JP5339975B2 - Ｘ線位相イメージングに用いられる位相格子、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム - Google Patents

Ｘ線位相イメージングに用いられる位相格子、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム Download PDF

Info

Publication number
JP5339975B2
JP5339975B2 JP2009058270A JP2009058270A JP5339975B2 JP 5339975 B2 JP5339975 B2 JP 5339975B2 JP 2009058270 A JP2009058270 A JP 2009058270A JP 2009058270 A JP2009058270 A JP 2009058270A JP 5339975 B2 JP5339975 B2 JP 5339975B2
Authority
JP
Japan
Prior art keywords
phase
grating
ray
diffraction grating
protrusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009058270A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009244260A5 (https=
JP2009244260A (ja
Inventor
高士 中村
英之助 伊藤
彩 今田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009058270A priority Critical patent/JP5339975B2/ja
Publication of JP2009244260A publication Critical patent/JP2009244260A/ja
Publication of JP2009244260A5 publication Critical patent/JP2009244260A5/ja
Application granted granted Critical
Publication of JP5339975B2 publication Critical patent/JP5339975B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
    • A61B6/06—Diaphragms
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
    • A61B6/42—Arrangements for detecting radiation specially adapted for radiation diagnosis
    • A61B6/4291—Arrangements for detecting radiation specially adapted for radiation diagnosis the detector being combined with a grid or grating
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
    • A61B6/48—Diagnostic techniques
    • A61B6/484—Diagnostic techniques involving phase contrast X-ray imaging
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G02B5/1871—Transmissive phase gratings
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
    • G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Medical Informatics (AREA)
  • Optics & Photonics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Biomedical Technology (AREA)
  • Veterinary Medicine (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Pathology (AREA)
  • Radiology & Medical Imaging (AREA)
  • Biophysics (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Molecular Biology (AREA)
  • Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2009058270A 2008-03-13 2009-03-11 Ｘ線位相イメージングに用いられる位相格子、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム Expired - Fee Related JP5339975B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009058270A JP5339975B2 (ja) 2008-03-13 2009-03-11 Ｘ線位相イメージングに用いられる位相格子、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008064709 2008-03-13
JP2008064709 2008-03-13
JP2009058270A JP5339975B2 (ja) 2008-03-13 2009-03-11 Ｘ線位相イメージングに用いられる位相格子、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム

Publications (3)

Publication Number Publication Date
JP2009244260A JP2009244260A (ja) 2009-10-22
JP2009244260A5 JP2009244260A5 (https=) 2012-04-26
JP5339975B2 true JP5339975B2 (ja) 2013-11-13

Family

ID=41061181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009058270A Expired - Fee Related JP5339975B2 (ja) 2008-03-13 2009-03-11 Ｘ線位相イメージングに用いられる位相格子、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム

Country Status (3)

Country Link
US (1) US8718228B2 (https=)
JP (1) JP5339975B2 (https=)
WO (1) WO2009113726A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4246038A4 (en) * 2020-12-29 2024-05-01 Huawei Technologies Co., Ltd. COMPOSITE GRATING AND PRODUCTION METHOD THEREOF, DIFFRACTIVE OPTICAL WAVEGUIDE AND ELECTRONIC DEVICE

