JP5367242B2 - 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置 - Google Patents

強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置 Download PDF

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JP5367242B2
JP5367242B2 JP2007229786A JP2007229786A JP5367242B2 JP 5367242 B2 JP5367242 B2 JP 5367242B2 JP 2007229786 A JP2007229786 A JP 2007229786A JP 2007229786 A JP2007229786 A JP 2007229786A JP 5367242 B2 JP5367242 B2 JP 5367242B2
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film
ferroelectric
ferroelectric film
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JP2008270704A (ja
JP2008270704A5 (OSRAM
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高見 新川
隆満 藤井
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Fujifilm Corp
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Priority to US12/052,547 priority patent/US8100513B2/en
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  • Formation Of Insulating Films (AREA)
  • Semiconductor Memories (AREA)
  • Physical Vapour Deposition (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP2007229786A 2007-03-22 2007-09-05 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置 Active JP5367242B2 (ja)

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Application Number Priority Date Filing Date Title
JP2007229786A JP5367242B2 (ja) 2007-03-22 2007-09-05 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
EP08005206.1A EP1973177B8 (en) 2007-03-22 2008-03-19 Ferroelectric film, process for producing the same, ferroelectric device, and liquid discharge device
US12/052,547 US8100513B2 (en) 2007-03-22 2008-03-20 Ferroelectric film, process for producing the same, ferroelectric device, and liquid discharge device

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JP2007074026 2007-03-22
JP2007074026 2007-03-22
JP2007229786A JP5367242B2 (ja) 2007-03-22 2007-09-05 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置

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JP2008270704A JP2008270704A (ja) 2008-11-06
JP2008270704A5 JP2008270704A5 (OSRAM) 2010-04-15
JP5367242B2 true JP5367242B2 (ja) 2013-12-11

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JP2007229788A Withdrawn JP2008266771A (ja) 2007-03-22 2007-09-05 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
JP2007229789A Active JP4808689B2 (ja) 2007-03-22 2007-09-05 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
JP2007229787A Withdrawn JP2008266770A (ja) 2007-03-22 2007-09-05 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置

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JP2007229789A Active JP4808689B2 (ja) 2007-03-22 2007-09-05 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
JP2007229787A Withdrawn JP2008266770A (ja) 2007-03-22 2007-09-05 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10103316B2 (en) 2014-11-28 2018-10-16 Fujifilm Corporation Piezoelectric film, piezoelectric element including the same, and liquid discharge apparatus
DE112017003384T5 (de) 2016-08-31 2019-03-21 Fujifilm Corporation Piezoelektrischer Film und piezoelektrisches Element mit einem solchen Film
US10615330B1 (en) 2017-02-16 2020-04-07 Panasonic Intellectual Property Management Co., Ltd. Piezoelectric element, actuator, and liquid droplet ejection head
US10622540B2 (en) 2016-12-12 2020-04-14 Panasonic Intellectual Property Management Co., Ltd. Piezoelectric functional film, actuator, and ink-jet head

