JP4634005B2 - 半導体処理装置の窒化ホウ素とイットリアとの複合材料の構成部品及びその製造方法 - Google Patents
半導体処理装置の窒化ホウ素とイットリアとの複合材料の構成部品及びその製造方法 Download PDFInfo
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- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims description 47
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 title claims description 43
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
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- C—CHEMISTRY; METALLURGY
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
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Description
1.発明の分野
本発明は、半導体処理装置及びその構成部品の耐食性を向上させる方法に関する。
半導体処理の分野では、エッチング又は成膜ガスを真空チャンバに供給し、RF電界をガスに印加してガスをプラズマ状態に活性化することによる、基板上の材料のエッチング及び化学気相成長法(CVD)のための真空処理チャンバが一般的に用いられている。平行平板の例としては、誘導結合プラズマ(ICP)とも呼ばれる変圧器結合プラズマ(TCP(登録商標))、電子サイクロトロン共鳴(ECR)反応器及びそれらの構成部品が、本願と同じ出願人による米国特許第4,340,462号、同4,948,458号、同5,200,232号及び同5,820,723号に開示されている。このような反応室内のプラズマ環境の腐食性及びパーティクル及び/又は重金属汚染を最小化するための条件のため、このような装置の構成部品は、高い耐食性を示すことが強く望まれる。
本発明の第1の側面によれば、耐食性の窒化ホウ素とイットリアとの複合材料を含む被膜を半導体処理装置の構成部品の表面上に提供するための処理を含む。この処理は、外側に耐食性の表面を形成するために、窒化ホウ素とイットリアとの複合材料を含む被膜を処理装置の構成部品の表面上に成膜する工程を含む。耐食性の表面に関しては、プラズマチャンバガスによる被膜の侵食を阻止する一方で、プラズマチャンバガスの腐食効果から下層の材料を保護する表面被膜を意味する。処理装置の構成部品の被覆すべき下層表面は、好適な材料である陽極酸化アルミを含む金属、セラミック又はポリマー材料で構成されうる。
本発明は、例えば、耐食性の被膜を利用することによって、プラズマ処理チャンバの部分等の半導体処理装置の構成部品の金属、セラミック、ポリマー表面に対して耐食性をもたらすのに効果的な方法を提供する。このような構成部品は、チャンバ壁、基板支持体、ガス供給システムであって、シャワーヘッド、バッフル、リング、ノズル等を含むガス供給システム、ファスナー、発熱体、プラズマスクリーン、ライナー、搬送モジュール構成部品、例えば、ロボットアーム、ファスナー、チャンバの内壁及び外壁等の部品等、などを含む。
Claims (22)
- プラズマ及び腐食性ガスの少なくとも一方に晒される、半導体処理装置の構成部品の表面を被覆する処理方法であって、
半導体処理装置の構成部品の表面の上に、粗面化された第1の中間被膜を成膜する工程と、
前記粗面化された第1の中間被膜の上に第2の中間被膜を成膜する工程と、
耐食性の外面を形成するために、前記第2の中間被膜の上に窒化ホウ素とイットリアとの複合材料を含有する被膜を成膜する工程と、を含み、
前記イットリアは、前記複合材料の重量で60〜80%を占め、前記窒化ホウ素は、前記複合材料の重量で20〜40%を占める、
ことを特徴とする被覆処理方法。 - 前記構成部品の前記表面は、金属、セラミック又はポリマー表面を含むことを特徴とする請求項1に記載の被覆処理方法。
- 前記表面は、陽極酸化アルミウムであることを特徴とする請求項2に記載の被覆処理方法。
- 前記第1の中間被膜は、金属、セラミック又はポリマー被膜を含むことを特徴とする請求項1に記載の被覆処理方法。
- 前記構成部品は、プラズマエッチングチャンバのチャンバ壁を含むことを特徴とする請求項1に記載の被覆処理方法。
- 窒化ホウ素とイットリアとの複合材料を含有する前記被膜は、立方晶相、六方晶相又はそれの混合体を含むことを特徴とする請求項1に記載の被覆処理方法。
- 窒化ホウ素とイットリアとの複合材料を含有する前記被膜は、窒化ホウ素又はイットリアの他に少なくとも1つの材料を含むことを特徴とする請求項1に記載の被覆処理方法。
- 前記他の材料は、金属、セラミック又はポリマーであることを特徴とする請求項7に記載の被覆処理方法。
- 前記他の材料は、ジルコニアを含むことを特徴とする請求項8に記載の被覆処理方法。
- 前記他の材料は、炭化チタン、ホウ化チタン、窒化チタン、炭化ケイ素、ホウ化ケイ素、窒化ケイ素又はこれらの混合物を含むことを特徴とする請求項8に記載の被覆処理方法。
- 窒化ホウ素とイットリアとの複合材料を含有する前記被膜は、化学気相成長法、プラズマ溶射、昇華、レーザ蒸発、スパッタリング、イオンビーム蒸着、熱溶射、浸漬被覆、蒸発被覆、ロールオン被覆又はブラシ被膜によって成膜されることを特徴とする請求項1に記載の被覆処理方法。
- 半導体処理装置の被覆された構成部品であって、
表面と、
前記表面の上の、粗面化された第1の中間被膜と、
前記粗面化された第1の中間被膜の上の第2の中間被膜と、
前記第2の中間被膜を覆って耐侵食性の外面を形成する窒化ホウ素とイットリアとの複合材料を含有する被膜と、
を備え、
