ATE453309T1 - Euv-quelle - Google Patents

Euv-quelle

Info

Publication number
ATE453309T1
ATE453309T1 AT04292256T AT04292256T ATE453309T1 AT E453309 T1 ATE453309 T1 AT E453309T1 AT 04292256 T AT04292256 T AT 04292256T AT 04292256 T AT04292256 T AT 04292256T AT E453309 T1 ATE453309 T1 AT E453309T1
Authority
AT
Austria
Prior art keywords
radiation
chamber
turbomolecular pumps
source
diaphragm
Prior art date
Application number
AT04292256T
Other languages
English (en)
Inventor
Benoit Barthod
Jean-Luc Rival
Matthieu Morpain
Original Assignee
Alcatel Lucent
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel Lucent filed Critical Alcatel Lucent
Application granted granted Critical
Publication of ATE453309T1 publication Critical patent/ATE453309T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
AT04292256T 2003-09-26 2004-09-20 Euv-quelle ATE453309T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0311280A FR2860385B1 (fr) 2003-09-26 2003-09-26 Source euv

Publications (1)

Publication Number Publication Date
ATE453309T1 true ATE453309T1 (de) 2010-01-15

Family

ID=34307180

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04292256T ATE453309T1 (de) 2003-09-26 2004-09-20 Euv-quelle

Country Status (6)

Country Link
US (1) US7095038B2 (de)
EP (1) EP1528846B1 (de)
JP (1) JP4690686B2 (de)
AT (1) ATE453309T1 (de)
DE (1) DE602004024754D1 (de)
FR (1) FR2860385B1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7034320B2 (en) * 2003-03-20 2006-04-25 Intel Corporation Dual hemispherical collectors
JP2005190904A (ja) * 2003-12-26 2005-07-14 Ushio Inc 極端紫外光源
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
ATE489839T1 (de) 2006-05-16 2010-12-15 Koninkl Philips Electronics Nv Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
CN101849212A (zh) * 2007-11-08 2010-09-29 Asml荷兰有限公司 辐射系统和方法以及光谱纯度滤光片
EP2083328B1 (de) * 2008-01-28 2013-06-19 Media Lario s.r.l. Kollektor für streifenden Strahlungseinfall geeignet für lasererzeugte Plasmaquellen
EP2182412A1 (de) * 2008-11-04 2010-05-05 ASML Netherlands B.V. Strahlungsquelle und lithografische Vorrichtung
US8330131B2 (en) * 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
WO2012177900A1 (en) 2011-06-22 2012-12-27 Research Triangle Institute, International Bipolar microelectronic device
US20150097107A1 (en) * 2012-03-20 2015-04-09 Fst Inc. Apparatus for generating extreme ultraviolet light using plasma
NL2010965A (en) 2012-06-22 2013-12-24 Asml Netherlands Bv Radiation source and lithographic apparatus.
US10880979B2 (en) 2015-11-10 2020-12-29 Kla Corporation Droplet generation for a laser produced plasma light source
US10021773B2 (en) 2015-11-16 2018-07-10 Kla-Tencor Corporation Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
US9918375B2 (en) * 2015-11-16 2018-03-13 Kla-Tencor Corporation Plasma based light source having a target material coated on a cylindrically-symmetric element
KR102024760B1 (ko) * 2018-01-18 2019-09-25 한국원자력연구원 빔집속장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01137543A (ja) * 1987-11-24 1989-05-30 Fujitsu Ltd レーザ励起ｘ線発生装置
JPH0837096A (ja) * 1994-07-26 1996-02-06 Nikon Corp Ｘ線発生装置
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6541786B1 (en) * 1997-05-12 2003-04-01 Cymer, Inc. Plasma pinch high energy with debris collector
JP2000089000A (ja) * 1998-09-14 2000-03-31 Nikon Corp Ｘ線発生装置
DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
US6304630B1 (en) * 1999-12-24 2001-10-16 U.S. Philips Corporation Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit
JP4351413B2 (ja) * 2002-03-05 2009-10-28 望月 孝晏 レーザプラズマｘ線発生装置
DE10251435B3 (de) * 2002-10-30 2004-05-27 Xtreme Technologies Gmbh Strahlungsquelle zur Erzeugung von extrem ultravioletter Strahlung

Also Published As

Publication number Publication date
US20050072942A1 (en) 2005-04-07
JP2005108834A (ja) 2005-04-21
FR2860385B1 (fr) 2007-06-01
FR2860385A1 (fr) 2005-04-01
EP1528846A2 (de) 2005-05-04
EP1528846A3 (de) 2005-06-08
EP1528846B1 (de) 2009-12-23
JP4690686B2 (ja) 2011-06-01
US7095038B2 (en) 2006-08-22
DE602004024754D1 (de) 2010-02-04

Similar Documents

Publication Publication Date Title
FR2860385B1 (fr) Source euv
ATE417674T1 (de) Mobiles hochdruckreinigungsgerät
ATE222125T1 (de) Tragbarer, keimtötender luftfilter
WO2008057441A3 (en) Water disinfection apparatus
IL161731A (en) Ultraviolet disinfecting apparatus
TW200725156A (en) Portable projector with heat dissipating system
ATE494532T1 (de) Luftspülsystem für einen optischen sensor
ATE511864T1 (de) Klimaanlage
DE502004006158D1 (de) Lichtpolymerisationsgerät mit Gebläse
ATE442527T1 (de) Seitenkanalverdichter
DE50208481D1 (de) Projektionsanordnung für ein Kraftfahrzeug
ATE340398T1 (de) Ultraschallwandleranordnung mit massering zur dämpfung störender resonanzen
SE9804475D0 (sv) Luftrenare
NO20051425D0 (no) Lyslederanviser
DE60204629D1 (de) Membranpumpe und damit ausgerüsteter Behälter
ATE380976T1 (de) Leuchtkörper
DE10336273A1 (de) Vorrichtung zur Erzeugung von EUV- und weicher Röntgenstrahlung
DE502006007469D1 (de) Vorrichtung zum Einziehen von Materialbahnen
FI20035204A0 (fi) Ääniloukku
DE60302445D1 (de) Einrichtung zur erzeugung von röntgenstrahlen mit einer flüssigmetallanode
DK1510764T3 (da) Ventilationsindretning og fremgangsmåde til drift heraf
FR3093165B1 (fr) Refroidisseur adiabatique
ATE345468T1 (de) Leuchte mit rohrförmiger gasentladungslampe
SE0203426D0 (sv) Anordning för passiv gassampling
DE50308786D1 (de) Gaslaserresonator

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties