JP4922355B2 - シリカ容器及びその製造方法 - Google Patents

シリカ容器及びその製造方法 Download PDF

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Publication number
JP4922355B2
JP4922355B2 JP2009166799A JP2009166799A JP4922355B2 JP 4922355 B2 JP4922355 B2 JP 4922355B2 JP 2009166799 A JP2009166799 A JP 2009166799A JP 2009166799 A JP2009166799 A JP 2009166799A JP 4922355 B2 JP4922355 B2 JP 4922355B2
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Japan
Prior art keywords
silica
substrate
container
gas
silica substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2009166799A
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English (en)
Japanese (ja)
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JP2011020886A (ja
JP2011020886A5 (https=
Inventor
茂 山形
友美 笛吹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2009166799A priority Critical patent/JP4922355B2/ja
Application filed by Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Quartz Products Co Ltd
Priority to KR1020117012685A priority patent/KR101268483B1/ko
Priority to US13/123,629 priority patent/US8733127B2/en
Priority to CN201080003082.5A priority patent/CN102197002B/zh
Priority to PCT/JP2010/003651 priority patent/WO2011007491A1/ja
Priority to EP10799555A priority patent/EP2455349A1/en
Priority to TW099118423A priority patent/TWI421222B/zh
Publication of JP2011020886A publication Critical patent/JP2011020886A/ja
Publication of JP2011020886A5 publication Critical patent/JP2011020886A5/ja
Application granted granted Critical
Publication of JP4922355B2 publication Critical patent/JP4922355B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
JP2009166799A 2009-07-15 2009-07-15 シリカ容器及びその製造方法 Active JP4922355B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2009166799A JP4922355B2 (ja) 2009-07-15 2009-07-15 シリカ容器及びその製造方法
US13/123,629 US8733127B2 (en) 2009-07-15 2010-06-01 Silica container and method for producing the same
CN201080003082.5A CN102197002B (zh) 2009-07-15 2010-06-01 二氧化硅容器及其制造方法
PCT/JP2010/003651 WO2011007491A1 (ja) 2009-07-15 2010-06-01 シリカ容器及びその製造方法
KR1020117012685A KR101268483B1 (ko) 2009-07-15 2010-06-01 실리카 용기 및 그 제조방법
EP10799555A EP2455349A1 (en) 2009-07-15 2010-06-01 Silica container and method for producing same
TW099118423A TWI421222B (zh) 2009-07-15 2010-06-07 Silica container and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009166799A JP4922355B2 (ja) 2009-07-15 2009-07-15 シリカ容器及びその製造方法

Publications (3)

Publication Number Publication Date
JP2011020886A JP2011020886A (ja) 2011-02-03
JP2011020886A5 JP2011020886A5 (https=) 2012-02-23
JP4922355B2 true JP4922355B2 (ja) 2012-04-25

Family

ID=43449103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009166799A Active JP4922355B2 (ja) 2009-07-15 2009-07-15 シリカ容器及びその製造方法

Country Status (7)

Country Link
US (1) US8733127B2 (https=)
EP (1) EP2455349A1 (https=)
JP (1) JP4922355B2 (https=)
KR (1) KR101268483B1 (https=)
CN (1) CN102197002B (https=)
TW (1) TWI421222B (https=)
WO (1) WO2011007491A1 (https=)

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US8272234B2 (en) * 2008-12-19 2012-09-25 Heraeus Shin-Etsu America, Inc. Silica crucible with pure and bubble free inner crucible layer and method of making the same
EP2431338B1 (en) * 2009-04-28 2021-08-25 Shin-Etsu Quartz Products Co., Ltd. Silica vessel
KR101315684B1 (ko) * 2009-05-26 2013-10-10 신에쯔 세끼에이 가부시키가이샤 실리카 용기 및 그 제조방법
JP4951040B2 (ja) * 2009-08-05 2012-06-13 信越石英株式会社 シリカ容器及びその製造方法
US9003832B2 (en) * 2009-11-20 2015-04-14 Heraeus Shin-Etsu America, Inc. Method of making a silica crucible in a controlled atmosphere
JP5462423B1 (ja) * 2012-03-23 2014-04-02 信越石英株式会社 単結晶シリコン引き上げ用シリカ容器及びその製造方法
KR101645663B1 (ko) * 2013-04-08 2016-08-04 신에쯔 세끼에이 가부시키가이샤 단결정 실리콘 인상용 실리카 용기 및 그 제조방법
ES2706877T3 (es) 2014-11-13 2019-04-01 Gerresheimer Glas Gmbh Filtro de partículas de máquina para conformar vidrio, unidad de émbolo, cabeza de soplado, soporte de cabeza de soplado y máquina para conformar vidrio adaptada a dicho filtro o que lo comprende
JP6220772B2 (ja) * 2014-12-26 2017-10-25 クアーズテック株式会社 石英ガラスルツボの製造方法
KR102165896B1 (ko) * 2016-09-13 2020-10-14 가부시키가이샤 사무코 석영 유리 도가니 및 그 제조 방법
JP6769893B2 (ja) * 2017-02-24 2020-10-14 東ソ−・エスジ−エム株式会社 Ｏｈ基拡散抑制能を有する石英ガラス材料及びその製造方法
US10710918B1 (en) 2018-02-19 2020-07-14 Owens-Brockway Glass Container Inc. Method of manufacturing a hollow glass article having a container shape
CN111122373B (zh) * 2018-10-30 2024-01-02 贝特瑞新材料集团股份有限公司 一种纳米硅基材料中硅含量的测试方法
KR20230153383A (ko) * 2021-03-05 2023-11-06 신에쯔 세끼에이 가부시키가이샤 석영유리 도가니의 평가방법 및 제조방법 그리고 석영유리 도가니
JP7724066B2 (ja) * 2021-03-05 2025-08-15 信越石英株式会社 石英ガラスるつぼの評価方法及び製造方法

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JP2559604B2 (ja) * 1987-12-15 1996-12-04 東芝セラミックス株式会社 石英ガラスルツボの製造方法
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EP0474158B1 (en) 1990-09-07 1995-04-19 Mitsubishi Chemical Corporation Silica glass powder and a method for its production and a silica glass body product made thereof
JPH0729871A (ja) 1993-06-25 1995-01-31 Toshiba Corp 表面処理方法および表面処理装置
JPH07206451A (ja) 1993-12-29 1995-08-08 Nippon Steel Corp 合成石英ガラスの製造方法
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JP5377930B2 (ja) * 2008-10-31 2013-12-25 株式会社Ｓｕｍｃｏ シリコン単結晶引上用石英ガラスルツボの製造方法
US8272234B2 (en) * 2008-12-19 2012-09-25 Heraeus Shin-Etsu America, Inc. Silica crucible with pure and bubble free inner crucible layer and method of making the same
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JP4969632B2 (ja) * 2009-10-14 2012-07-04 信越石英株式会社 シリカ粉及びシリカ容器並びにそれらの製造方法
US9003832B2 (en) * 2009-11-20 2015-04-14 Heraeus Shin-Etsu America, Inc. Method of making a silica crucible in a controlled atmosphere
JP4951057B2 (ja) * 2009-12-10 2012-06-13 信越石英株式会社 シリカ容器及びその製造方法
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Also Published As

Publication number Publication date
TW201119958A (en) 2011-06-16
JP2011020886A (ja) 2011-02-03
TWI421222B (zh) 2014-01-01
US8733127B2 (en) 2014-05-27
EP2455349A1 (en) 2012-05-23
WO2011007491A1 (ja) 2011-01-20
US20110192758A1 (en) 2011-08-11
CN102197002B (zh) 2014-03-19
KR20110092292A (ko) 2011-08-17
KR101268483B1 (ko) 2013-06-04
CN102197002A (zh) 2011-09-21

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