JP4917088B2 - 非球形表面の高分解能の精密測定方法 - Google Patents
非球形表面の高分解能の精密測定方法 Download PDFInfo
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- JP4917088B2 JP4917088B2 JP2008505464A JP2008505464A JP4917088B2 JP 4917088 B2 JP4917088 B2 JP 4917088B2 JP 2008505464 A JP2008505464 A JP 2008505464A JP 2008505464 A JP2008505464 A JP 2008505464A JP 4917088 B2 JP4917088 B2 JP 4917088B2
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- 238000000691 measurement method Methods 0.000 title description 2
- 238000000034 method Methods 0.000 claims description 97
- 238000005259 measurement Methods 0.000 claims description 96
- 238000012360 testing method Methods 0.000 claims description 78
- 238000012935 Averaging Methods 0.000 claims description 31
- 230000003287 optical effect Effects 0.000 claims description 29
- 238000006073 displacement reaction Methods 0.000 claims description 12
- 238000013461 design Methods 0.000 claims description 10
- 230000000694 effects Effects 0.000 claims description 7
- 238000001914 filtration Methods 0.000 claims description 6
- 238000004364 calculation method Methods 0.000 claims description 5
- 238000013519 translation Methods 0.000 claims description 5
- 230000001419 dependent effect Effects 0.000 claims description 4
- 238000004164 analytical calibration Methods 0.000 claims 1
- 230000003247 decreasing effect Effects 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- 230000007547 defect Effects 0.000 description 19
- 230000006872 improvement Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000013329 compounding Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000004441 surface measurement Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000009897 systematic effect Effects 0.000 description 2
- 241000698776 Duma Species 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000009885 systemic effect Effects 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
- G01B9/02063—Active error reduction, i.e. varying with time by particular alignment of focus position, e.g. dynamic focussing in optical coherence tomography
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
- G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02085—Combining two or more images of different regions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0278—Detecting defects of the object to be tested, e.g. scratches or dust
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Geometry (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Radiology & Medical Imaging (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- General Health & Medical Sciences (AREA)
- Signal Processing (AREA)
- Engineering & Computer Science (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66838505P | 2005-04-05 | 2005-04-05 | |
| US60/668,385 | 2005-04-05 | ||
| PCT/US2006/012527 WO2006107985A2 (en) | 2005-04-05 | 2006-04-05 | Method for accurate high-resolution measurements of aspheric surfaces |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008534986A JP2008534986A (ja) | 2008-08-28 |
| JP2008534986A5 JP2008534986A5 (enExample) | 2011-07-14 |
| JP4917088B2 true JP4917088B2 (ja) | 2012-04-18 |
Family
ID=37074042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008505464A Active JP4917088B2 (ja) | 2005-04-05 | 2006-04-05 | 非球形表面の高分解能の精密測定方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7433057B2 (enExample) |
| EP (1) | EP1869401B1 (enExample) |
| JP (1) | JP4917088B2 (enExample) |
| KR (4) | KR101393171B1 (enExample) |
| CN (3) | CN102353522B (enExample) |
| WO (1) | WO2006107985A2 (enExample) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7959490B2 (en) | 2005-10-31 | 2011-06-14 | Depuy Products, Inc. | Orthopaedic component manufacturing method and equipment |
| US7580135B2 (en) * | 2006-06-23 | 2009-08-25 | 4D Technology Corporation | Chromatic compensation in Fizeau interferometer |
| US7612893B2 (en) * | 2006-09-19 | 2009-11-03 | Zygo Corporation | Scanning interferometric methods and apparatus for measuring aspheric surfaces and wavefronts |
| WO2009126269A2 (en) | 2008-04-08 | 2009-10-15 | Qed Technologies International, Inc. | Stitching of near-nulled subaperture measurements |
| JP5339934B2 (ja) | 2009-01-22 | 2013-11-13 | キヤノン株式会社 | 光断層撮像装置および光断層撮像方法 |
| WO2011032572A1 (en) * | 2009-09-18 | 2011-03-24 | Carl Zeiss Smt Gmbh | Method of measuring a shape of an optical surface and interferometric measuring device |
| GB2474893A (en) * | 2009-10-30 | 2011-05-04 | Taylor Hobson Ltd | Surface measurement instrument and method |
| KR101336399B1 (ko) * | 2009-11-19 | 2013-12-04 | 캐논 가부시끼가이샤 | 계측 장치, 가공 방법 및 컴퓨터 판독가능한 저장 매체 |
| EP2594896B1 (en) * | 2010-07-15 | 2016-02-10 | Canon Kabushiki Kaisha | Method and apparatus for measuring shape of surface to be inspected, and method for manufacturing optical element |
| CN102155926A (zh) * | 2011-03-09 | 2011-08-17 | 浙江大学 | 一种非球面顶点球曲率半径的测量系统及方法 |
| TWI470184B (zh) * | 2011-08-20 | 2015-01-21 | Tonta Electro Optical Co Ltd | 表面輪廓偵測裝置及其對位方法以及全口徑量測資料的擷取方法 |
| GB2508219A (en) * | 2012-11-26 | 2014-05-28 | Taylor Hobson Ltd | Analysing and machining an optical profile |
| US9212901B2 (en) * | 2013-04-17 | 2015-12-15 | Corning Incorporated | Apparatus and methods for performing wavefront-based and profile-based measurements of an aspheric surface |
| CN103439090B (zh) * | 2013-09-01 | 2015-11-18 | 中国科学院光电技术研究所 | 一种用于子孔径拼接检测的数据采样路径规划方法 |
| US9435640B2 (en) | 2013-12-04 | 2016-09-06 | Zygo Corporation | Interferometer and method for measuring non-rotationally symmetric surface topography having unequal curvatures in two perpendicular principal meridians |
| JP6306724B2 (ja) | 2014-01-09 | 2018-04-04 | ザイゴ コーポレーションZygo Corporation | 非球面およびその他の非平坦面のトポグラフィの測定 |
| DE102014209040B4 (de) | 2014-05-13 | 2019-02-14 | Carl Mahr Holding Gmbh | Verfahren zur Kalibrierung eines Messgerätes |
| WO2016098469A1 (ja) * | 2014-12-16 | 2016-06-23 | 富士フイルム株式会社 | 形状測定装置及び形状測定方法 |
| JP6558975B2 (ja) * | 2015-06-22 | 2019-08-14 | キヤノン株式会社 | 形状計測方法、形状計測装置および形状計測プログラム |
| CN105423948B (zh) * | 2015-12-14 | 2018-10-16 | 中国科学院长春光学精密机械与物理研究所 | 采用变形镜的拼接干涉检测非球面面形的装置 |
| EP3190379A1 (de) | 2016-01-08 | 2017-07-12 | SwissOptic AG | Interferometrisches stitching-verfahren |
| CN109997010B (zh) * | 2016-11-18 | 2022-06-24 | 齐戈股份有限公司 | 用于优化干涉仪的光学性能的方法及设备 |
| CN106768892A (zh) * | 2016-12-28 | 2017-05-31 | 中国计量大学 | 基于哈特曼‑夏克波前传感器的自由曲面镜片波面拼接方法 |
| CN109425313B (zh) * | 2017-08-30 | 2022-12-13 | 上汽通用汽车有限公司 | 手持光泽仪定位装置及手持光泽仪套件 |
| CN107796329B (zh) * | 2017-09-29 | 2019-08-06 | 中国科学院长春光学精密机械与物理研究所 | 一种凸非球面反射镜面形检测装置及检测方法 |
| WO2019147936A1 (en) | 2018-01-26 | 2019-08-01 | Vanderbilt University | Systems and methods for non-destructive evaluation of optical material properties and surfaces |
| US11493751B2 (en) | 2019-01-23 | 2022-11-08 | Vanderbilt University | Systems and methods for compact optical relay |
| CN109955148B (zh) * | 2019-03-18 | 2023-09-22 | 中国工程物理研究院激光聚变研究中心 | 用于非球面光学元件中频波纹误差的在位检测装置及方法 |
| CN109990983B (zh) * | 2019-04-19 | 2020-12-11 | 北京理工大学 | 双边错位差动共焦超长焦距测量方法 |
| CN110307962B (zh) * | 2019-06-28 | 2020-10-27 | 苏州维纳仪器有限责任公司 | 检测光学系统任意波长透射波前的方法 |
| CN110307963B (zh) * | 2019-08-08 | 2020-11-03 | 苏州维纳仪器有限责任公司 | 检测透射式光学系统任意波长焦距的方法 |
| CN111811429B (zh) * | 2020-07-14 | 2021-04-20 | 北京理工大学 | 一种子孔径拼接干涉测量方法和装置 |
| CN113916510B (zh) * | 2021-11-23 | 2023-09-26 | 江苏北方湖光光电有限公司 | 基于伺服转动下的多光轴图像偏差校准方法 |
| CN115597484B (zh) * | 2022-09-26 | 2025-06-24 | 南京理工大学 | 一种基于多球随机的球面参考镜校正方法 |
| CN117906913B (zh) * | 2023-12-04 | 2024-11-15 | 武汉光谷航天三江激光产业技术研究院有限公司 | 一种高功率光学元件激光负载能力自动筛选装置及方法 |
| CN117451324B (zh) * | 2023-12-22 | 2024-02-27 | 中国科学院合肥物质科学研究院 | 用于大相对口径的二次凹曲面检测光路系统及设计方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10213421A (ja) * | 1997-01-31 | 1998-08-11 | Nikon Corp | ヌル波面計測装置 |
| JP2003161610A (ja) * | 2001-11-29 | 2003-06-06 | Satoshi Kiyono | 光学式測定装置 |
| JP2004125768A (ja) * | 2001-12-18 | 2004-04-22 | Qed Technologies Inc | 物体試験表面の完全アパーチャ数値データマップを合成する方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4124223C2 (de) * | 1991-07-22 | 2001-07-26 | Zeiss Carl | Verfahren zur Auswertung von Interferogrammen und Interferometer |
| GB2294327A (en) * | 1994-10-18 | 1996-04-24 | Rank Taylor Hobson Ltd | Roundness measuring |
| US6791696B1 (en) * | 1998-06-18 | 2004-09-14 | Optikos Corporation | Automated optical measurement apparatus and method |
| US6061133A (en) * | 1999-01-26 | 2000-05-09 | Phase Shift Technology | Interferometer light source |
| JP2002163830A (ja) | 2000-11-24 | 2002-06-07 | Toshiba Corp | 光学的収差を利用した光情報処理システムおよび厚みムラのある透明層で保護された記録層を持つ情報媒体 |
| US6643024B2 (en) * | 2001-05-03 | 2003-11-04 | Zygo Corporation | Apparatus and method(s) for reducing the effects of coherent artifacts in an interferometer |
| DE10121516A1 (de) | 2001-05-03 | 2002-11-07 | Michael Kuechel | Vorrichtung und Verfahren zur Verminderung der Wirkungen kohärenter Bildfehler in einem Interferometer |
| KR100449711B1 (ko) * | 2001-12-21 | 2004-09-22 | 삼성전자주식회사 | 오목면과 홀로그램을 가지는 비구면 측정장치 및 방법 |
| CN1529151A (zh) * | 2003-10-10 | 2004-09-15 | 清华大学 | 电子虚拟样板非球面检测方法 |
-
2006
- 2006-04-05 KR KR1020137004413A patent/KR101393171B1/ko active Active
- 2006-04-05 WO PCT/US2006/012527 patent/WO2006107985A2/en not_active Ceased
- 2006-04-05 KR KR1020137034713A patent/KR101459259B1/ko active Active
- 2006-04-05 US US11/398,193 patent/US7433057B2/en active Active
- 2006-04-05 KR KR1020077020800A patent/KR101427425B1/ko active Active
- 2006-04-05 JP JP2008505464A patent/JP4917088B2/ja active Active
- 2006-04-05 CN CN201110170847.0A patent/CN102353522B/zh active Active
- 2006-04-05 CN CN2006800099078A patent/CN101268331B/zh active Active
- 2006-04-05 CN CN201110170466.2A patent/CN102288390B/zh active Active
- 2006-04-05 EP EP06749263.7A patent/EP1869401B1/en active Active
- 2006-04-05 KR KR1020137034715A patent/KR101370171B1/ko active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10213421A (ja) * | 1997-01-31 | 1998-08-11 | Nikon Corp | ヌル波面計測装置 |
| JP2003161610A (ja) * | 2001-11-29 | 2003-06-06 | Satoshi Kiyono | 光学式測定装置 |
| JP2004125768A (ja) * | 2001-12-18 | 2004-04-22 | Qed Technologies Inc | 物体試験表面の完全アパーチャ数値データマップを合成する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20060221350A1 (en) | 2006-10-05 |
| KR101393171B1 (ko) | 2014-05-08 |
| KR20140008470A (ko) | 2014-01-21 |
| CN101268331A (zh) | 2008-09-17 |
| CN102288390A (zh) | 2011-12-21 |
| US7433057B2 (en) | 2008-10-07 |
| KR101370171B1 (ko) | 2014-03-04 |
| EP1869401A4 (en) | 2013-03-20 |
| CN101268331B (zh) | 2012-02-22 |
| CN102353522B (zh) | 2014-11-05 |
| CN102288390B (zh) | 2014-11-26 |
| EP1869401A2 (en) | 2007-12-26 |
| WO2006107985A2 (en) | 2006-10-12 |
| EP1869401B1 (en) | 2016-02-03 |
| KR101459259B1 (ko) | 2014-11-12 |
| WO2006107985A3 (en) | 2008-02-14 |
| KR20130037723A (ko) | 2013-04-16 |
| CN102353522A (zh) | 2012-02-15 |
| KR101427425B1 (ko) | 2014-08-08 |
| KR20070121663A (ko) | 2007-12-27 |
| JP2008534986A (ja) | 2008-08-28 |
| KR20140008469A (ko) | 2014-01-21 |
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