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2343537B1 (en) 2008-10-29 2019-04-10 Canon Kabushiki Kaisha X-ray imaging device and x-ray imaging method
US8559594B2 (en) 2008-10-29 2013-10-15 Canon Kabushiki Kaisha Imaging apparatus and imaging method
RU2539333C2 (ru) 2009-05-19 2015-01-20 Конинклейке Филипс Электроникс Н.В. Дифракционная решетка для получения изображений методом фазового контраста
JP5773624B2 (ja) 2010-01-08 2015-09-02 キヤノン株式会社 微細構造体の製造方法
JP2015178683A (ja) * 2010-01-08 2015-10-08 キヤノン株式会社 金属吸収格子及びタルボ干渉計
JP5538936B2 (ja) * 2010-02-10 2014-07-02 キヤノン株式会社 解析方法、プログラム、記憶媒体、ｘ線位相イメージング装置
JP5548085B2 (ja) * 2010-03-30 2014-07-16 富士フイルム株式会社 回折格子の調整方法
DE102010019991A1 (de) * 2010-05-10 2011-11-10 Siemens Aktiengesellschaft Computertomographiesystem
WO2012000694A1 (en) * 2010-06-28 2012-01-05 Paul Scherrer Institut A method for x-ray phase contrast and dark-field imaging using an arrangement of gratings in planar geometry
JP2012013530A (ja) * 2010-06-30 2012-01-19 Fujifilm Corp 回折格子及びその製造方法、並びに放射線撮影装置
JP5504104B2 (ja) * 2010-08-31 2014-05-28 株式会社東芝 Ｍｏコリメータおよびそれを用いたＸ線検出器並びにＣＴ装置
US9105369B2 (en) 2010-09-03 2015-08-11 Koninklijke Philips N.V. Differential phase-contrast imaging with improved sampling
WO2012032950A1 (en) * 2010-09-08 2012-03-15 Canon Kabushiki Kaisha X-ray differential phase contrast imaging using a two-dimensional source grating with pinhole apertures and two-dimensional phase and absorption gratings
JP2012103237A (ja) * 2010-10-14 2012-05-31 Canon Inc 撮像装置
RU2572644C2 (ru) * 2010-10-19 2016-01-20 Конинклейке Филипс Электроникс Н.В. Формирование дифференциальных фазово-контрастных изображений
BR112013011028A2 (pt) * 2010-11-08 2016-09-13 Koninkl Philips Electronics Nv reticulação laminada, disposição de detector de um sistema de raios x. sistema de geração de imagens de raios x e método de produção de uma reticulação laminada
WO2012073545A1 (en) * 2010-11-29 2012-06-07 Canon Kabushiki Kaisha Method of manufacturing an x-ray diffraction grating microstructure for imaging apparatus
JP2012143553A (ja) * 2010-12-24 2012-08-02 Fujifilm Corp 放射線画像撮影装置および放射線画像検出器
JP5944413B2 (ja) * 2011-02-07 2016-07-05 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． ダイナミックレンジを増大する微分位相コントラスト撮像装置及び方法
JP5860613B2 (ja) * 2011-05-26 2016-02-16 株式会社オプトニクス精密 Ｘ線干渉計用の回折格子及びその製造方法
JP2013188286A (ja) * 2012-03-13 2013-09-26 Fujifilm Corp 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム
FI20126119A7 (fi) 2012-10-29 2014-04-30 Teknologian Tutkimuskeskus Vtt Oy Interferometrinen dynaamihila-kuvannusmenetelmä, diffraktiohila ja kuvannuslaitteisto
US8989347B2 (en) 2012-12-19 2015-03-24 General Electric Company Image reconstruction method for differential phase contrast X-ray imaging
US9014333B2 (en) 2012-12-31 2015-04-21 General Electric Company Image reconstruction methods for differential phase contrast X-ray imaging
EP2827339A1 (en) * 2013-07-16 2015-01-21 Canon Kabushiki Kaisha Source grating, interferometer, and object information acquisition system
JP6362103B2 (ja) * 2013-09-04 2018-07-25 キヤノン株式会社 遮蔽格子及びトールボット干渉計
EP3042383A1 (de) 2013-10-07 2016-07-13 Siemens Healthcare GmbH Phasenkontrast-röntgenbildgebungsvorrichtung und phasengitter für eine solche
US11249034B2 (en) * 2015-12-02 2022-02-15 Konica Minolta, Inc. X-ray Talbot capturing apparatus
RU2601867C1 (ru) * 2015-12-09 2016-11-10 Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" Устройство для управления сходимостью рентгеновского пучка и способ изготовления дифракционного блока в составе указанного устройства (варианты)
KR102543948B1 (ko) 2016-05-17 2023-06-15 삼성전자주식회사 클럭 신호 생성기 및 기판 검사 장치
JPWO2018066198A1 (ja) * 2016-10-06 2019-06-24 株式会社島津製作所 回折格子ユニット、格子ユニットの製造方法およびｘ線位相イメージ撮影装置
JP6753342B2 (ja) * 2017-03-15 2020-09-09 株式会社島津製作所 放射線格子検出器およびｘ線検査装置
RU175213U1 (ru) * 2017-08-03 2017-12-01 Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" Устройство для управления сходимостью рентгеновского пучка с её настройкой
JP7225256B2 (ja) * 2018-03-06 2023-02-20 アプライド マテリアルズ インコーポレイテッド ３ｄ機能光学材料積層構造を構築する方法
JP6984783B2 (ja) * 2019-02-21 2021-12-22 株式会社島津製作所 Ｘ線位相イメージング装置およびｘ線位相イメージング方法
CN110916712B (zh) * 2019-11-29 2022-04-29 清华大学 光栅成像系统及其扫描方法
EP3832392A1 (en) * 2019-12-05 2021-06-09 Lumileds Holding B.V. Method for manufacturing lighting device
US12055737B2 (en) * 2022-05-18 2024-08-06 GE Precision Healthcare LLC Aligned and stacked high-aspect ratio metallized structures

