JP5155790B2 - 基板載置台およびそれを用いた基板処理装置 - Google Patents

基板載置台およびそれを用いた基板処理装置 Download PDF

Info

Publication number
JP5155790B2
JP5155790B2 JP2008236951A JP2008236951A JP5155790B2 JP 5155790 B2 JP5155790 B2 JP 5155790B2 JP 2008236951 A JP2008236951 A JP 2008236951A JP 2008236951 A JP2008236951 A JP 2008236951A JP 5155790 B2 JP5155790 B2 JP 5155790B2
Authority
JP
Japan
Prior art keywords
substrate
mounting table
base member
lifting
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008236951A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010073753A5 (enrdf_load_stackoverflow
JP2010073753A (ja
Inventor
潤 山下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2008236951A priority Critical patent/JP5155790B2/ja
Priority to US13/119,141 priority patent/US20110222038A1/en
Priority to PCT/JP2009/066160 priority patent/WO2010032750A1/ja
Priority to KR1020117005464A priority patent/KR101227743B1/ko
Priority to CN2009801363993A priority patent/CN102160166B/zh
Publication of JP2010073753A publication Critical patent/JP2010073753A/ja
Publication of JP2010073753A5 publication Critical patent/JP2010073753A5/ja
Application granted granted Critical
Publication of JP5155790B2 publication Critical patent/JP5155790B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP2008236951A 2008-09-16 2008-09-16 基板載置台およびそれを用いた基板処理装置 Expired - Fee Related JP5155790B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2008236951A JP5155790B2 (ja) 2008-09-16 2008-09-16 基板載置台およびそれを用いた基板処理装置
US13/119,141 US20110222038A1 (en) 2008-09-16 2009-09-16 Substrate processing apparatus and substrate placing table
PCT/JP2009/066160 WO2010032750A1 (ja) 2008-09-16 2009-09-16 基板処理装置および基板載置台
KR1020117005464A KR101227743B1 (ko) 2008-09-16 2009-09-16 기판 처리 장치 및 기판 배치대
CN2009801363993A CN102160166B (zh) 2008-09-16 2009-09-16 基板处理装置和基板载置台

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008236951A JP5155790B2 (ja) 2008-09-16 2008-09-16 基板載置台およびそれを用いた基板処理装置

Publications (3)

Publication Number Publication Date
JP2010073753A JP2010073753A (ja) 2010-04-02
JP2010073753A5 JP2010073753A5 (enrdf_load_stackoverflow) 2011-09-15
JP5155790B2 true JP5155790B2 (ja) 2013-03-06

Family

ID=42205300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008236951A Expired - Fee Related JP5155790B2 (ja) 2008-09-16 2008-09-16 基板載置台およびそれを用いた基板処理装置

Country Status (1)

Country Link
JP (1) JP5155790B2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200062374A (ko) * 2017-10-27 2020-06-03 어플라이드 머티어리얼스, 인코포레이티드 리프트 핀 홀더

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101319022B1 (ko) 2012-03-13 2013-10-29 피에스케이 주식회사 리프트 핀 어셈블리 및 그것을 구비한 기판 처리 장치
JP6112474B2 (ja) * 2013-05-09 2017-04-12 信越半導体株式会社 ウェーハ昇降装置、エピタキシャルウェーハの製造方法
JP6596362B2 (ja) * 2015-12-02 2019-10-23 東京エレクトロン株式会社 減圧された空間において被加工物を処理する処理装置
JP6747960B6 (ja) * 2016-12-16 2020-09-16 Sppテクノロジーズ株式会社 プラズマ処理装置
JP2021097162A (ja) * 2019-12-18 2021-06-24 東京エレクトロン株式会社 基板処理装置及び載置台

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08124999A (ja) * 1994-10-27 1996-05-17 Kokusai Electric Co Ltd 基板押上げピンの着脱構造
JP3398936B2 (ja) * 1999-04-09 2003-04-21 日本エー・エス・エム株式会社 半導体処理装置
JP4477784B2 (ja) * 2001-02-02 2010-06-09 東京エレクトロン株式会社 被処理体の載置機構
US8365682B2 (en) * 2004-06-01 2013-02-05 Applied Materials, Inc. Methods and apparatus for supporting substrates
JP4398802B2 (ja) * 2004-06-17 2010-01-13 東京エレクトロン株式会社 基板処理装置
JP4836512B2 (ja) * 2005-07-29 2011-12-14 東京エレクトロン株式会社 基板昇降装置および基板処理装置
JP4687534B2 (ja) * 2005-09-30 2011-05-25 東京エレクトロン株式会社 基板の載置機構及び基板処理装置
JP2007266595A (ja) * 2006-02-28 2007-10-11 Tokyo Electron Ltd プラズマ処理装置及びそれに用いる基板加熱機構
JP2007242954A (ja) * 2006-03-09 2007-09-20 Tokyo Electron Ltd リフタ及びリフタを備える被処理体の処理装置
JP4824590B2 (ja) * 2007-01-31 2011-11-30 東京エレクトロン株式会社 基板処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200062374A (ko) * 2017-10-27 2020-06-03 어플라이드 머티어리얼스, 인코포레이티드 리프트 핀 홀더

Also Published As

Publication number Publication date
JP2010073753A (ja) 2010-04-02

Similar Documents

Publication Publication Date Title
KR101227743B1 (ko) 기판 처리 장치 및 기판 배치대
JP5357486B2 (ja) プラズマ処理装置
KR101317018B1 (ko) 플라즈마 처리 장치
KR100993466B1 (ko) 기판 처리 장치 및 플라즈마에 노출되는 부재
JP5008562B2 (ja) 基板処理方法および基板処理装置
KR100886030B1 (ko) 처리 장치 및 덮개의 개폐 기구
TWI409357B (zh) Plasma processing device
JP5155790B2 (ja) 基板載置台およびそれを用いた基板処理装置
JP4979389B2 (ja) プラズマ処理装置
JP5479013B2 (ja) プラズマ処理装置及びこれに用いる遅波板
TWI761913B (zh) 基板處理裝置、基板承載盤蓋、半導體裝置之製造方法及基板處理方法
JP5090299B2 (ja) プラズマ処理装置および基板載置台
JP2007266595A (ja) プラズマ処理装置及びそれに用いる基板加熱機構
JP2007250569A (ja) プラズマ処理装置およびプラズマに曝される部材
JP4861208B2 (ja) 基板載置台および基板処理装置
WO2011013633A1 (ja) 平面アンテナ部材およびこれを備えたプラズマ処理装置
WO2009113680A1 (ja) 平面アンテナ部材、及び、これを備えたプラズマ処理装置
JP5249689B2 (ja) プラズマ処理装置および基板載置台
JP5728565B2 (ja) プラズマ処理装置及びこれに用いる遅波板
WO2006049125A1 (ja) 成膜装置及び成膜方法
JP2011029250A (ja) マイクロ波プラズマ処理装置およびマイクロ波プラズマ処理方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110802

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110802

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20121127

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20121207

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20151214

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 5155790

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees