JP4775583B2 - 誘電体粒子集合体、それを用いた低温焼結誘電体磁器組成物及びそれを用いて製造される低温焼結誘電体磁器 - Google Patents
誘電体粒子集合体、それを用いた低温焼結誘電体磁器組成物及びそれを用いて製造される低温焼結誘電体磁器 Download PDFInfo
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
Description
2 内部導体
3 外部導体
前もって表1に示した組成比で調整し仮焼して作製したBaO−TiO2−Nd2O3系材料(誘電体母材粒子)とこの誘電体材料100重量部に対してZnOを1重量部添加したものをエタノールと共にボールミルにいれ、12時間湿式混合した。尚、表1において、BaO−TiO2−Nd2O3系材料を構成する副成分としてのBi2O3及びAl2O3の量は、BaO−TiO2−Nd2O3系材料を構成する主成分であるBaO、TiO2及びNd2O3の合計量100重量部に対する重量部で示されている。
上記実施例1と同様にして、但し表1に示した条件で作製した表面にTiとZnとの酸化物を形成した誘電体粒子集合体を用い、表1に示した組成のガラス粉末を用いて、これらを表1に示した配合比で混合し、実施例1と同一の条件でペレット形状の焼結体を作製して、実施例1と同様な方法で種々の特性を評価した。その結果を表1に示した。
上記実施例1と同様にして、但し表1に示した条件で作製した表面にTiとZnとの酸化物を形成したBaTiO3、SrTiO3からなる誘電体粒子の集合体を用い、表1に示した組成のガラス粉末を用いて、これらを表1に示した配合比で混合し、実施例1と同一の条件でペレット形状の焼結体を作製して、実施例1と同様な方法で種々の特性を評価した。その結果を表1に示した。
上記実施例1と同様にして、但しBaO−TiO2−Nd2O3材料(誘電体母材粒子)の表面にTiとZnとを含む酸化物を形成する処理を行わずに得た表1に示した組成の誘電体粒子の集合体を用い、表1に示した組成のガラス粉末を用いて、これらを表1に示した配合比で混合し、実施例1と同一の条件でペレット形状の焼結体を作製して、実施例1と同様な方法で種々の特性を評価した。その結果を表1に示した。
上記実施例12または13と同様にして、但しBaTiO3またはSrTiO3材料(誘電体母材粒子)の表面にTiとZnとを含む酸化物を形成する処理を行わずに得た誘電体粒子の集合体を用い、表1に示した組成のガラス粉末を用いて、これらを表1に示した配合比で混合し、実施例1と同一の条件でペレット形状の焼結体を作製して、実施例1と同様な方法で種々の特性を評価した。その結果を表1に示した。
上記実施例3と同様な条件で作製した表面にTiとZnとの酸化物を形成した誘電体粒子をArイオンミリングによって加工して試料を作製し、該誘電体粒子の内部を日本電子製JEM−2010F(電界放射型透過型電子顕微鏡、加速電圧200kV)で観察し、組成をNORAN製UTW型Si(Li)半導体検出器(ビーム径1nm)で評価した。その結果を図5、図6及び図7と表2とに示した。図5は、実施例3で得られた本発明にかかるTi元素を含有する誘電体母材粒子の表面にTiとZnとを含有する酸化物を形成した誘電体粒子の透過型電子顕微鏡観察写真である。また、図6及び図7は、それぞれ図5中のスポット1及び5で評価したEDSのスペクトルである。
Claims (18)
- BaO−TiO 2 −Nd 2 O 3 系誘電体またはSrTiO 3 系誘電体からなる粒子の集合体であって、
前記粒子は表層部のみにZnTiO 3 および/またはZn 2 TiO 4 を含有することを特徴とする誘電体粒子集合体。 - 前記粒子は前記表層部と該表層部以外の部分とからなり、前記表層部以外の部分はZnTiO 3 およびZn 2 TiO 4 を含有しないことを特徴とする、請求項1に記載の誘電体粒子集合体。
- 前記粒子の集合体は、BaO−TiO 2 −Nd 2 O 3 系誘電体またはSrTiO 3 系誘電体からなる誘電体母材粒子の集合体100重量部に対してZnOを0.5〜10重量部混合し、仮焼処理してなるものであることを特徴とする、請求項1または2に記載の誘電体粒子集合体。
- 前記BaO−TiO 2 −Nd 2 O 3 系誘電体は、BaOを10〜16モル%、TiO2を67〜72モル%及びNd2O3を16〜18モル%含有する主成分と、該主成分100重量部に対し副成分としてBi2O3を7〜10重量部及びAl2O3を0.3〜1.0重量部とを含有してなることを特徴とする、請求項1乃至3のいずれか一項に記載の誘電体粒子集合体。
- 前記表層部は、厚さが50nm以下であることを特徴とする、請求項1乃至4のいずれか一項に記載の誘電体粒子集合体。
- 前記表層部は、厚さが10nm以上であることを特徴とする、請求項5に記載の誘電体粒子集合体。
- 前記誘電体粒子集合体は平均粒子径が0.4μm〜3.0μmであることを特徴とする、請求項1乃至6のいずれか一項に記載の誘電体粒子集合体。