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4419585A (en) * 1981-02-26 1983-12-06 Massachusetts General Hospital Variable angle slant hole collimator
JPS60181638A (ja) * 1984-02-29 1985-09-17 Toshiba Corp 放射線像撮影装置
JP3416976B2 (ja) * 1993-02-08 2003-06-16 セイコーエプソン株式会社 位相マスク及び位相マスク再生装置
JP3019723B2 (ja) 1994-06-09 2000-03-13 株式会社ニコン 回折光学素子の製造方法
US5606589A (en) * 1995-05-09 1997-02-25 Thermo Trex Corporation Air cross grids for mammography and methods for their manufacture and use
US5812629A (en) * 1997-04-30 1998-09-22 Clauser; John F. Ultrahigh resolution interferometric x-ray imaging
JP2006163291A (ja) 2004-12-10 2006-06-22 Canon Inc 光学素子及びその製造方法
JP4570992B2 (ja) * 2005-03-14 2010-10-27 株式会社リコー 光ピックアップ及び光情報記録装置
JP4608679B2 (ja) * 2005-03-17 2011-01-12 財団法人新産業創造研究機構 Ｘ線タルボ干渉計に用いられる位相型回折格子と振幅型回折格子の製造方法
DE102006063048B3 (de) * 2006-02-01 2018-03-29 Siemens Healthcare Gmbh Fokus/Detektor-System einer Röntgenapparatur zur Erzeugung von Phasenkontrastaufnahmen
DE102006037254B4 (de) * 2006-02-01 2017-08-03 Paul Scherer Institut Fokus-Detektor-Anordnung zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen mit röntgenoptischen Gittern, sowie Röntgen-System, Röntgen-C-Bogen-System und Röntgen-Computer-Tomographie-System
DE102006037256B4 (de) * 2006-02-01 2017-03-30 Paul Scherer Institut Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen sowie Röntgensystem, Röntgen-C-Bogen-System und Röntgen-CT-System
DE102006037255A1 (de) * 2006-02-01 2007-08-02 Siemens Ag Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen
DE102006017291B4 (de) * 2006-02-01 2017-05-24 Paul Scherer Institut Fokus/Detektor-System einer Röntgenapparatur zur Erzeugung von Phasenkontrastaufnahmen, Röntgensystem mit einem solchen Fokus/Detektor-System sowie zugehöriges Speichermedium und Verfahren
DE102006017290B4 (de) * 2006-02-01 2017-06-22 Siemens Healthcare Gmbh Fokus/Detektor-System einer Röntgenapparatur, Röntgen-System und Verfahren zur Erzeugung von Phasenkontrastaufnahmen
DE102006037281A1 (de) * 2006-02-01 2007-08-09 Siemens Ag Röntgenoptisches Durchstrahlungsgitter einer Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen von einem Untersuchungsobjekt
DE102006015358B4 (de) * 2006-02-01 2019-08-22 Paul Scherer Institut Fokus/Detektor-System einer Röntgenapparatur zur Erzeugung von Phasenkontrastaufnahmen, zugehöriges Röntgen-System sowie Speichermedium und Verfahren zur Erzeugung tomographischer Aufnahmen
DE102006037282B4 (de) * 2006-02-01 2017-08-17 Siemens Healthcare Gmbh Fokus-Detektor-Anordnung mit röntgenoptischem Gitter zur Phasenkontrastmessung
US7714368B2 (en) * 2006-06-26 2010-05-11 Aptina Imaging Corporation Method and apparatus providing imager pixel array with grating structure and imager device containing the same
US7609392B2 (en) * 2006-06-28 2009-10-27 California Institute Of Technology Harmonically matched diffraction grating pair
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US7924973B2 (en) * 2007-11-15 2011-04-12 Csem Centre Suisse D'electronique Et De Microtechnique Sa Interferometer device and method
DE102008048688B4 (de) * 2008-09-24 2011-08-25 Paul Scherrer Institut Röntgen-CT-System zur Erzeugung tomographischer Phasenkontrast- oder Dunkelfeldaufnahmen
EP2168488B1 (de) * 2008-09-30 2013-02-13 Siemens Aktiengesellschaft Röntgen-CT-System zur Röntgen-Phasenkontrast-und/oder Röntgen-Dunkelfeld-Bildgebung
EP2343537B1 (en) * 2008-10-29 2019-04-10 Canon Kabushiki Kaisha X-ray imaging device and x-ray imaging method
US7949095B2 (en) * 2009-03-02 2011-05-24 University Of Rochester Methods and apparatus for differential phase-contrast fan beam CT, cone-beam CT and hybrid cone-beam CT
JP5459659B2 (ja) * 2009-10-09 2014-04-02 キヤノン株式会社 Ｘ線位相コントラスト像の撮像に用いられる位相格子、該位相格子を用いた撮像装置、ｘ線コンピューター断層撮影システム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4246038A4 (en) * 2020-12-29 2024-05-01 Huawei Technologies Co., Ltd. COMPOSITE GRATING AND PRODUCTION METHOD THEREOF, DIFFRACTIVE OPTICAL WAVEGUIDE AND ELECTRONIC DEVICE

