JP5393298B2 - マスクケース - Google Patents

マスクケース Download PDF

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Publication number
JP5393298B2
JP5393298B2 JP2009159656A JP2009159656A JP5393298B2 JP 5393298 B2 JP5393298 B2 JP 5393298B2 JP 2009159656 A JP2009159656 A JP 2009159656A JP 2009159656 A JP2009159656 A JP 2009159656A JP 5393298 B2 JP5393298 B2 JP 5393298B2
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JP
Japan
Prior art keywords
case
mask
inner case
shipping
cushioning material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2009159656A
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English (en)
Japanese (ja)
Other versions
JP2011014823A5 (enExample
JP2011014823A (ja
Inventor
俊雄 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainichi Shoji KK
Original Assignee
Dainichi Shoji KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainichi Shoji KK filed Critical Dainichi Shoji KK
Priority to JP2009159656A priority Critical patent/JP5393298B2/ja
Publication of JP2011014823A publication Critical patent/JP2011014823A/ja
Publication of JP2011014823A5 publication Critical patent/JP2011014823A5/ja
Application granted granted Critical
Publication of JP5393298B2 publication Critical patent/JP5393298B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2009159656A 2009-07-06 2009-07-06 マスクケース Active JP5393298B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009159656A JP5393298B2 (ja) 2009-07-06 2009-07-06 マスクケース

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009159656A JP5393298B2 (ja) 2009-07-06 2009-07-06 マスクケース

Publications (3)

Publication Number Publication Date
JP2011014823A JP2011014823A (ja) 2011-01-20
JP2011014823A5 JP2011014823A5 (enExample) 2012-06-14
JP5393298B2 true JP5393298B2 (ja) 2014-01-22

Family

ID=43593409

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009159656A Active JP5393298B2 (ja) 2009-07-06 2009-07-06 マスクケース

Country Status (1)

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JP (1) JP5393298B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025026412A (ja) * 2023-08-09 2025-02-21 家登精密工業股▲ふん▼有限公司 下向き圧力を吸収するレチクル支持体を備えたレチクルポッド

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102789132B (zh) * 2011-01-28 2014-07-16 家登精密工业股份有限公司 具有固定结构的极紫外光光罩储存传送盒
JP6107305B2 (ja) * 2013-03-27 2017-04-05 大日本印刷株式会社 ケースの洗浄方法およびケースの洗浄装置
JP6490845B2 (ja) * 2017-01-25 2019-03-27 家登精密工業股▲ふん▼有限公司 極紫外線フォトマスクポッド
CN113451223B (zh) * 2021-08-31 2021-11-19 山东普利斯林智能仪表有限公司 一种用于半导体基板的封装机构及封装方法
EP4430659A1 (en) * 2021-11-09 2024-09-18 Entegris, Inc. Reticle pod including motion limiting features and method of assembling same

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH036915Y2 (enExample) * 1986-03-07 1991-02-21
JPH0754136Y2 (ja) * 1989-04-28 1995-12-13 旭化成工業株式会社 包装体
JP2506317Y2 (ja) * 1989-12-14 1996-08-07 信越ポリマー株式会社 マスク収納容器
JP3193567B2 (ja) * 1994-04-27 2001-07-30 キヤノン株式会社 基板収容容器
JP3893642B2 (ja) * 1996-07-25 2007-03-14 凸版印刷株式会社 マスク用収納容器
JP3755580B2 (ja) * 2000-11-21 2006-03-15 信越ポリマー株式会社 容器の梱包体及び容器の緩衝体
JP2004119566A (ja) * 2002-09-25 2004-04-15 Toppan Printing Co Ltd マスクケース
JP2005351935A (ja) * 2004-06-08 2005-12-22 Toppan Printing Co Ltd フォトマスクあるいはフォトマスクブランクスを収納する容器
JP4581681B2 (ja) * 2004-12-27 2010-11-17 株式会社ニコン レチクル保護装置および露光装置
US7528936B2 (en) * 2005-02-27 2009-05-05 Entegris, Inc. Substrate container with pressure equalization
US7400383B2 (en) * 2005-04-04 2008-07-15 Entegris, Inc. Environmental control in a reticle SMIF pod
JP2006330421A (ja) * 2005-05-27 2006-12-07 Toppan Printing Co Ltd フォトマスクケース
JP2007057624A (ja) * 2005-08-23 2007-03-08 Matsushita Electric Ind Co Ltd レチクル収納ケース
JP2007141925A (ja) * 2005-11-15 2007-06-07 Nikon Corp マスク収容容器、露光装置
JP4519777B2 (ja) * 2006-01-23 2010-08-04 信越ポリマー株式会社 梱包用緩衝体および包装体
JP4773216B2 (ja) * 2006-01-30 2011-09-14 Ｈｏｙａ株式会社 基板の搬送方法
TWI384322B (zh) * 2008-08-07 2013-02-01 Gudeng Prec Industral Co Ltd 光罩盒之承載盒及其緩衝定位裝置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025026412A (ja) * 2023-08-09 2025-02-21 家登精密工業股▲ふん▼有限公司 下向き圧力を吸収するレチクル支持体を備えたレチクルポッド

Also Published As

Publication number Publication date
JP2011014823A (ja) 2011-01-20

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