JP5451150B2 - X線用線源格子、x線位相コントラスト像の撮像装置 - Google Patents
X線用線源格子、x線位相コントラスト像の撮像装置 Download PDFInfo
- Publication number
- JP5451150B2 JP5451150B2 JP2009094998A JP2009094998A JP5451150B2 JP 5451150 B2 JP5451150 B2 JP 5451150B2 JP 2009094998 A JP2009094998 A JP 2009094998A JP 2009094998 A JP2009094998 A JP 2009094998A JP 5451150 B2 JP5451150 B2 JP 5451150B2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- grating
- partial
- phase
- ray source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009094998A JP5451150B2 (ja) | 2008-04-15 | 2009-04-09 | X線用線源格子、x線位相コントラスト像の撮像装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008105355 | 2008-04-15 | ||
| JP2008105355 | 2008-04-15 | ||
| JP2009094998A JP5451150B2 (ja) | 2008-04-15 | 2009-04-09 | X線用線源格子、x線位相コントラスト像の撮像装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009276342A JP2009276342A (ja) | 2009-11-26 |
| JP2009276342A5 JP2009276342A5 (enExample) | 2012-06-07 |
| JP5451150B2 true JP5451150B2 (ja) | 2014-03-26 |
Family
ID=40758687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009094998A Expired - Fee Related JP5451150B2 (ja) | 2008-04-15 | 2009-04-09 | X線用線源格子、x線位相コントラスト像の撮像装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8243879B2 (enExample) |
| EP (1) | EP2248135A1 (enExample) |
| JP (1) | JP5451150B2 (enExample) |
| CN (1) | CN102047344B (enExample) |
| WO (1) | WO2009128550A1 (enExample) |
Families Citing this family (80)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5587985B2 (ja) * | 2009-05-19 | 2014-09-10 | コーニンクレッカ フィリップス エヌ ヴェ | 位相コントラストイメージング用格子 |
| JP5459659B2 (ja) * | 2009-10-09 | 2014-04-02 | キヤノン株式会社 | X線位相コントラスト像の撮像に用いられる位相格子、該位相格子を用いた撮像装置、x線コンピューター断層撮影システム |
| JP2013513418A (ja) * | 2009-12-10 | 2013-04-22 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 微分位相コントラストイメージングシステム |
| JP5578868B2 (ja) * | 2010-01-26 | 2014-08-27 | キヤノン株式会社 | 光源格子、該光源格子を備えたx線位相コントラスト像の撮像装置、x線コンピューター断層撮影システム |
| US8532252B2 (en) * | 2010-01-27 | 2013-09-10 | Canon Kabushiki Kaisha | X-ray shield grating, manufacturing method therefor, and X-ray imaging apparatus |
| JP2012068225A (ja) * | 2010-08-25 | 2012-04-05 | Fujifilm Corp | 放射線画像撮影用グリッド及びその製造方法 |
| JP5504104B2 (ja) * | 2010-08-31 | 2014-05-28 | 株式会社東芝 | Moコリメータおよびそれを用いたX線検出器並びにCT装置 |
| WO2012032950A1 (en) * | 2010-09-08 | 2012-03-15 | Canon Kabushiki Kaisha | X-ray differential phase contrast imaging using a two-dimensional source grating with pinhole apertures and two-dimensional phase and absorption gratings |
| JP2012103237A (ja) * | 2010-10-14 | 2012-05-31 | Canon Inc | 撮像装置 |
| EP2630476B1 (en) * | 2010-10-19 | 2017-12-13 | Koninklijke Philips N.V. | Differential phase-contrast imaging |
| JP6228457B2 (ja) * | 2010-10-19 | 2017-11-08 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 微分位相コントラスト画像形成 |
| JP2012095865A (ja) * | 2010-11-02 | 2012-05-24 | Fujifilm Corp | 放射線撮影装置、放射線撮影システム |
| CN103200874B (zh) * | 2010-11-08 | 2015-11-25 | 皇家飞利浦电子股份有限公司 | 用于相位对比成像的光栅 |
| CN103460301B (zh) * | 2011-02-01 | 2017-08-11 | 皇家飞利浦电子股份有限公司 | 具有聚焦偏转结构板的微分相位对比成像 |
| JP5944413B2 (ja) * | 2011-02-07 | 2016-07-05 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | ダイナミックレンジを増大する微分位相コントラスト撮像装置及び方法 |
| JP5930614B2 (ja) * | 2011-06-02 | 2016-06-08 | キヤノン株式会社 | X線撮像装置 |
| US20150117599A1 (en) | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
| US9826949B2 (en) | 2012-03-05 | 2017-11-28 | University Of Rochester | Methods and apparatus for differential phase-contrast cone-beam CT and hybrid cone-beam CT |
| US20130259194A1 (en) * | 2012-03-30 | 2013-10-03 | Kwok L. Yip | Hybrid slot-scanning grating-based differential phase contrast imaging system for medical radiographic imaging |
