JP4756102B1 - 生体適用液への選択的水素添加器具 - Google Patents
生体適用液への選択的水素添加器具 Download PDFInfo
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- 238000005984 hydrogenation reaction Methods 0.000 title claims abstract description 34
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 343
- 239000001257 hydrogen Substances 0.000 claims abstract description 306
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 306
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 163
- 238000000926 separation method Methods 0.000 claims abstract description 37
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 36
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
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- KIUKXJAPPMFGSW-DNGZLQJQSA-N (2S,3S,4S,5R,6R)-6-[(2S,3R,4R,5S,6R)-3-Acetamido-2-[(2S,3S,4R,5R,6R)-6-[(2R,3R,4R,5S,6R)-3-acetamido-2,5-dihydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-2-carboxy-4,5-dihydroxyoxan-3-yl]oxy-5-hydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-3,4,5-trihydroxyoxane-2-carboxylic acid Chemical compound CC(=O)N[C@H]1[C@H](O)O[C@H](CO)[C@@H](O)[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@H](O[C@H]2[C@@H]([C@@H](O[C@H]3[C@@H]([C@@H](O)[C@H](O)[C@H](O3)C(O)=O)O)[C@H](O)[C@@H](CO)O2)NC(C)=O)[C@@H](C(O)=O)O1 KIUKXJAPPMFGSW-DNGZLQJQSA-N 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- 125000002066 L-histidyl group Chemical group [H]N1C([H])=NC(C([H])([H])[C@](C(=O)[*])([H])N([H])[H])=C1[H] 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
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- 229940024548 aluminum oxide Drugs 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
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- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- VBRNLOQCBCPPHL-UHFFFAOYSA-N calmagite Chemical compound CC1=CC=C(O)C(N=NC=2C3=CC=CC=C3C(=CC=2O)S(O)(=O)=O)=C1 VBRNLOQCBCPPHL-UHFFFAOYSA-N 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
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- 235000015165 citric acid Nutrition 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
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- 239000004310 lactic acid Substances 0.000 description 1
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- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
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- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
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- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/06—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents
- C01B3/08—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents with metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
- C02F1/685—Devices for dosing the additives
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
- C02F1/685—Devices for dosing the additives
- C02F1/687—Devices for dosing solid compounds
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/70—Treatment of water, waste water, or sewage by reduction
- C02F1/705—Reduction by metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
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- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Health & Medical Sciences (AREA)
- Combustion & Propulsion (AREA)
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Abstract
【解決手段】水素発生剤を必須成分とする水素発生系を、ガス透過膜または開閉式の弁を含む気液分離部を有する水素気泡形成体に収容し、該水素気泡形成体内において前記水素発生系と発生用水を反応させることを通じて、該水素気泡形成体内に発生した水素ガスを、前記気液分離部を介して、生体適用液に送り込むことで水素含有生体適用液を得る。
【選択図】図1B
Description
Mg(OH)2+→Mg2++2OH− ・・・式(2)
しかしながら、水素発生反応の前後で、自然的または人口的にすでに組成されている生体適用液の成分構成を変えてしまうことは基本的に望ましいことではない。成分の変化は茶やミネラルウォーターなど生体適用液の味を変えることに繋がる。
本発明の水素発生系は、水素発生剤のほか、金属イオン封鎖剤やpH調整剤など水素発生反応を促進する剤を含んでもよい。
また、振盪時間は、高圧・高濃度水素ガスの生体適用液への溶解を促進させるため、自然的振盪で5秒以上、好ましくは10秒以上、より好ましくは15秒以上、さらに好ましくは30秒以上であることが望ましい。
a−1…笠状の頭部
a−2…軸部
a−3…突起物
b…凹状部品
b−1…中心の穴
b−2…扇状の穴
b−3…縁
Claims (9)
- 水素発生剤を必須成分とする水素発生系を、ガス透過膜または開閉式の弁を含む気液分離部を有する水素気泡形成体に収容し、該水素気泡形成体内において前記水素発生系と発生用水を反応させることを通じて、該水素気泡形成体内に発生した水素ガスを、前記気液分離部を介して、生体適用液に送り込むことで水素含有生体適用液を得ることを特徴とする、生体適用液への選択的水素添加器具において、
前記水素発生剤には、水素発生反応に伴う反応熱が前記気液分離部のガス透過膜又は開閉式の弁に直接移行することを抑制するための防熱処理が施されていることを特徴とする、生体適用液への選択的水素添加器具。 - 請求項1に記載の生体適用液への選択的水素添加器具であって、前記ガス透過膜が、水難透過性または非透過性であり、かつ、水素ガス透過性を有するガス透過膜であることにより、前記発生用水は、前記水素気泡形成体から実質的に流出しないことを特徴とする、生体適用液への選択的水素添加器具。
- 請求項1に記載の生体適用液への選択的水素添加器具であって、前記開閉式の弁は、水素発生系と発生用水の反応により水素気泡形成体の内部に発生する水素ガスのガス圧によって押し開けられることで水素ガスを水素気泡形成体の外部に排気するが排気後には閉じることを特徴とする、生体適用液への選択的水素添加器具。
- 請求項1から3のいずれか一項に記載の生体適用液への選択的水素添加器具であって、前記水素発生剤が水素よりイオン化傾向の高い金属または水素化金属の粒子を含み、かつ、前記防熱処理が該粒子を被覆材で覆うことであることを特徴とする、生体適用液への選択的水素添加器具。
- 請求項1から3のいずれか一項に記載の生体適用液への選択的水素添加器具であって、前記水素発生剤が水素よりイオン化傾向の高い金属または水素化金属の粒子を含み、かつ、前記防熱処理が該粒子を固形化することであることを特徴とする、生体適用液への選択的水素添加器具。
- 請求項1から3のいずれか一項に記載の生体適用液への選択的水素添加器具であって、前記水素発生剤が水素よりイオン化傾向の高い金属または水素化金属の粒子を含み、かつ、前記防熱処理が水素発生反応に伴う副生成物の生成を通じて耐火層を形成することであることを特徴とする、生体適用液への選択的水素添加器具。
- 請求項6に記載の生体適用液への選択的水素添加器具であって、前記耐火層がアルミナセメントであることを特徴とする、生体適用液への選択的水素添加器具。
- 請求項1から7のいずれか一項に記載の生体適用液への選択的水素添加器具であって、前記水素発生系が、さらにpH調整剤を含むことを特徴とする、生体適用液への選択的水素添加器具。
- 請求項1から8のいずれか一項に記載の生体適用液への選択的水素添加器具であって、前記水素気泡形成体が、さらに生体適用液の水温を遮断するための外殻に覆われていることを特徴とする、生体適用液への選択的水素添加器具。
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