JP4978816B2 - 光学装置及び光学装置の結像挙動を補正又は改善する方法 - Google Patents

光学装置及び光学装置の結像挙動を補正又は改善する方法 Download PDF

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JP4978816B2
JP4978816B2 JP2009521149A JP2009521149A JP4978816B2 JP 4978816 B2 JP4978816 B2 JP 4978816B2 JP 2009521149 A JP2009521149 A JP 2009521149A JP 2009521149 A JP2009521149 A JP 2009521149A JP 4978816 B2 JP4978816 B2 JP 4978816B2
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optical
optical element
vibration
optical device
frequency
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JP2009521149A
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Japanese (ja)
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JP2009545146A5 (enExample
JP2009545146A (ja
Inventor
マルティン シュリーファー
ウルリッヒ ヴェークマン
シュテファン ヘムバッハー
ベルンハルト ゴイペルト
ユールゲン フーバー
ノルベルト ケルヴィーン
ミハエル トーツェック
マルクス ハウフ
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP2009521149A 2006-07-24 2007-07-19 光学装置及び光学装置の結像挙動を補正又は改善する方法 Expired - Fee Related JP4978816B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006034755.2 2006-07-24
DE102006034755A DE102006034755A1 (de) 2006-07-24 2006-07-24 Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung
PCT/EP2007/006407 WO2008012022A1 (de) 2006-07-24 2007-07-19 Optische vorrichtung und verfahren zur korrektur bzw. verbesserung des abbildungsverhaltens einer solchen vorrichtung

Publications (3)

Publication Number Publication Date
JP2009545146A JP2009545146A (ja) 2009-12-17
JP2009545146A5 JP2009545146A5 (enExample) 2010-08-05
JP4978816B2 true JP4978816B2 (ja) 2012-07-18

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JP2009521149A Expired - Fee Related JP4978816B2 (ja) 2006-07-24 2007-07-19 光学装置及び光学装置の結像挙動を補正又は改善する方法

Country Status (5)

Country Link
US (1) US8169595B2 (enExample)
EP (1) EP2044487B1 (enExample)
JP (1) JP4978816B2 (enExample)
DE (2) DE102006034755A1 (enExample)
WO (1) WO2008012022A1 (enExample)

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US9418270B2 (en) 2011-01-31 2016-08-16 Hand Held Products, Inc. Terminal with flicker-corrected aimer and alternating illumination
NL2008704A (en) * 2011-06-20 2012-12-28 Asml Netherlands Bv Wavefront modification apparatus, lithographic apparatus and method.
EP2726939B1 (en) * 2011-07-01 2020-09-16 Carl Zeiss SMT GmbH Optical imaging arrangement with individually actively supported components
DE102012205976A1 (de) * 2012-04-12 2013-05-02 Carl Zeiss Smt Gmbh Optische Vorrichtung für die Mikrolithographie und Verfahren zum Betreiben derselben
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
US9298102B2 (en) * 2013-03-13 2016-03-29 Carl Zeiss Smt Gmbh Projection lens with wavefront manipulator
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DE102013223808A1 (de) 2013-11-21 2014-12-11 Carl Zeiss Smt Gmbh Optische Spiegeleinrichtung zur Reflexion eines Bündels von EUV-Licht
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DE102017205548A1 (de) 2017-03-31 2018-10-04 Carl Zeiss Smt Gmbh Optische Baugruppe zum Führen eines Ausgabestrahls eines Freie-Elektronen-Lasers
US12230476B2 (en) 2017-11-17 2025-02-18 Advanced Energy Industries, Inc. Integrated control of a plasma processing system
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KR102877884B1 (ko) * 2017-11-17 2025-11-04 에이이에스 글로벌 홀딩스 피티이 리미티드 플라즈마 프로세싱 시스템에서 변조 공급기들의 개선된 적용
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
JP7603649B2 (ja) 2019-07-12 2024-12-20 エーイーエス グローバル ホールディングス， プライベート リミテッド 単一制御型スイッチを伴うバイアス供給装置
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RU2746857C1 (ru) * 2020-10-23 2021-04-21 федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский политехнический университет Петра Великого" (ФГАОУ ВО "СПбПУ") Способ управления импульсным оптическим излучением
JP2023034720A (ja) * 2021-08-31 2023-03-13 国立研究開発法人理化学研究所 毛髪観察装置
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KR101819711B1 (ko) * 2016-07-22 2018-01-29 충북대학교 산학협력단 머신 비전을 이용한 너트 풀림 감지 장치 및 방법

Also Published As

Publication number Publication date
US8169595B2 (en) 2012-05-01
WO2008012022A1 (de) 2008-01-31
EP2044487B1 (de) 2011-04-20
DE502007007006D1 (de) 2011-06-01
DE102006034755A1 (de) 2008-01-31
JP2009545146A (ja) 2009-12-17
EP2044487A1 (de) 2009-04-08
US20090174876A1 (en) 2009-07-09

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