JP5179077B2 - 投影露光装置の照明デバイスの光学システム - Google Patents

投影露光装置の照明デバイスの光学システム Download PDF

Info

Publication number
JP5179077B2
JP5179077B2 JP2007064831A JP2007064831A JP5179077B2 JP 5179077 B2 JP5179077 B2 JP 5179077B2 JP 2007064831 A JP2007064831 A JP 2007064831A JP 2007064831 A JP2007064831 A JP 2007064831A JP 5179077 B2 JP5179077 B2 JP 5179077B2
Authority
JP
Japan
Prior art keywords
optical system
photoconductive
optical
doe
structures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2007064831A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007258709A (ja
JP2007258709A5 (https=
Inventor
シュスター カール−ハインツ
ハルトマイアー ユルゲン
マウル マンフレート
シュメレク ディーター
ミュラー デトレフ
ハーネマン オットー
マリアネク フランク
ヴァイス グーンドゥーラ
フィオルカ ダミアン
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2007258709A publication Critical patent/JP2007258709A/ja
Publication of JP2007258709A5 publication Critical patent/JP2007258709A5/ja
Application granted granted Critical
Publication of JP5179077B2 publication Critical patent/JP5179077B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
    • G02B5/1823—Plural gratings positioned on the same surface, e.g. array of gratings in an overlapping or superposed manner
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1833—Diffraction gratings comprising birefringent materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Holo Graphy (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007064831A 2006-03-14 2007-03-14 投影露光装置の照明デバイスの光学システム Active JP5179077B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US78208906P 2006-03-14 2006-03-14
DE102006012034.5 2006-03-14
DE102006012034A DE102006012034A1 (de) 2006-03-14 2006-03-14 Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage
US60/782089 2006-03-14

Publications (3)

Publication Number Publication Date
JP2007258709A JP2007258709A (ja) 2007-10-04
JP2007258709A5 JP2007258709A5 (https=) 2010-04-30
JP5179077B2 true JP5179077B2 (ja) 2013-04-10

Family

ID=38374829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007064831A Active JP5179077B2 (ja) 2006-03-14 2007-03-14 投影露光装置の照明デバイスの光学システム

Country Status (4)

Country Link
US (1) US8068279B2 (https=)
EP (1) EP1835312B1 (https=)
JP (1) JP5179077B2 (https=)
DE (2) DE102006012034A1 (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101306503B1 (ko) * 2006-02-17 2013-09-09 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 노광 장치의 조명 시스템용 광 인터그레이터
TWI456267B (zh) 2006-02-17 2014-10-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
DE102009016608A1 (de) 2008-05-21 2009-11-26 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithographie-Projektionsbelichtungsanlage
JP5078764B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2011133640A (ja) * 2009-12-24 2011-07-07 Dainippon Printing Co Ltd 透過型ホログラムの製造方法
CN103097925B (zh) * 2010-08-06 2016-04-13 旭硝子株式会社 衍射光学元件和计测装置
US8902485B2 (en) 2012-11-29 2014-12-02 Christie Digital Systems Usa, Inc. Contrast enhancing system
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9517963B2 (en) 2013-12-17 2016-12-13 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
EP3166895B1 (en) 2014-07-08 2021-11-24 Corning Incorporated Methods and apparatuses for laser processing materials
JP2017530867A (ja) * 2014-07-14 2017-10-19 コーニング インコーポレイテッド 長さおよび直径の調節可能なレーザビーム焦線を用いて透明材料を加工するためのシステムおよび方法
JP7292006B2 (ja) 2015-03-24 2023-06-16 コーニング インコーポレイテッド ディスプレイガラス組成物のレーザ切断及び加工
JP6923284B2 (ja) 2016-09-30 2021-08-18 コーニング インコーポレイテッド 非軸対称ビームスポットを用いて透明被加工物をレーザ加工するための装置及び方法
LT3529214T (lt) 2016-10-24 2021-02-25 Corning Incorporated Substrato apdorojimo stotis lakšto formos stiklo substratų lazeriniam mašininiam apdorojimui
CN106647179A (zh) * 2016-11-25 2017-05-10 天津津芯微电子科技有限公司 复眼匀光系统、光学引擎及光源优化装置
JP6924427B2 (ja) * 2019-01-25 2021-08-25 大日本印刷株式会社 回折光学素子、照明装置、投射装置および投射型表示装置
CN114137655B (zh) * 2020-09-04 2022-12-23 宁波舜宇光电信息有限公司 用于ar设备的光波导装置及其制造方法和ar设备
DE102024207296A1 (de) * 2024-08-01 2026-02-05 Carl Zeiss Smt Gmbh Optische Baugruppe

