JP5408131B2 - 半導体素子搭載基板 - Google Patents
半導体素子搭載基板 Download PDFInfo
- Publication number
- JP5408131B2 JP5408131B2 JP2010516823A JP2010516823A JP5408131B2 JP 5408131 B2 JP5408131 B2 JP 5408131B2 JP 2010516823 A JP2010516823 A JP 2010516823A JP 2010516823 A JP2010516823 A JP 2010516823A JP 5408131 B2 JP5408131 B2 JP 5408131B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor element
- layer
- mounting substrate
- element mounting
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 262
- 239000004065 semiconductor Substances 0.000 title claims description 220
- 239000010410 layer Substances 0.000 claims description 162
- 229920005989 resin Polymers 0.000 claims description 108
- 239000011347 resin Substances 0.000 claims description 108
- 239000002344 surface layer Substances 0.000 claims description 82
- 229920000647 polyepoxide Polymers 0.000 claims description 79
- 239000003822 epoxy resin Substances 0.000 claims description 77
- 239000000463 material Substances 0.000 claims description 72
- 230000009477 glass transition Effects 0.000 claims description 40
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 claims description 39
- 239000011256 inorganic filler Substances 0.000 claims description 31
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 31
- 239000012790 adhesive layer Substances 0.000 claims description 22
- 239000005011 phenolic resin Substances 0.000 claims description 22
- 239000013034 phenoxy resin Substances 0.000 claims description 22
- 229920006287 phenoxy resin Polymers 0.000 claims description 22
- 239000000853 adhesive Substances 0.000 claims description 17
- 230000001070 adhesive effect Effects 0.000 claims description 16
- 229920003067 (meth)acrylic acid ester copolymer Polymers 0.000 claims description 14
- 238000003860 storage Methods 0.000 claims description 10
- 239000011342 resin composition Substances 0.000 claims description 9
- 239000002313 adhesive film Substances 0.000 description 97
- 238000004519 manufacturing process Methods 0.000 description 34
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 33
- 238000011156 evaluation Methods 0.000 description 33
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 29
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 27
- 238000010438 heat treatment Methods 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 21
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 18
- 238000005259 measurement Methods 0.000 description 18
- 239000004305 biphenyl Substances 0.000 description 16
- 235000010290 biphenyl Nutrition 0.000 description 16
- 239000000835 fiber Substances 0.000 description 16
- 238000001723 curing Methods 0.000 description 15
- 229920003986 novolac Polymers 0.000 description 15
- -1 Dicyclopentadiene modified phenol Chemical class 0.000 description 14
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 14
- 238000001035 drying Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 14
- 239000011521 glass Substances 0.000 description 14
- 239000000377 silicon dioxide Substances 0.000 description 14
- 230000004907 flux Effects 0.000 description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000003825 pressing Methods 0.000 description 9
- WXTMDXOMEHJXQO-UHFFFAOYSA-N 2,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC=C1O WXTMDXOMEHJXQO-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 239000007822 coupling agent Substances 0.000 description 7
- 239000000945 filler Substances 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 239000002966 varnish Substances 0.000 description 7
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical group C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 6
- 229920001342 Bakelite® Polymers 0.000 description 6
