JP5274490B2 - 垂直置換ゲートトランジスタと集積可能な容量の構造及び作製法 - Google Patents
垂直置換ゲートトランジスタと集積可能な容量の構造及び作製法 Download PDFInfo
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- JP5274490B2 JP5274490B2 JP2010004696A JP2010004696A JP5274490B2 JP 5274490 B2 JP5274490 B2 JP 5274490B2 JP 2010004696 A JP2010004696 A JP 2010004696A JP 2010004696 A JP2010004696 A JP 2010004696A JP 5274490 B2 JP5274490 B2 JP 5274490B2
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- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
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- H01L27/0629—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with diodes, or resistors, or capacitors
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors having potential barriers
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- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
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- H10B12/05—Making the transistor
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
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- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
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Description
本発明は電流を流すよう設計された伝導形の変化する接合を組込んだ半導体デバイス及びそのようなデバイスの作製方法に関する。より具体的には、本発明は垂直トランジスタの作製と両立する作製プロセスを用いて、ポリシリコン−窒化物−ポリシリコン、金属−窒化物−ポリシリコン及びポリシリコン−酸化物−ポリシリコン容量を作製するための設計及びプロセスに関する。
半導体デバイスの性能を向上させ、単位面積当りのデバイスの数を増すため、デバイス密度を増すことは、半導体製造業の重要な課題であり続ける。デバイス密度は個々のデバイスをより小さくし、よりコンパクトにデバイスを充填することにより、増大する。また、デバイスの寸法(特性長又は設計ルールとも呼ばれる)が減少するとともに、デバイス及びそれらの構成要素を形成する方法も、適合させなければならない。たとえば、生産ラインの設計ルールは現在0.25ミクロンないし0.18ミクロンの範囲で、より小さな寸法に向う不変の傾向がある。しかし、デバイスが縮小されるにつれ、ある種の製造上の限界が生じる。特に、リソグラフィプロセスに関して生じる。事実、現在のフォトリソグラフィプロセスは、現在のデバイスユーザーにより要求される必要な最小寸法で、デバイスを正確に製造できない点に近づいている。
本発明はMOSFETデバイス及び各種の容量形態の両方を含む集積回路構造を作製するプロセスを示す。そのプロセスは第1のデバイス領域、ソース又はドレイン領域のいずれかを半導体基板中に形成することを含む。少くとも3つの層の多層積層構造を、第1のデバイス領域上に形成する。3つの層の中央の層は犠牲となる層で、後に除去され、ゲート電極が置き代る。3つの層中に窓を形成し、続いて窓内にドープされた半導体材料、すなわち半導体プラグを形成する。第2のデバイス領域(ソース領域又はドレイン領域)を半導体プラグの上部端に形成する。次に、犠牲層を除去し、半導体プラグの露出された部分上に、ゲート酸化物を成長させるか堆積させる。次に、ゲート酸化物に隣接して、ゲート電極を形成する。一実施例において、ゲート電極は更にMOSFETデバイスを越えて、基板の領域まで延び、そこで容量の下部プレートとして働く。底部プレート上に誘電体層を形成し、続いて上部容量プレートを形成する。
本発明は容量構造と垂直置換ゲート金属−酸化物−半導体電界効果トランジスタ(VRGMOSFET)の作製と類似でかつ両立するプロセスを用いて、ポリシリコン−窒化物−ポリシリコン(PNP)、金属−窒化物−ポリシリコン(MNP)及びポリシリコン−酸化物−ポリシリコン(POP)容量を作製する付随した技術に関する。具体的には、価格及び作製の複雑さを最小にするため及び容量を作製するために必要な余分な工程数を最小にするため、第1のシリコン基板上に容量及びVRGを作製するのが望ましい。本発明はこれらの目的を達成する容量デバイス及び容量の作製プロセスを、明らかにする。
205 ソース領域
206 主表面
210 層、絶縁層、犠牲層
211 層、エッチ停止層
215 層、犠牲層
216 層、エッチ停止層
220 層、絶縁層
221 上部部分(図中になし)
225 窓
230 結晶半導体材料、半導体材料
231 最上部
232 ソース延長部
233 ドレイン延長部
235 ドレイン層
236 層
240 層
245 二酸化シリコン
250 ゲート誘電体
255 ゲート電極層
256 容量
257 領域
258 シリコン窒化物層
259 導電層、上部容量プレート
260 窒化物層
265 ゲート
266 底部容量プレート
267 窓
300 基板
305 ソース領域
306 主表面
310 層、絶縁層
311 層、エッチ停止層
315 層、犠牲層
316 層、エッチ停止層
320 層、絶縁層
325 窓、溝
326 窓、溝
327 TEOS層
330 結晶半導体材料
331 最上部分
332 層、多結晶層
333 二酸化シリコン
334 ポリシリコン層
335 シリコン窒化物層、シリコン窒化物、ソース領域
336 ドレイン層
337 層
340 層
345 犠牲層
350 ゲート誘電体、ゲート酸化物
355 ゲート電極層
365 ゲート
366 領域
371 ビアホール
379 窓
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Claims (19)
- 半導体基板中に半導体デバイスのソース領域及びドレイン領域から成るグループから選択された第1のデバイス領域を形成する工程と、
半導体基板中の第1のデバイス領域上に材料の少くとも3つの層を含む多層積層構造を形成する工程であって、第2の層が犠牲層であり第1及び第3の層の間にはさみ込まれ、第1の絶縁層が第1のデバイスに隣接する工程と、
前記材料の少くとも3つの層中に第1及び第2の窓を形成する工程であって、前記第1及び第2の窓が第1のデバイス領域で終端する工程と、
第1の窓内にドープされた半導体材料を形成し、それによって材料の少くとも3つの層中にドープされた半導体プラグが形成される工程であって、ドープされた導電体プラグが第1の端部と第2の端部を有し、第1の端部は第1のデバイス領域と接触する工程と、
前記第2の窓内に第1の導電層を形成する工程と、
前記第2の窓内の前記第1の導電層上に第1の絶縁層を形成する工程と、
前記第1の導電層、前記第1の絶縁層及び前記第2の導電層が容量を形成するように、前記第2の窓内の前記第1の絶縁層上に第2の導電層を形成する工程と、
ドープされた半導体プラグの第2の端部中に、ソース及びドレイン領域から成るグループから選択された第2のデバイス領域を形成する工程であって、第1及び第2のデバイス領域の1つは、ソース領域で、他方はドレイン領域である工程と、
第2の犠牲層を選択的に除去し、それによってドープされた半導体プラグの一部が露出される工程と、
第1の半導体プラグの露出された部分上に、ゲート誘電体材料を形成する工程と、
ゲートをゲート誘電体材料に接触させる工程とを、前記半導体材料が前記第1の窓内に形成された後に前記容量が形成されるように順に行い、集積回路の作製プロセス。 - 第2の層はエッチャント中のエッチングにより除去され、第1層のエッチング速度、第2の層のエッチング速度及び第3の層のエッチング速度を特徴とし、第2の層のエッチング速度は第1の層のエッチング速度及び第3の層のエッチング速度の少くとも10倍速い請求項1記載のプロセス。
- エッチャントは等方性湿式エッチャント及び等方性ドライエッチャントから成るグループから選択される請求項2記載のプロセス。
- 第1の層及び第3の層の材料は、シリコン窒化物、二酸化シリコン及びドープ二酸化シリコンから成る類から選択された電気的に絶縁性の材料である請求項1記載のプロセス。
- 第1及び第3の層はドープされた二酸化シリコンを含み、プロセスは更に、ドープされた半導体プラグ中のドープされた延長領域を形成するために、第1の層及び第3の層からのドーパントでドープされた半導体プラグをドーピングする工程を含む請求項1記載のプロセス。
- ドープされた二酸化シリコン中のドーパントの形は、n形及びp形から成るグループから選択され、ドーパントの形はドープされた半導体プラグ中のドーパントの形と相対する請求項5記載のプロセス。
- 半導体プラグ材料は結晶半導体材料を含み、シリコン、シリコン−ゲルマニウム及びシリコン−ゲルマニウム−カーボンから成るグループから選択される請求項1記載のプロセス。
- 材料の第1の層、 材料の第2の層又は材料の第1及び第2の層の両方の上に、エッチ停止層を形成する工程を更に含む請求項1記載のプロセス。
- 材料の少くとも3つの層が上に形成される前に、第1のデバイス領域上に拡散障壁を形成する工程を更に含む請求項1記載のプロセス。
- ゲートはドープ多結晶シリコン、ドープアモルファスシリコン、ドープ多結晶シリコン−ゲルマニウム、ドープアモルファスシリコン−ゲルマニウム、ドープ多結晶シリコン−ゲルマニウム−カーボン、ドープアモルファスシリコン−ゲルマニウム−カーボン、金属及び金属を含む化合物から成るグループから選択された材料で形成される請求項1記載のプロセス。
- ゲートは第1及び第2の部分を含み、第1の部分はそれがゲート誘電体に隣接するように、第1の窓の領域中の第2の層を除去することによって生じた領域中に形成され、第2の部分はそれが第2の窓中の第1の導電層に隣接するように、第2の窓中の第2の層を除去することによって生じた領域中に形成され、ゲート誘電体材料は容量のプレートに電気的に接続されるようにする請求項1記載のプロセス。
