JP4632934B2 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP4632934B2
JP4632934B2 JP2005332567A JP2005332567A JP4632934B2 JP 4632934 B2 JP4632934 B2 JP 4632934B2 JP 2005332567 A JP2005332567 A JP 2005332567A JP 2005332567 A JP2005332567 A JP 2005332567A JP 4632934 B2 JP4632934 B2 JP 4632934B2
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Japan
Prior art keywords
substrate
nozzle
processing
hole
peripheral
Prior art date
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Expired - Fee Related
Application number
JP2005332567A
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English (en)
Japanese (ja)
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JP2007142076A (ja
JP2007142076A5 (enExample
Inventor
勝彦 宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2005332567A priority Critical patent/JP4632934B2/ja
Publication of JP2007142076A publication Critical patent/JP2007142076A/ja
Publication of JP2007142076A5 publication Critical patent/JP2007142076A5/ja
Application granted granted Critical
Publication of JP4632934B2 publication Critical patent/JP4632934B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2005332567A 2005-11-17 2005-11-17 基板処理装置 Expired - Fee Related JP4632934B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005332567A JP4632934B2 (ja) 2005-11-17 2005-11-17 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005332567A JP4632934B2 (ja) 2005-11-17 2005-11-17 基板処理装置

Publications (3)

Publication Number Publication Date
JP2007142076A JP2007142076A (ja) 2007-06-07
JP2007142076A5 JP2007142076A5 (enExample) 2008-10-23
JP4632934B2 true JP4632934B2 (ja) 2011-02-16

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ID=38204603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005332567A Expired - Fee Related JP4632934B2 (ja) 2005-11-17 2005-11-17 基板処理装置

Country Status (1)

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JP (1) JP4632934B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4841451B2 (ja) 2007-01-31 2011-12-21 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP5480617B2 (ja) * 2009-12-25 2014-04-23 大日本スクリーン製造株式会社 基板処理装置
JP5706981B2 (ja) * 2014-02-13 2015-04-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002086039A (ja) * 2000-09-13 2002-03-26 Tokyo Electron Ltd 液処理装置
JP2003015529A (ja) * 2001-06-28 2003-01-17 Hitachi Ltd プラズマディスプレイパネル表示装置
JP4179593B2 (ja) * 2002-08-21 2008-11-12 大日本スクリーン製造株式会社 基板周縁処理装置および基板周縁処理方法
JP4112996B2 (ja) * 2003-01-28 2008-07-02 大日本スクリーン製造株式会社 基板処理装置
JP4398215B2 (ja) * 2003-10-10 2010-01-13 エス・イー・エス株式会社 ベベルエッチング処理法および処理装置
JP4191009B2 (ja) * 2003-11-05 2008-12-03 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP4409312B2 (ja) * 2004-02-18 2010-02-03 大日本スクリーン製造株式会社 基板周縁処理装置および基板周縁処理方法

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Publication number Publication date
JP2007142076A (ja) 2007-06-07

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