JP4690686B2 - Ｅｕｖ源 - Google Patents

Ｅｕｖ源 Download PDF

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Publication number
JP4690686B2
JP4690686B2 JP2004272681A JP2004272681A JP4690686B2 JP 4690686 B2 JP4690686 B2 JP 4690686B2 JP 2004272681 A JP2004272681 A JP 2004272681A JP 2004272681 A JP2004272681 A JP 2004272681A JP 4690686 B2 JP4690686 B2 JP 4690686B2
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JP
Japan
Prior art keywords
radiation
radiation source
irradiation
euv
chamber
Prior art date
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Expired - Fee Related
Application number
JP2004272681A
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English (en)
Japanese (ja)
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JP2005108834A5 (enExample
JP2005108834A (ja
Inventor
ブノワ・バルトツド
ジヤン−リユツク・リバル
マテユー・モルパン
Original Assignee
アルカテル−ルーセント
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
JP2004272681A 2003-09-26 2004-09-21 Ｅｕｖ源 Expired - Fee Related JP4690686B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0311280 2003-09-26
FR0311280A FR2860385B1 (fr) 2003-09-26 2003-09-26 Source euv

Publications (3)

Publication Number Publication Date
JP2005108834A JP2005108834A (ja) 2005-04-21
JP2005108834A5 JP2005108834A5 (enExample) 2011-02-24
JP4690686B2 true JP4690686B2 (ja) 2011-06-01

Family

ID=34307180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004272681A Expired - Fee Related JP4690686B2 (ja) 2003-09-26 2004-09-21 Ｅｕｖ源

Country Status (6)

Country Link
US (1) US7095038B2 (enExample)
EP (1) EP1528846B1 (enExample)
JP (1) JP4690686B2 (enExample)
AT (1) ATE453309T1 (enExample)
DE (1) DE602004024754D1 (enExample)
FR (1) FR2860385B1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7034320B2 (en) * 2003-03-20 2006-04-25 Intel Corporation Dual hemispherical collectors
JP2005190904A (ja) * 2003-12-26 2005-07-14 Ushio Inc 極端紫外光源
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
DE602007010765D1 (de) 2006-05-16 2011-01-05 Philips Intellectual Property Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US20110024651A1 (en) * 2007-11-08 2011-02-03 Asml Netherlands B.V. Radiation system and method, and a spectral purity filter
EP2083328B1 (en) * 2008-01-28 2013-06-19 Media Lario s.r.l. Grazing incidence collector for laser produced plasma sources
EP2182412A1 (en) * 2008-11-04 2010-05-05 ASML Netherlands B.V. Radiation source and lithographic apparatus
US8330131B2 (en) * 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
WO2012177900A1 (en) 2011-06-22 2012-12-27 Research Triangle Institute, International Bipolar microelectronic device
US20150097107A1 (en) * 2012-03-20 2015-04-09 Fst Inc. Apparatus for generating extreme ultraviolet light using plasma
US9753383B2 (en) 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
US10880979B2 (en) 2015-11-10 2020-12-29 Kla Corporation Droplet generation for a laser produced plasma light source
US10021773B2 (en) 2015-11-16 2018-07-10 Kla-Tencor Corporation Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
US9918375B2 (en) * 2015-11-16 2018-03-13 Kla-Tencor Corporation Plasma based light source having a target material coated on a cylindrically-symmetric element
KR102024760B1 (ko) * 2018-01-18 2019-09-25 한국원자력연구원 빔집속장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01137543A (ja) * 1987-11-24 1989-05-30 Fujitsu Ltd レーザ励起ｘ線発生装置
JPH0837096A (ja) * 1994-07-26 1996-02-06 Nikon Corp Ｘ線発生装置
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6541786B1 (en) * 1997-05-12 2003-04-01 Cymer, Inc. Plasma pinch high energy with debris collector
JP2000089000A (ja) * 1998-09-14 2000-03-31 Nikon Corp Ｘ線発生装置
DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
US6304630B1 (en) * 1999-12-24 2001-10-16 U.S. Philips Corporation Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit
JP4351413B2 (ja) * 2002-03-05 2009-10-28 望月 孝晏 レーザプラズマｘ線発生装置
DE10251435B3 (de) * 2002-10-30 2004-05-27 Xtreme Technologies Gmbh Strahlungsquelle zur Erzeugung von extrem ultravioletter Strahlung

Also Published As

Publication number Publication date
DE602004024754D1 (de) 2010-02-04
EP1528846B1 (fr) 2009-12-23
US20050072942A1 (en) 2005-04-07
EP1528846A3 (fr) 2005-06-08
FR2860385A1 (fr) 2005-04-01
US7095038B2 (en) 2006-08-22
EP1528846A2 (fr) 2005-05-04
ATE453309T1 (de) 2010-01-15
FR2860385B1 (fr) 2007-06-01
JP2005108834A (ja) 2005-04-21

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