JP5036349B2 - グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法 - Google Patents
グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法 Download PDFInfo
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- JP5036349B2 JP5036349B2 JP2007050234A JP2007050234A JP5036349B2 JP 5036349 B2 JP5036349 B2 JP 5036349B2 JP 2007050234 A JP2007050234 A JP 2007050234A JP 2007050234 A JP2007050234 A JP 2007050234A JP 5036349 B2 JP5036349 B2 JP 5036349B2
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007050234A JP5036349B2 (ja) | 2007-02-28 | 2007-02-28 | グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法 |
CN2008100740621A CN101256349B (zh) | 2007-02-28 | 2008-02-21 | 灰阶掩模的缺陷修正方法和制造方法以及灰阶掩模 |
TW097106725A TWI408494B (zh) | 2007-02-28 | 2008-02-27 | 灰階光罩之缺陷修正方法、灰階光罩之製法及灰階光罩 |
KR1020080017567A KR101242328B1 (ko) | 2007-02-28 | 2008-02-27 | 그레이톤 마스크의 결함 수정 방법, 그레이톤 마스크의 제조 방법 및 그레이톤 마스크 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007050234A JP5036349B2 (ja) | 2007-02-28 | 2007-02-28 | グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008216346A JP2008216346A (ja) | 2008-09-18 |
JP5036349B2 true JP5036349B2 (ja) | 2012-09-26 |
Family
ID=39836504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007050234A Active JP5036349B2 (ja) | 2007-02-28 | 2007-02-28 | グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5036349B2 (ko) |
KR (1) | KR101242328B1 (ko) |
CN (1) | CN101256349B (ko) |
TW (1) | TWI408494B (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5102912B2 (ja) * | 2007-03-31 | 2012-12-19 | Hoya株式会社 | グレートーンマスクの欠陥修正方法、グレートーンマスクの製造方法、及びパターン転写方法 |
JP5114367B2 (ja) * | 2008-11-21 | 2013-01-09 | Hoya株式会社 | フォトマスクの製造方法及びそのフォトマスクを用いたパターン転写方法 |
TWI440964B (zh) * | 2009-01-27 | 2014-06-11 | Hoya Corp | 多調式光罩、多調式光罩之製造方法及圖案轉印方法 |
JP2010276724A (ja) * | 2009-05-26 | 2010-12-09 | Hoya Corp | 多階調フォトマスク、多階調フォトマスクの製造方法、及びパターン転写方法 |
CN101943854B (zh) * | 2009-07-03 | 2012-07-04 | 深圳清溢光电股份有限公司 | 半灰阶掩模板半曝光区的设计方法及其制造方法 |
JP2011081282A (ja) * | 2009-10-09 | 2011-04-21 | Hoya Corp | フォトマスク用欠陥修正方法、フォトマスク用欠陥修正装置、フォトマスク用欠陥修正ヘッド、及びフォトマスク用欠陥検査装置、並びにフォトマスクの製造方法 |
JP5635577B2 (ja) * | 2012-09-26 | 2014-12-03 | Hoya株式会社 | フォトマスクの製造方法、フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法 |
JP6235643B2 (ja) * | 2016-03-25 | 2017-11-22 | Hoya株式会社 | パターン修正方法、フォトマスクの製造方法、フォトマスク、及び修正膜形成装置 |
JP6960741B2 (ja) | 2017-02-02 | 2021-11-05 | 株式会社エスケーエレクトロニクス | 位相シフトマスクの欠陥修正方法 |
TWI659262B (zh) * | 2017-08-07 | 2019-05-11 | 日商Hoya股份有限公司 | 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法 |
KR102254646B1 (ko) * | 2018-07-30 | 2021-05-21 | 호야 가부시키가이샤 | 포토마스크 수정 방법, 포토마스크의 제조 방법, 포토마스크, 및 표시 장치용 디바이스의 제조 방법 |
JP6741893B1 (ja) * | 2020-03-04 | 2020-08-19 | 株式会社エスケーエレクトロニクス | ハーフトーンマスクの欠陥修正方法、ハーフトーンマスクの製造方法及びハーフトーンマスク |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3249203B2 (ja) * | 1992-11-13 | 2002-01-21 | 株式会社日立製作所 | ホトマスクの製造方法 |
JP3082529B2 (ja) * | 1993-09-13 | 2000-08-28 | 株式会社日立製作所 | マスクの欠陥修正方法 |
JPH0980741A (ja) * | 1995-09-08 | 1997-03-28 | Toppan Printing Co Ltd | ハーフトーン位相シフトマスクの欠陥修正方法およびハーフトーン位相シフトマスク |
JP3630935B2 (ja) * | 1997-08-18 | 2005-03-23 | Hoya株式会社 | ハーフトーン型位相シフトマスクの欠陥修正方法 |
JP3489989B2 (ja) * | 1998-04-06 | 2004-01-26 | セイコーインスツルメンツ株式会社 | パターン膜形成方法及びそれに用いる集束イオンビーム加工装置 |
JP3556591B2 (ja) * | 2000-09-29 | 2004-08-18 | Hoya株式会社 | グレートーンマスクにおけるグレートーン部の欠陥修正方法 |
CN1258118C (zh) * | 2002-03-28 | 2006-05-31 | Hoya株式会社 | 灰调掩模以及灰调掩膜中灰调部的缺陷修正方法 |
JP4297693B2 (ja) * | 2003-01-31 | 2009-07-15 | 株式会社ルネサステクノロジ | フォトマスク、フォトマスクの製造方法、およびフォトマスクの製造装置 |
JP3993125B2 (ja) * | 2003-04-01 | 2007-10-17 | Hoya株式会社 | グレートーンマスクの欠陥修正方法 |
JP4294359B2 (ja) * | 2003-04-08 | 2009-07-08 | Hoya株式会社 | グレートーンマスクの欠陥修正方法 |
JP3875648B2 (ja) * | 2003-04-08 | 2007-01-31 | Hoya株式会社 | グレートーンマスクの欠陥検査方法 |
JP4559921B2 (ja) * | 2005-06-20 | 2010-10-13 | エスアイアイ・ナノテクノロジー株式会社 | グレートーンのパターン膜欠陥修正方法 |
JP4752495B2 (ja) * | 2005-12-22 | 2011-08-17 | 大日本印刷株式会社 | 階調をもつフォトマスクの欠陥修正方法 |
JP4736818B2 (ja) * | 2006-01-20 | 2011-07-27 | 大日本印刷株式会社 | 階調をもつフォトマスクの欠陥修正方法および階調をもつフォトマスク |
-
2007
- 2007-02-28 JP JP2007050234A patent/JP5036349B2/ja active Active
-
2008
- 2008-02-21 CN CN2008100740621A patent/CN101256349B/zh not_active Expired - Fee Related
- 2008-02-27 TW TW097106725A patent/TWI408494B/zh not_active IP Right Cessation
- 2008-02-27 KR KR1020080017567A patent/KR101242328B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TWI408494B (zh) | 2013-09-11 |
CN101256349A (zh) | 2008-09-03 |
CN101256349B (zh) | 2012-09-26 |
TW200844648A (en) | 2008-11-16 |
KR20080080023A (ko) | 2008-09-02 |
JP2008216346A (ja) | 2008-09-18 |
KR101242328B1 (ko) | 2013-03-12 |
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