JP5451150B2 - X線用線源格子、x線位相コントラスト像の撮像装置 - Google Patents
X線用線源格子、x線位相コントラスト像の撮像装置 Download PDFInfo
- Publication number
- JP5451150B2 JP5451150B2 JP2009094998A JP2009094998A JP5451150B2 JP 5451150 B2 JP5451150 B2 JP 5451150B2 JP 2009094998 A JP2009094998 A JP 2009094998A JP 2009094998 A JP2009094998 A JP 2009094998A JP 5451150 B2 JP5451150 B2 JP 5451150B2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- grating
- partial
- phase
- ray source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009094998A JP5451150B2 (ja) | 2008-04-15 | 2009-04-09 | X線用線源格子、x線位相コントラスト像の撮像装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008105355 | 2008-04-15 | ||
| JP2008105355 | 2008-04-15 | ||
| JP2009094998A JP5451150B2 (ja) | 2008-04-15 | 2009-04-09 | X線用線源格子、x線位相コントラスト像の撮像装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009276342A JP2009276342A (ja) | 2009-11-26 |
| JP2009276342A5 JP2009276342A5 (enExample) | 2012-06-07 |
| JP5451150B2 true JP5451150B2 (ja) | 2014-03-26 |
Family
ID=40758687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009094998A Expired - Fee Related JP5451150B2 (ja) | 2008-04-15 | 2009-04-09 | X線用線源格子、x線位相コントラスト像の撮像装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8243879B2 (enExample) |
| EP (1) | EP2248135A1 (enExample) |
| JP (1) | JP5451150B2 (enExample) |
| CN (1) | CN102047344B (enExample) |
| WO (1) | WO2009128550A1 (enExample) |
Families Citing this family (81)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5587985B2 (ja) * | 2009-05-19 | 2014-09-10 | コーニンクレッカ フィリップス エヌ ヴェ | 位相コントラストイメージング用格子 |
| JP5459659B2 (ja) * | 2009-10-09 | 2014-04-02 | キヤノン株式会社 | X線位相コントラスト像の撮像に用いられる位相格子、該位相格子を用いた撮像装置、x線コンピューター断層撮影システム |
| CN102651994A (zh) * | 2009-12-10 | 2012-08-29 | 皇家飞利浦电子股份有限公司 | 微分相位对比成像系统的校准 |
| JP5578868B2 (ja) * | 2010-01-26 | 2014-08-27 | キヤノン株式会社 | 光源格子、該光源格子を備えたx線位相コントラスト像の撮像装置、x線コンピューター断層撮影システム |
| US8532252B2 (en) * | 2010-01-27 | 2013-09-10 | Canon Kabushiki Kaisha | X-ray shield grating, manufacturing method therefor, and X-ray imaging apparatus |
| JP2012068225A (ja) * | 2010-08-25 | 2012-04-05 | Fujifilm Corp | 放射線画像撮影用グリッド及びその製造方法 |
| JP5504104B2 (ja) * | 2010-08-31 | 2014-05-28 | 株式会社東芝 | Moコリメータおよびそれを用いたX線検出器並びにCT装置 |
| WO2012032950A1 (en) * | 2010-09-08 | 2012-03-15 | Canon Kabushiki Kaisha | X-ray differential phase contrast imaging using a two-dimensional source grating with pinhole apertures and two-dimensional phase and absorption gratings |
| JP2012103237A (ja) * | 2010-10-14 | 2012-05-31 | Canon Inc | 撮像装置 |
| RU2573114C2 (ru) * | 2010-10-19 | 2016-01-20 | Конинклейке Филипс Электроникс Н.В. | Формирование изображений методом дифференциального фазового контраста |
| RU2572644C2 (ru) * | 2010-10-19 | 2016-01-20 | Конинклейке Филипс Электроникс Н.В. | Формирование дифференциальных фазово-контрастных изображений |
| JP2012095865A (ja) * | 2010-11-02 | 2012-05-24 | Fujifilm Corp | 放射線撮影装置、放射線撮影システム |
| RU2013126110A (ru) * | 2010-11-08 | 2014-12-20 | Конинклейке Филипс Электроникс Н.В. | Дифракционная решетка для получения фазоконтрастного изображения |
| US10734128B2 (en) * | 2011-02-01 | 2020-08-04 | Koninklijke Philips N.V. | Differential phase-contrast imaging with focussing deflection structure plates |
| US9287017B2 (en) * | 2011-02-07 | 2016-03-15 | Koninklijke Philips N.V. | Differential phase-contrast imaging with increased dynamic range |
| JP5930614B2 (ja) * | 2011-06-02 | 2016-06-08 | キヤノン株式会社 | X線撮像装置 |
| US20150117599A1 (en) | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
| US9826949B2 (en) * | 2012-03-05 | 2017-11-28 | University Of Rochester | Methods and apparatus for differential phase-contrast cone-beam CT and hybrid cone-beam CT |
| US20130259194A1 (en) * | 2012-03-30 | 2013-10-03 | Kwok L. Yip | Hybrid slot-scanning grating-based differential phase contrast imaging system for medical radiographic imaging |
| WO2013187970A2 (en) * | 2012-05-14 | 2013-12-19 | The General Hospital Corporation | Method for coded-source phase contrast x-ray imaging |
| FI20126119L (fi) | 2012-10-29 | 2014-04-30 | Teknologian Tutkimuskeskus Vtt Oy | Interferometrinen dynaamihila-kuvannusmenetelmä, diffraktiohila ja kuvannuslaitteisto |
| US8989347B2 (en) | 2012-12-19 | 2015-03-24 | General Electric Company | Image reconstruction method for differential phase contrast X-ray imaging |
| US9724063B2 (en) | 2012-12-21 | 2017-08-08 | Carestream Health, Inc. | Surrogate phantom for differential phase contrast imaging |
| US9357975B2 (en) | 2013-12-30 | 2016-06-07 | Carestream Health, Inc. | Large FOV phase contrast imaging based on detuned configuration including acquisition and reconstruction techniques |
| US9907524B2 (en) | 2012-12-21 | 2018-03-06 | Carestream Health, Inc. | Material decomposition technique using x-ray phase contrast imaging system |
| US10096098B2 (en) | 2013-12-30 | 2018-10-09 | Carestream Health, Inc. | Phase retrieval from differential phase contrast imaging |
| US9494534B2 (en) | 2012-12-21 | 2016-11-15 | Carestream Health, Inc. | Material differentiation with phase contrast imaging |
| US9700267B2 (en) | 2012-12-21 | 2017-07-11 | Carestream Health, Inc. | Method and apparatus for fabrication and tuning of grating-based differential phase contrast imaging system |
| US10578563B2 (en) | 2012-12-21 | 2020-03-03 | Carestream Health, Inc. | Phase contrast imaging computed tomography scanner |
| US9014333B2 (en) | 2012-12-31 | 2015-04-21 | General Electric Company | Image reconstruction methods for differential phase contrast X-ray imaging |
| DE102013205406A1 (de) * | 2013-03-27 | 2014-10-16 | Siemens Aktiengesellschaft | Röntgenaufnahmesystem zur Röntgenbildgebung bei hohen Bildfrequenzen eines Untersuchungsobjekts mittels direkter Messung des Interferenzmusters |
| EP2827339A1 (en) * | 2013-07-16 | 2015-01-21 | Canon Kabushiki Kaisha | Source grating, interferometer, and object information acquisition system |
| JP6362103B2 (ja) * | 2013-09-04 | 2018-07-25 | キヤノン株式会社 | 遮蔽格子及びトールボット干渉計 |
| US10269528B2 (en) | 2013-09-19 | 2019-04-23 | Sigray, Inc. | Diverging X-ray sources using linear accumulation |
| US10297359B2 (en) | 2013-09-19 | 2019-05-21 | Sigray, Inc. | X-ray illumination system with multiple target microstructures |
