DE102006034755A1 - Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung - Google Patents
Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung Download PDFInfo
- Publication number
- DE102006034755A1 DE102006034755A1 DE102006034755A DE102006034755A DE102006034755A1 DE 102006034755 A1 DE102006034755 A1 DE 102006034755A1 DE 102006034755 A DE102006034755 A DE 102006034755A DE 102006034755 A DE102006034755 A DE 102006034755A DE 102006034755 A1 DE102006034755 A1 DE 102006034755A1
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- Germany
- Prior art keywords
- optical element
- optical device
- optical
- light source
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Links
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Optics & Photonics (AREA)
- Public Health (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- Microscoopes, Condenser (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006034755A DE102006034755A1 (de) | 2006-07-24 | 2006-07-24 | Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung |
| EP07786179A EP2044487B1 (de) | 2006-07-24 | 2007-07-19 | Optische vorrichtung mit korrigiertem bzw. verbessertem abbildungsverhalten |
| DE502007007006T DE502007007006D1 (de) | 2006-07-24 | 2007-07-19 | Optische vorrichtung mit korrigiertem bzw. verbessertem abbildungsverhalten |
| JP2009521149A JP4978816B2 (ja) | 2006-07-24 | 2007-07-19 | 光学装置及び光学装置の結像挙動を補正又は改善する方法 |
| PCT/EP2007/006407 WO2008012022A1 (de) | 2006-07-24 | 2007-07-19 | Optische vorrichtung und verfahren zur korrektur bzw. verbesserung des abbildungsverhaltens einer solchen vorrichtung |
| US12/357,126 US8169595B2 (en) | 2006-07-24 | 2009-01-21 | Optical apparatus and method for modifying the imaging behavior of such apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006034755A DE102006034755A1 (de) | 2006-07-24 | 2006-07-24 | Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102006034755A1 true DE102006034755A1 (de) | 2008-01-31 |
Family
ID=38645887
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102006034755A Ceased DE102006034755A1 (de) | 2006-07-24 | 2006-07-24 | Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung |
| DE502007007006T Active DE502007007006D1 (de) | 2006-07-24 | 2007-07-19 | Optische vorrichtung mit korrigiertem bzw. verbessertem abbildungsverhalten |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE502007007006T Active DE502007007006D1 (de) | 2006-07-24 | 2007-07-19 | Optische vorrichtung mit korrigiertem bzw. verbessertem abbildungsverhalten |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8169595B2 (enExample) |
| EP (1) | EP2044487B1 (enExample) |
| JP (1) | JP4978816B2 (enExample) |
| DE (2) | DE102006034755A1 (enExample) |
| WO (1) | WO2008012022A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009110793A1 (en) * | 2008-03-03 | 2009-09-11 | Asml Netherlands B.V. | Lithographic apparatus, plasma source, and reflecting method |
| DE102012205976A1 (de) * | 2012-04-12 | 2013-05-02 | Carl Zeiss Smt Gmbh | Optische Vorrichtung für die Mikrolithographie und Verfahren zum Betreiben derselben |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009009221A1 (de) * | 2009-02-17 | 2010-08-26 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem Aktuatorsystem |
| US11615941B2 (en) | 2009-05-01 | 2023-03-28 | Advanced Energy Industries, Inc. | System, method, and apparatus for controlling ion energy distribution in plasma processing systems |
| US10707055B2 (en) | 2017-11-17 | 2020-07-07 | Advanced Energy Industries, Inc. | Spatial and temporal control of ion bias voltage for plasma processing |
| NL2004256A (en) * | 2009-05-13 | 2010-11-18 | Asml Netherlands Bv | Enhancing alignment in lithographic apparatus device manufacture. |
| NL2007036A (en) * | 2010-07-30 | 2012-01-31 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| DE102010041623A1 (de) * | 2010-09-29 | 2012-03-29 | Carl Zeiss Smt Gmbh | Spiegel |
| US9418270B2 (en) | 2011-01-31 | 2016-08-16 | Hand Held Products, Inc. | Terminal with flicker-corrected aimer and alternating illumination |
| NL2008704A (en) | 2011-06-20 | 2012-12-28 | Asml Netherlands Bv | Wavefront modification apparatus, lithographic apparatus and method. |
| KR101857322B1 (ko) * | 2011-07-01 | 2018-06-25 | 칼 짜이스 에스엠테 게엠베하 | 개별적으로 능동적으로 지지되는 구성요소를 갖는 광학적 이미징 장치 |
| US9685297B2 (en) | 2012-08-28 | 2017-06-20 | Advanced Energy Industries, Inc. | Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system |
| US9651872B2 (en) | 2013-03-13 | 2017-05-16 | Carl Zeiss Smt Gmbh | Projection lens with wavefront manipulator |
| US9298102B2 (en) * | 2013-03-13 | 2016-03-29 | Carl Zeiss Smt Gmbh | Projection lens with wavefront manipulator |
| DE102013223808A1 (de) | 2013-11-21 | 2014-12-11 | Carl Zeiss Smt Gmbh | Optische Spiegeleinrichtung zur Reflexion eines Bündels von EUV-Licht |
| DE102013223935A1 (de) | 2013-11-22 | 2015-05-28 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für die EUV-Belichtungslithographie |
| WO2015158487A1 (en) * | 2014-04-17 | 2015-10-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2015173362A1 (de) | 2014-05-14 | 2015-11-19 | Carl Zeiss Smt Gmbh | Optimale anordnung von aktuier- und sensorpunkten auf einem optischen element |
| CN107003447B (zh) * | 2014-11-24 | 2020-03-24 | Asml荷兰有限公司 | 辐射束设备 |
| DE102014226917A1 (de) | 2014-12-23 | 2015-12-17 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für die EUV-Projektionslithographie |
| DE102015209051B4 (de) * | 2015-05-18 | 2018-08-30 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Wellenfrontmanipulator sowie Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage |
| DE102015225262A1 (de) * | 2015-12-15 | 2017-06-22 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| KR101819711B1 (ko) * | 2016-07-22 | 2018-01-29 | 충북대학교 산학협력단 | 머신 비전을 이용한 너트 풀림 감지 장치 및 방법 |
| DE102016226082A1 (de) * | 2016-12-22 | 2018-06-28 | Carl Zeiss Smt Gmbh | Steuerungsvorrichtung zum ansteuern einer aktuatoreinheit einer lithographieanlage, lithographieanlage mit einer steuerungsvorrichtung und verfahren zum betreiben der steuerungsvorrichtung |
| DE102017205548A1 (de) | 2017-03-31 | 2018-10-04 | Carl Zeiss Smt Gmbh | Optische Baugruppe zum Führen eines Ausgabestrahls eines Freie-Elektronen-Lasers |
| US11437221B2 (en) | 2017-11-17 | 2022-09-06 | Advanced Energy Industries, Inc. | Spatial monitoring and control of plasma processing environments |
| US12230476B2 (en) | 2017-11-17 | 2025-02-18 | Advanced Energy Industries, Inc. | Integrated control of a plasma processing system |
| TWI767088B (zh) * | 2017-11-17 | 2022-06-11 | 新加坡商Ａｅｓ全球公司 | 電漿處理系統，用於調變其中的電源的控制方法及相關的電漿處理控制系統 |
| CN114222958B (zh) | 2019-07-12 | 2024-03-19 | 先进工程解决方案全球控股私人有限公司 | 具有单个受控开关的偏置电源 |
