DE602007014285D1 - Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen - Google Patents

Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen

Info

Publication number
DE602007014285D1
DE602007014285D1 DE602007014285T DE602007014285T DE602007014285D1 DE 602007014285 D1 DE602007014285 D1 DE 602007014285D1 DE 602007014285 T DE602007014285 T DE 602007014285T DE 602007014285 T DE602007014285 T DE 602007014285T DE 602007014285 D1 DE602007014285 D1 DE 602007014285D1
Authority
DE
Germany
Prior art keywords
refractive
optical element
exposure apparatus
illumination device
arranged parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007014285T
Other languages
English (en)
Inventor
Karl-Heinz Schuster
Juergen Hartmaier
Manfred Maul
Dieter Schmerek
Detlev Mueller
Otto Hahnemann
Frank Marianek
Gundula Weiss
Damian Fiolka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of DE602007014285D1 publication Critical patent/DE602007014285D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
    • G02B5/1823—Plural gratings positioned on the same surface, e.g. array of gratings in an overlapping or superposed manner
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1833—Diffraction gratings comprising birefringent materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
DE602007014285T 2006-03-14 2007-03-09 Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen Active DE602007014285D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78208906P 2006-03-14 2006-03-14
DE102006012034A DE102006012034A1 (de) 2006-03-14 2006-03-14 Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage

Publications (1)

Publication Number Publication Date
DE602007014285D1 true DE602007014285D1 (de) 2011-06-16

Family

ID=38374829

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102006012034A Withdrawn DE102006012034A1 (de) 2006-03-14 2006-03-14 Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage
DE602007014285T Active DE602007014285D1 (de) 2006-03-14 2007-03-09 Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102006012034A Withdrawn DE102006012034A1 (de) 2006-03-14 2006-03-14 Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage

Country Status (4)

Country Link
US (1) US8068279B2 (de)
EP (1) EP1835312B1 (de)
JP (1) JP5179077B2 (de)
DE (2) DE102006012034A1 (de)

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TWI545352B (zh) 2006-02-17 2016-08-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
KR101254843B1 (ko) * 2006-02-17 2013-04-15 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 노광 장치의 조명 시스템용 광 인터그레이터
DE102009016608A1 (de) 2008-05-21 2009-11-26 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithographie-Projektionsbelichtungsanlage
JP5078764B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2011133640A (ja) * 2009-12-24 2011-07-07 Dainippon Printing Co Ltd 透過型ホログラムの製造方法
WO2012018017A1 (ja) * 2010-08-06 2012-02-09 旭硝子株式会社 回折光学素子及び計測装置
US8902485B2 (en) 2012-11-29 2014-12-02 Christie Digital Systems Usa, Inc. Contrast enhancing system
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EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9517963B2 (en) 2013-12-17 2016-12-13 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
CN106687419A (zh) 2014-07-08 2017-05-17 康宁股份有限公司 用于激光处理材料的方法和设备
EP3169477B1 (de) * 2014-07-14 2020-01-29 Corning Incorporated System und verfahren zur verarbeitung transparenter materialien mithilfe von in länge und durchmesser anpassbaren laserstrahlbrennlinien
KR102546692B1 (ko) 2015-03-24 2023-06-22 코닝 인코포레이티드 디스플레이 유리 조성물의 레이저 절단 및 가공
KR102078294B1 (ko) 2016-09-30 2020-02-17 코닝 인코포레이티드 비-축대칭 빔 스폿을 이용하여 투명 워크피스를 레이저 가공하기 위한 기기 및 방법
EP3848333A1 (de) 2016-10-24 2021-07-14 Corning Incorporated Substratverarbeitungsstation zur laserbasierten verarbeitung von flächigen glassubstraten
CN106647179A (zh) * 2016-11-25 2017-05-10 天津津芯微电子科技有限公司 复眼匀光系统、光学引擎及光源优化装置
WO2020153504A1 (ja) * 2019-01-25 2020-07-30 大日本印刷株式会社 回折光学素子、照明装置、投射装置、投射型表示装置および要素回折光学素子の製造方法
CN114137655B (zh) * 2020-09-04 2022-12-23 宁波舜宇光电信息有限公司 用于ar设备的光波导装置及其制造方法和ar设备

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Also Published As

Publication number Publication date
DE102006012034A1 (de) 2007-09-20
US20070217013A1 (en) 2007-09-20
JP5179077B2 (ja) 2013-04-10
EP1835312B1 (de) 2011-05-04
EP1835312A3 (de) 2007-10-10
EP1835312A2 (de) 2007-09-19
JP2007258709A (ja) 2007-10-04
US8068279B2 (en) 2011-11-29

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