JP5265050B1 - Ｌｅｄ光源装置、膜厚測定装置及び薄膜形成装置 - Google Patents

Ｌｅｄ光源装置、膜厚測定装置及び薄膜形成装置 Download PDF

Info

Publication number
JP5265050B1
JP5265050B1 JP2012521822A JP2012521822A JP5265050B1 JP 5265050 B1 JP5265050 B1 JP 5265050B1 JP 2012521822 A JP2012521822 A JP 2012521822A JP 2012521822 A JP2012521822 A JP 2012521822A JP 5265050 B1 JP5265050 B1 JP 5265050B1
Authority
JP
Japan
Prior art keywords
light
led
film thickness
substrate
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012521822A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2013128537A1 (ja
Inventor
旭陽 佐井
陽平 日向
芳幸 大瀧
充祐 宮内
亦周 長江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shincron Co Ltd
Original Assignee
Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Application granted granted Critical
Publication of JP5265050B1 publication Critical patent/JP5265050B1/ja
Publication of JPWO2013128537A1 publication Critical patent/JPWO2013128537A1/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Led Device Packages (AREA)
JP2012521822A 2012-02-27 2012-02-27 Ｌｅｄ光源装置、膜厚測定装置及び薄膜形成装置 Active JP5265050B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2012/054719 WO2013128537A1 (ja) 2012-02-27 2012-02-27 Ｌｅｄ光源装置、膜厚測定装置及び薄膜形成装置

Publications (2)

Publication Number Publication Date
JP5265050B1 true JP5265050B1 (ja) 2013-08-14
JPWO2013128537A1 JPWO2013128537A1 (ja) 2015-07-30

Family

ID=49053051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012521822A Active JP5265050B1 (ja) 2012-02-27 2012-02-27 Ｌｅｄ光源装置、膜厚測定装置及び薄膜形成装置

Country Status (6)

Country Link
JP (1) JP5265050B1 (ko)
KR (1) KR101693397B1 (ko)
CN (1) CN104169676B (ko)
HK (1) HK1204491A1 (ko)
TW (1) TWI515407B (ko)
WO (1) WO2013128537A1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016120226A1 (en) * 2015-01-30 2016-08-04 Odl Srl Projection system using leds or phosphor-converted light sources
US10948346B2 (en) 2016-11-08 2021-03-16 Samsung Electronics Co., Ltd. Spectrometer, apparatus and method for measuring biometric information

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107608037B (zh) * 2017-09-12 2020-03-20 杭州电子科技大学 应用于环介导等温扩增的光纤耦合装置
JP2019144217A (ja) * 2018-02-20 2019-08-29 国立大学法人千葉大学 膜厚測定装置、これを用いた蒸着装置及び膜特性評価装置
US10782120B2 (en) * 2018-07-03 2020-09-22 Kla Corporation Dual-interferometry wafer thickness gauge

Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694910U (ko) * 1979-12-21 1981-07-28
JPH03162605A (ja) * 1989-11-20 1991-07-12 Fuji Electric Co Ltd 赤外線膜厚計
JPH08201168A (ja) * 1995-01-26 1996-08-09 Hamamatsu Photonics Kk 光帰還式光検出装置
JPH09113229A (ja) * 1995-10-17 1997-05-02 Sony Corp 膜厚管理装置及び膜厚検出方法
JPH09119812A (ja) * 1995-06-06 1997-05-06 Holtronic Technol Ltd 多層皮膜構造を特徴づけ、その皮膜に直面する２つの面の間の距離を測定する方法及び装置
JPH11241162A (ja) * 1997-12-01 1999-09-07 Natl Res Council Of Canada 光学的にモニタできるスパッタリング方法及びそのための装置
JP2000088531A (ja) * 1998-09-14 2000-03-31 Shincron:Kk 薄膜の膜厚計測装置及び薄膜の膜厚計測方法
JP2000258128A (ja) * 1999-03-02 2000-09-22 Internatl Business Mach Corp <Ibm> 膜厚検査装置及び膜厚検査方法
JP2002004046A (ja) * 2000-06-20 2002-01-09 Canon Inc 成膜方法および成膜装置
JP2002081910A (ja) * 2000-09-08 2002-03-22 Omron Corp 膜厚測定方法およびその方法を用いた膜厚センサ
JP2002277215A (ja) * 2001-03-14 2002-09-25 Omron Corp 膜厚測定方法およびその方法を用いた膜厚センサ
JP2003130615A (ja) * 2001-10-25 2003-05-08 Yokogawa Electric Corp 厚さ／成分計測方法及び装置
JP2004294155A (ja) * 2003-03-26 2004-10-21 Oyokoden Lab Co Ltd 屈折率及び厚さの測定装置ならびに測定方法
JP2005207829A (ja) * 2004-01-21 2005-08-04 Dainippon Printing Co Ltd 膜厚良否検査方法及び装置
JP2005214927A (ja) * 2004-02-02 2005-08-11 Yamagata Public Corp For The Development Of Industry 並列光ヘテロダイン検出法を用いた光干渉計測方法
JP2005344168A (ja) * 2004-06-03 2005-12-15 Shincron:Kk 薄膜形成方法，膜厚測定方法及び膜厚測定装置
JP2006009099A (ja) * 2004-06-25 2006-01-12 Asahi Glass Co Ltd 膜厚制御方法及び装置、並びに光学多層膜の製造方法
JP2006250851A (ja) * 2005-03-14 2006-09-21 Toppan Printing Co Ltd 膜厚ムラ検出方法および検出装置
JP2006275704A (ja) * 2005-03-29 2006-10-12 Toppan Printing Co Ltd 膜厚ムラ検出方法
US20080068722A1 (en) * 2003-07-11 2008-03-20 Chow Peter P Film mapping system
JP2011013145A (ja) * 2009-07-03 2011-01-20 Shincron:Kk 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
JP2012021856A (ja) * 2010-07-14 2012-02-02 Keyence Corp 干渉膜厚計

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3944693B2 (ja) * 2001-10-04 2007-07-11 オムロン株式会社 膜厚測定装置
JP2006139044A (ja) 2004-11-12 2006-06-01 Shinka Cho Ｌｅｄ光源装置

Patent Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694910U (ko) * 1979-12-21 1981-07-28
JPH03162605A (ja) * 1989-11-20 1991-07-12 Fuji Electric Co Ltd 赤外線膜厚計
JPH08201168A (ja) * 1995-01-26 1996-08-09 Hamamatsu Photonics Kk 光帰還式光検出装置
JPH09119812A (ja) * 1995-06-06 1997-05-06 Holtronic Technol Ltd 多層皮膜構造を特徴づけ、その皮膜に直面する２つの面の間の距離を測定する方法及び装置
JPH09113229A (ja) * 1995-10-17 1997-05-02 Sony Corp 膜厚管理装置及び膜厚検出方法
JPH11241162A (ja) * 1997-12-01 1999-09-07 Natl Res Council Of Canada 光学的にモニタできるスパッタリング方法及びそのための装置
JP2000088531A (ja) * 1998-09-14 2000-03-31 Shincron:Kk 薄膜の膜厚計測装置及び薄膜の膜厚計測方法
JP2000258128A (ja) * 1999-03-02 2000-09-22 Internatl Business Mach Corp <Ibm> 膜厚検査装置及び膜厚検査方法
JP2002004046A (ja) * 2000-06-20 2002-01-09 Canon Inc 成膜方法および成膜装置
JP2002081910A (ja) * 2000-09-08 2002-03-22 Omron Corp 膜厚測定方法およびその方法を用いた膜厚センサ
JP2002277215A (ja) * 2001-03-14 2002-09-25 Omron Corp 膜厚測定方法およびその方法を用いた膜厚センサ
JP2003130615A (ja) * 2001-10-25 2003-05-08 Yokogawa Electric Corp 厚さ／成分計測方法及び装置
JP2004294155A (ja) * 2003-03-26 2004-10-21 Oyokoden Lab Co Ltd 屈折率及び厚さの測定装置ならびに測定方法
US20080068722A1 (en) * 2003-07-11 2008-03-20 Chow Peter P Film mapping system
JP2005207829A (ja) * 2004-01-21 2005-08-04 Dainippon Printing Co Ltd 膜厚良否検査方法及び装置
JP2005214927A (ja) * 2004-02-02 2005-08-11 Yamagata Public Corp For The Development Of Industry 並列光ヘテロダイン検出法を用いた光干渉計測方法
JP2005344168A (ja) * 2004-06-03 2005-12-15 Shincron:Kk 薄膜形成方法，膜厚測定方法及び膜厚測定装置
JP2006009099A (ja) * 2004-06-25 2006-01-12 Asahi Glass Co Ltd 膜厚制御方法及び装置、並びに光学多層膜の製造方法
JP2006250851A (ja) * 2005-03-14 2006-09-21 Toppan Printing Co Ltd 膜厚ムラ検出方法および検出装置
JP2006275704A (ja) * 2005-03-29 2006-10-12 Toppan Printing Co Ltd 膜厚ムラ検出方法
JP2011013145A (ja) * 2009-07-03 2011-01-20 Shincron:Kk 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
JP2012021856A (ja) * 2010-07-14 2012-02-02 Keyence Corp 干渉膜厚計

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JPN6013001892; '特集＊基礎からのＬＥＤ活用テクニック' トランジスタ技術 ２月号, 20060201, ｐ．１２４-１２５，１４２, ＣＱ出版社 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016120226A1 (en) * 2015-01-30 2016-08-04 Odl Srl Projection system using leds or phosphor-converted light sources
US10948346B2 (en) 2016-11-08 2021-03-16 Samsung Electronics Co., Ltd. Spectrometer, apparatus and method for measuring biometric information

Also Published As

Publication number Publication date
KR20140121338A (ko) 2014-10-15
CN104169676A (zh) 2014-11-26
KR101693397B1 (ko) 2017-01-06
JPWO2013128537A1 (ja) 2015-07-30
CN104169676B (zh) 2019-01-15
WO2013128537A1 (ja) 2013-09-06
TW201335568A (zh) 2013-09-01
HK1204491A1 (en) 2015-11-20
TWI515407B (zh) 2016-01-01

Similar Documents

Publication Publication Date Title
JP5265050B1 (ja) Ｌｅｄ光源装置、膜厚測定装置及び薄膜形成装置
JP3725218B2 (ja) 誘導プラズマ光源からの選択可能な放射を持つスペクトロメータ
JP4878632B2 (ja) 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
JP2020065081A (ja) プラズマ処理装置及びプラズマ処理装置の運転方法
JP5319856B1 (ja) 膜厚測定装置及び成膜装置
JP2559541B2 (ja) 光学試験装置
US4207835A (en) Arrangement and photometer for measuring and controlling the thickness of optically active thin layers
EP1111333A1 (en) Light source device, spectroscope comprising the light source device, and film thickness sensor
US20100123086A1 (en) Extreme ultraviolet light source device
WO2015004755A1 (ja) 光学式膜厚計，薄膜形成装置及び膜厚測定方法
CN107107127A (zh) 关于清洁离子源的方法和装置
KR101607639B1 (ko) 시편에서 반사된 빛의 스펙트럼이 광 센서의 측정감도에 최적화되도록 파장영역별로 밝기가 제어되는 광원 모듈 및 이를 이용한 박막두께 측정장치
US7671543B2 (en) Light exposure control device and apparatus
TWI377337B (en) Spectrometer
CN109752348A (zh) 透射比标准量具、透射比测量装置
CN209471047U (zh) 透射比标准量具、透射比测量装置
CN221925375U (zh) 紫外探头以及紫外辐照计
JP2014115268A (ja) 分光分析装置
JP2007303924A (ja) イオン化ポテンシャル測定装置
RU2602433C2 (ru) Рентгеновский источник с оптической индикацией
JP3656038B2 (ja) 光学モニタ及び薄膜形成装置
JPS61129555A (ja) 空間分解能を有するモニタ−
KR100495361B1 (ko) 측정장치 및 성막가공방법
JP2006337303A (ja) 真空室の湿度測定装置
JP2009103562A (ja) 原子吸光分光光度計

Legal Events

Date Code Title Description
TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130430

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130430

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 5265050

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250