JP4884333B2 - 電解用電極 - Google Patents
電解用電極 Download PDFInfo
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- JP4884333B2 JP4884333B2 JP2007218444A JP2007218444A JP4884333B2 JP 4884333 B2 JP4884333 B2 JP 4884333B2 JP 2007218444 A JP2007218444 A JP 2007218444A JP 2007218444 A JP2007218444 A JP 2007218444A JP 4884333 B2 JP4884333 B2 JP 4884333B2
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- JP
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- Prior art keywords
- oxide
- titanium
- iridium
- mol
- tantalum
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- 238000005868 electrolysis reaction Methods 0.000 title claims description 18
- 239000010936 titanium Substances 0.000 claims description 53
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 52
- 229910052719 titanium Inorganic materials 0.000 claims description 52
- 239000000758 substrate Substances 0.000 claims description 47
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 45
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052697 platinum Inorganic materials 0.000 claims description 20
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 20
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 16
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 16
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 15
- 229910000457 iridium oxide Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002131 composite material Substances 0.000 claims description 8
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 claims description 5
- 229910003450 rhodium oxide Inorganic materials 0.000 claims description 5
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 38
- 239000000243 solution Substances 0.000 description 35
- 239000000460 chlorine Substances 0.000 description 29
- 229910052801 chlorine Inorganic materials 0.000 description 29
- 239000010410 layer Substances 0.000 description 29
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 28
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 14
- 150000002504 iridium compounds Chemical class 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 13
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 150000003482 tantalum compounds Chemical class 0.000 description 13
- 239000007864 aqueous solution Substances 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000010304 firing Methods 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 10
- 239000011780 sodium chloride Substances 0.000 description 10
- 229910052715 tantalum Inorganic materials 0.000 description 10
- 229910052741 iridium Inorganic materials 0.000 description 9
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 9
- NGCRLFIYVFOUMZ-UHFFFAOYSA-N 2,3-dichloroquinoxaline-6-carbonyl chloride Chemical compound N1=C(Cl)C(Cl)=NC2=CC(C(=O)Cl)=CC=C21 NGCRLFIYVFOUMZ-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- -1 titanium hydride Chemical compound 0.000 description 8
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 150000003058 platinum compounds Chemical class 0.000 description 7
- 150000003284 rhodium compounds Chemical class 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 229910000048 titanium hydride Inorganic materials 0.000 description 6
- SWZKWRHUDDJXFL-UHFFFAOYSA-N [O-2].[Ta+5].[Rh+]=O.[Ir+]=O.[Pt+2] Chemical compound [O-2].[Ta+5].[Rh+]=O.[Ir+]=O.[Pt+2] SWZKWRHUDDJXFL-UHFFFAOYSA-N 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000008399 tap water Substances 0.000 description 4
- 235000020679 tap water Nutrition 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910004349 Ti-Al Inorganic materials 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- 229910004692 Ti—Al Inorganic materials 0.000 description 1
- 229910010977 Ti—Pd Inorganic materials 0.000 description 1
- QLNDFPOGZALVHH-UHFFFAOYSA-K [K].[Ir](Cl)(Cl)Cl Chemical compound [K].[Ir](Cl)(Cl)Cl QLNDFPOGZALVHH-UHFFFAOYSA-K 0.000 description 1
- MEIDELZBIGBQHQ-UHFFFAOYSA-N [Pt+2].[O-2].[Ta+5].[Ir+]=O.[O-2].[O-2].[O-2] Chemical compound [Pt+2].[O-2].[Ta+5].[Ir+]=O.[O-2].[O-2].[O-2] MEIDELZBIGBQHQ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- IXSUHTFXKKBBJP-UHFFFAOYSA-L azanide;platinum(2+);dinitrite Chemical compound [NH2-].[NH2-].[Pt+2].[O-]N=O.[O-]N=O IXSUHTFXKKBBJP-UHFFFAOYSA-L 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- GSNZLGXNWYUHMI-UHFFFAOYSA-N iridium(3+);trinitrate Chemical compound [Ir+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O GSNZLGXNWYUHMI-UHFFFAOYSA-N 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- VXNYVYJABGOSBX-UHFFFAOYSA-N rhodium(3+);trinitrate Chemical compound [Rh+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VXNYVYJABGOSBX-UHFFFAOYSA-N 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- PMTRSEDNJGMXLN-UHFFFAOYSA-N titanium zirconium Chemical compound [Ti].[Zr] PMTRSEDNJGMXLN-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Description
(a) チタン又はチタン合金よりなる電極基体と、
(b) 該電極基体上に設けられた酸化チタン層と、
(c) 該酸化チタン層上に設けられた、金属換算で、酸化イリジウム3〜30モル%と
酸化タンタル70〜97モル%の複合体からなる中間酸化物層と
(d) 該中間酸化物層上に設けられた、金属換算で、酸化ロジウム2〜35モル%、酸
化イリジウム30〜80モル%、酸化タンタル6〜35モル%及び白金12〜62
モル%の複合体、
とからなることを特徴とする電解用電極が提供される。
〜約600℃、好ましくは約450〜約550℃の範囲内の温度に加熱することによって行うことができる。その際の加熱時間は焼成すべき基体の大きさ等に応じて大体5分〜2時間程度とすることができる。この焼成によりイリジウム化合物及びタンタル化合物はそれぞれ酸化イリジウム及び酸化タンタルに変わり、中間酸化物を形成する。
JIS2種相当のチタン板素材(t1.0mm×w100mm×l100mm)をアルコールで洗浄後、20℃の8重量%フッ化水素酸水溶液中で2分間処理し、120℃の60重量%硫酸水溶液中で3分間処理した。次いで、チタン基体を硫酸水溶液から取りだし、窒素雰囲気中で冷水を噴霧し急冷した。さらに、20℃の0.3重量%フッ化水素酸水溶液中に2分間浸漬した後水洗した。水洗後、400℃の大気中で1時間加熱処理して、チタン基体表面に薄い酸化チタン層を形成せしめた。
例1〜3の溶液を作製した。
JIS2種相当のチタン板素材(t1.0mm×w100mm×l100mm)をアルコールで洗浄後、20℃の8重量%フッ化水素酸水溶液中で2分間処理し、120℃の60重量%硫酸水溶液中で3分間処理した。次いで、チタン基体を硫酸水溶液から取りだし、窒素雰囲気中で冷水を噴霧し急冷した。さらに、20℃の0.3重量%フッ化水素酸水溶液中に2分間浸漬した後水洗した。
JIS2種相当のチタン板素材(t1.0mm×w100mm×l100mm)をアルコールで洗浄し、熱シュウ酸水溶液で前処理した後、水洗した。次いで、イリジウム濃度100g/Lに調整した塩化イリジウム酸のブタノール溶液とタンタル濃度100g/Lに調整したタンタルエトキシドのブタノール溶液と白金濃度200g/Lに調整した塩化白金酸のブタノール溶液を、Ir−Ta−Ptの組成比が表−1に示すモル%となるようにそれぞれ秤量し、次いで、Ir−Ta−Ptの金属換算合計量が75g/Lとなるようにブタノールにて希釈し、表−1に示す比較例6〜8の溶液を作製した。
Claims (1)
- (a) チタン又はチタン合金よりなる電極基体と、
(b) 該電極基体上に設けられた酸化チタン層と、
(c) 該酸化チタン層上に設けられた、金属換算で、酸化イリジウム3〜30モル%と
酸化タンタル70〜97モル%の複合体からなる中間酸化物層と
(d) 該中間酸化物層上に設けられた、金属換算で、酸化ロジウム2〜35モル%、酸
化イリジウム30〜80モル%、酸化タンタル6〜35モル%及び白金12〜62
モル%の複合体、
とからなることを特徴とする電解用電極。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007218444A JP4884333B2 (ja) | 2007-08-24 | 2007-08-24 | 電解用電極 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007218444A JP4884333B2 (ja) | 2007-08-24 | 2007-08-24 | 電解用電極 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009052069A JP2009052069A (ja) | 2009-03-12 |
JP4884333B2 true JP4884333B2 (ja) | 2012-02-29 |
Family
ID=40503401
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2007218444A Active JP4884333B2 (ja) | 2007-08-24 | 2007-08-24 | 電解用電極 |
Country Status (1)
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JP (1) | JP4884333B2 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101665952B (zh) * | 2009-10-14 | 2011-05-04 | 欧派斯环保科技(北京)有限公司 | 一种钛基二氧化铑电极及其制备方法和用途 |
CN102560561A (zh) * | 2010-12-10 | 2012-07-11 | 上海太阳能工程技术研究中心有限公司 | Dsa电极及其制作方法 |
JP6106396B2 (ja) * | 2012-01-10 | 2017-03-29 | 石福金属興業株式会社 | 殺菌水生成装置 |
KR101585995B1 (ko) * | 2012-01-10 | 2016-01-22 | 이시후꾸 긴조꾸 고오교 가부시끼가이샤 | 살균수 생성장치 |
JP5886052B2 (ja) * | 2012-01-10 | 2016-03-16 | 石福金属興業株式会社 | 殺菌水生成用電極及びその製造方法 |
JP6021255B2 (ja) * | 2012-11-29 | 2016-11-09 | 石福金属興業株式会社 | 電解用電極板および電解用電極 |
JP5646677B2 (ja) * | 2012-12-07 | 2014-12-24 | 石福金属興業株式会社 | 殺菌水生成装置 |
KR101579154B1 (ko) * | 2012-12-07 | 2015-12-21 | 토토 가부시키가이샤 | 살균수 생성장치 |
WO2017043472A1 (ja) * | 2015-09-08 | 2017-03-16 | 富士フイルム株式会社 | 酸素発生用光触媒電極およびモジュール |
EP3358043A4 (en) * | 2015-09-28 | 2019-06-26 | Osaka Soda Co., Ltd. | ELECTRODE FOR CHLORINE PRODUCTION AND METHOD FOR PRODUCING THE SAME |
WO2018124195A1 (ja) * | 2016-12-28 | 2018-07-05 | Toto株式会社 | 電解水生成装置 |
CN113795612A (zh) | 2019-04-26 | 2021-12-14 | 松下知识产权经营株式会社 | 电解用电极和制造电解用电极的方法 |
JP7153887B2 (ja) | 2019-12-13 | 2022-10-17 | パナソニックIpマネジメント株式会社 | 電解用電極 |
CN113337845B (zh) * | 2020-02-17 | 2024-02-09 | 马赫内托特殊阳极(苏州)有限公司 | 一种能够极性反转的电极及其用途 |
JP7396391B2 (ja) | 2022-03-31 | 2023-12-12 | Toto株式会社 | 次亜塩素酸生成電極 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH07171571A (ja) * | 1993-12-21 | 1995-07-11 | Kobe Steel Ltd | 電解イオン水製造用電極および該電極を用いた電解イオン水の製造方法 |
JP2925938B2 (ja) * | 1994-04-04 | 1999-07-28 | 古河電気工業株式会社 | 酸素発生用電極とその製造方法 |
JP2904003B2 (ja) * | 1994-05-10 | 1999-06-14 | 株式会社日本触媒 | 廃水の電解処理法および該電解処理に使用する陽極 |
JP4975271B2 (ja) * | 2005-05-18 | 2012-07-11 | 株式会社フルヤ金属 | 電解的水処理電極 |
JP4554542B2 (ja) * | 2006-03-09 | 2010-09-29 | 石福金属興業株式会社 | 電解用電極 |
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