JP5095315B2 - ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置 - Google Patents

ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置 Download PDF

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JP5095315B2
JP5095315B2 JP2007229785A JP2007229785A JP5095315B2 JP 5095315 B2 JP5095315 B2 JP 5095315B2 JP 2007229785 A JP2007229785 A JP 2007229785A JP 2007229785 A JP2007229785 A JP 2007229785A JP 5095315 B2 JP5095315 B2 JP 5095315B2
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film
ferroelectric
ferroelectric film
pzt
electric field
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JP2009062207A5 (enExample
JP2009062207A (ja
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高見 新川
隆満 藤井
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2007229785A priority Critical patent/JP5095315B2/ja
Priority to EP20080015289 priority patent/EP2034040A3/en
Priority to CNA2008102148578A priority patent/CN101381101A/zh
Priority to US12/204,644 priority patent/US20090062114A1/en
Publication of JP2009062207A publication Critical patent/JP2009062207A/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/69398—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides the material having a perovskite structure, e.g. BaTiO3
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14201—Structure of print heads with piezoelectric elements
    • B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
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    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1607—Production of print heads with piezoelectric elements
    • B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
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    • C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
    • C04B35/49—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing also titanium oxides or titanates
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/088—Oxides of the type ABO3 with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal
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    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/682—Capacitors having no potential barriers having dielectrics comprising perovskite structures
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    • H10N30/00—Piezoelectric or electrostrictive devices
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    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
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    • H10N30/80—Constructional details
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    • H10N30/8548—Lead-based oxides
    • H10N30/8554—Lead-zirconium titanate [PZT] based
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    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
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    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
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JP2007229785A 2007-09-05 2007-09-05 ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置 Expired - Fee Related JP5095315B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007229785A JP5095315B2 (ja) 2007-09-05 2007-09-05 ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
EP20080015289 EP2034040A3 (en) 2007-09-05 2008-08-29 Perovskite type oxide, ferroelectric film, process for producing same, ferroelectric device, and liquid discharge apparatus
CNA2008102148578A CN101381101A (zh) 2007-09-05 2008-09-03 钙钛矿型氧化物、铁电体膜及其制备方法、铁电体器件和液体排出装置
US12/204,644 US20090062114A1 (en) 2007-09-05 2008-09-04 Perovskite type oxide, ferroelectric film, process for producing same, ferroelectric device, and liquid discharge apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007229785A JP5095315B2 (ja) 2007-09-05 2007-09-05 ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置

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JP2009062207A JP2009062207A (ja) 2009-03-26
JP2009062207A5 JP2009062207A5 (enExample) 2010-04-15
JP5095315B2 true JP5095315B2 (ja) 2012-12-12

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US (1) US20090062114A1 (enExample)
EP (1) EP2034040A3 (enExample)
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CN (1) CN101381101A (enExample)

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JP4993294B2 (ja) * 2007-09-05 2012-08-08 富士フイルム株式会社 ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
JP5449970B2 (ja) * 2009-10-09 2014-03-19 富士フイルム株式会社 圧電体膜の成膜方法、圧電素子、液体吐出装置、及び圧電型超音波振動子
JP5621964B2 (ja) * 2009-11-02 2014-11-12 セイコーエプソン株式会社 液体噴射ヘッド、液体噴射装置及び圧電素子並びに超音波デバイス
JP5556182B2 (ja) * 2010-01-05 2014-07-23 セイコーエプソン株式会社 液体噴射ヘッド及び液体噴射装置並びに圧電素子
CN102245513B (zh) * 2010-01-21 2015-10-14 友技科株式会社 Pbnzt强电介质膜、溶胶凝胶溶液、成膜方法及强电介质膜的制造方法
CN104021264B (zh) 2013-02-28 2017-06-20 华为技术有限公司 一种缺陷预测方法及装置
JP6341446B2 (ja) 2014-03-13 2018-06-13 株式会社リコー 電気機械変換素子の製造方法、電気機械変換素子、液滴吐出ヘッド、液滴吐出装置及び画像形成装置
JP6258241B2 (ja) * 2015-02-27 2018-01-10 富士フイルム株式会社 圧電アクチュエータ
CN111525021B (zh) * 2020-04-22 2023-08-22 济南大学 一种兼具正负电卡效应的钛酸铋钠基薄膜及其制备方法

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