| WO2013187970A2 (en) * | 2012-05-14 | 2013-12-19 | The General Hospital Corporation | Method for coded-source phase contrast x-ray imaging |
| FI20126119L (fi) | 2012-10-29 | 2014-04-30 | Teknologian Tutkimuskeskus Vtt Oy | Interferometrinen dynaamihila-kuvannusmenetelmä, diffraktiohila ja kuvannuslaitteisto |
| US8989347B2 (en) | 2012-12-19 | 2015-03-24 | General Electric Company | Image reconstruction method for differential phase contrast X-ray imaging |
| US10578563B2 (en) | 2012-12-21 | 2020-03-03 | Carestream Health, Inc. | Phase contrast imaging computed tomography scanner |
| US9357975B2 (en) | 2013-12-30 | 2016-06-07 | Carestream Health, Inc. | Large FOV phase contrast imaging based on detuned configuration including acquisition and reconstruction techniques |
| US9700267B2 (en) | 2012-12-21 | 2017-07-11 | Carestream Health, Inc. | Method and apparatus for fabrication and tuning of grating-based differential phase contrast imaging system |
| US10096098B2 (en) | 2013-12-30 | 2018-10-09 | Carestream Health, Inc. | Phase retrieval from differential phase contrast imaging |
| US9724063B2 (en) | 2012-12-21 | 2017-08-08 | Carestream Health, Inc. | Surrogate phantom for differential phase contrast imaging |
| US9907524B2 (en) | 2012-12-21 | 2018-03-06 | Carestream Health, Inc. | Material decomposition technique using x-ray phase contrast imaging system |
| US9494534B2 (en) | 2012-12-21 | 2016-11-15 | Carestream Health, Inc. | Material differentiation with phase contrast imaging |
| US9014333B2 (en) | 2012-12-31 | 2015-04-21 | General Electric Company | Image reconstruction methods for differential phase contrast X-ray imaging |
| DE102013205406A1 (de) * | 2013-03-27 | 2014-10-16 | Siemens Aktiengesellschaft | Röntgenaufnahmesystem zur Röntgenbildgebung bei hohen Bildfrequenzen eines Untersuchungsobjekts mittels direkter Messung des Interferenzmusters |
| EP2827339A1 (en) * | 2013-07-16 | 2015-01-21 | Canon Kabushiki Kaisha | Source grating, interferometer, and object information acquisition system |
| JP6362103B2 (ja) * | 2013-09-04 | 2018-07-25 | キヤノン株式会社 | 遮蔽格子及びトールボット干渉計 |
| US10416099B2 (en) | 2013-09-19 | 2019-09-17 | Sigray, Inc. | Method of performing X-ray spectroscopy and X-ray absorption spectrometer system |
| US10297359B2 (en) | 2013-09-19 | 2019-05-21 | Sigray, Inc. | X-ray illumination system with multiple target microstructures |
| US10269528B2 (en) | 2013-09-19 | 2019-04-23 | Sigray, Inc. | Diverging X-ray sources using linear accumulation |
| US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
| CN105612584B (zh) * | 2013-10-07 | 2018-12-04 | 西门子医疗有限公司 | 相衬x射线成像设备及其相位光栅 |
| US10304580B2 (en) | 2013-10-31 | 2019-05-28 | Sigray, Inc. | Talbot X-ray microscope |
| USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
| US20150325322A1 (en) * | 2014-05-08 | 2015-11-12 | General Electric Company | X-ray anti-scatter grid |
| US10401309B2 (en) | 2014-05-15 | 2019-09-03 | Sigray, Inc. | X-ray techniques using structured illumination |
| DE102014221599A1 (de) * | 2014-10-23 | 2016-04-28 | Siemens Aktiengesellschaft | Vorrichtung und Verfahren zur Röntgen-Phasenkontrast-Bildgebung |
| CN105628718A (zh) * | 2014-11-04 | 2016-06-01 | 同方威视技术股份有限公司 | 多能谱x射线光栅成像系统与成像方法 |
| CN107209393B (zh) * | 2015-01-28 | 2022-02-08 | 镭亚股份有限公司 | 三维(3d)电子显示器 |
| CN106033133B (zh) * | 2015-03-11 | 2019-09-17 | 同方威视技术股份有限公司 | 一种光栅、制造方法和辐射成像装置 |
| US10352880B2 (en) | 2015-04-29 | 2019-07-16 | Sigray, Inc. | Method and apparatus for x-ray microscopy |
| CN107810538B (zh) * | 2015-06-29 | 2021-11-02 | 皇家飞利浦有限公司 | 用于生成和准直x射线束的系统 |
| US10295486B2 (en) | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
| US20180001111A1 (en) * | 2016-06-30 | 2018-01-04 | The Johns Hopkins University | Method for optimizing radiation beam intensity profile shape using dual multiple aperture devices |
| JP6656391B2 (ja) * | 2016-09-27 | 2020-03-04 | 株式会社島津製作所 | 放射線位相差撮影装置 |
| US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
| JP6753342B2 (ja) * | 2017-03-15 | 2020-09-09 | 株式会社島津製作所 | 放射線格子検出器およびx線検査装置 |
| JP6743983B2 (ja) * | 2017-10-31 | 2020-08-19 | 株式会社島津製作所 | X線位相差撮像システム |
| US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
| WO2019236384A1 (en) | 2018-06-04 | 2019-12-12 | Sigray, Inc. | Wavelength dispersive x-ray spectrometer |
| CN112470245B (zh) | 2018-07-26 | 2025-03-18 | 斯格瑞公司 | 高亮度x射线反射源 |
| US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
| WO2020051061A1 (en) | 2018-09-04 | 2020-03-12 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
| US11056308B2 (en) | 2018-09-07 | 2021-07-06 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
| DE112020004169T5 (de) | 2019-09-03 | 2022-05-25 | Sigray, Inc. | System und verfahren zur computergestützten laminografieröntgenfluoreszenz-bildgebung |
| CN110833427B (zh) * | 2019-11-29 | 2021-01-29 | 清华大学 | 光栅成像系统及其扫描方法 |
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| CN114371529B (zh) * | 2022-01-30 | 2024-01-09 | 珠海莫界科技有限公司 | 一种堆叠光栅及ar显示装置 |
| US12360067B2 (en) | 2022-03-02 | 2025-07-15 | Sigray, Inc. | X-ray fluorescence system and x-ray source with electrically insulative target material |
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| US12429437B2 (en) | 2023-11-07 | 2025-09-30 | Sigray, Inc. | System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes |
| US12429436B2 (en) | 2024-01-08 | 2025-09-30 | Sigray, Inc. | X-ray analysis system with focused x-ray beam and non-x-ray microscope |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4327966A (en) * | 1980-02-25 | 1982-05-04 | Bell Telephone Laboratories, Incorporated | Variable attenuator for laser radiation |
| US5812629A (en) * | 1997-04-30 | 1998-09-22 | Clauser; John F. | Ultrahigh resolution interferometric x-ray imaging |
| US6175615B1 (en) * | 1999-04-12 | 2001-01-16 | General Electric Company | Radiation imager collimator |
| DE102006037254B4 (de) * | 2006-02-01 | 2017-08-03 | Paul Scherer Institut | Fokus-Detektor-Anordnung zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen mit röntgenoptischen Gittern, sowie Röntgen-System, Röntgen-C-Bogen-System und Röntgen-Computer-Tomographie-System |
| CN101013613B (zh) * | 2006-02-01 | 2011-10-19 | 西门子公司 | X射线设备的焦点-检测器装置的x射线光学透射光栅 |
| DE102006037281A1 (de) * | 2006-02-01 | 2007-08-09 | Siemens Ag | Röntgenoptisches Durchstrahlungsgitter einer Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen von einem Untersuchungsobjekt |
| DE102006015356B4 (de) * | 2006-02-01 | 2016-09-22 | Siemens Healthcare Gmbh | Verfahren zur Erzeugung projektiver und tomographischer Phasenkontrastaufnahmen mit einem Röntgen-System |
| US7400703B2 (en) * | 2006-08-11 | 2008-07-15 | General Electric Company | Method and system for controlling radiation intensity of an imaging system |
-
2009
- 2009-04-09 JP JP2009094998A patent/JP5451150B2/ja not_active Expired - Fee Related
- 2009-04-13 EP EP09733319A patent/EP2248135A1/en not_active Withdrawn
- 2009-04-13 CN CN2009801128512A patent/CN102047344B/zh not_active Expired - Fee Related
- 2009-04-13 US US12/594,243 patent/US8243879B2/en not_active Expired - Fee Related
- 2009-04-13 WO PCT/JP2009/057807 patent/WO2009128550A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| US8243879B2 (en) | 2012-08-14 |
| WO2009128550A9 (en) | 2011-01-27 |
| CN102047344B (zh) | 2013-11-06 |
| US20100246764A1 (en) | 2010-09-30 |
| JP2009276342A (ja) | 2009-11-26 |
| CN102047344A (zh) | 2011-05-04 |
| WO2009128550A1 (en) | 2009-10-22 |
| EP2248135A1 (en) | 2010-11-10 |
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