JP5315106B2 - アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物 - Google Patents

アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物 Download PDF

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JP5315106B2
JP5315106B2 JP2009075108A JP2009075108A JP5315106B2 JP 5315106 B2 JP5315106 B2 JP 5315106B2 JP 2009075108 A JP2009075108 A JP 2009075108A JP 2009075108 A JP2009075108 A JP 2009075108A JP 5315106 B2 JP5315106 B2 JP 5315106B2
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acid
alkali
general formula
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represented
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Japanese (ja)
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JP2010229173A (ja
Inventor
高志 今野
裕章 山田
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Nippon Steel and Sumikin Chemical Co Ltd
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Nippon Steel and Sumikin Chemical Co Ltd
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Priority to JP2009075108A priority Critical patent/JP5315106B2/ja
Priority to TW099106342A priority patent/TWI449724B/zh
Priority to KR1020100026141A priority patent/KR101772111B1/ko
Priority to CN2010101490349A priority patent/CN101845137B/zh
Publication of JP2010229173A publication Critical patent/JP2010229173A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0381—Macromolecular compounds which are rendered insoluble or differentially wettable using a combination of a phenolic resin and a polyoxyethylene resin
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Optical Filters (AREA)
JP2009075108A 2009-03-25 2009-03-25 アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物 Active JP5315106B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009075108A JP5315106B2 (ja) 2009-03-25 2009-03-25 アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物
TW099106342A TWI449724B (zh) 2009-03-25 2010-03-04 Alkali-soluble resin and method for producing the same, and a photosensitive resin composition using an alkali-soluble resin
KR1020100026141A KR101772111B1 (ko) 2009-03-25 2010-03-24 알칼리 가용성 수지 및 그 제조방법, 및 알칼리 가용성 수지를 사용한 감광성 수지 조성물
CN2010101490349A CN101845137B (zh) 2009-03-25 2010-03-25 碱可溶性树脂及其制备方法以及使用了碱可溶性树脂的感光性树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009075108A JP5315106B2 (ja) 2009-03-25 2009-03-25 アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物

Publications (2)

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JP2010229173A JP2010229173A (ja) 2010-10-14
JP5315106B2 true JP5315106B2 (ja) 2013-10-16

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JP2009075108A Active JP5315106B2 (ja) 2009-03-25 2009-03-25 アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物

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JP (1) JP5315106B2 (ko)
KR (1) KR101772111B1 (ko)
CN (1) CN101845137B (ko)
TW (1) TWI449724B (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013064993A (ja) 2011-08-31 2013-04-11 Fujifilm Corp カラーフィルタの製造方法、カラーフィルタ、及び固体撮像素子
JP2014002374A (ja) * 2012-05-25 2014-01-09 Nippon Steel & Sumikin Chemical Co Ltd シリカゾルを含んだ感光性樹脂組成物、及びこれを用いた硬化物
TWI477539B (zh) * 2014-02-13 2015-03-21 Chi Mei Corp 鹼可溶性樹脂、感光性樹脂組成物、彩色濾光片及其製造方法、液晶顯示裝置
CN103980473B (zh) * 2014-05-27 2016-03-02 张家港康得新光电材料有限公司 含芴的聚酯丙烯酸酯低聚物及其制备方法和应用
KR102590795B1 (ko) * 2015-03-23 2023-10-19 제이에스알 가부시끼가이샤 중합체, 수지 조성물 및 수지 성형체
WO2016175160A1 (ja) * 2015-04-28 2016-11-03 ナガセケムテックス株式会社 アルカリ可溶性樹脂
JP7150230B2 (ja) * 2015-11-02 2022-10-11 互応化学工業株式会社 カルボキシル基含有樹脂、感光性樹脂組成物、ドライフィルム、プリント配線板、及びカルボキシル基含有樹脂の製造方法
JP2018070724A (ja) * 2016-10-27 2018-05-10 ナガセケムテックス株式会社 不飽和基含有アルカリ可溶性樹脂及びアルカリ可溶型感放射線性樹脂組成物
JP6876823B2 (ja) * 2017-03-30 2021-05-26 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 青色感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
CN107329368B (zh) * 2017-07-05 2020-08-14 江苏广信感光新材料股份有限公司 一种碱可溶感光性组合物及其制备方法与应用
CN109163788A (zh) * 2018-08-29 2019-01-08 日照钢铁控股集团有限公司 免磷化卷板干膜重量检测方法
CN111748077A (zh) * 2019-03-29 2020-10-09 日铁化学材料株式会社 碱可溶性树脂、氢化化合物及其制造方法、树脂组合物及其硬化膜、触控面板及滤光片
JP7250591B2 (ja) * 2019-03-29 2023-04-03 日鉄ケミカル＆マテリアル株式会社 重合性不飽和基含有アルカリ可溶性樹脂の製造方法、重合性不飽和基含有アルカリ可溶性樹脂、それを含む感光性樹脂組成物、それを硬化してなる硬化物、その硬化物を構成成分として含むタッチパネルおよびカラーフィルター
JP2020173433A (ja) * 2019-04-12 2020-10-22 日鉄ケミカル＆マテリアル株式会社 感光性樹脂組成物、それを硬化してなる硬化膜、およびその硬化膜を有する表示装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2975173B2 (ja) * 1991-06-06 1999-11-10 日本化薬株式会社 カラーフイルターの保護膜用材料及びその硬化物
JP3148429B2 (ja) * 1992-02-04 2001-03-19 新日本製鐵株式会社 光重合性不飽和化合物及びアルカリ現像型感光性樹脂組成物
JP3813244B2 (ja) * 1996-06-07 2006-08-23 新日鐵化学株式会社 アルカリ現像性不飽和樹脂組成物及びこれを用いた高感度ネガ型パターン形成材料
JP4033428B2 (ja) * 1999-03-31 2008-01-16 日本化薬株式会社 新規不飽和基含有ポリカルボン酸樹脂、樹脂組成物及びその硬化物
JP2002088136A (ja) * 2000-09-12 2002-03-27 Nagase Kasei Kogyo Kk 光重合性不飽和樹脂および該樹脂を含有する感光性樹脂組成物
JP2003176343A (ja) * 2001-12-11 2003-06-24 Nagase Chemtex Corp 光重合性不飽和樹脂、その製造方法及びそれを用いたアルカリ可溶型感放射線性樹脂組成物
JP4570999B2 (ja) * 2004-03-30 2010-10-27 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
JP4508928B2 (ja) * 2005-03-31 2010-07-21 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
TWI397769B (zh) * 2006-11-30 2013-06-01 Nippon Steel Chemical Co Alkali-soluble resin and method for producing the same, and a photosensitive resin composition, a hardened product and a color filter using an alkali-soluble resin
JP5449666B2 (ja) * 2006-11-30 2014-03-19 新日鉄住金化学株式会社 アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物、硬化物及びカラーフィルター
JP5133658B2 (ja) 2007-03-28 2013-01-30 新日鉄住金化学株式会社 ブラックマトリックス用感光性樹脂組成物、それを用いた硬化物及びカラーフィルター

Also Published As

Publication number Publication date
TW201043647A (en) 2010-12-16
KR101772111B1 (ko) 2017-08-28
CN101845137B (zh) 2013-06-05
KR20100107409A (ko) 2010-10-05
TWI449724B (zh) 2014-08-21
JP2010229173A (ja) 2010-10-14
CN101845137A (zh) 2010-09-29

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