JP4623210B2 - 情報記録媒体用ガラス基板の製造方法 - Google Patents
情報記録媒体用ガラス基板の製造方法 Download PDFInfo
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- JP4623210B2 JP4623210B2 JP2008523651A JP2008523651A JP4623210B2 JP 4623210 B2 JP4623210 B2 JP 4623210B2 JP 2008523651 A JP2008523651 A JP 2008523651A JP 2008523651 A JP2008523651 A JP 2008523651A JP 4623210 B2 JP4623210 B2 JP 4623210B2
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- glass substrate
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- cleaning
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- 239000000758 substrate Substances 0.000 title claims description 152
- 239000011521 glass Substances 0.000 title claims description 146
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000007788 liquid Substances 0.000 claims description 49
- 238000004140 cleaning Methods 0.000 claims description 43
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 31
- 238000005498 polishing Methods 0.000 claims description 22
- 239000000377 silicon dioxide Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 235000012239 silicon dioxide Nutrition 0.000 claims description 13
- 239000000243 solution Substances 0.000 claims description 5
- 239000003599 detergent Substances 0.000 claims description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 239000012670 alkaline solution Substances 0.000 claims description 2
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 claims description 2
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 claims description 2
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 description 22
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- 239000010410 layer Substances 0.000 description 15
- 239000002245 particle Substances 0.000 description 9
- 238000001035 drying Methods 0.000 description 8
- 239000011241 protective layer Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 229910001149 41xx steel Inorganic materials 0.000 description 5
- 239000003082 abrasive agent Substances 0.000 description 5
- 239000006061 abrasive grain Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000005354 aluminosilicate glass Substances 0.000 description 4
- 238000003426 chemical strengthening reaction Methods 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 description 4
- 229910000943 NiAl Inorganic materials 0.000 description 3
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- 229910002546 FeCo Inorganic materials 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XTEOTKRLHMVSEO-UHFFFAOYSA-N [Si](=O)=O.[O-2].[Al+3].[O-2].[Li+] Chemical compound [Si](=O)=O.[O-2].[Al+3].[O-2].[Li+] XTEOTKRLHMVSEO-UHFFFAOYSA-N 0.000 description 1
- YRLSDFLDWGBBGW-UHFFFAOYSA-N [Si](=O)=O.[O-2].[Li+].[Li+] Chemical compound [Si](=O)=O.[O-2].[Li+].[Li+] YRLSDFLDWGBBGW-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
- Cleaning In General (AREA)
- Magnetic Record Carriers (AREA)
Description
型によってプレス成形して円盤状のガラス基板前駆体を得る(プレス成形工程)。なお、円盤状のガラス基板前駆体は、プレス成形によらず、例えばダウンドロー法やフロート法で形成したシートガラスを研削砥石で切り出して作製してもよい。
Claims (4)
- ガラス基板を研磨する工程と、研磨したガラス基板をスクラブ洗浄する工程を有するガラス基板の製造方法において、
研磨工程の次に、ガラス基板の表面を液体と10分間以上接触させ、それに続いてスクラブ洗浄工程を行う、情報記録媒体用ガラス基板の製造方法であって、
前記液体はpHが3乃至11の範囲であるイオン水、活性剤添加水、弱アルカリ溶液、弱酸溶液、オゾン水または過酸化水素水(但し、洗剤は除く)であることを特徴とする情報記録媒体用ガラス基板の製造方法。 - 貯溜された該液体中にガラス基板を浸漬させて、該ガラス基板の表面を該液体に接触させる、請求項1記載のガラス基板の製造方法。
- 該ガラス基板がSiO2を主成分とする、請求項1記載のガラス基板の製造方法。
- 該接触させる時間が100分以下である、請求項1に記載の情報記録媒体用ガラス基板の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006183087 | 2006-07-03 | ||
JP2006183087 | 2006-07-03 | ||
PCT/JP2007/062866 WO2008004470A1 (fr) | 2006-07-03 | 2007-06-27 | Procédé de fabrication d'un substrat de verre pour support d'enregistrement d'informations |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010246998A Division JP2011060416A (ja) | 2006-07-03 | 2010-11-04 | 情報記録媒体用ガラス基板の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008004470A1 JPWO2008004470A1 (ja) | 2009-12-03 |
JP4623210B2 true JP4623210B2 (ja) | 2011-02-02 |
Family
ID=38894441
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008523651A Active JP4623210B2 (ja) | 2006-07-03 | 2007-06-27 | 情報記録媒体用ガラス基板の製造方法 |
JP2010246998A Pending JP2011060416A (ja) | 2006-07-03 | 2010-11-04 | 情報記録媒体用ガラス基板の製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010246998A Pending JP2011060416A (ja) | 2006-07-03 | 2010-11-04 | 情報記録媒体用ガラス基板の製造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20080011017A1 (ja) |
JP (2) | JP4623210B2 (ja) |
WO (1) | WO2008004470A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100062287A1 (en) * | 2008-09-10 | 2010-03-11 | Seagate Technology Llc | Method of polishing amorphous/crystalline glass to achieve a low rq & wq |
JP4620789B1 (ja) * | 2009-07-16 | 2011-01-26 | シナノケンシ株式会社 | 光走査装置 |
JP5979744B2 (ja) * | 2011-05-26 | 2016-08-31 | 花王株式会社 | ハードディスク製造方法 |
SG11201501492YA (en) * | 2012-09-20 | 2015-05-28 | Hoya Corp | Method for manufacturing glass substrate for information recording medium |
WO2014103246A1 (ja) * | 2012-12-27 | 2014-07-03 | Hoya株式会社 | Hdd用ガラス基板の製造方法 |
CN106795042B (zh) * | 2015-03-24 | 2019-09-13 | 安瀚视特控股株式会社 | 玻璃基板的制造方法 |
Citations (6)
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JPH0922885A (ja) * | 1995-07-07 | 1997-01-21 | Fujitsu Ltd | 化学的機械研磨後の基板洗浄方法 |
JPH10309656A (ja) * | 1997-05-09 | 1998-11-24 | Showa Alum Corp | 磁気ディスク基板の研磨装置 |
JP2002074653A (ja) * | 2000-08-30 | 2002-03-15 | Hoya Corp | 情報記録媒体用ガラス基板の製造方法及び情報記録媒体用ガラス基板並びに情報記録媒体の製造方法及び情報記録媒体 |
JP2002362944A (ja) * | 2001-06-08 | 2002-12-18 | Matsushita Electric Ind Co Ltd | ガラス基板、その製造方法ならびに情報記録ディスクの製造方法 |
JP2003346316A (ja) * | 2002-03-19 | 2003-12-05 | Nippon Sheet Glass Co Ltd | 情報記録媒体並びに該情報記録媒体用ガラス基板の製造方法および該方法によって製造された情報記録媒体用ガラス基板 |
JP2006085889A (ja) * | 2004-08-19 | 2006-03-30 | Showa Denko Kk | 磁気記録媒体及びその製造方法 |
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US4855023A (en) * | 1986-10-06 | 1989-08-08 | Athens, Inc. | Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids used in semiconductor wafer cleaning |
US5037481B1 (en) * | 1987-04-29 | 1993-05-11 | Verteq, Inc. | Megasonic cleaning method |
JP2840966B2 (ja) * | 1989-11-08 | 1998-12-24 | ティーディーケイ株式会社 | 磁気記録媒体および磁気記録再生方法 |
JPH08250455A (ja) * | 1995-02-15 | 1996-09-27 | Texas Instr Inc <Ti> | 化学機械的に研磨される半導体ウェーハ面から汚染粒子を除去する方法および装置 |
JP2000311336A (ja) * | 1999-04-28 | 2000-11-07 | Nippon Sheet Glass Co Ltd | 磁気ディスク用基板の作製方法、その方法により得られた磁気ディスク用基板及び磁気記録媒体 |
US6402851B1 (en) * | 2000-05-19 | 2002-06-11 | International Business Machines Corporation | Lanthanide oxide dissolution from glass surface |
JP2001344743A (ja) * | 2000-05-31 | 2001-12-14 | Asahi Techno Glass Corp | ガラス基板の製造方法及びガラス基板の強化処理装置 |
JP2003146667A (ja) * | 2001-11-15 | 2003-05-21 | Matsushita Electric Ind Co Ltd | 成形用金型の製造方法および製造装置 |
JP4115722B2 (ja) * | 2002-03-15 | 2008-07-09 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法 |
US20050074635A1 (en) * | 2002-03-19 | 2005-04-07 | Nippon Sheet Glass Co., Ltd. | Information recording medium and method of manufacturing glass substrate for the information recording medium, and glass substrate for the information recording medium, manufactured using the method |
JP4795614B2 (ja) * | 2002-10-23 | 2011-10-19 | Hoya株式会社 | 情報記録媒体用ガラス基板及びその製造方法 |
US20050205835A1 (en) * | 2004-03-19 | 2005-09-22 | Tamboli Dnyanesh C | Alkaline post-chemical mechanical planarization cleaning compositions |
US20080305364A1 (en) * | 2004-08-19 | 2008-12-11 | Showa Denko K.K. | Magnetic Recording Media and Production Process Thereof |
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2007
- 2007-06-27 JP JP2008523651A patent/JP4623210B2/ja active Active
- 2007-06-27 WO PCT/JP2007/062866 patent/WO2008004470A1/ja active Application Filing
- 2007-07-02 US US11/824,769 patent/US20080011017A1/en not_active Abandoned
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2010
- 2010-11-04 JP JP2010246998A patent/JP2011060416A/ja active Pending
Patent Citations (6)
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JPH0922885A (ja) * | 1995-07-07 | 1997-01-21 | Fujitsu Ltd | 化学的機械研磨後の基板洗浄方法 |
JPH10309656A (ja) * | 1997-05-09 | 1998-11-24 | Showa Alum Corp | 磁気ディスク基板の研磨装置 |
JP2002074653A (ja) * | 2000-08-30 | 2002-03-15 | Hoya Corp | 情報記録媒体用ガラス基板の製造方法及び情報記録媒体用ガラス基板並びに情報記録媒体の製造方法及び情報記録媒体 |
JP2002362944A (ja) * | 2001-06-08 | 2002-12-18 | Matsushita Electric Ind Co Ltd | ガラス基板、その製造方法ならびに情報記録ディスクの製造方法 |
JP2003346316A (ja) * | 2002-03-19 | 2003-12-05 | Nippon Sheet Glass Co Ltd | 情報記録媒体並びに該情報記録媒体用ガラス基板の製造方法および該方法によって製造された情報記録媒体用ガラス基板 |
JP2006085889A (ja) * | 2004-08-19 | 2006-03-30 | Showa Denko Kk | 磁気記録媒体及びその製造方法 |
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JP2011060416A (ja) | 2011-03-24 |
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