JP4633656B2 - リソグラフィ装置及びデバイス製造方法 - Google Patents

リソグラフィ装置及びデバイス製造方法 Download PDF

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Publication number
JP4633656B2
JP4633656B2 JP2006062036A JP2006062036A JP4633656B2 JP 4633656 B2 JP4633656 B2 JP 4633656B2 JP 2006062036 A JP2006062036 A JP 2006062036A JP 2006062036 A JP2006062036 A JP 2006062036A JP 4633656 B2 JP4633656 B2 JP 4633656B2
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Prior art keywords
seal structure
flexible seal
cover plate
sensor
substrate
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Expired - Lifetime
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JP2006253688A (ja
JP2006253688A5 (https=
Inventor
ヨハネス コーネルス ヘンドリック スマルダース パトリック
スミッツ ペーター
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エーエスエムエル ネザーランズ ビー．ブイ．
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006062036A 2005-03-09 2006-03-08 リソグラフィ装置及びデバイス製造方法 Expired - Lifetime JP4633656B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/075,819 US7684010B2 (en) 2005-03-09 2005-03-09 Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010112063A Division JP5069770B2 (ja) 2005-03-09 2010-05-14 リソグラフィ装置及びシール構造

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JP2006253688A JP2006253688A (ja) 2006-09-21
JP2006253688A5 JP2006253688A5 (https=) 2009-10-01
JP4633656B2 true JP4633656B2 (ja) 2011-02-16

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JP2006062036A Expired - Lifetime JP4633656B2 (ja) 2005-03-09 2006-03-08 リソグラフィ装置及びデバイス製造方法
JP2010112063A Expired - Lifetime JP5069770B2 (ja) 2005-03-09 2010-05-14 リソグラフィ装置及びシール構造

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JP2010112063A Expired - Lifetime JP5069770B2 (ja) 2005-03-09 2010-05-14 リソグラフィ装置及びシール構造

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JP (2) JP4633656B2 (https=)

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Also Published As

Publication number Publication date
US20060203215A1 (en) 2006-09-14
JP2006253688A (ja) 2006-09-21
US8390778B2 (en) 2013-03-05
US7684010B2 (en) 2010-03-23
US20100182578A1 (en) 2010-07-22
JP5069770B2 (ja) 2012-11-07
JP2010177709A (ja) 2010-08-12

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