JP5217069B2 - 感光性セラミックス組成物及びセラミックス基板 - Google Patents

感光性セラミックス組成物及びセラミックス基板 Download PDF

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Publication number
JP5217069B2
JP5217069B2 JP2001252542A JP2001252542A JP5217069B2 JP 5217069 B2 JP5217069 B2 JP 5217069B2 JP 2001252542 A JP2001252542 A JP 2001252542A JP 2001252542 A JP2001252542 A JP 2001252542A JP 5217069 B2 JP5217069 B2 JP 5217069B2
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Japan
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weight
hollow structure
inorganic
powder
sio
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JP2001252542A
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Japanese (ja)
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JP2003055036A (ja
JP2003055036A5 (https=
Inventor
智也 山舗
孝樹 正木
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Toray Industries Inc
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Toray Industries Inc
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Priority to JP2001252542A priority Critical patent/JP5217069B2/ja
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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Oxide Ceramics (AREA)
JP2001252542A 2001-08-23 2001-08-23 感光性セラミックス組成物及びセラミックス基板 Expired - Fee Related JP5217069B2 (ja)

Priority Applications (1)

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JP2001252542A JP5217069B2 (ja) 2001-08-23 2001-08-23 感光性セラミックス組成物及びセラミックス基板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001252542A JP5217069B2 (ja) 2001-08-23 2001-08-23 感光性セラミックス組成物及びセラミックス基板

Publications (3)

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JP2003055036A JP2003055036A (ja) 2003-02-26
JP2003055036A5 JP2003055036A5 (https=) 2008-09-25
JP5217069B2 true JP5217069B2 (ja) 2013-06-19

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JP2001252542A Expired - Fee Related JP5217069B2 (ja) 2001-08-23 2001-08-23 感光性セラミックス組成物及びセラミックス基板

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011125546A1 (ja) * 2010-03-31 2011-10-13 京セラ株式会社 インターポーザー及びそれを用いた電子装置
JP5618651B2 (ja) * 2010-06-30 2014-11-05 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、反射防止膜、光学デバイス、及び、固体撮像素子
JP5622564B2 (ja) * 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
US20130149514A1 (en) * 2010-07-30 2013-06-13 Kyocera Corporation Insulating sheet, method of manufacturing the same, and method of manufacturing structure using the insulating sheet
JP5647910B2 (ja) * 2011-01-31 2015-01-07 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
KR20250151361A (ko) * 2023-03-08 2025-10-21 가부시끼가이샤 레조낙 감광성 수지 조성물, 감광성 수지 필름, 다층 프린트 배선판 및 반도체 패키지, 및 다층 프린트 배선판의 제조 방법
WO2025115581A1 (ja) * 2023-11-28 2025-06-05 Ａｇｃ株式会社 セラミックス基板及びセラミックスグリーンシート

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3275326B2 (ja) * 1990-04-24 2002-04-15 株式会社日立製作所 多層セラミック焼結体の製造方法
JP3128910B2 (ja) * 1991-12-26 2001-01-29 東レ株式会社 セラミックス・グリ−ンシ−ト

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