JP5393298B2 - マスクケース - Google Patents
マスクケース Download PDFInfo
- Publication number
- JP5393298B2 JP5393298B2 JP2009159656A JP2009159656A JP5393298B2 JP 5393298 B2 JP5393298 B2 JP 5393298B2 JP 2009159656 A JP2009159656 A JP 2009159656A JP 2009159656 A JP2009159656 A JP 2009159656A JP 5393298 B2 JP5393298 B2 JP 5393298B2
- Authority
- JP
- Japan
- Prior art keywords
- case
- mask
- inner case
- shipping
- cushioning material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000463 material Substances 0.000 claims description 49
- 239000004065 semiconductor Substances 0.000 claims description 19
- 238000012856 packing Methods 0.000 claims description 16
- -1 polyethylene terephthalate Polymers 0.000 claims description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 5
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 4
- 229920000515 polycarbonate Polymers 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 2
- 239000000428 dust Substances 0.000 description 34
- 238000004519 manufacturing process Methods 0.000 description 14
- 230000005611 electricity Effects 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 230000010354 integration Effects 0.000 description 6
- 238000003860 storage Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011359 shock absorbing material Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920003174 cellulose-based polymer Polymers 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003562 lightweight material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009159656A JP5393298B2 (ja) | 2009-07-06 | 2009-07-06 | マスクケース |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009159656A JP5393298B2 (ja) | 2009-07-06 | 2009-07-06 | マスクケース |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011014823A JP2011014823A (ja) | 2011-01-20 |
| JP2011014823A5 JP2011014823A5 (zh) | 2012-06-14 |
| JP5393298B2 true JP5393298B2 (ja) | 2014-01-22 |
Family
ID=43593409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009159656A Active JP5393298B2 (ja) | 2009-07-06 | 2009-07-06 | マスクケース |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5393298B2 (zh) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102789132B (zh) * | 2011-01-28 | 2014-07-16 | 家登精密工业股份有限公司 | 具有固定结构的极紫外光光罩储存传送盒 |
| JP6107305B2 (ja) * | 2013-03-27 | 2017-04-05 | 大日本印刷株式会社 | ケースの洗浄方法およびケースの洗浄装置 |
| US10670976B2 (en) * | 2017-01-25 | 2020-06-02 | Gudeng Precision Industrial Co., Ltd | EUV reticle pod |
| CN113451223B (zh) * | 2021-08-31 | 2021-11-19 | 山东普利斯林智能仪表有限公司 | 一种用于半导体基板的封装机构及封装方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH036915Y2 (zh) * | 1986-03-07 | 1991-02-21 | ||
| JPH0754136Y2 (ja) * | 1989-04-28 | 1995-12-13 | 旭化成工業株式会社 | 包装体 |
| JP2506317Y2 (ja) * | 1989-12-14 | 1996-08-07 | 信越ポリマー株式会社 | マスク収納容器 |
| JP3193567B2 (ja) * | 1994-04-27 | 2001-07-30 | キヤノン株式会社 | 基板収容容器 |
| JP3893642B2 (ja) * | 1996-07-25 | 2007-03-14 | 凸版印刷株式会社 | マスク用収納容器 |
| JP3755580B2 (ja) * | 2000-11-21 | 2006-03-15 | 信越ポリマー株式会社 | 容器の梱包体及び容器の緩衝体 |
| JP2004119566A (ja) * | 2002-09-25 | 2004-04-15 | Toppan Printing Co Ltd | マスクケース |
| JP2005351935A (ja) * | 2004-06-08 | 2005-12-22 | Toppan Printing Co Ltd | フォトマスクあるいはフォトマスクブランクスを収納する容器 |
| JP4581681B2 (ja) * | 2004-12-27 | 2010-11-17 | 株式会社ニコン | レチクル保護装置および露光装置 |
| US7528936B2 (en) * | 2005-02-27 | 2009-05-05 | Entegris, Inc. | Substrate container with pressure equalization |
| US7400383B2 (en) * | 2005-04-04 | 2008-07-15 | Entegris, Inc. | Environmental control in a reticle SMIF pod |
| JP2006330421A (ja) * | 2005-05-27 | 2006-12-07 | Toppan Printing Co Ltd | フォトマスクケース |
| JP2007057624A (ja) * | 2005-08-23 | 2007-03-08 | Matsushita Electric Ind Co Ltd | レチクル収納ケース |
| JP2007141925A (ja) * | 2005-11-15 | 2007-06-07 | Nikon Corp | マスク収容容器、露光装置 |
| JP4519777B2 (ja) * | 2006-01-23 | 2010-08-04 | 信越ポリマー株式会社 | 梱包用緩衝体および包装体 |
| JP4773216B2 (ja) * | 2006-01-30 | 2011-09-14 | Ｈｏｙａ株式会社 | 基板の搬送方法 |
| TWI384322B (zh) * | 2008-08-07 | 2013-02-01 | Gudeng Prec Industral Co Ltd | 光罩盒之承載盒及其緩衝定位裝置 |
-
2009
- 2009-07-06 JP JP2009159656A patent/JP5393298B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011014823A (ja) | 2011-01-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5268142B2 (ja) | マスクブランク収納ケース及びマスクブランクの収納方法、並びにマスクブランク収納体 | |
| TW201433537A (zh) | 玻璃基板搬運台車 | |
| JP4236535B2 (ja) | 大型ペリクル収納容器 | |
| JP5393298B2 (ja) | マスクケース | |
| KR101848950B1 (ko) | 마스크 블랭크 수납 케이스 및 마스크 블랭크 수납체 | |
| JP2006124034A (ja) | 薄膜付基板の支持部材、薄膜付基板の収納容器、マスクブランク収納体、転写マスク収納体、及び薄膜付基板の輸送方法 | |
| JP5864399B2 (ja) | ペリクル収納容器 | |
| US20020089656A1 (en) | Containers for lithography mask and method of use | |
| JP5416154B2 (ja) | 基板収納容器、膜付きガラス基板収納体、マスクブランク収納体、および転写マスク収納体 | |
| JP2000173887A (ja) | ペリクル収納ケース | |
| JP5668346B2 (ja) | ペリクルのフォトマスクへの取り付け構造 | |
| JP4773216B2 (ja) | 基板の搬送方法 | |
| KR102619269B1 (ko) | 리소그래피용 펠리클 용기 | |
| JPWO2006006318A1 (ja) | マスクブランクス及びその製造方法並びに転写プレートの製造方法 | |
| JP6218309B2 (ja) | マスクブランク収納ケース及びマスクブランク収納体 | |
| JP4776721B2 (ja) | 大型ペリクル収納容器及びその製造方法 | |
| JP4801981B2 (ja) | 基板収納容器、膜付きガラス基板収納体、マスクブランク収納体、および転写マスク収納体 | |
| TWI474957B (zh) | 防塵薄膜組件收容容器 | |
| CN217821248U (zh) | 防护膜框架层叠体及制造系统、包装物以及运输系统 | |
| JP2008087847A (ja) | 基板収納ケース | |
| JP2009037269A (ja) | 大型ペリクル収納容器及びその製造方法 | |
| CN111308855B (zh) | 防尘薄膜框架及防尘薄膜组件 | |
| JP2009037269A5 (zh) | ||
| JP7442291B2 (ja) | ペリクルとその専用ペリクルケースからなるアセンブリ | |
| JP2007145397A5 (zh) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD13 | Notification of appointment of power of sub attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7433 Effective date: 20110125 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110713 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120426 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120426 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130614 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130625 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130823 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20131008 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20131015 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5393298 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |