JP4741821B2 - 皮脂テカリ防止に好適な皮膚外用剤 - Google Patents

皮脂テカリ防止に好適な皮膚外用剤 Download PDF

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Publication number
JP4741821B2
JP4741821B2 JP2004248554A JP2004248554A JP4741821B2 JP 4741821 B2 JP4741821 B2 JP 4741821B2 JP 2004248554 A JP2004248554 A JP 2004248554A JP 2004248554 A JP2004248554 A JP 2004248554A JP 4741821 B2 JP4741821 B2 JP 4741821B2
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sebum
cosmetic
acid
mass
present
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Japanese (ja)
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JP2006063032A (ja
JP2006063032A5 (https=
Inventor
顕吉 松原
匡人 瀬戸
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Pola Orbis Holdings Inc
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Pola Chemical Industries Inc
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JP2004248554A 2004-08-27 2004-08-27 皮脂テカリ防止に好適な皮膚外用剤 Expired - Fee Related JP4741821B2 (ja)

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JP2004248554A JP4741821B2 (ja) 2004-08-27 2004-08-27 皮脂テカリ防止に好適な皮膚外用剤

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JP2004248554A JP4741821B2 (ja) 2004-08-27 2004-08-27 皮脂テカリ防止に好適な皮膚外用剤

Publications (3)

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JP2006063032A JP2006063032A (ja) 2006-03-09
JP2006063032A5 JP2006063032A5 (https=) 2007-05-31
JP4741821B2 true JP4741821B2 (ja) 2011-08-10

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JP2004248554A Expired - Fee Related JP4741821B2 (ja) 2004-08-27 2004-08-27 皮脂テカリ防止に好適な皮膚外用剤

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5107560B2 (ja) * 2006-11-22 2012-12-26 日本精化株式会社 シクロヘキサンジカルボン酸ジエステル及びこれを含有する化粧料又は皮膚外用剤
CN104066421B (zh) * 2012-01-20 2017-11-14 花王株式会社 化妆品组合物
CN108366953B (zh) 2015-10-30 2021-12-21 株式会社资生堂 组合物
JP7665510B2 (ja) * 2019-05-07 2025-04-21 ナガセヴィータ株式会社 ゲル状皮膚外用組成物

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05331066A (ja) * 1992-05-25 1993-12-14 Toko Yakuhin Kogyo Kk 尋常性ざ瘡治療用組成物
JPH08104610A (ja) * 1994-10-05 1996-04-23 Shiseido Co Ltd 洗顔料
JPH09255523A (ja) * 1996-03-25 1997-09-30 Shiseido Co Ltd 化粧料
JPH09255531A (ja) * 1996-03-27 1997-09-30 Shiseido Co Ltd 洗顔料
FR2787322B1 (fr) * 1998-12-18 2002-10-18 Galderma Res & Dev Emulsion huile-dans-eau comprenant un agent actif micronise et un systeme emulsionnant approprie
JP3524445B2 (ja) * 1999-09-17 2004-05-10 カネボウ株式会社 清涼剤組成物
JP2001247433A (ja) * 2000-03-07 2001-09-11 Pola Chem Ind Inc 頭部用の化粧料及び化粧料セット
JP2001278772A (ja) * 2000-03-30 2001-10-10 Shiseido Co Ltd 皮膚外用剤
JP2002047122A (ja) * 2000-08-01 2002-02-12 Shiseido Co Ltd 化粧料
JP2002114624A (ja) * 2000-08-01 2002-04-16 Shiseido Co Ltd 化粧料
JP2002114665A (ja) * 2000-10-04 2002-04-16 Fancl Corp 皮脂コントロール化粧料
JP2002187811A (ja) * 2000-12-20 2002-07-05 Pola Chem Ind Inc テカリ防止用の化粧料
JP2002348214A (ja) * 2001-05-25 2002-12-04 Kose Corp 毛穴隠し用水中油型乳化化粧料
JP4807867B2 (ja) * 2001-06-07 2011-11-02 信越化学工業株式会社 オルガノポリシロキサン粉体処理剤及びそれを用いて処理された表面処理粉体、並びにこの表面処理粉体を含有する化粧料
JP4045108B2 (ja) * 2002-03-08 2008-02-13 花王株式会社 シート状化粧料
JP2004169015A (ja) * 2002-11-01 2004-06-17 Shin Etsu Chem Co Ltd 粉体組成物及び油中粉体分散物.並びにそれらを有する化粧料
JP2004285016A (ja) * 2003-03-24 2004-10-14 Kose Corp 凹凸補正化粧料

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