| US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
| EP3042383A1 (de) | 2013-10-07 | 2016-07-13 | Siemens Healthcare GmbH | Phasenkontrast-röntgenbildgebungsvorrichtung und phasengitter für eine solche |
| US10304580B2 (en) | 2013-10-31 | 2019-05-28 | Sigray, Inc. | Talbot X-ray microscope |
| USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
| US20150325322A1 (en) * | 2014-05-08 | 2015-11-12 | General Electric Company | X-ray anti-scatter grid |
| US10401309B2 (en) | 2014-05-15 | 2019-09-03 | Sigray, Inc. | X-ray techniques using structured illumination |
| DE102014221599A1 (de) * | 2014-10-23 | 2016-04-28 | Siemens Aktiengesellschaft | Vorrichtung und Verfahren zur Röntgen-Phasenkontrast-Bildgebung |
| CN105628718A (zh) | 2014-11-04 | 2016-06-01 | 同方威视技术股份有限公司 | 多能谱x射线光栅成像系统与成像方法 |
| JP6633087B2 (ja) | 2015-01-28 | 2020-01-22 | レイア、インコーポレイテッドLeia Inc. | 3次元(3d)電子ディスプレイ |
| CN106033133B (zh) * | 2015-03-11 | 2019-09-17 | 同方威视技术股份有限公司 | 一种光栅、制造方法和辐射成像装置 |
| US10352880B2 (en) | 2015-04-29 | 2019-07-16 | Sigray, Inc. | Method and apparatus for x-ray microscopy |
| US10541061B2 (en) * | 2015-06-29 | 2020-01-21 | Koninklijke Philips N.V. | System for generating and collimating an X-ray beam |
| US10295486B2 (en) | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
| US20180001111A1 (en) * | 2016-06-30 | 2018-01-04 | The Johns Hopkins University | Method for optimizing radiation beam intensity profile shape using dual multiple aperture devices |
| EP3520697B1 (en) * | 2016-09-27 | 2021-04-14 | Shimadzu Corporation | Radiation phase-contrast imaging device |
| US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
| JP6753342B2 (ja) * | 2017-03-15 | 2020-09-09 | 株式会社島津製作所 | 放射線格子検出器およびx線検査装置 |
| WO2018175570A1 (en) | 2017-03-22 | 2018-09-27 | Sigray, Inc. | Method of performing x-ray spectroscopy and x-ray absorption spectrometer system |
| WO2019087605A1 (ja) * | 2017-10-31 | 2019-05-09 | 株式会社島津製作所 | X線位相差撮像システム |
| US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
| WO2019236384A1 (en) | 2018-06-04 | 2019-12-12 | Sigray, Inc. | Wavelength dispersive x-ray spectrometer |
| JP7117452B2 (ja) | 2018-07-26 | 2022-08-12 | シグレイ、インコーポレイテッド | 高輝度反射型x線源 |
| US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
| US10962491B2 (en) | 2018-09-04 | 2021-03-30 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
| DE112019004478T5 (de) | 2018-09-07 | 2021-07-08 | Sigray, Inc. | System und verfahren zur röntgenanalyse mit wählbarer tiefe |
| WO2021046059A1 (en) | 2019-09-03 | 2021-03-11 | Sigray, Inc. | System and method for computed laminography x-ray fluorescence imaging |
| CN110833427B (zh) * | 2019-11-29 | 2021-01-29 | 清华大学 | 光栅成像系统及其扫描方法 |
| US11175243B1 (en) | 2020-02-06 | 2021-11-16 | Sigray, Inc. | X-ray dark-field in-line inspection for semiconductor samples |
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| CN115667896B (zh) | 2020-05-18 | 2024-06-21 | 斯格瑞公司 | 使用晶体分析器和多个检测元件的x射线吸收光谱的系统和方法 |
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| CN113205899B (zh) * | 2021-04-25 | 2023-02-28 | 中国工程物理研究院激光聚变研究中心 | 一种x射线折射闪耀光栅及制备方法 |