| US12125674B2 (en) | 2020-05-11 | 2024-10-22 | Advanced Energy Industries, Inc. | Surface charge and power feedback and control using a switch mode bias system |
| RU2746857C1 (ru) * | 2020-10-23 | 2021-04-21 | федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский политехнический университет Петра Великого" (ФГАОУ ВО "СПбПУ") | Способ управления импульсным оптическим излучением |
| JP2023034720A (ja) * | 2021-08-31 | 2023-03-13 | 国立研究開発法人理化学研究所 | 毛髪観察装置 |
| US12046448B2 (en) | 2022-01-26 | 2024-07-23 | Advanced Energy Industries, Inc. | Active switch on time control for bias supply |
| US11670487B1 (en) | 2022-01-26 | 2023-06-06 | Advanced Energy Industries, Inc. | Bias supply control and data processing |
| US11942309B2 (en) | 2022-01-26 | 2024-03-26 | Advanced Energy Industries, Inc. | Bias supply with resonant switching |
| US11978613B2 (en) | 2022-09-01 | 2024-05-07 | Advanced Energy Industries, Inc. | Transition control in a bias supply |
| WO2025160289A1 (en) * | 2024-01-24 | 2025-07-31 | Bifrost Biosystems, Inc. | Methods and systems for cell imaging |
| WO2025242362A1 (en) * | 2024-05-21 | 2025-11-27 | Asml Netherlands B.V. | Improvements to lithographic methods and apparatus |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4577932A (en) * | 1984-05-08 | 1986-03-25 | Creo Electronics Corporation | Multi-spot modulator using a laser diode |
| US5825844A (en) * | 1995-03-24 | 1998-10-20 | Canon Kabushiki Kaisha | Optical arrangement and illumination method |
| US6037967A (en) * | 1996-12-18 | 2000-03-14 | Etec Systems, Inc. | Short wavelength pulsed laser scanner |
| US6072813A (en) * | 1996-07-09 | 2000-06-06 | Thomson-Csf | Device for controlling light pulses by a programmable acoustooptic device |
| US6490390B1 (en) * | 2001-01-05 | 2002-12-03 | Phaethon Communications | Grating writing systems based on an acousto-optic element |
| US6574035B2 (en) * | 2000-12-13 | 2003-06-03 | Minolta Co., Ltd. | Diffraction optical device and optical apparatus using the same |
| WO2005109083A2 (en) * | 2004-05-06 | 2005-11-17 | Esko-Graphics A/S | Optical image exposing method and apparatus |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3205296A1 (de) * | 1982-02-15 | 1983-09-01 | Werner 3512 Reinhardshagen Geiger | Frequenzvervielfacher |
| JP2569711B2 (ja) | 1988-04-07 | 1997-01-08 | 株式会社ニコン | 露光制御装置及び該装置による露光方法 |
| JP3301153B2 (ja) * | 1993-04-06 | 2002-07-15 | 株式会社ニコン | 投影露光装置、露光方法、及び素子製造方法 |
| JPH06313833A (ja) * | 1993-04-30 | 1994-11-08 | Toshiba Corp | 光学装置 |
| US5818507A (en) * | 1994-10-28 | 1998-10-06 | Xerox Corporation | Method and apparatus for controlling the modulation of light beams in a rotating polygon type image forming apparatus |
| US5774274A (en) * | 1995-05-12 | 1998-06-30 | Schachar; Ronald A. | Variable focus lens by small changes of the equatorial lens diameter |
| JP3632264B2 (ja) * | 1995-11-30 | 2005-03-23 | 株式会社ニコン | Ｘ線投影露光装置 |
| JPH09298154A (ja) * | 1996-05-07 | 1997-11-18 | Nikon Corp | 照明装置 |
| JPH1039208A (ja) * | 1996-07-23 | 1998-02-13 | Nikon Corp | 投影光学系 |
| JPH10133150A (ja) * | 1996-10-29 | 1998-05-22 | Canon Inc | 回折光学装置及びこれを用いた露光装置 |
| JPH10206714A (ja) * | 1997-01-20 | 1998-08-07 | Canon Inc | レンズ移動装置 |
| DE19827602A1 (de) * | 1998-06-20 | 1999-12-23 | Zeiss Carl Fa | Verfahren zur Korrektur nicht-rotationssymmetrischer Bildfehler |