- 229930185605 Bisphenol Natural products 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 239000004843 novolac epoxy resin Substances 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 238000005336 cracking Methods 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 239000005350 fused silica glass Substances 0.000 description 5
- 239000003365 glass fiber Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229920001187 thermosetting polymer Polymers 0.000 description 5
- VOJUXHHACRXLTD-UHFFFAOYSA-N 1,4-dihydroxy-2-naphthoic acid Chemical compound C1=CC=CC2=C(O)C(C(=O)O)=CC(O)=C21 VOJUXHHACRXLTD-UHFFFAOYSA-N 0.000 description 4
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 4
- GLDQAMYCGOIJDV-UHFFFAOYSA-N 2,3-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1O GLDQAMYCGOIJDV-UHFFFAOYSA-N 0.000 description 4
- UIAFKZKHHVMJGS-UHFFFAOYSA-N 2,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1O UIAFKZKHHVMJGS-UHFFFAOYSA-N 0.000 description 4
- AKEUNCKRJATALU-UHFFFAOYSA-N 2,6-dihydroxybenzoic acid Chemical compound OC(=O)C1=C(O)C=CC=C1O AKEUNCKRJATALU-UHFFFAOYSA-N 0.000 description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- 101000821100 Homo sapiens Synapsin-1 Proteins 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- 102100021905 Synapsin-1 Human genes 0.000 description 4
- 208000034487 X-linked 50 intellectual disability Diseases 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229930003836 cresol Natural products 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 208000023741 non-syndromic X-linked intellectual disability 50 Diseases 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 4
- 229920001225 polyester resin Polymers 0.000 description 4
- 239000004645 polyester resin Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 3
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 3
- 238000013007 heat curing Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 3
- 229920003987 resole Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000002759 woven fabric Substances 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- 229940082044 2,3-dihydroxybenzoic acid Drugs 0.000 description 2
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- YQUVCSBJEUQKSH-UHFFFAOYSA-N 3,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C(O)=C1 YQUVCSBJEUQKSH-UHFFFAOYSA-N 0.000 description 2
- UYEMGAFJOZZIFP-UHFFFAOYSA-N 3,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC(O)=C1 UYEMGAFJOZZIFP-UHFFFAOYSA-N 0.000 description 2
- YELLAPKUWRTITI-UHFFFAOYSA-N 3,5-dihydroxynaphthalene-2-carboxylic acid Chemical compound C1=CC(O)=C2C=C(O)C(C(=O)O)=CC2=C1 YELLAPKUWRTITI-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- VKOUCJUTMGHNOR-UHFFFAOYSA-N Diphenolic acid Chemical compound C=1C=C(O)C=CC=1C(CCC(O)=O)(C)C1=CC=C(O)C=C1 VKOUCJUTMGHNOR-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- FFFPYJTVNSSLBQ-UHFFFAOYSA-N Phenolphthalin Chemical compound OC(=O)C1=CC=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 FFFPYJTVNSSLBQ-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 239000004637 bakelite Substances 0.000 description 2
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- 229940114055 beta-resorcylic acid Drugs 0.000 description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 2
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229940074391 gallic acid Drugs 0.000 description 2
- 235000004515 gallic acid Nutrition 0.000 description 2
- 229960005219 gentisic acid Drugs 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 239000002655 kraft paper Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- 125000002560 nitrile group Chemical group 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- IXQGCWUGDFDQMF-UHFFFAOYSA-N 2-Ethylphenol Chemical compound CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 1
