JP2009545146A5 - - Google Patents

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Publication number
JP2009545146A5
JP2009545146A5 JP2009521149A JP2009521149A JP2009545146A5 JP 2009545146 A5 JP2009545146 A5 JP 2009545146A5 JP 2009521149 A JP2009521149 A JP 2009521149A JP 2009521149 A JP2009521149 A JP 2009521149A JP 2009545146 A5 JP2009545146 A5 JP 2009545146A5
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Japan
Prior art keywords
optical
optical element
optical device
vibration
light source
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JP2009521149A
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Japanese (ja)
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JP4978816B2 (ja
JP2009545146A (ja
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Priority claimed from DE102006034755A external-priority patent/DE102006034755A1/de
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Expired - Fee Related legal-status Critical Current
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JP2009521149A 2006-07-24 2007-07-19 光学装置及び光学装置の結像挙動を補正又は改善する方法 Expired - Fee Related JP4978816B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006034755.2 2006-07-24
DE102006034755A DE102006034755A1 (de) 2006-07-24 2006-07-24 Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung
PCT/EP2007/006407 WO2008012022A1 (de) 2006-07-24 2007-07-19 Optische vorrichtung und verfahren zur korrektur bzw. verbesserung des abbildungsverhaltens einer solchen vorrichtung

Publications (3)

Publication Number Publication Date
JP2009545146A JP2009545146A (ja) 2009-12-17
JP2009545146A5 true JP2009545146A5 (enExample) 2010-08-05
JP4978816B2 JP4978816B2 (ja) 2012-07-18

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JP2009521149A Expired - Fee Related JP4978816B2 (ja) 2006-07-24 2007-07-19 光学装置及び光学装置の結像挙動を補正又は改善する方法

Country Status (5)

Country Link
US (1) US8169595B2 (enExample)
EP (1) EP2044487B1 (enExample)
JP (1) JP4978816B2 (enExample)
DE (2) DE102006034755A1 (enExample)
WO (1) WO2008012022A1 (enExample)

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DE102017205548A1 (de) 2017-03-31 2018-10-04 Carl Zeiss Smt Gmbh Optische Baugruppe zum Führen eines Ausgabestrahls eines Freie-Elektronen-Lasers
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CN111788655B (zh) 2017-11-17 2024-04-05 先进工程解决方案全球控股私人有限公司 对等离子体处理的离子偏置电压的空间和时间控制
KR102877884B1 (ko) * 2017-11-17 2025-11-04 에이이에스 글로벌 홀딩스 피티이 리미티드 플라즈마 프로세싱 시스템에서 변조 공급기들의 개선된 적용
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
JP7603649B2 (ja) 2019-07-12 2024-12-20 エーイーエス グローバル ホールディングス， プライベート リミテッド 単一制御型スイッチを伴うバイアス供給装置
US12125674B2 (en) 2020-05-11 2024-10-22 Advanced Energy Industries, Inc. Surface charge and power feedback and control using a switch mode bias system
RU2746857C1 (ru) * 2020-10-23 2021-04-21 федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский политехнический университет Петра Великого" (ФГАОУ ВО "СПбПУ") Способ управления импульсным оптическим излучением
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