JP4720051B2 - 窒化物系iii−v族化合物半導体基板およびその製造方法ならびに半導体発光素子の製造方法ならびに半導体装置の製造方法 - Google Patents

窒化物系iii−v族化合物半導体基板およびその製造方法ならびに半導体発光素子の製造方法ならびに半導体装置の製造方法 Download PDF

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JP4720051B2
JP4720051B2 JP2001273245A JP2001273245A JP4720051B2 JP 4720051 B2 JP4720051 B2 JP 4720051B2 JP 2001273245 A JP2001273245 A JP 2001273245A JP 2001273245 A JP2001273245 A JP 2001273245A JP 4720051 B2 JP4720051 B2 JP 4720051B2
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layer
substrate
gan
nitride
compound semiconductor
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JP2003081697A (ja
JP2003081697A5 (enExample
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修 後藤
信一 安齋
博 中島
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Sony Corp
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  • Semiconductor Lasers (AREA)
JP2001273245A 2001-09-10 2001-09-10 窒化物系iii−v族化合物半導体基板およびその製造方法ならびに半導体発光素子の製造方法ならびに半導体装置の製造方法 Expired - Fee Related JP4720051B2 (ja)

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JP2003081697A5 JP2003081697A5 (enExample) 2008-09-18
JP4720051B2 true JP4720051B2 (ja) 2011-07-13

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* Cited by examiner, † Cited by third party
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JP5103014B2 (ja) * 2003-05-21 2012-12-19 サン−ゴバン クリストー エ デテクトゥール マスクを通るラテラル成長による窒化ガリウム基板の製造
JP2006344930A (ja) * 2005-04-07 2006-12-21 Showa Denko Kk Iii族窒化物半導体素子の製造方法
KR20060131327A (ko) * 2005-06-16 2006-12-20 엘지전자 주식회사 발광 다이오드의 제조 방법
JP2007214257A (ja) * 2006-02-08 2007-08-23 Rohm Co Ltd 半導体発光素子およびその製造方法
JP5192785B2 (ja) * 2007-11-21 2013-05-08 新日本無線株式会社 窒化物半導体装置の製造方法
WO2025115743A1 (ja) * 2023-11-30 2025-06-05 京セラ株式会社 半導体基板並びにその製造方法および製造装置、半導体デバイス

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JPS63319294A (ja) * 1987-06-19 1988-12-27 Sharp Corp 炭化珪素単結晶基板の製造方法
JP3678061B2 (ja) * 1999-05-21 2005-08-03 日亜化学工業株式会社 窒化物半導体の成長方法及び窒化物半導体素子

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