01 |
DE102007035266B4 (de) | 2010-03-25 |
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