JP5155790B2 - 基板載置台およびそれを用いた基板処理装置 - Google Patents
基板載置台およびそれを用いた基板処理装置 Download PDFInfo
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- JP5155790B2 JP5155790B2 JP2008236951A JP2008236951A JP5155790B2 JP 5155790 B2 JP5155790 B2 JP 5155790B2 JP 2008236951 A JP2008236951 A JP 2008236951A JP 2008236951 A JP2008236951 A JP 2008236951A JP 5155790 B2 JP5155790 B2 JP 5155790B2
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- 229910052759 nickel Inorganic materials 0.000 description 1
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Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008236951A JP5155790B2 (ja) | 2008-09-16 | 2008-09-16 | 基板載置台およびそれを用いた基板処理装置 |
US13/119,141 US20110222038A1 (en) | 2008-09-16 | 2009-09-16 | Substrate processing apparatus and substrate placing table |
PCT/JP2009/066160 WO2010032750A1 (ja) | 2008-09-16 | 2009-09-16 | 基板処理装置および基板載置台 |
KR1020117005464A KR101227743B1 (ko) | 2008-09-16 | 2009-09-16 | 기판 처리 장치 및 기판 배치대 |
CN2009801363993A CN102160166B (zh) | 2008-09-16 | 2009-09-16 | 基板处理装置和基板载置台 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008236951A JP5155790B2 (ja) | 2008-09-16 | 2008-09-16 | 基板載置台およびそれを用いた基板処理装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010073753A JP2010073753A (ja) | 2010-04-02 |
JP2010073753A5 JP2010073753A5 (enrdf_load_stackoverflow) | 2011-09-15 |
JP5155790B2 true JP5155790B2 (ja) | 2013-03-06 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008236951A Expired - Fee Related JP5155790B2 (ja) | 2008-09-16 | 2008-09-16 | 基板載置台およびそれを用いた基板処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5155790B2 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200062374A (ko) * | 2017-10-27 | 2020-06-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 리프트 핀 홀더 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101319022B1 (ko) | 2012-03-13 | 2013-10-29 | 피에스케이 주식회사 | 리프트 핀 어셈블리 및 그것을 구비한 기판 처리 장치 |
JP6112474B2 (ja) * | 2013-05-09 | 2017-04-12 | 信越半導体株式会社 | ウェーハ昇降装置、エピタキシャルウェーハの製造方法 |
JP6596362B2 (ja) * | 2015-12-02 | 2019-10-23 | 東京エレクトロン株式会社 | 減圧された空間において被加工物を処理する処理装置 |
JP6747960B6 (ja) * | 2016-12-16 | 2020-09-16 | Sppテクノロジーズ株式会社 | プラズマ処理装置 |
JP2021097162A (ja) * | 2019-12-18 | 2021-06-24 | 東京エレクトロン株式会社 | 基板処理装置及び載置台 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08124999A (ja) * | 1994-10-27 | 1996-05-17 | Kokusai Electric Co Ltd | 基板押上げピンの着脱構造 |
JP3398936B2 (ja) * | 1999-04-09 | 2003-04-21 | 日本エー・エス・エム株式会社 | 半導体処理装置 |
JP4477784B2 (ja) * | 2001-02-02 | 2010-06-09 | 東京エレクトロン株式会社 | 被処理体の載置機構 |
US8365682B2 (en) * | 2004-06-01 | 2013-02-05 | Applied Materials, Inc. | Methods and apparatus for supporting substrates |
JP4398802B2 (ja) * | 2004-06-17 | 2010-01-13 | 東京エレクトロン株式会社 | 基板処理装置 |
JP4836512B2 (ja) * | 2005-07-29 | 2011-12-14 | 東京エレクトロン株式会社 | 基板昇降装置および基板処理装置 |
JP4687534B2 (ja) * | 2005-09-30 | 2011-05-25 | 東京エレクトロン株式会社 | 基板の載置機構及び基板処理装置 |
JP2007266595A (ja) * | 2006-02-28 | 2007-10-11 | Tokyo Electron Ltd | プラズマ処理装置及びそれに用いる基板加熱機構 |
JP2007242954A (ja) * | 2006-03-09 | 2007-09-20 | Tokyo Electron Ltd | リフタ及びリフタを備える被処理体の処理装置 |
JP4824590B2 (ja) * | 2007-01-31 | 2011-11-30 | 東京エレクトロン株式会社 | 基板処理装置 |
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2008
- 2008-09-16 JP JP2008236951A patent/JP5155790B2/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200062374A (ko) * | 2017-10-27 | 2020-06-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 리프트 핀 홀더 |
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Publication number | Publication date |
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JP2010073753A (ja) | 2010-04-02 |
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