JP5157444B2 - 硬化促進性化合物−シリカ複合体、硬化促進性化合物−シリカ複合体の製造方法、硬化促進剤、硬化性樹脂組成物及び電子部品装置 - Google Patents
硬化促進性化合物−シリカ複合体、硬化促進性化合物−シリカ複合体の製造方法、硬化促進剤、硬化性樹脂組成物及び電子部品装置 Download PDFInfo
- Publication number
- JP5157444B2 JP5157444B2 JP2007526859A JP2007526859A JP5157444B2 JP 5157444 B2 JP5157444 B2 JP 5157444B2 JP 2007526859 A JP2007526859 A JP 2007526859A JP 2007526859 A JP2007526859 A JP 2007526859A JP 5157444 B2 JP5157444 B2 JP 5157444B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- substituted
- curing
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 0 Oc1cccc(*c2ccccc2)c1 Chemical compound Oc1cccc(*c2ccccc2)c1 0.000 description 6
- CULWBNQVDZHTKT-UHFFFAOYSA-N CC(c1ccccc1)PC1(C)C=CC(O)=CC1 Chemical compound CC(c1ccccc1)PC1(C)C=CC(O)=CC1 CULWBNQVDZHTKT-UHFFFAOYSA-N 0.000 description 1
- UAEPNZWRGJTJPN-UHFFFAOYSA-N CC1CCCCC1 Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Cc1ccccc1 Chemical compound Cc1ccccc1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/395—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Silicon Polymers (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007526859A JP5157444B2 (ja) | 2005-04-15 | 2006-04-14 | 硬化促進性化合物−シリカ複合体、硬化促進性化合物−シリカ複合体の製造方法、硬化促進剤、硬化性樹脂組成物及び電子部品装置 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005118190 | 2005-04-15 | ||
| JP2005118190 | 2005-04-15 | ||
| PCT/JP2006/307943 WO2006112396A1 (ja) | 2005-04-15 | 2006-04-14 | 硬化促進性化合物-シリカ複合体、硬化促進性化合物-シリカ複合体の製造方法、硬化促進剤、硬化性樹脂組成物及び電子部品装置 |
| JP2007526859A JP5157444B2 (ja) | 2005-04-15 | 2006-04-14 | 硬化促進性化合物−シリカ複合体、硬化促進性化合物−シリカ複合体の製造方法、硬化促進剤、硬化性樹脂組成物及び電子部品装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2006112396A1 JPWO2006112396A1 (ja) | 2008-12-11 |
| JP5157444B2 true JP5157444B2 (ja) | 2013-03-06 |
Family
ID=37115114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007526859A Active JP5157444B2 (ja) | 2005-04-15 | 2006-04-14 | 硬化促進性化合物−シリカ複合体、硬化促進性化合物−シリカ複合体の製造方法、硬化促進剤、硬化性樹脂組成物及び電子部品装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8129467B2 (enExample) |
| JP (1) | JP5157444B2 (enExample) |
| KR (1) | KR101005994B1 (enExample) |
| CN (1) | CN101155854B (enExample) |
| TW (1) | TW200643100A (enExample) |
| WO (1) | WO2006112396A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010138372A (ja) * | 2008-11-13 | 2010-06-24 | Seiko Epson Corp | 樹脂組成物 |
| KR101095136B1 (ko) * | 2009-04-23 | 2011-12-16 | 삼성전기주식회사 | 인쇄회로기판용 수지 조성물 및 이를 이용한 인쇄회로기판 |
| EP2484715A4 (en) * | 2009-09-28 | 2017-04-12 | Mitsubishi Rayon Co., Ltd. | Fiber-reinforced composite material |
| US9176259B2 (en) | 2011-03-04 | 2015-11-03 | Intermolecular, Inc. | Sol-gel based antireflective (AR) coatings with controllable pore size using organic nanocrystals and dendrimers |
| US9441119B2 (en) * | 2011-03-28 | 2016-09-13 | Intermolecular, Inc. | Sol-gel transition control of coatings by addition of solidifiers for conformal coatings on textured glass |
| EP2762511B1 (en) | 2011-09-29 | 2016-11-16 | Hitachi Chemical Co., Ltd. | Epoxy resin composition and electronic component device |
| CN103865379A (zh) * | 2012-12-11 | 2014-06-18 | 深圳富泰宏精密工业有限公司 | 聚二甲基硅氧烷溶胶,应用该聚二甲基硅氧烷溶胶对金属基体进行表面处理的方法及制品 |
| US8753021B1 (en) * | 2013-02-12 | 2014-06-17 | Corning Cable Systems Llc | Adhesives for securing optical fibers to ferrules of optical connectors and methods for use thereof |
| CN106397740A (zh) * | 2015-07-30 | 2017-02-15 | 肯特催化材料股份有限公司 | 环氧树脂固化促进剂及其制备方法 |
| WO2021048977A1 (ja) * | 2019-09-12 | 2021-03-18 | 昭和電工マテリアルズ株式会社 | 圧縮成形用封止材及び電子部品装置 |
| WO2021207154A1 (en) * | 2020-04-06 | 2021-10-14 | Aspen Aerogels Inc. | Improved aerogel compositions and methods |
Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5337799A (en) * | 1976-09-18 | 1978-04-07 | Merck Patent Gmbh | Composite containing silicone dioxide and process for producing same |
| JPS63223027A (ja) * | 1987-03-12 | 1988-09-16 | Taoka Chem Co Ltd | 硬化性組成物 |
| JPH02300229A (ja) * | 1989-05-16 | 1990-12-12 | Sumitomo Bakelite Co Ltd | 一液型エポキシ樹脂組成物 |
| JPH03122114A (ja) * | 1989-10-06 | 1991-05-24 | Somar Corp | 硬化剤組成物、その製造方法及び熱硬化性エポキシ樹脂組成物 |
| JPH0625470A (ja) * | 1992-07-10 | 1994-02-01 | Nippon Kayaku Co Ltd | マイクロカプセル型硬化促進剤及びこれを含む樹脂組成物 |
| JPH06184283A (ja) * | 1992-12-21 | 1994-07-05 | Sumitomo Bakelite Co Ltd | 半導体封止用樹脂組成物 |
| JPH06256746A (ja) * | 1993-03-09 | 1994-09-13 | Hitachi Chem Co Ltd | 接着剤組成物および接着フィルム |
| JPH0977959A (ja) * | 1995-09-14 | 1997-03-25 | Toshiba Corp | マイクロカプセル型硬化促進剤および樹脂組成物 |
| JP2000186132A (ja) * | 1998-12-22 | 2000-07-04 | Toshiba Corp | マイクロカプセル型硬化触媒およびそれを用いた半導体封止用樹脂組成物 |
| WO2003068840A1 (fr) * | 2002-02-18 | 2003-08-21 | Sony Chemicals Corporation | Durcisseur latent, procede de production et adhesif contenant un durcisseur latent |
| JP2003525100A (ja) * | 1998-08-13 | 2003-08-26 | ゾル−ゲル テクノロジーズ エルティーディー. | 機能性分子により充填されたオキシドマイクロカプセルの調製のための方法およびそれにより得られた生産物 |
| JP2004149437A (ja) * | 2002-10-30 | 2004-05-27 | Sumikin Air Water Chemical Inc | トリアリールホスホニオフェノラートの製造方法 |
| JP2004156036A (ja) * | 2002-10-18 | 2004-06-03 | Hitachi Chem Co Ltd | 硬化性樹脂の硬化促進剤、硬化性樹脂組成物、電子部品装置、及びホスフィン誘導体の製造方法 |
| JP2004156035A (ja) * | 2002-10-18 | 2004-06-03 | Hitachi Chem Co Ltd | 硬化性樹脂の硬化促進剤、硬化性樹脂組成物及び電子部品装置 |
| JP2004277511A (ja) * | 2003-03-13 | 2004-10-07 | Sumitomo Bakelite Co Ltd | 硬化促進剤 |
| JP2004300071A (ja) * | 2003-03-31 | 2004-10-28 | Air Water Chemical Inc | ヒドロキシアリールトリアリールホスホニウムアイオダイド、その製法及びその誘導体の製造方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5124399B2 (enExample) | 1973-03-19 | 1976-07-23 | ||
| JP2912193B2 (ja) | 1995-06-14 | 1999-06-28 | 日東電工株式会社 | マイクロカプセル型硬化剤または硬化促進剤、およびそれを含有するエポキシ樹脂組成物、並びに硬化方法およびエポキシ樹脂硬化物 |
| JP3478315B2 (ja) | 1995-12-06 | 2003-12-15 | 日立化成工業株式会社 | 半導体封止用エポキシ樹脂組成物及び該樹脂組成物で封止した半導体装置 |
| JP3217266B2 (ja) | 1996-06-11 | 2001-10-09 | 住友ベークライト株式会社 | 潜伏性触媒及び該触媒を配合してなる熱硬化性樹脂組成物 |
| EP0844283B1 (en) * | 1996-11-20 | 2002-10-09 | JSR Corporation | Curable resin composition and cured products |