Also Published As

Publication number Publication date
WO2009113726A3 (en) 2009-12-03
WO2009113726A2 (en) 2009-09-17
US8718228B2 (en) 2014-05-06
US20110013743A1 (en) 2011-01-20
JP2009244260A (ja) 2009-10-22

Similar Documents

Publication Publication Date Title
JP5339975B2 (ja) Ｘ線位相イメージングに用いられる位相格子、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム
JP5451150B2 (ja) Ｘ線用線源格子、ｘ線位相コントラスト像の撮像装置
JP5459659B2 (ja) Ｘ線位相コントラスト像の撮像に用いられる位相格子、該位相格子を用いた撮像装置、ｘ線コンピューター断層撮影システム
JP5586899B2 (ja) Ｘ線用位相格子及びその製造方法
JP2010249533A (ja) タルボ・ロー干渉計用の線源格子
US9036773B2 (en) Method for X-ray phase contrast and dark-field imaging using an arrangement of gratings in planar geometry
US8532252B2 (en) X-ray shield grating, manufacturing method therefor, and X-ray imaging apparatus
JP2009244260A5 (https=)
JP2012013530A (ja) 回折格子及びその製造方法、並びに放射線撮影装置
CN102626320A (zh) 放射线成像中使用的栅格和栅格制备方法,以及放射线成像系统
JP2008197593A (ja) Ｘ線用透過型回折格子、ｘ線タルボ干渉計およびｘ線撮像装置
US9891327B2 (en) Structure, method for manufacturing the same, and image pickup apparatus including the structure
JP2012022239A (ja) 回折格子及びその製造方法、放射線撮影装置
JP2011153869A (ja) 光源格子、該光源格子を備えたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム
JP5258504B2 (ja) Ｘ線位相イメージングに用いられる位相格子及びその製造方法、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム
US20120148029A1 (en) Grid for use in radiation imaging, method for producing the same, and radiation imaging system
WO2018066198A1 (ja) 回折格子ユニット、格子ユニットの製造方法およびｘ線位相イメージ撮影装置
WO2014034033A1 (ja) 回折格子および回折格子の製造方法、格子ユニットならびにｘ線撮像装置
CN102590912A (zh) 用于射线摄影的栅格及其修补方法，以及射线成像系统
JP2018179586A (ja) Ｘ線用金属グリッド、ｘ線撮像装置、及びｘ線用金属グリッドの製造方法
JP6914702B2 (ja) Ｘ線用金属グリッド、ｘ線撮像装置、及びｘ線用金属グリッドの製造方法
WO2012081376A1 (ja) 放射線画像撮影用グリッド及び放射線画像撮影システム
JP2010025662A (ja) Ｘ線集光レンズ
JP2016095343A (ja) 位相格子及びトールボット干渉計。
JP4700034B2 (ja) Ｘ線集光レンズ

Legal Events

Date Code Title Description
RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20100201

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20100630

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120309

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120309

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120828

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121025

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130423

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130624

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130709

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130806

LAPS Cancellation because of no payment of annual fees