窒化ホウ素とイットリアとの複合材料を含有する前記被膜は、前記装置内でプラズマ及び腐食性ガスの少なくとも一方に晒され、
前記イットリアは、前記複合材料の重量で60〜80%を占め、前記窒化ホウ素は、前記複合材料の重量で20〜40%を占める、
ことを特徴とする半導体装置の構成部品。 - 前記表面は、金属、セラミック又はポリマー表面であることを特徴とする請求項12に記載の構成部品。
- 前記表面は、陽極酸化アルミニウムであることを特徴とする請求項13に記載の構成部品。
- 前記構成部品は、プラズマエッチングチャンバのチャンバ壁を含むことを特徴とする請求項12に記載の構成部品。
- 窒化ホウ素とイットリアとの複合材料を含有する前記被膜は、立方晶相、六方晶相又はその混合体を含むことを特徴とする請求項12に記載の構成部品。
- 窒化ホウ素とイットリアとの複合材料を含有する前記被膜は、窒化ホウ素又はイットリアの他に少なくとも1つの材料を含むことを特徴とする請求項12に記載の構成部品。
- 前記少なくとも1つの材料は、金属、セラミック又はポリマーの少なくとも1つであることを特徴とする請求項17に記載の構成部品。
- 前記少なくとも1つの材料は、ジルコニアであることを特徴とする請求項18に記載の構成部品。
- 前記少なくとも1つの材料は、炭化チタン、ホウ化チタン、窒化チタン、炭化ケイ素、ホウ化ケイ素、窒化ケイ素又はこれらの混合物を含むことを特徴とする請求項18に記載の構成部品。
- 半導体処理装置の被覆された構成部品であって、
表面と、
前記表面の上の、粗面化された第1の中間被膜と、
前記粗面化された第1の中間被膜の上の第2の中間被膜と、
前記第2の中間被膜を覆って耐侵食性の外面を形成する窒化ホウ素とイットリアとの複合材料を含有する被膜と、
を備え、
前記窒化ホウ素又はイットリアは、窒化ホウ素とイットリアとの複合材料を含有する被膜内で連続マトリックス相を形成し、窒化ホウ素とイットリアとの複合材料を含有する前記被膜は、前記装置内でプラズマ及び腐食性ガスの少なくとも一方に晒され、
前記イットリアは、前記複合材料の重量で60〜80%を占め、前記窒化ホウ素は、前記複合材料の重量で20〜40%を占める、
ことを特徴とする半導体装置の構成部品。 - 窒化ホウ素とイットリアとの複合材料を含有する前記被膜は、前記装置内のプラズマに晒された少なくとも25.4μmの厚さの表面を形成することを特徴とする請求項21に記載の構成部品。
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PCT/US2001/043836 WO2002053799A1 (en) | 2000-12-29 | 2001-11-23 | Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
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US6533910B2 (en) * | 2000-12-29 | 2003-03-18 | Lam Research Corporation | Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
-
2000
- 2000-12-29 US US09/749,924 patent/US6613442B2/en not_active Expired - Lifetime
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2001
- 2001-11-23 WO PCT/US2001/043836 patent/WO2002053799A1/en active Application Filing
- 2001-11-23 CN CN018215572A patent/CN1484712B/zh not_active Expired - Fee Related
- 2001-11-23 JP JP2002554295A patent/JP4634005B2/ja not_active Expired - Fee Related
- 2001-11-23 EP EP01995199A patent/EP1364075A1/en not_active Withdrawn
- 2001-11-23 KR KR1020037008515A patent/KR100830068B1/ko not_active IP Right Cessation
- 2001-12-04 TW TW090130001A patent/TW533494B/zh not_active IP Right Cessation
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Also Published As
Publication number | Publication date |
---|---|
US20020086554A1 (en) | 2002-07-04 |
TW533494B (en) | 2003-05-21 |
US6613442B2 (en) | 2003-09-02 |
KR20030066756A (ko) | 2003-08-09 |
CN1484712A (zh) | 2004-03-24 |
WO2002053799A1 (en) | 2002-07-11 |
JP2004523649A (ja) | 2004-08-05 |
EP1364075A1 (en) | 2003-11-26 |
KR100830068B1 (ko) | 2008-05-16 |
US20040137147A1 (en) | 2004-07-15 |
US6773751B2 (en) | 2004-08-10 |
CN1484712B (zh) | 2010-04-21 |
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