JP5441779B2 - 縦型熱処理炉のシャッタ装置 - Google Patents

縦型熱処理炉のシャッタ装置 Download PDF

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Publication number
JP5441779B2
JP5441779B2 JP2010068155A JP2010068155A JP5441779B2 JP 5441779 B2 JP5441779 B2 JP 5441779B2 JP 2010068155 A JP2010068155 A JP 2010068155A JP 2010068155 A JP2010068155 A JP 2010068155A JP 5441779 B2 JP5441779 B2 JP 5441779B2
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JP
Japan
Prior art keywords
shutter
heat treatment
process tube
end opening
furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010068155A
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English (en)
Japanese (ja)
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JP2011204747A (ja
Inventor
義彦 浦崎
克尚 笠次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JTEKT Thermo Systems Corp
Original Assignee
Koyo Thermo Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koyo Thermo Systems Co Ltd filed Critical Koyo Thermo Systems Co Ltd
Priority to JP2010068155A priority Critical patent/JP5441779B2/ja
Priority to KR1020100055809A priority patent/KR101583092B1/ko
Publication of JP2011204747A publication Critical patent/JP2011204747A/ja
Application granted granted Critical
Publication of JP5441779B2 publication Critical patent/JP5441779B2/ja
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Especially adapted for treating semiconductor wafers

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP2010068155A 2010-03-24 2010-03-24 縦型熱処理炉のシャッタ装置 Expired - Fee Related JP5441779B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010068155A JP5441779B2 (ja) 2010-03-24 2010-03-24 縦型熱処理炉のシャッタ装置
KR1020100055809A KR101583092B1 (ko) 2010-03-24 2010-06-14 종형 열처리로의 셔터 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010068155A JP5441779B2 (ja) 2010-03-24 2010-03-24 縦型熱処理炉のシャッタ装置

Publications (2)

Publication Number Publication Date
JP2011204747A JP2011204747A (ja) 2011-10-13
JP5441779B2 true JP5441779B2 (ja) 2014-03-12

Family

ID=44881136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010068155A Expired - Fee Related JP5441779B2 (ja) 2010-03-24 2010-03-24 縦型熱処理炉のシャッタ装置

Country Status (2)

Country Link
JP (1) JP5441779B2 (ko)
KR (1) KR101583092B1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102014809B1 (ko) * 2019-04-26 2019-08-27 이준연 불활성 가스를 이용한 열처리로

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04157162A (ja) * 1990-10-22 1992-05-29 Shinko Electric Co Ltd 表面処理装置
JPH0661164A (ja) 1992-08-07 1994-03-04 Kokusai Electric Co Ltd 半導体製造装置の炉口シャッタ装置
JP4361668B2 (ja) * 2000-06-22 2009-11-11 東京エレクトロン株式会社 熱処理装置及びその方法
JP3836812B2 (ja) * 2003-05-14 2006-10-25 東京エレクトロン株式会社 熱処理装置のシャッター機構及び縦型熱処理装置
JP4268069B2 (ja) * 2003-10-24 2009-05-27 東京エレクトロン株式会社 縦型熱処理装置
JP5144990B2 (ja) * 2006-10-13 2013-02-13 東京エレクトロン株式会社 熱処理装置
US7762809B2 (en) * 2006-10-13 2010-07-27 Tokyo Electron Limited Heat treatment apparatus

Also Published As

Publication number Publication date
JP2011204747A (ja) 2011-10-13
KR20110107252A (ko) 2011-09-30
KR101583092B1 (ko) 2016-01-07

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