| JPH115829A (ja) | 1997-06-19 | 1999-01-12 | Sumitomo Bakelite Co Ltd | 熱硬化性樹脂組成物 |
| JP2000181632A (ja) | 1998-12-17 | 2000-06-30 | Funai Electric Co Ltd | 映像機器のタッチ入力装置 |
| JP2001114872A (ja) | 1999-08-06 | 2001-04-24 | Hitachi Chem Co Ltd | 封止用エポキシ樹脂組成物及び電子部品装置 |
| JP4569076B2 (ja) | 2002-06-05 | 2010-10-27 | 住友ベークライト株式会社 | 硬化促進剤、エポキシ樹脂組成物および半導体装置 |
| US6753373B2 (en) * | 2002-06-20 | 2004-06-22 | Kris W. Winowiecki | Polyolefin compositions and method of use thereof in molded products |
| KR100524820B1 (ko) * | 2003-06-17 | 2005-10-31 | 한국화학연구원 | 실리카 마이크로캡슐의 제조방법 |
| JP4329426B2 (ja) | 2003-06-24 | 2009-09-09 | 日立化成工業株式会社 | 封止用エポキシ樹脂成形材料及び電子部品装置 |
| KR100893022B1 (ko) * | 2005-01-26 | 2009-04-15 | 히다치 가세고교 가부시끼가이샤 | 경화 촉진제, 경화성 수지 조성물 및 전자 부품 장치 |
-
2006
- 2006-04-14 US US11/911,267 patent/US8129467B2/en not_active Expired - Fee Related
- 2006-04-14 TW TW095113443A patent/TW200643100A/zh not_active IP Right Cessation
- 2006-04-14 WO PCT/JP2006/307943 patent/WO2006112396A1/ja not_active Ceased
- 2006-04-14 JP JP2007526859A patent/JP5157444B2/ja active Active
- 2006-04-14 KR KR1020077026328A patent/KR101005994B1/ko not_active Expired - Fee Related
- 2006-04-14 CN CN2006800118115A patent/CN101155854B/zh not_active Expired - Fee Related
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5337799A (en) * | 1976-09-18 | 1978-04-07 | Merck Patent Gmbh | Composite containing silicone dioxide and process for producing same |
| JPS63223027A (ja) * | 1987-03-12 | 1988-09-16 | Taoka Chem Co Ltd | 硬化性組成物 |
| JPH02300229A (ja) * | 1989-05-16 | 1990-12-12 | Sumitomo Bakelite Co Ltd | 一液型エポキシ樹脂組成物 |
| JPH03122114A (ja) * | 1989-10-06 | 1991-05-24 | Somar Corp | 硬化剤組成物、その製造方法及び熱硬化性エポキシ樹脂組成物 |
| JPH0625470A (ja) * | 1992-07-10 | 1994-02-01 | Nippon Kayaku Co Ltd | マイクロカプセル型硬化促進剤及びこれを含む樹脂組成物 |
| JPH06184283A (ja) * | 1992-12-21 | 1994-07-05 | Sumitomo Bakelite Co Ltd | 半導体封止用樹脂組成物 |
| JPH06256746A (ja) * | 1993-03-09 | 1994-09-13 | Hitachi Chem Co Ltd | 接着剤組成物および接着フィルム |
| JPH0977959A (ja) * | 1995-09-14 | 1997-03-25 | Toshiba Corp | マイクロカプセル型硬化促進剤および樹脂組成物 |
| JP2003525100A (ja) * | 1998-08-13 | 2003-08-26 | ゾル−ゲル テクノロジーズ エルティーディー. | 機能性分子により充填されたオキシドマイクロカプセルの調製のための方法およびそれにより得られた生産物 |
| JP2000186132A (ja) * | 1998-12-22 | 2000-07-04 | Toshiba Corp | マイクロカプセル型硬化触媒およびそれを用いた半導体封止用樹脂組成物 |
| WO2003068840A1 (fr) * | 2002-02-18 | 2003-08-21 | Sony Chemicals Corporation | Durcisseur latent, procede de production et adhesif contenant un durcisseur latent |
| JP2004156036A (ja) * | 2002-10-18 | 2004-06-03 | Hitachi Chem Co Ltd | 硬化性樹脂の硬化促進剤、硬化性樹脂組成物、電子部品装置、及びホスフィン誘導体の製造方法 |
| JP2004156035A (ja) * | 2002-10-18 | 2004-06-03 | Hitachi Chem Co Ltd | 硬化性樹脂の硬化促進剤、硬化性樹脂組成物及び電子部品装置 |
| JP2004149437A (ja) * | 2002-10-30 | 2004-05-27 | Sumikin Air Water Chemical Inc | トリアリールホスホニオフェノラートの製造方法 |
| JP2004277511A (ja) * | 2003-03-13 | 2004-10-07 | Sumitomo Bakelite Co Ltd | 硬化促進剤 |
| JP2004300071A (ja) * | 2003-03-31 | 2004-10-28 | Air Water Chemical Inc | ヒドロキシアリールトリアリールホスホニウムアイオダイド、その製法及びその誘導体の製造方法 |
