JP5213532B2 - 液晶表示パネル用基板及び液晶表示パネルの製造方法 - Google Patents
液晶表示パネル用基板及び液晶表示パネルの製造方法 Download PDFInfo
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- JP5213532B2 JP5213532B2 JP2008153748A JP2008153748A JP5213532B2 JP 5213532 B2 JP5213532 B2 JP 5213532B2 JP 2008153748 A JP2008153748 A JP 2008153748A JP 2008153748 A JP2008153748 A JP 2008153748A JP 5213532 B2 JP5213532 B2 JP 5213532B2
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- 239000000758 substrate Substances 0.000 title claims description 198
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 90
- 238000000034 method Methods 0.000 title claims description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 230000002093 peripheral effect Effects 0.000 claims description 56
- 239000011347 resin Substances 0.000 claims description 47
- 229920005989 resin Polymers 0.000 claims description 47
- 239000000463 material Substances 0.000 claims description 39
- 125000006850 spacer group Chemical group 0.000 claims description 9
- 239000010410 layer Substances 0.000 description 115
- 239000011521 glass Substances 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 11
- 230000001681 protective effect Effects 0.000 description 11
- 239000005357 flat glass Substances 0.000 description 8
- 238000000206 photolithography Methods 0.000 description 8
- 239000003566 sealing material Substances 0.000 description 8
- 238000005530 etching Methods 0.000 description 7
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 6
- 239000002243 precursor Substances 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
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- 230000008719 thickening Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
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- Liquid Crystal (AREA)
Description
Claims (3)
- 液晶層を挟持して対向配置された第1基板及び第2基板を有し、前記第1基板は表示領域の周辺部に周辺回路配線が形成されており、前記第2基板を予め定めたスクライブラインに沿ってスクライブすることによって前記第1基板の周辺回路配線が露出されている液晶表示パネルの製造工程で形成される液晶表示パネル用基板において、
前記第2基板は、前記第1基板と対向する面側に前記スクライブラインを跨いで予め定めた所定の幅となるように、遮光層、オーバーコート層、カラーフィルタ層及びフォトスペーサの形成材料から選択される少なくとも一層で形成されている樹脂層を有し、
前記樹脂層は、前記第1基板の周辺回路配線に対応する領域に個別に形成されている、
液晶表示パネル用基板。 - 前記樹脂層は、前記第2基板に形成され、前記スクライブラインの基準となるスクライブマークを除外した領域に形成されている、
請求項1に記載の液晶表示パネル用基板。 - 表示領域の周辺部に周辺回路配線が形成された第1基板と、前記第1基板と対向配置された第2基板とを備え、前記第1基板及び第2基板の間に液晶層が挟持された液晶表示パネル用基板を用意し、前記液晶表示パネル用基板の前記第2基板を予め定めたスクライブラインに沿ってスクライブすることによって前記第1基板の周辺回路配線を露出させる工程を有する液晶表示パネルの製造方法において、
前記液晶表示パネル用基板の前記第2基板の前記第1基板との対向面側の前記第1基板の周辺回路配線に対応する個別の領域に、前記スクライブラインを跨いで予め定めた所定の幅となるように、遮光層、オーバーコート層、カラーフィルタ層及びフォトスペーサの形成材料から選択される少なくとも一層からなる樹脂層を形成し、
その後に前記第2基板を前記スクライブラインに沿ってスクライブする、
液晶表示パネルの製造方法。
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JP2008153748A JP5213532B2 (ja) | 2008-06-12 | 2008-06-12 | 液晶表示パネル用基板及び液晶表示パネルの製造方法 |
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JP2008153748A JP5213532B2 (ja) | 2008-06-12 | 2008-06-12 | 液晶表示パネル用基板及び液晶表示パネルの製造方法 |
Publications (3)
Publication Number | Publication Date |
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JP2009300634A JP2009300634A (ja) | 2009-12-24 |
JP2009300634A5 JP2009300634A5 (ja) | 2011-06-30 |
JP5213532B2 true JP5213532B2 (ja) | 2013-06-19 |
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JP2008153748A Active JP5213532B2 (ja) | 2008-06-12 | 2008-06-12 | 液晶表示パネル用基板及び液晶表示パネルの製造方法 |
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Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2014021472A (ja) * | 2012-07-24 | 2014-02-03 | Mitsubishi Electric Corp | 表示パネルおよび表示装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10104561A (ja) * | 1996-09-27 | 1998-04-24 | Toshiba Corp | 液晶表示装置およびその製造方法 |
JPH10325951A (ja) * | 1997-05-26 | 1998-12-08 | Hitachi Ltd | 液晶表示装置 |
JP2006003561A (ja) * | 2004-06-16 | 2006-01-05 | Sharp Corp | 貼り合わせ基板 |
JP2006343735A (ja) * | 2005-05-13 | 2006-12-21 | Toshiba Matsushita Display Technology Co Ltd | 液晶表示装置及び液晶表示装置の製造方法 |
JP4682346B2 (ja) * | 2006-08-02 | 2011-05-11 | 株式会社 日立ディスプレイズ | 液晶表示装置及び液晶表示装置の製造方法 |
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