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5367242B2 (ja) * 2007-03-22 2013-12-11 富士フイルム株式会社 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
JP4438892B1 (ja) * 2009-02-03 2010-03-24 富士フイルム株式会社 圧電体とその製造方法、圧電素子、及び液体吐出装置
JP5592104B2 (ja) 2009-02-17 2014-09-17 富士フイルム株式会社 圧電体膜並びにそれを備えた圧電素子及び液体吐出装置
US8540851B2 (en) * 2009-02-19 2013-09-24 Fujifilm Corporation Physical vapor deposition with impedance matching network
JP5435206B2 (ja) * 2009-02-25 2014-03-05 セイコーエプソン株式会社 液体噴射ヘッド及び液体噴射装置
US8164234B2 (en) * 2009-02-26 2012-04-24 Fujifilm Corporation Sputtered piezoelectric material
JP2011029532A (ja) * 2009-07-29 2011-02-10 Fujitsu Ltd 強誘電体キャパシタ及び強誘電体メモリ装置
JP2011181828A (ja) * 2010-03-03 2011-09-15 Fujifilm Corp 圧電体膜とその製造方法、圧電素子および液体吐出装置
JP5555072B2 (ja) 2010-06-25 2014-07-23 富士フイルム株式会社 圧電体膜、圧電素子および液体吐出装置
JP5601899B2 (ja) * 2010-06-25 2014-10-08 富士フイルム株式会社 圧電体膜および圧電素子
JP5865601B2 (ja) 2011-04-28 2016-02-17 株式会社リコー 強誘電体膜の製造方法及び強誘電体膜の製造装置
KR20160015805A (ko) * 2014-07-31 2016-02-15 삼성전기주식회사 Pzt계 압전 세라믹 재료 및 이를 이용한 압전 소자
JP6392360B2 (ja) 2014-08-29 2018-09-19 富士フイルム株式会社 圧電体膜とその製造方法、圧電素子、及び液体吐出装置
WO2016190110A1 (ja) * 2015-05-25 2016-12-01 コニカミノルタ株式会社 圧電薄膜、圧電アクチュエータ、インクジェットヘッド、インクジェットプリンタおよび圧電アクチュエータの製造方法
WO2017018222A1 (ja) * 2015-07-24 2017-02-02 株式会社ユーテック 圧電体膜及びその製造方法、バイモルフ素子、圧電体素子及びその製造方法
DE112017003091B4 (de) * 2016-07-28 2021-02-18 Fujifilm Corporation Piezoelektrischer Film, Piezoelektrisches Element und Verfahren zur Herstellung eines Piezoelektrischen Films
EP4224541A4 (en) 2020-09-30 2024-03-13 FUJIFILM Corporation Piezoelectric laminate and piezoelectric element
EP4318619B1 (en) * 2021-03-25 2025-09-03 FUJIFILM Corporation Piezoelectric film, piezoelectric element and method for producing piezoelectric film

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3381473B2 (ja) * 1994-08-25 2003-02-24 セイコーエプソン株式会社 液体噴射ヘッド
US5719607A (en) * 1994-08-25 1998-02-17 Seiko Epson Corporation Liquid jet head
JP3487068B2 (ja) * 1995-04-03 2004-01-13 セイコーエプソン株式会社 圧電体薄膜およびその製造法ならびにそれを用いたインクジェット記録ヘッド
JP2000203990A (ja) * 1999-01-19 2000-07-25 Japan Science & Technology Corp プラズマスパッタリングによる結晶薄膜の低温成長法
JP4171908B2 (ja) * 2004-01-20 2008-10-29 セイコーエプソン株式会社 強誘電体膜、強誘電体メモリ、及び圧電素子
JP4450654B2 (ja) * 2004-03-25 2010-04-14 株式会社アルバック スパッタ源及び成膜装置
JP2007042818A (ja) * 2005-08-02 2007-02-15 Fujitsu Ltd 成膜装置及び成膜方法
JP4396857B2 (ja) * 2005-08-30 2010-01-13 セイコーエプソン株式会社 絶縁性ターゲット材料の製造方法
JP4142705B2 (ja) * 2006-09-28 2008-09-03 富士フイルム株式会社 成膜方法、圧電膜、圧電素子、及び液体吐出装置
JP4142706B2 (ja) * 2006-09-28 2008-09-03 富士フイルム株式会社 成膜装置、成膜方法、絶縁膜、誘電体膜、圧電膜、強誘電体膜、圧電素子および液体吐出装置
JP5367242B2 (ja) * 2007-03-22 2013-12-11 富士フイルム株式会社 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
JP4993294B2 (ja) * 2007-09-05 2012-08-08 富士フイルム株式会社 ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10103316B2 (en) 2014-11-28 2018-10-16 Fujifilm Corporation Piezoelectric film, piezoelectric element including the same, and liquid discharge apparatus
DE112017003384T5 (de) 2016-08-31 2019-03-21 Fujifilm Corporation Piezoelektrischer Film und piezoelektrisches Element mit einem solchen Film
US10483452B2 (en) 2016-08-31 2019-11-19 Fujifilm Corporation Piezoelectric film and piezoelectric element including the same
US10622540B2 (en) 2016-12-12 2020-04-14 Panasonic Intellectual Property Management Co., Ltd. Piezoelectric functional film, actuator, and ink-jet head
US10615330B1 (en) 2017-02-16 2020-04-07 Panasonic Intellectual Property Management Co., Ltd. Piezoelectric element, actuator, and liquid droplet ejection head

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JP2008266772A (ja) 2008-11-06
JP4808689B2 (ja) 2011-11-02
JP2008266770A (ja) 2008-11-06
JP2008270704A (ja) 2008-11-06
JP2008266771A (ja) 2008-11-06

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