JP5377666B2 - 真空排気装置及び真空排気方法及び基板処理装置 - Google Patents
真空排気装置及び真空排気方法及び基板処理装置 Download PDFInfo
- Publication number
- JP5377666B2 JP5377666B2 JP2011547426A JP2011547426A JP5377666B2 JP 5377666 B2 JP5377666 B2 JP 5377666B2 JP 2011547426 A JP2011547426 A JP 2011547426A JP 2011547426 A JP2011547426 A JP 2011547426A JP 5377666 B2 JP5377666 B2 JP 5377666B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- exhaust
- vacuum pump
- processing chamber
- substrate processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
- F04B37/16—Means for nullifying unswept space
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation
- F04C28/065—Capacity control using a multiplicity of units or pumping capacities, e.g. multiple chambers, individually switchable or controllable
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/08—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids characterised by varying the rotational speed
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/24—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids characterised by using valves controlling pressure or flow rate, e.g. discharge valves or unloading valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/28—Safety arrangements; Monitoring
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/10—Vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2240/00—Components
- F04C2240/70—Use of multiplicity of similar components; Modular construction
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2270/00—Control; Monitoring or safety arrangements
- F04C2270/56—Number of pump/machine units in operation
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011547426A JP5377666B2 (ja) | 2009-12-28 | 2010-11-29 | 真空排気装置及び真空排気方法及び基板処理装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009298952 | 2009-12-28 | ||
JP2009298952 | 2009-12-28 | ||
PCT/JP2010/071234 WO2011080980A1 (ja) | 2009-12-28 | 2010-11-29 | 真空排気装置及び真空排気方法及び基板処理装置 |
JP2011547426A JP5377666B2 (ja) | 2009-12-28 | 2010-11-29 | 真空排気装置及び真空排気方法及び基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2011080980A1 JPWO2011080980A1 (ja) | 2013-05-09 |
JP5377666B2 true JP5377666B2 (ja) | 2013-12-25 |
Family
ID=44226400
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011547426A Active JP5377666B2 (ja) | 2009-12-28 | 2010-11-29 | 真空排気装置及び真空排気方法及び基板処理装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5377666B2 (ko) |
KR (1) | KR101327715B1 (ko) |
CN (1) | CN102713287B (ko) |
TW (1) | TWI503481B (ko) |
WO (1) | WO2011080980A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016110694A1 (en) * | 2015-01-06 | 2016-07-14 | Edwards Limited | Improvements in or relating to vacuum pumping arrangements |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102255195B1 (ko) | 2013-04-16 | 2021-05-25 | 삼성디스플레이 주식회사 | 필름 건조 장치 및 필름 건조 방법 |
KR102114313B1 (ko) | 2013-08-06 | 2020-05-25 | 삼성디스플레이 주식회사 | 증착장치 및 이를 이용한 증착방법 |
CN105649986B (zh) * | 2014-11-10 | 2018-07-20 | 中国科学院沈阳科学仪器股份有限公司 | 用于多级真空泵的防冲击结构和具有该结构的多级真空泵 |
DE202015004596U1 (de) * | 2015-06-26 | 2015-09-21 | Oerlikon Leybold Vacuum Gmbh | Vakuumpumpensystem |
CN105552001B (zh) * | 2015-12-10 | 2018-06-15 | 武汉华星光电技术有限公司 | 一种真空系统 |
CN105691706B (zh) * | 2016-03-11 | 2019-11-08 | 上海嘉迪机械有限公司 | 一种旋转真空封口机的抽气系统 |
CN107364155B (zh) * | 2016-05-13 | 2019-05-31 | 株洲时代新材料科技股份有限公司 | 一种风电叶片模具用抽气装置 |
CN106321435A (zh) * | 2016-09-09 | 2017-01-11 | 武汉华星光电技术有限公司 | 降低干泵功耗的系统及方法 |