- ゲート誘電体材料を容量から分離するために、ゲートの第1及び第2の部分間に絶縁層を形成する工程を更に含む請求項11記載のプロセス。
- 第2の窓内に形成される第1及び第2の導電層は、ドープ多結晶シリコン、ドープアモルファスシリコン、ドープ多結晶シリコン−ゲルマニウム、ドープアモルファスシリコン−ゲルマニウム、ドープ多結晶シリコン−ゲルマニウム−カーボン、ドープアモルファスシリコン−ゲルマニウム−カーボン、金属及び金属を含む化合物から成るグループから選択された材料で形成される請求項1記載のプロセス。
- 第1の誘電体層は二酸化シリコン及びシリコン窒化物から成るグループから選択された材料を含む請求項1記載のプロセス。
- 平面に沿って形成された主表面を有する半導体層と、
表面の第1の領域中の第1の伝導形の第1のドープ領域と、
前記第1のドープ領域に延びる窓をその中に有する前記第1のドープ領域上の複数の層と、前記複数の層が、第1及び第3の絶縁層及び前記第1及び第3の絶縁層の間に挟み込まれた第2の犠牲層を含み、
窓中の第2の伝導形の第2のドープ領域と、
前記第2のドープ領域上に接触する第1の伝導形の第3のドープ領域と、
前記第2のドープ領域に隣接する酸化物層と、前記第2のドープ領域上の前記酸化物層の長さと配置が前記第2の犠牲層の厚さにより規定され、
表面の第2の領域内の第2の窓中で、前記酸化物層と接触する第1の導電層の第1の部分と、
前記第2の窓の内部表面と適合した前記第1の導電層の第2の部分と、
前記第1の導電層の前記第2の部分上の適合する誘電体層と、
第2の導電層、前記第1の誘電体層及び前記第1の導電層の第2の部分が容量を構成するように形成された前記誘電体層上の前記第2の導電層と、
を含む集積回路構造。 - 第1の導電層の第1の部分はMOSFETのゲートを構成し、第1の導電層の第2の部分は容量プレートを構成する請求項15記載の集積回路構造。
- 第1の導電層の材料はドープ多結晶シリコン、ドープアモルファスシリコン、ドープシリコン−ゲルマニウム、ドープシリコン−ゲルマニウム−カーボン、金属及び金属化合物から成るグループから選択される請求項15記載の集積回路構造。
- 誘電層を形成する材料は、二酸化シリコン及びシリコン窒化物から選択される請求項15記載の集積回路構造。
- 第1の導電層の第1及び第2の部分間にはさまれた絶縁材料を更に含む請求項15記載の集積回路構造。
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- 2001-09-18 US US09/956,381 patent/US20030052365A1/en not_active Abandoned
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- 2002-06-18 GB GB0214017A patent/GB2381124B/en not_active Expired - Fee Related
- 2002-08-12 KR KR1020020047420A patent/KR100898265B1/ko not_active IP Right Cessation
- 2002-09-17 JP JP2002269987A patent/JP2003163281A/ja active Pending
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2004
- 2004-04-05 US US10/819,253 patent/US7242056B2/en not_active Expired - Lifetime
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Also Published As
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US7491610B2 (en) | 2009-02-17 |
TW560065B (en) | 2003-11-01 |
US7633118B2 (en) | 2009-12-15 |
US20070228440A1 (en) | 2007-10-04 |
US7242056B2 (en) | 2007-07-10 |
US7700432B2 (en) | 2010-04-20 |
GB2381124A (en) | 2003-04-23 |
US20030052365A1 (en) | 2003-03-20 |
GB2381124B (en) | 2005-04-20 |
JP2003163281A (ja) | 2003-06-06 |
US20090130810A1 (en) | 2009-05-21 |
US20070238243A1 (en) | 2007-10-11 |
KR20030024566A (ko) | 2003-03-26 |
US7911006B2 (en) | 2011-03-22 |
US20040188737A1 (en) | 2004-09-30 |
GB0214017D0 (en) | 2002-07-31 |
JP2010157742A (ja) | 2010-07-15 |
KR100898265B1 (ko) | 2009-05-19 |
US20100044767A1 (en) | 2010-02-25 |
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