DE102009039400A8 - Reflektives optisches Element zur Verwendung in einem EUV-System - Google Patents

Reflektives optisches Element zur Verwendung in einem EUV-System Download PDF

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Publication number
DE102009039400A8
DE102009039400A8 DE102009039400A DE102009039400A DE102009039400A8 DE 102009039400 A8 DE102009039400 A8 DE 102009039400A8 DE 102009039400 A DE102009039400 A DE 102009039400A DE 102009039400 A DE102009039400 A DE 102009039400A DE 102009039400 A8 DE102009039400 A8 DE 102009039400A8
Authority
DE
Germany
Prior art keywords
optical element
reflective optical
euv system
euv
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102009039400A
Other languages
English (en)
Other versions
DE102009039400A1 (de
Inventor
Holger Kierey
Michel Le Maire
Willi Anderl
Hubert Holderer
Anton Lengel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss Laser Optics GmbH
Original Assignee
Carl Zeiss Laser Optics GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Laser Optics GmbH filed Critical Carl Zeiss Laser Optics GmbH
Priority to DE102009039400A priority Critical patent/DE102009039400A1/de
Priority to US12/851,187 priority patent/US8342701B2/en
Priority to JP2010192235A priority patent/JP5829389B2/ja
Publication of DE102009039400A1 publication Critical patent/DE102009039400A1/de
Publication of DE102009039400A8 publication Critical patent/DE102009039400A8/de
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE102009039400A 2009-08-31 2009-08-31 Reflektives optisches Element zur Verwendung in einem EUV-System Ceased DE102009039400A1 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE102009039400A DE102009039400A1 (de) 2009-08-31 2009-08-31 Reflektives optisches Element zur Verwendung in einem EUV-System
US12/851,187 US8342701B2 (en) 2009-08-31 2010-08-05 Reflective optical element for use in an EUV system
JP2010192235A JP5829389B2 (ja) 2009-08-31 2010-08-30 Ｅｕｖシステムに用いる反射光学素子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102009039400A DE102009039400A1 (de) 2009-08-31 2009-08-31 Reflektives optisches Element zur Verwendung in einem EUV-System

Publications (2)

Publication Number Publication Date
DE102009039400A1 DE102009039400A1 (de) 2011-03-03
DE102009039400A8 true DE102009039400A8 (de) 2011-06-01

Family

ID=43525133

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102009039400A Ceased DE102009039400A1 (de) 2009-08-31 2009-08-31 Reflektives optisches Element zur Verwendung in einem EUV-System

Country Status (3)

Country Link
US (1) US8342701B2 (de)
JP (1) JP5829389B2 (de)
DE (1) DE102009039400A1 (de)

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US20080280539A1 (en) * 2007-05-11 2008-11-13 Asml Holding N.V. Optical component fabrication using amorphous oxide coated substrates
US20080318066A1 (en) * 2007-05-11 2008-12-25 Asml Holding N.V. Optical Component Fabrication Using Coated Substrates
DE102009040785A1 (de) * 2009-09-09 2011-03-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung
JP5093267B2 (ja) * 2010-03-11 2012-12-12 ウシオ電機株式会社 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置
WO2011113591A2 (en) * 2010-03-18 2011-09-22 Eth Zurich Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and euv source with such a collector
DE102011002953A1 (de) * 2011-01-21 2012-07-26 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102011004446A1 (de) * 2011-02-21 2012-08-23 Carl Zeiss Smt Gmbh Gekühltes optisches Element
DE102011015141A1 (de) 2011-03-16 2012-09-20 Carl Zeiss Laser Optics Gmbh Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement
DE102011005778A1 (de) * 2011-03-18 2012-09-20 Carl Zeiss Smt Gmbh Optisches Element
DE102011080052A1 (de) * 2011-07-28 2013-01-31 Carl Zeiss Smt Gmbh Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels
US9599756B2 (en) 2011-08-01 2017-03-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for manufacturing a mirror comprising at least one cavity and optical mirror
NL2010185A (en) * 2012-01-30 2013-08-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN104081283A (zh) 2012-01-30 2014-10-01 Asml荷兰有限公司 具有用于测量衬底台的位置的计量系统的光刻装置
DE102012210712A1 (de) * 2012-06-25 2014-01-02 Carl Zeiss Smt Gmbh Verfahren und Kühlsystem zum Kühlen eines optischen Elements für EUV-Anwendungen
DE102012219540A1 (de) * 2012-10-25 2013-10-17 Carl Zeiss Smt Gmbh Optische Anordnung für EUV-Anwendungen mit einer Verbindungsschnittstelle für eine Fluidleitung sowie Verfahren zum Herstellen derselben
DE102013204427A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
US20150083938A1 (en) * 2013-09-24 2015-03-26 Carl Zeiss Laser Optics Gmbh Cooler for plasma generation chamber of euv radiation source
DE102014203461A1 (de) * 2014-02-26 2015-03-05 Carl Zeiss Smt Gmbh Kühlbare spiegelanordnung
WO2016091486A1 (en) * 2014-12-12 2016-06-16 Asml Netherlands B.V. Reflector
DE102015100918A1 (de) * 2015-01-22 2016-07-28 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines reflektiven optischen Elements, reflektives optisches Element und Verwendung eines reflektiven optischen Elements
DE102015206114A1 (de) 2015-04-07 2016-05-25 Carl Zeiss Smt Gmbh Kühler zur Verwendung in einer Vorrichtung im Vakuum
DE102015210045A1 (de) * 2015-06-01 2016-06-23 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Kühlkörpers und Kühlkörper für eine Lithographieanlage
US10955595B2 (en) 2016-03-07 2021-03-23 Asml Netherlands B.V. Multilayer reflector, method of manufacturing a multilayer reflector and lithographic apparatus
DE102017201835A1 (de) * 2017-02-06 2017-12-21 Carl Zeiss Smt Gmbh Optische Anordnung mit Durchgangskanal in einem Spiegelsubstrat
DE102017221388A1 (de) 2017-11-29 2018-10-11 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines mit einem Kühlfluid durchströmbaren Bauteils, optisches Element und EUV-Lithographiesystem
DE102018212224A1 (de) 2018-07-23 2020-01-23 Carl Zeiss Smt Gmbh Vorrichtung zur Rückkopplung von emittierter Strahlung in eine Laserquelle
US11226438B2 (en) * 2018-10-03 2022-01-18 Corning Incorporated Reflective optical element
DE102019219179A1 (de) * 2019-12-09 2021-06-10 Carl Zeiss Smt Gmbh Optisches Element und Lithographiesystem
DE102020204669A1 (de) * 2020-04-14 2021-10-14 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems
WO2022073610A1 (de) * 2020-10-08 2022-04-14 Carl Zeiss Smt Gmbh Herstellungsverfahren und messverfahren
DE102020214466A1 (de) 2020-11-18 2022-05-19 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Grundkörpers eines optischen Elementes für die Halbleiterlithographie und Grundkörper eines optischen Elementes für die Halbleiterlithographie
DE102020131383A1 (de) * 2020-11-26 2022-06-02 Carl Zeiss Ag Verfahren und Vorrichtung zur Inspektion einer Schweißnaht in einer Baugruppe eines optischen Systems für die Mikrolithographie
TW202332979A (zh) * 2021-12-14 2023-08-16 德商卡爾蔡司Ｓｍｔ有限公司 用於製造至少一中空結構的方法和裝置、鏡子、ｅｕｖ微影系統、流體供應裝置和應用於供應流體的方法
DE102022209791B3 (de) 2022-09-19 2023-07-06 Carl Zeiss Smt Gmbh EUV-Kollektor für eine EUV-Projektionsbelichtungsanlage

