JP4774014B2 - ＡｌまたはＡｌ合金 - Google Patents

ＡｌまたはＡｌ合金 Download PDF

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Publication number
JP4774014B2
JP4774014B2 JP2007134503A JP2007134503A JP4774014B2 JP 4774014 B2 JP4774014 B2 JP 4774014B2 JP 2007134503 A JP2007134503 A JP 2007134503A JP 2007134503 A JP2007134503 A JP 2007134503A JP 4774014 B2 JP4774014 B2 JP 4774014B2
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JP
Japan
Prior art keywords
hardness
anodic oxide
oxide film
alloy
crack
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007134503A
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English (en)
Japanese (ja)
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JP2008285742A (ja
Inventor
淳 久本
浩司 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP2007134503A priority Critical patent/JP4774014B2/ja
Priority to PCT/JP2008/057613 priority patent/WO2008142932A1/ja
Priority to CN200880014768A priority patent/CN101680103A/zh
Priority to CN201310424558.8A priority patent/CN103540987B/zh
Priority to TW97118387A priority patent/TW200925330A/zh
Publication of JP2008285742A publication Critical patent/JP2008285742A/ja
Application granted granted Critical
Publication of JP4774014B2 publication Critical patent/JP4774014B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Coating By Spraying Or Casting (AREA)
JP2007134503A 2007-05-21 2007-05-21 ＡｌまたはＡｌ合金 Expired - Fee Related JP4774014B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007134503A JP4774014B2 (ja) 2007-05-21 2007-05-21 ＡｌまたはＡｌ合金
PCT/JP2008/057613 WO2008142932A1 (ja) 2007-05-21 2008-04-18 ＡｌまたはＡｌ合金
CN200880014768A CN101680103A (zh) 2007-05-21 2008-04-18 Al或Al合金
CN201310424558.8A CN103540987B (zh) 2007-05-21 2008-04-18 Al或Al合金
TW97118387A TW200925330A (en) 2007-05-21 2008-05-19 Al or Al-alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007134503A JP4774014B2 (ja) 2007-05-21 2007-05-21 ＡｌまたはＡｌ合金

Publications (2)

Publication Number Publication Date
JP2008285742A JP2008285742A (ja) 2008-11-27
JP4774014B2 true JP4774014B2 (ja) 2011-09-14

Family

ID=40031648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007134503A Expired - Fee Related JP4774014B2 (ja) 2007-05-21 2007-05-21 ＡｌまたはＡｌ合金

Country Status (4)

Country Link
JP (1) JP4774014B2 (zh)
CN (2) CN103540987B (zh)
TW (1) TW200925330A (zh)
WO (1) WO2008142932A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240287700A1 (en) * 2021-09-06 2024-08-29 Uacj Corporation Aluminum member for semiconductor manufacturing apparatuses, and method of manufacturing the same
CN117491375B (zh) * 2024-01-02 2024-03-22 中信戴卡股份有限公司 一种铝合金铸件氧化膜缺陷的定量表征及评价方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS506536A (zh) * 1973-05-23 1975-01-23
JPS5832977B2 (ja) * 1980-05-08 1983-07-16 東京アルミニウム工業株式会社 鍋
JPS59117675U (ja) * 1983-01-24 1984-08-08 旭可鍛鉄株式会社 アルミニウム又はその合金における陽極酸化皮膜の構造
JPH06330386A (ja) * 1993-05-20 1994-11-29 Fujikura Ltd 硬質陽極酸化皮膜の形成方法および硬質陽極酸化皮膜形成用アルミニウム合金
JP2935789B2 (ja) * 1993-06-23 1999-08-16 本田技研工業株式会社 アルミニウムまたはアルミニウム合金の着色被膜形成方法
JPH08311692A (ja) * 1995-05-17 1996-11-26 Kobe Steel Ltd 真空チャンバ用部品及びその製造方法
JPH0953196A (ja) * 1995-08-15 1997-02-25 Nikkoshi Prod Kk 電極材料と、その製造方法
JPH09176892A (ja) * 1995-12-20 1997-07-08 Ricoh Co Ltd 陽極酸化法及び装置
JP3559920B2 (ja) * 1996-07-29 2004-09-02 東京エレクトロン株式会社 プラズマ処理装置
JP3256480B2 (ja) * 1997-12-19 2002-02-12 スカイアルミニウム株式会社 耐加熱クラック性に優れた高強度Ａｌ−Ｚｎ−Ｍｇ−Ｃｕ系合金アルマイト部材およびその製造方法
JP4174888B2 (ja) * 1998-12-24 2008-11-05 アイシン精機株式会社 アルマイト皮膜
JP2002196603A (ja) * 2000-12-27 2002-07-12 Ricoh Co Ltd 薄肉定着ロール及びその製造方法
JP3855663B2 (ja) * 2001-02-15 2006-12-13 日本軽金属株式会社 耐電圧特性に優れた表面処理装置用部品
TWI223354B (en) * 2002-05-28 2004-11-01 Applied Materials Inc Clean aluminum alloy for semiconductor processing equipment
JP2004241992A (ja) * 2003-02-05 2004-08-26 Yazaki Corp 車両用電源重畳多重通信装置
US7732056B2 (en) * 2005-01-18 2010-06-08 Applied Materials, Inc. Corrosion-resistant aluminum component having multi-layer coating

Also Published As

Publication number Publication date
CN103540987A (zh) 2014-01-29
JP2008285742A (ja) 2008-11-27
TW200925330A (en) 2009-06-16
WO2008142932A1 (ja) 2008-11-27
CN101680103A (zh) 2010-03-24
CN103540987B (zh) 2017-09-22

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