- OELQSSWXRGADDE-UHFFFAOYSA-N 2-methylprop-2-eneperoxoic acid Chemical compound CC(=C)C(=O)OO OELQSSWXRGADDE-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical group C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 description 1
- QMWOUSYSNFCKAZ-UHFFFAOYSA-N 3,7-dihydroxynaphthalene-2-carboxylic acid Chemical class OC1=CC=C2C=C(O)C(C(=O)O)=CC2=C1 QMWOUSYSNFCKAZ-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- WOCGGVRGNIEDSZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical compound C=1C=C(O)C(CC=C)=CC=1C(C)(C)C1=CC=C(O)C(CC=C)=C1 WOCGGVRGNIEDSZ-UHFFFAOYSA-N 0.000 description 1
- NTDQQZYCCIDJRK-UHFFFAOYSA-N 4-octylphenol Chemical compound CCCCCCCCC1=CC=C(O)C=C1 NTDQQZYCCIDJRK-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- XBWHBPMCIGBGTA-UHFFFAOYSA-N 5-methyl-2-oxaspiro[3.5]non-5-ene-1,3-dione Chemical compound CC1=CCCCC11C(=O)OC1=O XBWHBPMCIGBGTA-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 235000019498 Walnut oil Nutrition 0.000 description 1
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 1
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 1
- 235000014121 butter Nutrition 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- AWGWKAZLSXEUBI-UHFFFAOYSA-N carboxy 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(O)=O AWGWKAZLSXEUBI-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 150000005209 naphthoic acids Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- NRZWYNLTFLDQQX-UHFFFAOYSA-N p-tert-Amylphenol Chemical compound CCC(C)(C)C1=CC=C(O)C=C1 NRZWYNLTFLDQQX-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229950010765 pivalate Drugs 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 229920005586 poly(adipic acid) Polymers 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 239000002383 tung oil Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000008170 walnut oil Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5389—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/147—Semiconductor insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3135—Double encapsulation or coating and encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/562—Protection against mechanical damage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/284—Applying non-metallic protective coatings for encapsulating mounted components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29101—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/2929—Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29339—Silver [Ag] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29363—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/29366—Titanium [Ti] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/29386—Base material with a principal constituent of the material being a non metallic, non metalloid inorganic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00013—Fully indexed content
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0101—Neon [Ne]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01012—Magnesium [Mg]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01015—Phosphorus [P]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01023—Vanadium [V]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01027—Cobalt [Co]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01059—Praseodymium [Pr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01072—Hafnium [Hf]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01073—Tantalum [Ta]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/049—Nitrides composed of metals from groups of the periodic table
- H01L2924/0495—5th Group
- H01L2924/04953—TaN
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/0665—Epoxy resin
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1301—Thyristor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
- H01L2924/3511—Warping
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0271—Arrangements for reducing stress or warp in rigid printed circuit boards, e.g. caused by loads, vibrations or differences in thermal expansion
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/06—Thermal details
- H05K2201/068—Thermal details wherein the coefficient of thermal expansion is important
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10674—Flip chip
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1305—Moulding and encapsulation
- H05K2203/1322—Encapsulation comprising more than one layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
- H05K3/305—Affixing by adhesive
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
Description
(1) 基板と、
基板と、
前記基板の一方の面側に搭載された半導体素子と、
前記基板と前記半導体素子とを接着する接着層と、
前記半導体素子を埋め込む第1の層と、
前記基板の前記第1の層とは反対側に設けられた第2の層と、
前記第1の層上および前記第2の層上に設けられた少なくとも1層の表層とを有し、
前記接着層の25℃における貯蔵弾性率が、5〜1000MPaであり、
前記表層の、20℃以上、JIS C 6481に準拠して測定される前記表層のガラス転移点Tga[℃]以下でのJIS C 6481に準拠して測定される面方向の熱膨張係数が、40ppm/℃以下であり、
前記表層は、主として、シアネート樹脂とアリールアルキレン型エポキシ樹脂とを含む樹脂材料と無機充填材とで構成されたものであることを特徴とする半導体素子搭載基板。
前記第1の層の体積を100としたとき、前記半導体素子の体積は、2〜7である上記(1)ないし(3)のいずれかに記載の半導体素子搭載基板。
前記接着剤は、(メタ)アクリル酸エステル共重合体と、エポキシ樹脂と、フェノール樹脂と、無機充填剤とを含む樹脂組成物で構成されるものである上記(1)ないし(4)のいずれかに記載の半導体素子搭載基板。
前記樹脂材料中の前記シアネート樹脂の含有率をC[重量%]、前記樹脂材料中のフェノキシ樹脂の含有率をE[重量%]としたとき、0.2≦E/C≦2である上記(1)ないし(18)のいずれかに記載の半導体素子搭載基板。
<半導体素子搭載基板>
図1は、本発明の半導体素子搭載基板の好適な実施形態を示す縦断面図である。なお、以下の説明では、図1中の上側を「上」または「上方」という。
コア基板1は、搭載された半導体素子2を支持する機能を有している。
半導体素子2は、図1に示すように、後述するような接着層3を介してコア基板1に接合されている。
接着フィルム(接着層)3は、上述したような半導体素子2をコア基板1上に接着する機能を備えている。
エポキシ樹脂の具体例として、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂等のノボラック型エポキシ樹脂;ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂等のビスフェノール型エポキシ樹脂;ハイドロキノン型エポキシ樹脂;ビフェニル型エポキシ樹脂;スチルベン型エポキシ樹脂;トリフェノールメタン型エポキシ樹脂;トリアジン核含有エポキシ樹脂;ジシクロペンタジエン変性フェノール型エポキシ樹脂;ナフトール型エポキシ樹脂、および、フェニレンおよび/またはビフェニレン骨格を有するフェノールアラルキル型エポキシ樹脂、フェニレンおよび/またはビフェニレン骨格を有するナフトールアラルキル型エポキシ樹脂等のアラルキル型エポキシ樹脂が挙げられる。
コア基板1の両面には、図1に示すように、前述した半導体素子2を埋め込むように形成された第1の層4と、第2の層5とが形成されている。
第1の層4(第2の層5)を構成する樹脂材料としては、絶縁性の高いものであれば特に限定されず、例えば、後述するような表層6を構成する樹脂材料と同様のものを用いることができる。特に、第1の層4(第2の層5)が、後述する表層6を構成する樹脂材料と同じ樹脂材料で構成されている場合、表層6との密着性が特に高いものとなり、界面の剥離を防止できる。また、界面に存在する導体回路材料である銅の熱膨張率に近い熱膨張率が得られる為、銅で構成された導体回路材料との界面でのストレスを低減し、回路の導通性を確保する事に優れる、といった効果も得られる。
また、第1の層4上および第2の層5上には、それぞれ、表層6が形成されている。
次に、上述したような半導体素子搭載基板の製造方法の一例について説明する。
まず、図2(a)に示すように、コア基板1を用意する。
その後、絶縁シート6’を硬化させて、表層6とし、半導体素子搭載基板10(本発明の半導体素子搭載基板)を得る(図2(d)参照)。
図3も、半導体素子搭載基板の製造方法の一例を示す図である。
まず、図3(a)に示すように、コア基板1を用意する。
実施例及び比較例において用いた原材料は以下の通りである。
シアネート樹脂A:15重量部、シアネート樹脂B:10重量部、エポキシ樹脂:25重量部、フェノキシ樹脂A:5重量部、フェノキシ樹脂B:5重量部、硬化触媒:0.4重量部をメチルエチルケトンに溶解、分散させた。さらに、無機充填材40重量部とカップリング剤0.2重量部を添加して、高速攪拌装置を用いて10分間攪拌して、固形分50重量%の樹脂ワニスを調製した。
(1)基材付絶縁性シートAの作製
上記のようにして得られた樹脂ワニスを、厚さ38μmのPET(ポリエチレンテレフタレート)フィルムの片面に、コンマコーター装置を用いて乾燥後の絶縁フィルムの厚さが120μmとなるように塗工し、これを160℃の乾燥装置で10分間乾燥して、基材付絶縁シートAを製造した。
上記のようにして得られた樹脂ワニスを、ガラス織布(WEA−1035、厚さ:28μm、日東紡績製)に含浸し、120℃の加熱炉で2分間乾燥してワニス固形分(プリプレグ中に樹脂とシリカの占める成分)が約50wt%のプリプレグを得た。このプリプレグを用い、厚さ38μmのPET(ポリエチレンテレフタレート)フィルムの片面に、ラミネーター装置を用いて乾燥後の絶縁フィルムの厚さが40μmとなるように貼り付け、これを160℃の乾燥装置で10分間乾燥して、基材付絶縁シートBを製造した。
上記のようにして得られた樹脂ワニスを、厚さ38μmのPET(ポリエチレンテレフタレート)フィルムの片面に、コンマコーター装置を用いて乾燥後の絶縁フィルムの厚さが40μmとなるように塗工し、これを160℃の乾燥装置で10分間乾燥して、基材付絶縁シートCを製造した。
上記のようにして得られた樹脂ワニスを、厚さ38μmのPET(ポリエチレンテレフタレート)フィルムの片面に、コンマコーター装置を用いて乾燥後の絶縁フィルムの厚さが160μmとなるように塗工し、これを160℃の乾燥装置で10分間乾燥して、基材付絶縁シートDを製造した。
(1)接着フィルムAの作製
アクリル酸エステル共重合体(ナガセケムテックス社製、商品名「SG−708−6」):25.0重量部、エポキシ樹脂(日本化薬社製、商品名「EOCN−1020−80」):16.0重量部、エポキシ樹脂(日本化薬社製、商品名「NC3000P」):24.2重量部、フェノール樹脂(住友ベークライト社製、商品名「PR51470」):17.5重量部、硬化触媒(四国化成社製、商品名「2PHZ−PW」):0.1重量部、密着助剤(信越化学工業社製、商品名「KBM403E」):0.4重量部、無機充填材としてのシリカ(アドマテックス社製、商品名「SE−2050LC」):16.7重量部を混合して、接着剤を得た。なお、上記重量部は、固形分としての重量部を指す。
アクリル酸エステル共重合体(ナガセケムテックス社製、商品名「SG−70L」):11.2重量部、アクリルポリマー(東亞合成社製、商品名「UG−4010」):6.8重量部、エポキシ樹脂(日本化薬社製、商品名「EOCN−1020−80」):17.7重量部、エポキシ樹脂(日本化薬社製、商品名「NC6000」):26.5重量部、フェノール樹脂(住友ベークライト社製、商品名「PR−HF−3」):11.1重量部、フェノール樹脂(明和化成社製、商品名「MEH8000H」):16.6重量部、硬化触媒(四国化成社製、商品名「2PHZ−PW」):0.1重量部、密着助剤(信越化学工業社製、商品名「KBM403E」):0.1重量部、無機充填材としてのシリカ(アドマテックス社製、商品名「SE−2050LC」):10.0重量部を混合して、接着剤を得た。なお、上記重量部は、固形分としての重量部を指す。
アクリル酸エステル共重合体(ナガセケムテックス社製、商品名「SG−70L」):53.99重量部、エポキシ樹脂(日本化薬社製、商品名「EOCN−1020−80」):3.73重量部、フェノール樹脂(住友ベークライト社製、商品名「PR53647」):1.91重量部、硬化触媒(四国化成社製、商品名「2PHZ−PW」):0.04重量部、密着助剤(信越化学工業社製、商品名「KBM403E」):0.31重量部、無機充填材としてのシリカ(アドマテックス社製、商品名「SE−2050LE」):40.01重量部を混合して、接着剤を得た。なお、上記重量部は、固形分としての重量部を指す。
アクリル酸エステル共重合体(ナガセケムテックス社製、商品名「SG−70L」):42.0重量部、エポキシ樹脂(日本化薬社製、商品名「EOCN−1020−80」):4.53重量部、エポキシ樹脂(日本化薬社製、商品名「NC6000」):6.86重量部、フェノール樹脂(住友ベークライト社製、商品名「PR53647」):5.92重量部、硬化触媒(四国化成社製、商品名「2PHZ−PW」):0.06重量部、密着助剤(信越化学工業社製、商品名「KBM403E」):0.63重量部、無機充填材としてのシリカ(アドマテックス社製、商品名「SE−2050LE」):40.0重量部を混合して、接着剤を得た。なお、上記重量部は、固形分としての重量部を指す。
(実施例1)
両面銅張積層板(住友ベークライト株式会社製:ELC−4785GS)の銅箔をエッチング処理し取り除く事で、厚さ100μm、40mm角のコア基板を得た。
接着フィルムAの代わりに、接着フィルムBを用いた以外は、前記実施例1と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムCを用いた以外は、前記実施例1と同様にして、評価用の半導体素子搭載基板を得た。
実施例1と同様にして作製した、チップ搭載済みのコア基板のチップ搭載側およびチップ未搭載側の両方に、平均厚さが120μmの市販の基材付絶縁シートE(味の素ファインケミカル株式会社製:商品名「ABF−GX13」)の絶縁シート層面を内側にして、重ね合わせ、これを、真空加圧式ラミネーター装置を用いて、圧力1.0MPa、温度105℃で30秒間、真空加熱加圧成形した後、基材を剥離除去し、熱風乾燥機にて温度180℃、時間90分間で加熱硬化させ、半導体素子埋め込み形状の基板を得た。すなわち、第1の層および第2の層を形成した。
接着フィルムAの代わりに、接着フィルムBを用いた以外は、前記実施例4と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムCを用いた以外は、前記実施例4と同様にして、評価用の半導体素子搭載基板を得た。
実施例1と同様にして作製した、チップ搭載済みのコア基板のチップ搭載側およびチップ未搭載側の両方に、基材付絶縁シートAの絶縁シート層面を内側にして、重ね合わせ、これを、真空加圧式ラミネーター装置を用いて、圧力1.0MPa、温度105℃で30秒間、真空加熱加圧成形した後、基材を剥離除去し、熱風乾燥機にて温度180℃、時間90分間で加熱硬化させ、半導体素子埋め込み形状の基板を得た。すなわち、第1の層および第2の層を形成した。
接着フィルムAの代わりに、接着フィルムBを用いた以外は、前記実施例7と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムCを用いた以外は、前記実施例7と同様にして、評価用の半導体素子搭載基板を得た。
両面銅張積層板(住友ベークライト株式会社製:ELC−4785GS)の銅箔をエッチング処理し取り除く事で、厚さ100μm、40mm角のコア基板を得た。
接着フィルムAの代わりに、接着フィルムBを用いた以外は、前記実施例10と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムCを用いた以外は、前記実施例10と同様にして、評価用の半導体素子搭載基板を得た。
実施例10と同様にして作製した、チップ搭載済みのコア基板のチップ搭載側およびチップ未搭載側の両方に、平均厚さが160μmの市販の基材付絶縁シートF(味の素ファインケミカル株式会社製:商品名「ABF−GX13」)の絶縁シート層面を内側にして、重ね合わせ、これを、真空加圧式ラミネーター装置を用いて、圧力1.0MPa、温度105℃で30秒間、真空加熱加圧成形した後、基材を剥離除去し、熱風乾燥機にて温度180℃、時間90分間で加熱硬化させ、半導体素子埋め込み形状の基板を得た。すなわち、第1の層および第2の層を形成した。
接着フィルムAの代わりに、接着フィルムBを用いた以外は、前記実施例13と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムCを用いた以外は、前記実施例13と同様にして、評価用の半導体素子搭載基板を得た。
実施例10と同様にして作製した、チップ搭載済みのコア基板のチップ搭載側およびチップ未搭載側の両方に、基材付絶縁シートDの絶縁シート層面を内側にして、重ね合わせ、これを、真空加圧式ラミネーター装置を用いて、圧力1.0MPa、温度105℃で30秒間、真空加熱加圧成形した後、基材を剥離除去し、熱風乾燥機にて温度180℃、時間90分間で加熱硬化させ、半導体素子埋め込み形状の基板を得た。すなわち、第1の層および第2の層を形成した。
接着フィルムAの代わりに、接着フィルムCを用いた以外は、前記実施例16と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムDを用いた以外は、前記実施例1と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムDを用いた以外は、前記実施例4と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムDを用いた以外は、前記実施例7と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムDを用いた以外は、前記実施例10と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムDを用いた以外は、前記実施例13と同様にして、評価用の半導体素子搭載基板を得た。
接着フィルムAの代わりに、接着フィルムDを用いた以外は、前記実施例16と同様にして、評価用の半導体素子搭載基板を得た。
実施例1と同様にして作製した、チップ搭載済みのコア基板のチップ搭載側およびチップ未搭載側の両方に、平均厚さが120μmの市販の基材付絶縁シートE(味の素ファインケミカル株式会社製:商品名「ABF−GX13」)の絶縁シート層面を内側にして、重ね合わせ、これを、真空加圧式ラミネーター装置を用いて、圧力1.0MPa、温度105℃で30秒間、真空加熱加圧成形した後、基材を剥離除去し、熱風乾燥機にて温度180℃、時間90分間で加熱硬化させ、半導体素子埋め込み形状の基板を得た。すなわち、第1の層および第2の層を形成した。