| DE19827603A1 (de) * | 1998-06-20 | 1999-12-23 | Zeiss Carl Fa | Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie |
| DE19859634A1 (de) * | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
| DE10001291A1 (de) * | 2000-01-14 | 2001-07-19 | Zeiss Carl | Adaptronischer Spiegel |
| DE10040813A1 (de) * | 2000-08-21 | 2002-03-21 | Zeiss Carl | Spektrometeranordnung |
| JP4694768B2 (ja) * | 2001-01-04 | 2011-06-08 | レーザー・イメージング・システムズ・ゲーエムベーハー・ウント・カンパニー・カーゲー | 直接パターンライター |
| DE10123725A1 (de) * | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
| JP2003107311A (ja) * | 2001-09-27 | 2003-04-09 | Nikon Corp | 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法 |
| DE10151919B4 (de) * | 2001-10-20 | 2007-02-01 | Carl Zeiss Smt Ag | Belichtungsobjektiv in der Halbleiterlithographie |
| JP2003234269A (ja) * | 2002-02-07 | 2003-08-22 | Nikon Corp | 反射ミラーの保持方法、反射ミラーの保持部材及び露光装置 |
| US7436484B2 (en) * | 2004-12-28 | 2008-10-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2006
- 2006-07-24 DE DE102006034755A patent/DE102006034755A1/de not_active Ceased
-
2007
- 2007-07-19 DE DE502007007006T patent/DE502007007006D1/de active Active
- 2007-07-19 EP EP07786179A patent/EP2044487B1/de not_active Ceased
- 2007-07-19 JP JP2009521149A patent/JP4978816B2/ja not_active Expired - Fee Related
- 2007-07-19 WO PCT/EP2007/006407 patent/WO2008012022A1/de not_active Ceased
-
2009
- 2009-01-21 US US12/357,126 patent/US8169595B2/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4577932A (en) * | 1984-05-08 | 1986-03-25 | Creo Electronics Corporation | Multi-spot modulator using a laser diode |
| US5825844A (en) * | 1995-03-24 | 1998-10-20 | Canon Kabushiki Kaisha | Optical arrangement and illumination method |
| US6072813A (en) * | 1996-07-09 | 2000-06-06 | Thomson-Csf | Device for controlling light pulses by a programmable acoustooptic device |
| US6037967A (en) * | 1996-12-18 | 2000-03-14 | Etec Systems, Inc. | Short wavelength pulsed laser scanner |
| US6574035B2 (en) * | 2000-12-13 | 2003-06-03 | Minolta Co., Ltd. | Diffraction optical device and optical apparatus using the same |
| US6490390B1 (en) * | 2001-01-05 | 2002-12-03 | Phaethon Communications | Grating writing systems based on an acousto-optic element |
| WO2005109083A2 (en) * | 2004-05-06 | 2005-11-17 | Esko-Graphics A/S | Optical image exposing method and apparatus |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009110793A1 (en) * | 2008-03-03 | 2009-09-11 | Asml Netherlands B.V. | Lithographic apparatus, plasma source, and reflecting method |
| CN101971100B (zh) * | 2008-03-03 | 2013-10-16 | Asml荷兰有限公司 | 光刻设备、等离子体源以及反射方法 |
| US8593617B2 (en) | 2008-03-03 | 2013-11-26 | Asml Netherlands B.V. | Lithographic apparatus, plasma source, and reflecting method |
| DE102012205976A1 (de) * | 2012-04-12 | 2013-05-02 | Carl Zeiss Smt Gmbh | Optische Vorrichtung für die Mikrolithographie und Verfahren zum Betreiben derselben |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009545146A (ja) | 2009-12-17 |
| EP2044487A1 (de) | 2009-04-08 |
| US20090174876A1 (en) | 2009-07-09 |
| WO2008012022A1 (de) | 2008-01-31 |
| JP4978816B2 (ja) | 2012-07-18 |
| US8169595B2 (en) | 2012-05-01 |
| EP2044487B1 (de) | 2011-04-20 |
| DE502007007006D1 (de) | 2011-06-01 |
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