Non-Patent Citations (1)
| Title |
|---|
| JPN6011050912; Polymer Prepints Vol.41,No.2, 2000, P.1844 * |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200643100A (en) | 2006-12-16 |
| WO2006112396A1 (ja) | 2006-10-26 |
| US20090062460A1 (en) | 2009-03-05 |
| US8129467B2 (en) | 2012-03-06 |
| JPWO2006112396A1 (ja) | 2008-12-11 |
| KR20070120193A (ko) | 2007-12-21 |
| TWI325437B (enExample) | 2010-06-01 |
| CN101155854B (zh) | 2011-09-07 |
| CN101155854A (zh) | 2008-04-02 |
| KR101005994B1 (ko) | 2011-01-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5937794B2 (ja) | 新規硬化性樹脂とその製造方法、及びエポキシ樹脂組成物、電子部品装置 | |
| JP5157444B2 (ja) | 硬化促進性化合物−シリカ複合体、硬化促進性化合物−シリカ複合体の製造方法、硬化促進剤、硬化性樹脂組成物及び電子部品装置 | |
| JP5040510B2 (ja) | エポキシ樹脂組成物及び電子部品装置 | |
| JP5750777B2 (ja) | カリックスアレーン誘導体、カリックスアレーン誘導体の製造方法、エポキシ樹脂用硬化剤、エポキシ樹脂組成物及び電子部品装置 | |
| JP2008260853A (ja) | 新規硬化性樹脂とその製造方法、及びエポキシ樹脂組成物、電子部品装置 | |
| KR100893022B1 (ko) | 경화 촉진제, 경화성 수지 조성물 및 전자 부품 장치 | |
| JP5256614B2 (ja) | エポキシ樹脂組成物及び電子部品装置 | |
| JP4892984B2 (ja) | 硬化性樹脂組成物及び電子部品装置 | |
| JP5008199B2 (ja) | エポキシ樹脂用硬化剤、エポキシ樹脂組成物及び電子部品装置 | |
| JP5040509B2 (ja) | エポキシ樹脂組成物及び電子部品装置 | |
| JP5285208B2 (ja) | 新規化合物とその製造方法、及び新規化合物を含む硬化性樹脂、エポキシ樹脂組成物、電子部品装置 | |
| JP2010031089A (ja) | カリックスアレーン誘導体、カリックスアレーン誘導体の製造方法、エポキシ樹脂組成物及び電子部品装置 | |
| JP5028913B2 (ja) | エポキシ樹脂組成物、半導体素子収納用中空パッケージ及び電子部品装置 | |
| JP6291729B2 (ja) | エポキシ樹脂用硬化促進剤、エポキシ樹脂組成物及び電子部品装置 | |
| JP4952131B2 (ja) | エポキシ樹脂の硬化剤、エポキシ樹脂の硬化剤の製造方法、エポキシ樹脂組成物及び電子部品装置 | |
| JP5045985B2 (ja) | エポキシ樹脂組成物及び電子部品装置 | |
| JP5326184B2 (ja) | 新規化合物及びその製造方法 | |
| JP2006249222A (ja) | エポキシ樹脂硬化剤とその製造方法、エポキシ樹脂組成物及び電子部品装置 | |
| JP2012052123A (ja) | エポキシ樹脂組成物、電子部品装置 | |
| JP5257643B2 (ja) | エポキシ樹脂組成物及び電子部品装置 | |
| JP2008248107A (ja) | 硬化促進性化合物−ゲル複合体、硬化促進性化合物−ゲル複合体の製造方法、硬化促進剤、硬化性樹脂組成物及び電子部品装置 | |
| JP5077630B2 (ja) | エポキシ樹脂用硬化剤とその製造方法、エポキシ樹脂組成物及び電子部品装置 | |
| JP2006233189A (ja) | 硬化促進剤、硬化性樹脂組成物及び電子部品装置 | |
| JP2007031698A (ja) | エポキシ樹脂組成物及び電子部品装置 | |
| JP2009102511A (ja) | エポキシ樹脂組成物及び電子部品装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111004 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111205 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120619 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120814 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20121113 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20121126 |
|
| R151 | Written notification of patent or utility model registration |
Ref document number: 5157444 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151221 Year of fee payment: 3 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151221 Year of fee payment: 3 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| S801 | Written request for registration of abandonment of right |
Free format text: JAPANESE INTERMEDIATE CODE: R311801 |
|
| ABAN | Cancellation due to abandonment | ||
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |