KR101393171B1 - 비구면을 정밀 고해상도로 측정하는 방법 - Google Patents

비구면을 정밀 고해상도로 측정하는 방법 Download PDF

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KR101393171B1
KR101393171B1 KR1020137004413A KR20137004413A KR101393171B1 KR 101393171 B1 KR101393171 B1 KR 101393171B1 KR 1020137004413 A KR1020137004413 A KR 1020137004413A KR 20137004413 A KR20137004413 A KR 20137004413A KR 101393171 B1 KR101393171 B1 KR 101393171B1
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gauge
measurement
wavefront
data
test
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KR20130037723A (ko
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폴 이. 머피
드라기샤 밀라디노빅
그렉 더블유. 포브스
게리 엠. 데브리스
존 에프. 플라익
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퀘드 테크놀러지즈 인터내셔날, 인크.
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/14Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02034Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056Passive reduction of errors
    • G01B9/02057Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062Active error reduction, i.e. varying with time
    • G01B9/02063Active error reduction, i.e. varying with time by particular alignment of focus position, e.g. dynamic focussing in optical coherence tomography
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02083Interferometers characterised by particular signal processing and presentation
    • G01B9/02085Combining two or more images of different regions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0278Detecting defects of the object to be tested, e.g. scratches or dust

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Signal Processing (AREA)
  • Engineering & Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
KR1020137004413A 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법 Active KR101393171B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US66838505P 2005-04-05 2005-04-05
US60/668,385 2005-04-05
PCT/US2006/012527 WO2006107985A2 (en) 2005-04-05 2006-04-05 Method for accurate high-resolution measurements of aspheric surfaces

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KR1020077020800A Division KR101427425B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

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KR20130037723A KR20130037723A (ko) 2013-04-16
KR101393171B1 true KR101393171B1 (ko) 2014-05-08

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KR1020137004413A Active KR101393171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137034713A Active KR101459259B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020077020800A Active KR101427425B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137034715A Active KR101370171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

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KR1020077020800A Active KR101427425B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137034715A Active KR101370171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