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5610733A (en) 1994-02-28 1997-03-11 Digital Optics Corporation Beam-homogenizer
US5850300A (en) 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
JP2000206321A (ja) * 1999-01-19 2000-07-28 Canon Inc 回折光学素子、回折光学素子を備えた光学系、回折光学素子の製造方法、回折光学素子を備えた光学系を含む露光装置、及び露光装置を用いたデバイスの製造方法
JP2001343512A (ja) * 2000-05-31 2001-12-14 Canon Inc 回折光学素子及びそれを有する光学系
DE10124803A1 (de) * 2001-05-22 2002-11-28 Zeiss Carl Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator
JP4859311B2 (ja) * 2001-09-17 2012-01-25 株式会社リコー レーザ照明光学系、該光学系を用いた露光装置、レーザ加工機、及び投射装置
JP4310080B2 (ja) * 2002-06-17 2009-08-05 キヤノン株式会社 回折光学素子およびこれを備えた光学系、光学装置
GB2403815A (en) * 2003-07-10 2005-01-12 Ocuity Ltd Birefringent lens array structure
JP2005032909A (ja) * 2003-07-10 2005-02-03 Fuji Photo Film Co Ltd 照明光学系およびそれを用いた露光装置
DE10344010A1 (de) * 2003-09-15 2005-04-07 Carl Zeiss Smt Ag Wabenkondensor und Beleuchtungssystem damit
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
JP4497968B2 (ja) * 2004-03-18 2010-07-07 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
WO2005121900A1 (de) * 2004-06-10 2005-12-22 Carl Zeiss Smt Ag Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage
DE102005030543A1 (de) * 2004-07-08 2006-02-02 Carl Zeiss Smt Ag Polarisatoreinrichtung zur Erzeugung einer definierten Ortsverteilung von Polarisationszuständen
DE102005039519A1 (de) 2005-08-20 2007-02-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
EP1835312B1 (en) 2011-05-04
DE602007014285D1 (de) 2011-06-16
JP2007258709A (ja) 2007-10-04
US20070217013A1 (en) 2007-09-20
EP1835312A2 (en) 2007-09-19
DE102006012034A1 (de) 2007-09-20
US8068279B2 (en) 2011-11-29
EP1835312A3 (en) 2007-10-10

Similar Documents

Publication Publication Date Title
JP5179077B2 (ja) 投影露光装置の照明デバイスの光学システム
TWI573175B (zh) 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
JP5173309B2 (ja) ホログラム、露光装置及びデバイス製造方法
US20080130109A1 (en) Apparatus For Providing A Pattern Of Polarization
KR101522146B1 (ko) 광학 시스템, 특히 마이크로리소그래피 투영 노광 장치의 조명 시스템 또는 투영 대물렌즈
US7548370B2 (en) Layered structure for a tile wave plate assembly
TWI293696B (en) Optical system for spatially controlling ligth polarization and method for manufacturing the same
JP2007258709A5 (https=)
JP4879348B2 (ja) 特にマイクロリソグラフィ投影露光装置の光学系
US7916390B2 (en) Monolithic polarization controlled angle diffusers, associated methods and lithographic systems incorporating controlled angle diffusers
KR20060039925A (ko) 조명 광학 장치, 노광 장치 및 노광 방법
TW200928607A (en) Illuminating optical apparatus, and exposure method and apparatus
US8437058B2 (en) Computer generated hologram and exposure apparatus to suppress an illumination variation and loss in light
JP2006003479A (ja) 光学素子及び照明光学系
JP5566501B2 (ja) 特にマイクロリソグラフィ投影露光装置の光学系
JP2005116831A (ja) 投影露光装置、露光方法、及びデバイス製造方法
US8576378B2 (en) Illumination optical system, exposure apparatus, and device manufacturing method
JP2016186642A (ja) 特にマイクロリソグラフィ投影露光装置における偏光影響光学配置
KR101551991B1 (ko) 마이크로리소그래픽 투사 노출 장치의 조명 시스템
JP2005303313A (ja) マイクロリソグラフィ用投影露光装置の光学システム
JP2008047673A (ja) 露光装置及びデバイス製造方法
JP4692745B2 (ja) マスク基板、フォトマスク、露光方法、露光装置の管理方法、及びデバイス製造方法
JP2005141228A (ja) マイクロリソグラフィ投影露光装置に使用されるマスク

Legal Events

Date Code Title Description
RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20080828

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20080828

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20080911

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20080911

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100315

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100315

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120113

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120123

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120207

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120910

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121122

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20121210

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130109

R150 Certificate of patent or registration of utility model

Ref document number: 5179077

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250