- 請求項1〜7のいずれか一項に記載の誘電体粒子集合体を製造する方法であって、BaO−TiO 2 −Nd 2 O 3 系誘電体またはSrTiO 3 系誘電体からなる誘電体母材粒子の集合体100重量部に対してZnOを0.5〜10重量部混合し、仮焼処理することを特徴とする誘電体粒子集合体の製造方法。
- 前記仮焼処理は酸素含有雰囲気下で行われることを特徴とする、請求項8に記載の誘電体粒子集合体の製造方法。
- 前記仮焼処理の温度は900〜1200℃であることを特徴とする、請求項8または9に記載の誘電体粒子集合体の製造方法。
- 請求項1〜7のいずれか一項に記載の誘電体粒子集合体100重量部に対してガラス成分を2.5〜20重量部配合してなることを特徴とする低温焼結誘電体磁器組成物。
- 前記ガラス成分は、ZnOを45〜70重量%、B2O3を5〜13重量%、SiO2を7〜40重量%、Al2O3を8〜20重量%含有してなることを特徴とする、請求項11に記載の低温焼結誘電体磁器組成物。
- 請求項1〜7のいずれか一項に記載の誘電体粒子集合体を構成する誘電体粒子100重量部とガラス成分2.5〜20重量部とからなることを特徴とする低温焼結誘電体磁器。
- 前記ガラス成分は、ZnOを45〜70重量%、B2O3を5〜13重量%、SiO2を7〜40重量%、Al2O3を8〜20重量%含有してなることを特徴とする、請求項13に記載の低温焼結誘電体磁器。
- 請求項11または12に記載の低温焼結誘電体磁器組成物を880〜1000℃で焼成する焼成工程を含むことを特徴とする、低温焼結誘電体磁器の製造方法。
- 前記ガラス成分は、ZnOを45〜70重量%、B2O3を5〜13重量%、SiO2を7〜40重量%、Al2O3を8〜20重量%含有してなることを特徴とする、請求項15に記載の低温焼結誘電体磁器の製造方法。
- 前記焼成工程は前記低温焼結誘電体磁器組成物を含む層と金属を含む層との積層体に対してなされ、これにより前記金属からなる層を内部導体とする積層構造電子部品を得ることを特徴とする、請求項15または16に記載の低温焼結誘電体磁器の製造方法。
- 前記金属からなる層はAg及びCuまたはこれらの少なくとも1つを含む合金からなることを特徴とする、請求項17に記載の低温焼結誘電体磁器の製造方法。
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JP2006510723A JP4775583B2 (ja) | 2004-03-05 | 2005-03-03 | 誘電体粒子集合体、それを用いた低温焼結誘電体磁器組成物及びそれを用いて製造される低温焼結誘電体磁器 |
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CN107176834A (zh) * | 2016-03-11 | 2017-09-19 | 上海卡翱投资管理合伙企业(有限合伙) | 中高介电常数的ltcc陶瓷材料及其制备方法 |
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JP5294441B2 (ja) * | 2006-03-30 | 2013-09-18 | 双信電機株式会社 | 電子部品 |
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KR100930184B1 (ko) * | 2007-11-29 | 2009-12-07 | 삼성전기주식회사 | 유전체 조성물 및 이를 이용한 적층 세라믹 커패시터내장형 저온동시소성 세라믹 기판 |
US7987566B2 (en) * | 2009-07-15 | 2011-08-02 | Sturzebecher Richard J | Capacitor forming method |
JP5483028B2 (ja) * | 2011-02-24 | 2014-05-07 | 株式会社村田製作所 | 粒界絶縁型半導体セラミック、半導体セラミックコンデンサ、及び半導体セラミックコンデンサの製造方法 |
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EP1724244A1 (en) | 2006-11-22 |
EP1724244A4 (en) | 2007-12-05 |
WO2005085154A1 (ja) | 2005-09-15 |
US7641970B2 (en) | 2010-01-05 |
JPWO2005085154A1 (ja) | 2007-12-06 |
EP1724244B1 (en) | 2013-07-03 |
CN100532323C (zh) | 2009-08-26 |
US20070172652A1 (en) | 2007-07-26 |
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