TWI684707B (zh) * | 2019-02-27 | 2020-02-11 | 亞台富士精機股份有限公司 | 尾氣真空節能幫浦系統 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07167053A (ja) * | 1993-12-14 | 1995-07-04 | Nec Yamagata Ltd | 高真空排気装置 |
JP2003139054A (ja) * | 2001-10-31 | 2003-05-14 | Ulvac Japan Ltd | 真空排気装置 |
JP2003161281A (ja) * | 2001-11-28 | 2003-06-06 | Tokyo Electron Ltd | 真空処理装置 |
JP2007231938A (ja) * | 2006-02-06 | 2007-09-13 | Boc Edwards Kk | 真空装置、真空装置における水蒸気分圧の急速低減方法、ロードロックチャンバー内の水蒸気分圧の上昇防止方法、および、真空装置用真空ポンプ |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100876318B1 (ko) * | 2001-09-06 | 2008-12-31 | 가부시키가이샤 아루박 | 진공배기장치 및 진공배기장치의 운전방법 |
US20060254289A1 (en) * | 2003-08-20 | 2006-11-16 | Dirk Schiller | Vacuum device |
CN100491721C (zh) * | 2005-06-27 | 2009-05-27 | 建国科技大学 | 多级式抽真空装置及其抽真空方法 |
KR20080043419A (ko) * | 2006-11-14 | 2008-05-19 | 방경석 | 진공발생장치 |
JP2009114984A (ja) * | 2007-11-07 | 2009-05-28 | Toyota Motor Corp | 真空ポンプ装置 |
-
2010
- 2010-11-29 WO PCT/JP2010/071234 patent/WO2011080980A1/ja active Application Filing
- 2010-11-29 JP JP2011547426A patent/JP5377666B2/ja active Active
- 2010-11-29 KR KR1020127019175A patent/KR101327715B1/ko active IP Right Grant
- 2010-11-29 CN CN201080059663.0A patent/CN102713287B/zh active Active
- 2010-12-03 TW TW099142146A patent/TWI503481B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07167053A (ja) * | 1993-12-14 | 1995-07-04 | Nec Yamagata Ltd | 高真空排気装置 |
JP2003139054A (ja) * | 2001-10-31 | 2003-05-14 | Ulvac Japan Ltd | 真空排気装置 |
JP2003161281A (ja) * | 2001-11-28 | 2003-06-06 | Tokyo Electron Ltd | 真空処理装置 |
JP2007231938A (ja) * | 2006-02-06 | 2007-09-13 | Boc Edwards Kk | 真空装置、真空装置における水蒸気分圧の急速低減方法、ロードロックチャンバー内の水蒸気分圧の上昇防止方法、および、真空装置用真空ポンプ |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016110694A1 (en) * | 2015-01-06 | 2016-07-14 | Edwards Limited | Improvements in or relating to vacuum pumping arrangements |
Also Published As
Publication number | Publication date |
---|---|
CN102713287A (zh) | 2012-10-03 |
CN102713287B (zh) | 2015-04-15 |
WO2011080980A1 (ja) | 2011-07-07 |
KR20120096101A (ko) | 2012-08-29 |
KR101327715B1 (ko) | 2013-11-11 |
TW201139851A (en) | 2011-11-16 |
TWI503481B (zh) | 2015-10-11 |
JPWO2011080980A1 (ja) | 2013-05-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5377666B2 (ja) | 真空排気装置及び真空排気方法及び基板処理装置 | |
JP5504353B2 (ja) | 真空排気装置及び真空処理装置及び真空排気方法 | |
KR101570657B1 (ko) | 공유 진공 펌프를 구비한 트윈 챔버 프로세싱 시스템 | |
JP3564069B2 (ja) | 真空装置 | |
JP4634918B2 (ja) | 真空処理装置 | |
JP4472005B2 (ja) | 真空処理装置及び真空処理方法 | |
EP2569541B1 (en) | Vacuum pumping system | |
WO2010016484A1 (ja) | 真空処理装置、真空処理方法 | |
JP6759790B2 (ja) | ゲートバルブ、真空処理装置及び真空処理装置の制御方法 | |
JP2008075135A (ja) | 真空処理装置および大気開放方法 | |
JP2004218648A (ja) | 真空装置 | |
JP5956754B2 (ja) | 真空排気システム | |
WO2011007652A1 (ja) | 減圧システム及び真空処理装置 | |
WO2012008439A1 (ja) | 基板処理方法及び基板処理システム | |
JP4633370B2 (ja) | 真空装置 | |
JP2006169576A (ja) | 真空装置 | |
JP5597433B2 (ja) | 真空処理装置 | |
JP2009158527A (ja) | ロードロック室を有する真空チャンバー装置 | |
JP3107794U (ja) | 真空排気装置 | |
KR20100042492A (ko) | 반도체 제조설비의 가스 쿨링시스템 | |
JP2011137394A (ja) | 真空処理装置及び真空処理方法 | |
JP2005183705A (ja) | レーザアニーリング装置及びロードロックチャンバの真空装置及びその制御方法及びプログラム | |
JP2004136275A (ja) | 真空処理装置における処理対象物搬送方法 | |
JP2003074469A (ja) | 真空処理装置 | |
JP2007061711A (ja) | 真空処理装置および真空処理装置の圧力調整方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130911 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130924 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5377666 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |