DE102006012034A1 - Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage - Google Patents
Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage Download PDFInfo
- Publication number
- DE102006012034A1 DE102006012034A1 DE102006012034A DE102006012034A DE102006012034A1 DE 102006012034 A1 DE102006012034 A1 DE 102006012034A1 DE 102006012034 A DE102006012034 A DE 102006012034A DE 102006012034 A DE102006012034 A DE 102006012034A DE 102006012034 A1 DE102006012034 A1 DE 102006012034A1
- Authority
- DE
- Germany
- Prior art keywords
- optical system
- light
- crystal material
- doe
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 123
- 239000000463 material Substances 0.000 claims abstract description 91
- 239000013078 crystal Substances 0.000 claims abstract description 84
- 230000010287 polarization Effects 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 4
- 238000004519 manufacturing process Methods 0.000 claims abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 20
- -1 Fluoride compound Chemical class 0.000 claims description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 6
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 6
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 5
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 claims description 5
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 claims description 3
- 229910001637 strontium fluoride Inorganic materials 0.000 claims description 3
- 239000011149 active material Substances 0.000 claims 2
- 239000004020 conductor Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 description 6
- 239000002178 crystalline material Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 210000001747 pupil Anatomy 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000005056 compaction Methods 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910020068 MgAl Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
- G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
- G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
- G02B5/1823—Plural gratings positioned on the same surface, e.g. array of gratings in an overlapping or superposed manner
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1833—Diffraction gratings comprising birefringent materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Holo Graphy (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006012034A DE102006012034A1 (de) | 2006-03-14 | 2006-03-14 | Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage |
| DE602007014285T DE602007014285D1 (de) | 2006-03-14 | 2007-03-09 | Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen |
| EP07103867A EP1835312B1 (en) | 2006-03-14 | 2007-03-09 | Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis |
| US11/685,620 US8068279B2 (en) | 2006-03-14 | 2007-03-13 | Optical system of an illumination device of a projection exposure apparatus |
| JP2007064831A JP5179077B2 (ja) | 2006-03-14 | 2007-03-14 | 投影露光装置の照明デバイスの光学システム |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006012034A DE102006012034A1 (de) | 2006-03-14 | 2006-03-14 | Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102006012034A1 true DE102006012034A1 (de) | 2007-09-20 |
Family
ID=38374829
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102006012034A Withdrawn DE102006012034A1 (de) | 2006-03-14 | 2006-03-14 | Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage |
| DE602007014285T Active DE602007014285D1 (de) | 2006-03-14 | 2007-03-09 | Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602007014285T Active DE602007014285D1 (de) | 2006-03-14 | 2007-03-09 | Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8068279B2 (https=) |
| EP (1) | EP1835312B1 (https=) |
| JP (1) | JP5179077B2 (https=) |
| DE (2) | DE102006012034A1 (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101306503B1 (ko) * | 2006-02-17 | 2013-09-09 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 노광 장치의 조명 시스템용 광 인터그레이터 |
| TWI456267B (zh) | 2006-02-17 | 2014-10-11 | 卡爾蔡司Ｓｍｔ有限公司 | 用於微影投射曝光設備之照明系統 |
| DE102009016608A1 (de) | 2008-05-21 | 2009-11-26 | Carl Zeiss Smt Ag | Beleuchtungsoptik für eine Mikrolithographie-Projektionsbelichtungsanlage |
| JP5078764B2 (ja) * | 2008-06-10 | 2012-11-21 | キヤノン株式会社 | 計算機ホログラム、露光装置及びデバイスの製造方法 |
| JP5078765B2 (ja) * | 2008-06-10 | 2012-11-21 | キヤノン株式会社 | 計算機ホログラム、露光装置及びデバイスの製造方法 |
| JP2011133640A (ja) * | 2009-12-24 | 2011-07-07 | Dainippon Printing Co Ltd | 透過型ホログラムの製造方法 |