| CN114371529B (zh) * | 2022-01-30 | 2024-01-09 | 珠海莫界科技有限公司 | 一种堆叠光栅及ar显示装置 |
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| DE112023001408T5 (de) | 2022-03-15 | 2025-02-13 | Sigray, Inc. | System und verfahren für die kompakte laminographie unter verwendung einer mikrofokus-transmissionsröntgenquelle und eines röntgendetektors mit variabler vergrösserung |
| CN119173759A (zh) | 2022-05-02 | 2024-12-20 | 斯格瑞公司 | X射线顺序阵列波长色散光谱仪 |
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| WO2025101530A1 (en) | 2023-11-07 | 2025-05-15 | Sigray, Inc. | System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes |
| US12429436B2 (en) | 2024-01-08 | 2025-09-30 | Sigray, Inc. | X-ray analysis system with focused x-ray beam and non-x-ray microscope |
| WO2025155719A1 (en) | 2024-01-18 | 2025-07-24 | Sigray, Inc. | Sequential array of x-ray imaging detectors |
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| CN118131380A (zh) * | 2024-04-03 | 2024-06-04 | 清华大学 | 高深宽比x射线光栅的制造方法及高深宽比x射线光栅 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4327966A (en) | 1980-02-25 | 1982-05-04 | Bell Telephone Laboratories, Incorporated | Variable attenuator for laser radiation |
| US5812629A (en) | 1997-04-30 | 1998-09-22 | Clauser; John F. | Ultrahigh resolution interferometric x-ray imaging |
| US6175615B1 (en) | 1999-04-12 | 2001-01-16 | General Electric Company | Radiation imager collimator |
| DE102006037254B4 (de) * | 2006-02-01 | 2017-08-03 | Paul Scherer Institut | Fokus-Detektor-Anordnung zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen mit röntgenoptischen Gittern, sowie Röntgen-System, Röntgen-C-Bogen-System und Röntgen-Computer-Tomographie-System |
| DE102006037281A1 (de) * | 2006-02-01 | 2007-08-09 | Siemens Ag | Röntgenoptisches Durchstrahlungsgitter einer Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen von einem Untersuchungsobjekt |
| DE102006015356B4 (de) * | 2006-02-01 | 2016-09-22 | Siemens Healthcare Gmbh | Verfahren zur Erzeugung projektiver und tomographischer Phasenkontrastaufnahmen mit einem Röntgen-System |
| CN101044987A (zh) * | 2006-02-01 | 2007-10-03 | 西门子公司 | 产生投影的和断层造影的相位对比照片的x射线ct系统 |
| US7400703B2 (en) * | 2006-08-11 | 2008-07-15 | General Electric Company | Method and system for controlling radiation intensity of an imaging system |
-
2009
- 2009-04-09 JP JP2009094998A patent/JP5451150B2/ja not_active Expired - Fee Related
- 2009-04-13 EP EP09733319A patent/EP2248135A1/en not_active Withdrawn
- 2009-04-13 CN CN2009801128512A patent/CN102047344B/zh not_active Expired - Fee Related
- 2009-04-13 WO PCT/JP2009/057807 patent/WO2009128550A1/en not_active Ceased
- 2009-04-13 US US12/594,243 patent/US8243879B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009128550A9 (en) | 2011-01-27 |
| CN102047344A (zh) | 2011-05-04 |
| US8243879B2 (en) | 2012-08-14 |
| CN102047344B (zh) | 2013-11-06 |
| US20100246764A1 (en) | 2010-09-30 |
| JP2009276342A (ja) | 2009-11-26 |
| EP2248135A1 (en) | 2010-11-10 |
| WO2009128550A1 (en) | 2009-10-22 |
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