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040165296A1 (en) * 2003-02-24 2004-08-26 Schaefer John P. High precision mirror, and a method of making it
DE102005017262B3 (de) * 2005-04-12 2006-10-12 Xtreme Technologies Gmbh Kollektorspiegel für plasmabasierte kurzwellige Strahlungsquellen
DE102005026418A1 (de) * 2005-06-08 2006-12-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Spiegelträger für einen optischen Spiegel
DE102007052885A1 (de) * 2006-11-03 2008-05-08 Carl Zeiss Smt Ag Spiegel mit einem Spiegelträger und Projektionsbelichtungsanlage
DE102008054882A1 (de) * 2008-01-08 2009-07-16 Carl Zeiss Smt Ag Reparaturverfahren für optische Elemente mit Beschichtung und entsprechende optische Elemente

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JP4080030B2 (ja) * 1996-06-14 2008-04-23 住友電気工業株式会社 半導体基板材料、半導体基板、半導体装置、及びその製造方法
JPH11326598A (ja) * 1998-05-08 1999-11-26 Nikon Corp 反射鏡およびその製造方法
US7843632B2 (en) 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
US20050099611A1 (en) * 2002-06-20 2005-05-12 Nikon Corporation Minimizing thermal distortion effects on EUV mirror
EP1376239A3 (de) 2002-06-25 2005-06-29 Nikon Corporation Kühlvorrichtung für ein optisches Element
JP2004095993A (ja) * 2002-09-03 2004-03-25 Nikon Corp 光学部品冷却方法、光学部品冷却装置及びそれを有するｅｕｖ露光装置
DE102005028456A1 (de) * 2005-06-17 2006-12-28 Schott Ag Metallreflektor und Verfahren zu dessen Herstellung
JP4708891B2 (ja) * 2005-07-14 2011-06-22 新日鉄マテリアルズ株式会社 光学反射ミラー
US7591561B2 (en) 2005-10-13 2009-09-22 Nikon Corporation Liquid cooled mirror for use in extreme ultraviolet lithography
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Patent Citations (5)

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Publication number Priority date Publication date Assignee Title
US20040165296A1 (en) * 2003-02-24 2004-08-26 Schaefer John P. High precision mirror, and a method of making it
DE102005017262B3 (de) * 2005-04-12 2006-10-12 Xtreme Technologies Gmbh Kollektorspiegel für plasmabasierte kurzwellige Strahlungsquellen
DE102005026418A1 (de) * 2005-06-08 2006-12-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Spiegelträger für einen optischen Spiegel
DE102007052885A1 (de) * 2006-11-03 2008-05-08 Carl Zeiss Smt Ag Spiegel mit einem Spiegelträger und Projektionsbelichtungsanlage
DE102008054882A1 (de) * 2008-01-08 2009-07-16 Carl Zeiss Smt Ag Reparaturverfahren für optische Elemente mit Beschichtung und entsprechende optische Elemente

Also Published As

Publication number Publication date
US20110051267A1 (en) 2011-03-03
JP5829389B2 (ja) 2015-12-09
JP2011053687A (ja) 2011-03-17
US8342701B2 (en) 2013-01-01
DE102009039400A1 (de) 2011-03-03

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8196 Reprint of faulty title page (publication) german patentblatt: part 1a6
OP8 Request for examination as to paragraph 44 patent law
R002 Refusal decision in examination/registration proceedings
R003 Refusal decision now final

Effective date: 20140214