JP7454561B2 - Euv光源中の放射源材料の汚染を軽減するための装置及び方法 - Google Patents
Euv光源中の放射源材料の汚染を軽減するための装置及び方法 Download PDFInfo
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
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- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
[0001] 本出願は、2018年10月22日に出願されAPPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATERIAL IN AN EUV LIGHT SOURCEと題される米国特許出願第62/748,735号(その全体が参照により本明細書に援用される)の優先権を主張する。
[0042] R1=H*が発生の比率(これは一般に、特定のEUV強度及びH2圧の場合に比較的一定となる)
[0043] R2=H*が到達する比率(容器中の他の箇所から対象の領域まで)
[0044] R3=H*が溶融スズに入る正味の比率
[0045] R4=容器の壁の上でH*が再結合する比率
[0046] R5=ラジカル間の衝突のためにH*が再結合する比率
[0047] R6=H*が圧送される比率。
[0056] CH4+H*=CH3 *+H2。
[0058] Sn+4CH3 *=Sn(CH3)4。
1.EUV放射発生させる装置であって:
容器と;
容器内に配置される集光ミラーであって、光軸と、容器中及び光軸上に位置する主焦点と、光軸上の中間焦点とを有する集光ミラーと;
少なくとも1つの排出口であって、主焦点と中間焦点との間の光軸上の第1の位置のそばの容器の側壁中に配置される少なくとも1つの排出口と;
少なくとも1つのインレットであって、水素ラジカルと結合するガスの供給源と流体連通して配置され、中間焦点と第1の位置との間の光軸上の第2の位置のそばの側壁中に配置されるように適合した少なくとも1つのインレットと、
を含む、装置。
容器と;
容器内に配置される集光ミラーであって、光軸と、容器中及び光軸上に位置する主焦点と、光軸上の中間焦点とを有する集光ミラーと;
少なくとも1つの排出口であって、主焦点と中間焦点との間の光軸上の第1の位置のそばの容器の側壁中に配置される少なくとも1つの排出口と;
少なくとも1つのインレットであって、水素ラジカルと結合するガスの供給源と流体連通して配置され、主焦点よりも排出口に近い側壁中に配置されるように適合した少なくとも1つのインレットと、
を含む、装置。
水素ラジカルとの反応に関与させるために活性ガスを上記領域中に導入し、上記領域では水素ラジカルが消費されるステップと、
上記領域と主焦点との間の位置で容器から活性ガスと反応生成物とを排出するステップと、を含む方法。
Claims (15)
- 溶融ターゲット材料及び水素ガスが供給される容器と、
前記容器内に配置された集光ミラーであって、光軸と、前記容器中及び前記光軸上に位置する主焦点と、前記光軸上の中間焦点とを有する集光ミラーと、
前記容器内に供給された溶融ターゲット材料にレーザ放射を照射するレーザ放射源と、
前記主焦点と前記中間焦点との間の前記光軸上の第1の位置の近傍の前記容器の側壁中に配置された少なくとも1つの排出口と、
水素ラジカルと結合するガスの供給源と流体連通して配置された少なくとも1つのインレットであって、前記中間焦点と前記第1の位置との間の前記光軸上の第2の位置の近傍の前記側壁中に配置された少なくとも1つのインレットと、
を含む、EUV放射を発生させる装置。 - 前記ガスが酸素を含む、請求項1に記載の装置。
- 前記ガスが分子酸素を含む、請求項2に記載の装置。
- 前記ガスが酸素ラジカルを含む、請求項2に記載の装置。
- 前記ガスがメタンを含む、請求項1に記載の装置。
- 前記ガスが、CO、CO2、ハロゲン、アセトン蒸気、H2S、NO2、N2、NH3、H2O、ヒドラジン、及びNF3の中の1つの分子を含む、請求項1に記載の装置。
- 前記ガスが、CO、CO2、ハロゲン、アセトン蒸気、H2S、NO2、N2、NH3、H2O、ヒドラジン、及びNF3の中の1つのラジカルを含む、請求項1に記載の装置。
- 溶融ターゲット材料及び水素ガスが供給される容器と、
前記容器内に配置された集光ミラーであって、光軸と、前記容器中及び前記光軸上に位置する主焦点と、前記光軸上の中間焦点とを有する集光ミラーと、
前記容器内に供給された溶融ターゲット材料にレーザ放射を照射するレーザ放射源と、
前記主焦点と前記中間焦点との間の前記光軸上の第1の位置の近傍の前記容器の側壁中に配置された少なくとも1つの排出口と、
水素ラジカルと結合するガスの供給源と流体連通して配置された少なくとも1つのインレットであって、前記主焦点よりも排出口に近い前記側壁中に配置された少なくとも1つのインレットと、
を含む、EUV放射を発生させる装置。 - 前記ガスが酸素を含む、請求項8に記載の装置。
- 前記ガスがメタンを含む、請求項8に記載の装置。
- 前記ガスが、CO、CO2、ハロゲン、アセトン蒸気、H2S、NO2、N2、NH3、H2O、ヒドラジン、及びNF3の中の1つのラジカルを含む、請求項8に記載の装置。
- 前記ガスの分圧が約10E-4mbar~約10E-2mbarの範囲内である、請求項8に記載の装置。
- 溶融ターゲット材料及び水素ガスが供給される容器中に反射光学素子を有するEUV放射源中の容器中のある領域中の水素ラジカルの分圧を低下させる方法であって、前記反射光学素子が主焦点を有し、
前記方法が、
水素ラジカルとの反応に関与させるために活性ガスを前記領域中に導入し、前記領域では前記水素ラジカルが消費されるステップと、
上記領域と主焦点との間の位置で前記容器から活性ガスと反応生成物とを排出するステップと、
を含む方法。 - 前記活性ガスが酸素を含む、請求項13に記載の方法。
- 前記活性ガスがメタンを含む、請求項13に記載の方法。
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US201862748735P | 2018-10-22 | 2018-10-22 | |
US62/748,735 | 2018-10-22 | ||
PCT/US2019/057256 WO2020086478A1 (en) | 2018-10-22 | 2019-10-21 | Apparatus for and method of reducing contamination from source material in an euv light source |
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JP7454561B2 true JP7454561B2 (ja) | 2024-03-22 |
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NL2022644A (en) | 2018-03-05 | 2019-09-10 | Asml Netherlands Bv | Prolonging optical element lifetime in an euv lithography system |
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JP2008108945A (ja) | 2006-10-26 | 2008-05-08 | Ushio Inc | 極端紫外光光源装置 |
JP2018500601A (ja) | 2014-12-16 | 2018-01-11 | ケーエルエー−テンカー コーポレイション | プラズマベース光源 |
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US11874608B2 (en) | 2024-01-16 |
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US20210325791A1 (en) | 2021-10-21 |
NL2024042A (en) | 2020-05-07 |
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