実施例11と同様にして作製した、チップ搭載済みのコア基板のチップ搭載側およびチップ未搭載側の両方に、平均厚さが160μmの市販の基材付絶縁シートF(味の素ファインケミカル株式会社製:商品名「ABF−GX13」)の絶縁シート層面を内側にして、重ね合わせ、これを、真空加圧式ラミネーター装置を用いて、圧力1.0MPa、温度105℃で30秒間、真空加熱加圧成形した後、基材を剥離除去し、熱風乾燥機にて温度180℃、時間90分間で加熱硬化させ、半導体素子埋め込み形状の基板を得た。すなわち、第1の層および第2の層を形成した。
上記各実施例および各比較例の半導体素子搭載基板の表層および第1の層(第2の層)の形成に用いた基材付き絶縁シート2枚を、絶縁シート側どうしを内側にして重ね合わせ、これを、真空プレス装置を用いて圧力2MPa、温度200℃で2時間加熱加圧成形を行った後、基材を剥離除去して、絶縁シート硬化物を得た。得られた絶縁シート硬化物から8mm×35mmの評価用試料を採取し、DMA装置(TAインスツルメント社製、DMA2980、測定モード:引張り、測定長:20mm、昇温速度:5℃/min、測定温度域:0〜350℃、周波数:1Hz)を用いて、25℃におけるヤング率を測定した。
上記各実施例および各比較例の半導体素子搭載基板の表層および第1の層(第2の層)の形成に用いた基材付き絶縁シート2枚を、絶縁シート側どうしを内側にして重ね合わせ、これを、真空プレス装置を用いて圧力2MPa、温度200℃で2時間加熱加圧成形を行った後、基材を剥離除去して、絶縁シート硬化物を得た。得られた絶縁シート硬化物から4mm×20mmの評価用試料を採取し、TMA装置(TAインスツルメント社製、TMA2940、測定モード:引張り、測定長:20mm、昇温速度:10℃/min、測定温度域:0〜300℃、測定荷重:5gf)を用いて、面方向における熱膨張係数を測定した。
上記各実施例および各比較例の半導体素子搭載基板の表層および第1の層(第2の層)の形成に用いた基材付き絶縁シート2枚を、絶縁シート側どうしを内側にして重ね合わせ、これを、真空プレス装置を用いて圧力2MPa、温度200℃で2時間加熱加圧成形を行った後、基材を剥離除去して、絶縁シート硬化物を得た。得られた絶縁シート硬化物から、10mm×30mmの評価用試料を切り出し、DMA(TAインスツルメント社製、DMA2980、測定モード:引張り、測定長:20mm、昇温速度:5℃/min、測定温度域:0〜350℃、周波数:1Hz)を用いて、5℃/分で昇温し、tanδのピーク位置をガラス転移温度とした。
(貯蔵弾性率の測定方法)
上記各実施例および各比較例で得られた厚み25μmの接着フィルムを、175℃2時間熱処理し、接着フィルム硬化物を得た。得られた接着フィルム硬化物から10mm×25mmの評価用試料を採取し、DMA(セイコーインスツルメンツ社製、DMS210、測定モード:引張り、測定長:20mm、昇温速度:3℃/min、測定温度域:−65〜300℃、周波数:10Hz)を用いて、3℃/分で昇温し、25℃における貯蔵弾性率(E’)を求めた。
上記各実施例および各比較例で得られた厚み25μmの接着フィルムを、175℃2時間熱処理し、接着フィルム硬化物を得た。得られた接着フィルム硬化物から3mm×25mmの評価用試料を採取し、TMA装置(セイコーインスツルメンツ社製TMA/SS6100、測定モード:引張り、測定長:10mm、昇温速度:5℃/min、測定温度域:−65〜300℃、測定荷重:1gf)を用いて、面方向における熱膨張係数を測定した。さらに引っ張った際の変曲点よりガラス転移温度を求めた。
[1]
上記各実施例および各比較例で得られた半導体素子搭載基板の常温時(25℃)での半導体素子表面部分の反りを測定し、表3に示した。
上記各実施例および各比較例で得られた半導体素子搭載基板各10枚を用いて、冷熱サイクル試験(冷却状態−65℃、加熱状態150℃で1000サイクルおよび3000サイクル)を行い、半導体素子への保護性能を比較評価した。
Claims (19)
- 基板と、
前記基板の一方の面側に搭載された半導体素子と、
前記基板と前記半導体素子とを接着する接着層と、
前記半導体素子を埋め込む第1の層と、
前記基板の前記第1の層とは反対側に設けられた第2の層と、
前記第1の層上および前記第2の層上に設けられた少なくとも1層の表層とを有し、
前記接着層の25℃における貯蔵弾性率が、5〜1000MPaであり、
前記表層の、20℃以上、JIS C 6481に準拠して測定される前記表層のガラス転移点Tga[℃]以下でのJIS C 6481に準拠して測定される面方向の熱膨張係数が、40ppm/℃以下であり、
前記表層は、主として、シアネート樹脂とアリールアルキレン型エポキシ樹脂とを含む樹脂材料と無機充填材とで構成されたものであることを特徴とする半導体素子搭載基板。 - 前記基板の平均厚さをT1[μm]、前記第1の層の平均厚さをT2[μm]としたとき、0.5≦T2/T1≦3.0の関係を満足する請求項1に記載の半導体素子搭載基板。
- 前記接着層の平均厚さは、5〜50μmである請求項1に記載の半導体素子搭載基板。
- 前記第1の層を平面視した際の前記第1の層の面積を100としたとき、前記半導体素子を平面視した際の前記半導体素子の面積は、6〜10であり、
前記第1の層の体積を100としたとき、前記半導体素子の体積は、2〜7である請求項1に記載の半導体素子搭載基板。 - 前記接着層は、接着剤で構成され、
前記接着剤は、(メタ)アクリル酸エステル共重合体と、エポキシ樹脂と、フェノール樹脂と、無機充填剤とを含む樹脂組成物で構成されるものである請求項1に記載の半導体素子搭載基板。 - 前記接着層のガラス転移点は、0〜180℃である請求項1に記載の半導体素子搭載基板。
- 前記第1の層の、20℃以上、JIS C 6481に準拠して測定される前記第1の層のガラス転移点Tgb[℃]以下でのJIS C 6481に準拠して測定される面方向の熱膨張係数は、25〜50ppm/℃である請求項1に記載の半導体素子搭載基板。
- 前記第1の層の25℃におけるヤング率は、2〜10GPaである請求項1に記載の半導体素子搭載基板。
- JIS C 6481に準拠して測定される前記第1の層のガラス転移点Tgbは、100〜250℃の範囲内である請求項1に記載の半導体素子搭載基板。
- 前記表層の25℃におけるヤング率をX[GPa]、前記第1の層の25℃におけるヤング率をY[GPa]としたとき、0.5≦X−Y≦13の関係を満足する請求項1に記載の半導体素子搭載基板。
- 前記表層の25℃におけるヤング率は、4〜15GPaである請求項1に記載の半導体素子搭載基板。
- 前記表層の、20℃以上、JIS C 6481に準拠して測定される前記表層のガラス転移点Tga[℃]以下でのJIS C 6481に準拠して測定される面方向の熱膨張係数をA[ppm/℃]、前記第1の層の、20℃以上、JIS C 6481に準拠して測定される前記第1の層のガラス転移点Tgb[℃]以下でのJIS C 6481に準拠して測定される面方向の熱膨張係数をB[ppm/℃]としたとき、0.5≦B−A≦50の関係を満足する請求項1に記載の半導体素子搭載基板。
- JIS C 6481に準拠して測定される前記表層のガラス転移点Tgaは、100〜300℃の範囲内である請求項1に記載の半導体素子搭載基板。
- 前記基板の25℃におけるヤング率は、20〜50GPaである請求項1に記載の半導体素子搭載基板。
- 前記基板の、20℃以上、JIS C 6481に準拠して測定される前記基板のガラス転移点Tgc[℃]以下でのJIS C 6481に準拠して測定される面方向の熱膨張係数は、13ppm/℃以下である請求項1に記載の半導体素子搭載基板。
- 前記表層中における前記樹脂材料の含有量は、30〜70重量%である請求項1に記載の半導体素子搭載基板。
- 前記表層中における前記無機充填材の含有量は、5〜40重量%である請求項1に記載の半導体素子搭載基板。
- 前記樹脂材料中の前記シアネート樹脂の含有率をC[重量%]、前記樹脂材料中の前記アリールアルキレン型エポキシ樹脂の含有率をD[重量%]としたとき、0.5≦D/C≦4である請求項1に記載の半導体素子搭載基板。
- 前記樹脂材料は、フェノキシ樹脂をさらに含み、
前記樹脂材料中の前記シアネート樹脂の含有率をC[重量%]、前記樹脂材料中のフェノキシ樹脂の含有率をE[重量%]としたとき、0.2≦E/C≦2である請求項1に記載の半導体素子搭載基板。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010516823A JP5408131B2 (ja) | 2008-06-12 | 2009-06-03 | 半導体素子搭載基板 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008154713 | 2008-06-12 | ||
JP2008154713 | 2008-06-12 | ||
PCT/JP2009/060194 WO2009150985A1 (ja) | 2008-06-12 | 2009-06-03 | 半導体素子搭載基板 |
JP2010516823A JP5408131B2 (ja) | 2008-06-12 | 2009-06-03 | 半導体素子搭載基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2009150985A1 JPWO2009150985A1 (ja) | 2011-11-17 |
JP5408131B2 true JP5408131B2 (ja) | 2014-02-05 |
Family
ID=41416694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010516823A Expired - Fee Related JP5408131B2 (ja) | 2008-06-12 | 2009-06-03 | 半導体素子搭載基板 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8598719B2 (ja) |
JP (1) | JP5408131B2 (ja) |
KR (1) | KR101549285B1 (ja) |
CN (2) | CN102057484B (ja) |
TW (1) | TWI456720B (ja) |
WO (1) | WO2009150985A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101735562B (zh) * | 2009-12-11 | 2012-09-26 | 广东生益科技股份有限公司 | 环氧树脂组合物及其制备方法及采用其制作的层压材料及覆铜箔层压板 |
JP5593897B2 (ja) * | 2010-07-12 | 2014-09-24 | 住友ベークライト株式会社 | 回路基板、半導体装置、回路基板の製造方法および半導体装置の製造方法 |
WO2013115069A1 (ja) * | 2012-01-31 | 2013-08-08 | 三菱瓦斯化学株式会社 | プリント配線板材料用樹脂組成物、並びにそれを用いたプリプレグ、樹脂シート、金属箔張積層板及びプリント配線板 |
KR102152590B1 (ko) * | 2012-05-15 | 2020-09-08 | 다우 실리콘즈 코포레이션 | 캡슐화된 반도체 소자의 제조 방법 및 캡슐화된 반도체 소자 |
WO2014094841A1 (en) * | 2012-12-19 | 2014-06-26 | Telefonaktiebolaget L M Ericsson (Publ) | Planar transformer |
JP6327429B2 (ja) * | 2013-08-01 | 2018-05-23 | パナソニックIpマネジメント株式会社 | 樹脂組成物、樹脂ワニス、プリプレグ、金属張積層板、及びプリント配線板 |
JP6001515B2 (ja) * | 2013-09-04 | 2016-10-05 | 信越化学工業株式会社 | 封止材積層複合体、封止後半導体素子搭載基板、封止後半導体素子形成ウエハ、半導体装置、及び半導体装置の製造方法 |
JP6410494B2 (ja) * | 2014-07-04 | 2018-10-24 | 住友ベークライト株式会社 | 発熱体封止物の製造方法および誘導装置封止物の製造方法 |
JP6356581B2 (ja) * | 2014-11-19 | 2018-07-11 | 信越化学工業株式会社 | 半導体装置の製造方法 |
JP2017017238A (ja) * | 2015-07-03 | 2017-01-19 | 株式会社ジェイデバイス | 半導体装置及びその製造方法 |
KR102531219B1 (ko) * | 2015-07-06 | 2023-05-10 | 미츠비시 가스 가가쿠 가부시키가이샤 | 수지 조성물, 프리프레그, 금속박 피복 적층판, 및 프린트 배선판 |
GB2563206A (en) * | 2017-06-02 | 2018-12-12 | Conti Temic Microelectronic Gmbh | Electronic arrangement and method for overmolding same |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07297560A (ja) * | 1994-04-28 | 1995-11-10 | Hitachi Ltd | 多層プリント配線基板およびその実装構造体 |
JP2006261657A (ja) * | 2005-02-21 | 2006-09-28 | Nitto Denko Corp | 半導体装置の製造方法 |
JP2007043184A (ja) * | 2006-09-15 | 2007-02-15 | Sumitomo Bakelite Co Ltd | 多層プリント配線板用銅箔付き絶縁シートおよびそれを用いたプリント配線板 |
JP2007059821A (ja) * | 2005-08-26 | 2007-03-08 | Shinko Electric Ind Co Ltd | 配線基板の製造方法 |
JP2007096260A (ja) * | 2005-08-29 | 2007-04-12 | Shinko Electric Ind Co Ltd | 多層配線基板及びその製造方法 |
JP2007173276A (ja) * | 2005-12-19 | 2007-07-05 | Tdk Corp | Ic内蔵基板の製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG63803A1 (en) * | 1997-01-23 | 1999-03-30 | Toray Industries | Epoxy-resin composition to seal semiconductors and resin-sealed semiconductor device |
US6025995A (en) * | 1997-11-05 | 2000-02-15 | Ericsson Inc. | Integrated circuit module and method |
JP4503632B2 (ja) | 2001-05-11 | 2010-07-14 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
US6861757B2 (en) * | 2001-09-03 | 2005-03-01 | Nec Corporation | Interconnecting substrate for carrying semiconductor device, method of producing thereof and package of semiconductor device |
JP2007173862A (ja) | 2003-06-24 | 2007-07-05 | Ngk Spark Plug Co Ltd | 中継基板、半導体素子付き中継基板、中継基板付き基板、半導体素子と中継基板と基板とからなる構造体 |
WO2005027223A1 (ja) * | 2003-09-09 | 2005-03-24 | Sanyo Electric Co., Ltd | 回路素子と絶縁膜を含む半導体モジュールとその製造方法およびその応用 |
JP2005236039A (ja) | 2004-02-19 | 2005-09-02 | Tdk Corp | 半導体ic内蔵基板及びその製造方法、並びに、半導体ic内蔵モジュール |
MY138566A (en) * | 2004-03-15 | 2009-06-30 | Hitachi Chemical Co Ltd | Dicing/die bonding sheet |
JP4443962B2 (ja) * | 2004-03-17 | 2010-03-31 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP2005327984A (ja) * | 2004-05-17 | 2005-11-24 | Shinko Electric Ind Co Ltd | 電子部品及び電子部品実装構造の製造方法 |
TWI362708B (en) * | 2005-02-21 | 2012-04-21 | Nitto Denko Corp | A manufacturing method of semiconductor device |
EP1896002A4 (en) * | 2005-06-27 | 2009-11-25 | Biovail Lab Int Srl | BUPROPIONAL SALT FORMULATIONS WITH MODIFIED RELEASE |
WO2007114392A1 (ja) * | 2006-03-30 | 2007-10-11 | Kyocera Corporation | 配線基板および実装構造体 |
CN101356643B (zh) * | 2006-09-13 | 2012-04-25 | 住友电木株式会社 | 半导体器件 |
-
2009
- 2009-06-03 CN CN2009801213411A patent/CN102057484B/zh not_active Expired - Fee Related
- 2009-06-03 CN CN201310018374.1A patent/CN103094133B/zh not_active Expired - Fee Related
- 2009-06-03 US US12/997,376 patent/US8598719B2/en not_active Expired - Fee Related
- 2009-06-03 KR KR1020117000045A patent/KR101549285B1/ko not_active IP Right Cessation
- 2009-06-03 WO PCT/JP2009/060194 patent/WO2009150985A1/ja active Application Filing
- 2009-06-03 JP JP2010516823A patent/JP5408131B2/ja not_active Expired - Fee Related
- 2009-06-10 TW TW098119399A patent/TWI456720B/zh not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07297560A (ja) * | 1994-04-28 | 1995-11-10 | Hitachi Ltd | 多層プリント配線基板およびその実装構造体 |
JP2006261657A (ja) * | 2005-02-21 | 2006-09-28 | Nitto Denko Corp | 半導体装置の製造方法 |
JP2007059821A (ja) * | 2005-08-26 | 2007-03-08 | Shinko Electric Ind Co Ltd | 配線基板の製造方法 |
JP2007096260A (ja) * | 2005-08-29 | 2007-04-12 | Shinko Electric Ind Co Ltd | 多層配線基板及びその製造方法 |
JP2007173276A (ja) * | 2005-12-19 | 2007-07-05 | Tdk Corp | Ic内蔵基板の製造方法 |
JP2007043184A (ja) * | 2006-09-15 | 2007-02-15 | Sumitomo Bakelite Co Ltd | 多層プリント配線板用銅箔付き絶縁シートおよびそれを用いたプリント配線板 |
Also Published As
Publication number | Publication date |
---|---|
US8598719B2 (en) | 2013-12-03 |
WO2009150985A1 (ja) | 2009-12-17 |
CN103094133A (zh) | 2013-05-08 |
JPWO2009150985A1 (ja) | 2011-11-17 |
TWI456720B (zh) | 2014-10-11 |
CN103094133B (zh) | 2015-10-28 |
CN102057484A (zh) | 2011-05-11 |
KR101549285B1 (ko) | 2015-09-01 |
US20110084409A1 (en) | 2011-04-14 |
KR20110025205A (ko) | 2011-03-09 |
TW201003872A (en) | 2010-01-16 |
CN102057484B (zh) | 2013-03-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5408131B2 (ja) | 半導体素子搭載基板 | |
JP5771987B2 (ja) | 多層回路基板、絶縁シート、および多層回路基板を用いた半導体パッケージ | |
JP5682308B2 (ja) | 半導体部品の製造方法 | |
JP5533657B2 (ja) | 積層板、回路板および半導体装置 | |
KR101346877B1 (ko) | 회로기판, 반도체 장치, 회로기판의 제조방법 및 반도체 장치의 제조방법 | |
KR20120064701A (ko) | 접착 필름, 다층 회로 기판, 전자 부품 및 반도체 장치 | |
JP2010199611A (ja) | 半導体装置 | |
WO2010073583A1 (ja) | 接着フィルム、多層回路基板、半導体用部品および半導体装置 | |
JP5569582B2 (ja) | 可撓性基板および電子機器 | |
JP2012049423A (ja) | 回路基板、半導体装置、回路基板の製造方法および半導体装置の製造方法 | |
JPWO2009051120A1 (ja) | 半導体素子搭載基板 | |
JP5256681B2 (ja) | 半導体装置、半導体装置用プリント配線板及び銅張積層板 | |
JP5292847B2 (ja) | 半導体素子搭載基板 | |
WO2011118146A1 (ja) | 回路基板、半導体装置、回路基板の製造方法および半導体装置の製造方法 | |
JP2009070891A (ja) | 半導体装置 | |
JP5593897B2 (ja) | 回路基板、半導体装置、回路基板の製造方法および半導体装置の製造方法 | |
JP2012057109A (ja) | 樹脂組成物、接着フィルム、半導体装置、多層回路基板および電子部品 | |
JP2012089727A (ja) | 電子装置、その製造方法 | |
JP5211624B2 (ja) | 半導体装置の製造方法および半導体装置用プリント配線板の製造方法 | |
JP2009202422A (ja) | 積層シート、多層プリント配線板および半導体装置 | |
JP2019199505A (ja) | 封止用樹脂組成物層、支持体付き樹脂シート、封止用樹脂硬化層、半導体パッケージ及び半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120529 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130709 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130903 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20131008 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20131021 |
|
LAPS | Cancellation because of no payment of annual fees |