| CN103097925B (zh) * | 2010-08-06 | 2016-04-13 | 旭硝子株式会社 | 衍射光学元件和计测装置 |
| US8902485B2 (en) | 2012-11-29 | 2014-12-02 | Christie Digital Systems Usa, Inc. | Contrast enhancing system |
| EP2754524B1 (de) | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
| EP2781296B1 (de) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| US9517963B2 (en) | 2013-12-17 | 2016-12-13 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| EP3166895B1 (en) | 2014-07-08 | 2021-11-24 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| JP2017530867A (ja) * | 2014-07-14 | 2017-10-19 | コーニング インコーポレイテッド | 長さおよび直径の調節可能なレーザビーム焦線を用いて透明材料を加工するためのシステムおよび方法 |
| JP7292006B2 (ja) | 2015-03-24 | 2023-06-16 | コーニング インコーポレイテッド | ディスプレイガラス組成物のレーザ切断及び加工 |
| JP6923284B2 (ja) | 2016-09-30 | 2021-08-18 | コーニング インコーポレイテッド | 非軸対称ビームスポットを用いて透明被加工物をレーザ加工するための装置及び方法 |
| LT3529214T (lt) | 2016-10-24 | 2021-02-25 | Corning Incorporated | Substrato apdorojimo stotis lakšto formos stiklo substratų lazeriniam mašininiam apdorojimui |
| CN106647179A (zh) * | 2016-11-25 | 2017-05-10 | 天津津芯微电子科技有限公司 | 复眼匀光系统、光学引擎及光源优化装置 |
| JP6924427B2 (ja) * | 2019-01-25 | 2021-08-25 | 大日本印刷株式会社 | 回折光学素子、照明装置、投射装置および投射型表示装置 |
| CN114137655B (zh) * | 2020-09-04 | 2022-12-23 | 宁波舜宇光电信息有限公司 | 用于ar设备的光波导装置及其制造方法和ar设备 |
| DE102024207296A1 (de) * | 2024-08-01 | 2026-02-05 | Carl Zeiss Smt Gmbh | Optische Baugruppe |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020003661A1 (en) * | 2000-05-31 | 2002-01-10 | Takehiko Nakai | Diffractive optical element and optical system having the same |
| US20030231395A1 (en) * | 2002-06-17 | 2003-12-18 | Takehiko Nakai | Diffractive optical element, and optical system and optical apparatus provided with the same |
| WO2005006774A1 (en) * | 2003-07-10 | 2005-01-20 | Ocuity Limited | Lens array structure |
| WO2005121900A1 (de) * | 2004-06-10 | 2005-12-22 | Carl Zeiss Smt Ag | Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5610733A (en) | 1994-02-28 | 1997-03-11 | Digital Optics Corporation | Beam-homogenizer |
| US5850300A (en) | 1994-02-28 | 1998-12-15 | Digital Optics Corporation | Diffractive beam homogenizer having free-form fringes |
| JP2000206321A (ja) * | 1999-01-19 | 2000-07-28 | Canon Inc | 回折光学素子、回折光学素子を備えた光学系、回折光学素子の製造方法、回折光学素子を備えた光学系を含む露光装置、及び露光装置を用いたデバイスの製造方法 |
| DE10124803A1 (de) * | 2001-05-22 | 2002-11-28 | Zeiss Carl | Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator |
| JP4859311B2 (ja) * | 2001-09-17 | 2012-01-25 | 株式会社リコー | レーザ照明光学系、該光学系を用いた露光装置、レーザ加工機、及び投射装置 |
| JP2005032909A (ja) * | 2003-07-10 | 2005-02-03 | Fuji Photo Film Co Ltd | 照明光学系およびそれを用いた露光装置 |
| DE10344010A1 (de) * | 2003-09-15 | 2005-04-07 | Carl Zeiss Smt Ag | Wabenkondensor und Beleuchtungssystem damit |
| US20070019179A1 (en) | 2004-01-16 | 2007-01-25 | Damian Fiolka | Polarization-modulating optical element |
| JP4497968B2 (ja) * | 2004-03-18 | 2010-07-07 | キヤノン株式会社 | 照明装置、露光装置及びデバイス製造方法 |
| DE102005030543A1 (de) * | 2004-07-08 | 2006-02-02 | Carl Zeiss Smt Ag | Polarisatoreinrichtung zur Erzeugung einer definierten Ortsverteilung von Polarisationszuständen |
| DE102005039519A1 (de) | 2005-08-20 | 2007-02-22 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage |
-
2006
- 2006-03-14 DE DE102006012034A patent/DE102006012034A1/de not_active Withdrawn
-
2007
- 2007-03-09 EP EP07103867A patent/EP1835312B1/en not_active Ceased
- 2007-03-09 DE DE602007014285T patent/DE602007014285D1/de active Active
- 2007-03-13 US US11/685,620 patent/US8068279B2/en active Active
- 2007-03-14 JP JP2007064831A patent/JP5179077B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020003661A1 (en) * | 2000-05-31 | 2002-01-10 | Takehiko Nakai | Diffractive optical element and optical system having the same |
| US20030231395A1 (en) * | 2002-06-17 | 2003-12-18 | Takehiko Nakai | Diffractive optical element, and optical system and optical apparatus provided with the same |
| WO2005006774A1 (en) * | 2003-07-10 | 2005-01-20 | Ocuity Limited | Lens array structure |
| WO2005121900A1 (de) * | 2004-06-10 | 2005-12-22 | Carl Zeiss Smt Ag | Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1835312B1 (en) | 2011-05-04 |
| JP5179077B2 (ja) | 2013-04-10 |
| DE602007014285D1 (de) | 2011-06-16 |
| JP2007258709A (ja) | 2007-10-04 |
| US20070217013A1 (en) | 2007-09-20 |
| EP1835312A2 (en) | 2007-09-19 |
| US8068279B2 (en) | 2011-11-29 |
| EP1835312A3 (en) | 2007-10-10 |
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