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US (1) US7433057B2 (enExample)
EP (1) EP1869401B1 (enExample)
JP (1) JP4917088B2 (enExample)
KR (4) KR101393171B1 (enExample)
CN (3) CN102353522B (enExample)
WO (1) WO2006107985A2 (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7959490B2 (en) 2005-10-31 2011-06-14 Depuy Products, Inc. Orthopaedic component manufacturing method and equipment
US7580135B2 (en) * 2006-06-23 2009-08-25 4D Technology Corporation Chromatic compensation in Fizeau interferometer
US7612893B2 (en) * 2006-09-19 2009-11-03 Zygo Corporation Scanning interferometric methods and apparatus for measuring aspheric surfaces and wavefronts
WO2009126269A2 (en) 2008-04-08 2009-10-15 Qed Technologies International, Inc. Stitching of near-nulled subaperture measurements
JP5339934B2 (ja) 2009-01-22 2013-11-13 キヤノン株式会社 光断層撮像装置および光断層撮像方法
WO2011032572A1 (en) * 2009-09-18 2011-03-24 Carl Zeiss Smt Gmbh Method of measuring a shape of an optical surface and interferometric measuring device
GB2474893A (en) * 2009-10-30 2011-05-04 Taylor Hobson Ltd Surface measurement instrument and method
KR101336399B1 (ko) * 2009-11-19 2013-12-04 캐논 가부시끼가이샤 계측 장치, 가공 방법 및 컴퓨터 판독가능한 저장 매체
EP2594896B1 (en) * 2010-07-15 2016-02-10 Canon Kabushiki Kaisha Method and apparatus for measuring shape of surface to be inspected, and method for manufacturing optical element
CN102155926A (zh) * 2011-03-09 2011-08-17 浙江大学 一种非球面顶点球曲率半径的测量系统及方法
TWI470184B (zh) * 2011-08-20 2015-01-21 Tonta Electro Optical Co Ltd 表面輪廓偵測裝置及其對位方法以及全口徑量測資料的擷取方法
GB2508219A (en) * 2012-11-26 2014-05-28 Taylor Hobson Ltd Analysing and machining an optical profile
US9212901B2 (en) * 2013-04-17 2015-12-15 Corning Incorporated Apparatus and methods for performing wavefront-based and profile-based measurements of an aspheric surface
CN103439090B (zh) * 2013-09-01 2015-11-18 中国科学院光电技术研究所 一种用于子孔径拼接检测的数据采样路径规划方法
US9435640B2 (en) 2013-12-04 2016-09-06 Zygo Corporation Interferometer and method for measuring non-rotationally symmetric surface topography having unequal curvatures in two perpendicular principal meridians
JP6306724B2 (ja) 2014-01-09 2018-04-04 ザイゴ コーポレーションZygo Corporation 非球面およびその他の非平坦面のトポグラフィの測定
DE102014209040B4 (de) 2014-05-13 2019-02-14 Carl Mahr Holding Gmbh Verfahren zur Kalibrierung eines Messgerätes
WO2016098469A1 (ja) * 2014-12-16 2016-06-23 富士フイルム株式会社 形状測定装置及び形状測定方法
JP6558975B2 (ja) * 2015-06-22 2019-08-14 キヤノン株式会社 形状計測方法、形状計測装置および形状計測プログラム
CN105423948B (zh) * 2015-12-14 2018-10-16 中国科学院长春光学精密机械与物理研究所 采用变形镜的拼接干涉检测非球面面形的装置
EP3190379A1 (de) 2016-01-08 2017-07-12 SwissOptic AG Interferometrisches stitching-verfahren
CN109997010B (zh) * 2016-11-18 2022-06-24 齐戈股份有限公司 用于优化干涉仪的光学性能的方法及设备
CN106768892A (zh) * 2016-12-28 2017-05-31 中国计量大学 基于哈特曼‑夏克波前传感器的自由曲面镜片波面拼接方法
CN109425313B (zh) * 2017-08-30 2022-12-13 上汽通用汽车有限公司 手持光泽仪定位装置及手持光泽仪套件
CN107796329B (zh) * 2017-09-29 2019-08-06 中国科学院长春光学精密机械与物理研究所 一种凸非球面反射镜面形检测装置及检测方法
WO2019147936A1 (en) 2018-01-26 2019-08-01 Vanderbilt University Systems and methods for non-destructive evaluation of optical material properties and surfaces
US11493751B2 (en) 2019-01-23 2022-11-08 Vanderbilt University Systems and methods for compact optical relay
CN109955148B (zh) * 2019-03-18 2023-09-22 中国工程物理研究院激光聚变研究中心 用于非球面光学元件中频波纹误差的在位检测装置及方法
CN109990983B (zh) * 2019-04-19 2020-12-11 北京理工大学 双边错位差动共焦超长焦距测量方法
CN110307962B (zh) * 2019-06-28 2020-10-27 苏州维纳仪器有限责任公司 检测光学系统任意波长透射波前的方法
CN110307963B (zh) * 2019-08-08 2020-11-03 苏州维纳仪器有限责任公司 检测透射式光学系统任意波长焦距的方法
CN111811429B (zh) * 2020-07-14 2021-04-20 北京理工大学 一种子孔径拼接干涉测量方法和装置
CN113916510B (zh) * 2021-11-23 2023-09-26 江苏北方湖光光电有限公司 基于伺服转动下的多光轴图像偏差校准方法
CN115597484B (zh) * 2022-09-26 2025-06-24 南京理工大学 一种基于多球随机的球面参考镜校正方法
CN117906913B (zh) * 2023-12-04 2024-11-15 武汉光谷航天三江激光产业技术研究院有限公司 一种高功率光学元件激光负载能力自动筛选装置及方法
CN117451324B (zh) * 2023-12-22 2024-02-27 中国科学院合肥物质科学研究院 用于大相对口径的二次凹曲面检测光路系统及设计方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004125768A (ja) * 2001-12-18 2004-04-22 Qed Technologies Inc 物体試験表面の完全アパーチャ数値データマップを合成する方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4124223C2 (de) * 1991-07-22 2001-07-26 Zeiss Carl Verfahren zur Auswertung von Interferogrammen und Interferometer
GB2294327A (en) * 1994-10-18 1996-04-24 Rank Taylor Hobson Ltd Roundness measuring
JPH10213421A (ja) * 1997-01-31 1998-08-11 Nikon Corp ヌル波面計測装置
US6791696B1 (en) * 1998-06-18 2004-09-14 Optikos Corporation Automated optical measurement apparatus and method
US6061133A (en) * 1999-01-26 2000-05-09 Phase Shift Technology Interferometer light source
JP2002163830A (ja) 2000-11-24 2002-06-07 Toshiba Corp 光学的収差を利用した光情報処理システムおよび厚みムラのある透明層で保護された記録層を持つ情報媒体
US6643024B2 (en) * 2001-05-03 2003-11-04 Zygo Corporation Apparatus and method(s) for reducing the effects of coherent artifacts in an interferometer
DE10121516A1 (de) 2001-05-03 2002-11-07 Michael Kuechel Vorrichtung und Verfahren zur Verminderung der Wirkungen kohärenter Bildfehler in einem Interferometer
JP2003161610A (ja) * 2001-11-29 2003-06-06 Satoshi Kiyono 光学式測定装置
KR100449711B1 (ko) * 2001-12-21 2004-09-22 삼성전자주식회사 오목면과 홀로그램을 가지는 비구면 측정장치 및 방법
CN1529151A (zh) * 2003-10-10 2004-09-15 清华大学 电子虚拟样板非球面检测方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004125768A (ja) * 2001-12-18 2004-04-22 Qed Technologies Inc 物体試験表面の完全アパーチャ数値データマップを合成する方法

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US20060221350A1 (en) 2006-10-05
KR20140008470A (ko) 2014-01-21
CN101268331A (zh) 2008-09-17
CN102288390A (zh) 2011-12-21
JP4917088B2 (ja) 2012-04-18
US7433057B2 (en) 2008-10-07
KR101370171B1 (ko) 2014-03-04
EP1869401A4 (en) 2013-03-20
CN101268331B (zh) 2012-02-22
CN102353522B (zh) 2014-11-05
CN102288390B (zh) 2014-11-26
EP1869401A2 (en) 2007-12-26
WO2006107985A2 (en) 2006-10-12
EP1869401B1 (en) 2016-02-03
KR101459259B1 (ko) 2014-11-12
WO2006107985A3 (en) 2008-02-14
KR20130037723A (ko) 2013-04-16
CN102353522A (zh) 2012-02-15
KR101427425B1 (ko) 2014-08-08
KR20070121663A (ko) 2007-12-27
JP2008534986A (ja) 2008-08-28
KR20140008469A (ko) 2014-01-21

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