JP5083212B2 - ガラス基板の洗浄方法、製造方法およびそれを用いた磁気ディスク - Google Patents
ガラス基板の洗浄方法、製造方法およびそれを用いた磁気ディスク Download PDFInfo
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- JP5083212B2 JP5083212B2 JP2008523649A JP2008523649A JP5083212B2 JP 5083212 B2 JP5083212 B2 JP 5083212B2 JP 2008523649 A JP2008523649 A JP 2008523649A JP 2008523649 A JP2008523649 A JP 2008523649A JP 5083212 B2 JP5083212 B2 JP 5083212B2
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- 238000004140 cleaning Methods 0.000 title claims description 168
- 239000000758 substrate Substances 0.000 title claims description 123
- 239000011521 glass Substances 0.000 title claims description 116
- 238000000034 method Methods 0.000 title claims description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000007788 liquid Substances 0.000 claims description 89
- 238000010828 elution Methods 0.000 claims description 23
- 238000005498 polishing Methods 0.000 claims description 12
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 10
- 230000002378 acidificating effect Effects 0.000 claims description 9
- 230000007935 neutral effect Effects 0.000 claims description 5
- 238000005406 washing Methods 0.000 claims description 4
- 239000003599 detergent Substances 0.000 claims description 3
- 238000005201 scrubbing Methods 0.000 claims description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 17
- 239000000243 solution Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000002245 particle Substances 0.000 description 8
- 239000011241 protective layer Substances 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 6
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- 229910052782 aluminium Inorganic materials 0.000 description 4
- 229910000420 cerium oxide Inorganic materials 0.000 description 4
- 238000003426 chemical strengthening reaction Methods 0.000 description 4
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- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 4
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- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
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- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
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- 229910052759 nickel Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- 229910018404 Al2 O3 Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- 229910002546 FeCo Inorganic materials 0.000 description 1
- 229910011763 Li2 O Inorganic materials 0.000 description 1
- 229910004742 Na2 O Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XTEOTKRLHMVSEO-UHFFFAOYSA-N [Si](=O)=O.[O-2].[Al+3].[O-2].[Li+] Chemical compound [Si](=O)=O.[O-2].[Al+3].[O-2].[Li+] XTEOTKRLHMVSEO-UHFFFAOYSA-N 0.000 description 1
- YRLSDFLDWGBBGW-UHFFFAOYSA-N [Si](=O)=O.[O-2].[Li+].[Li+] Chemical compound [Si](=O)=O.[O-2].[Li+].[Li+] YRLSDFLDWGBBGW-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
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- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
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- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
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- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
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- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
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- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Surface Treatment Of Glass (AREA)
- Magnetic Record Carriers (AREA)
Description
2a、2b ノズル
3 洗浄液
4 純水
G ガラス基板
Hs>10 且つ Hs/He>1.5 ・・・・・・(1)
(Hs:最初の洗浄液のpH,He:最後の洗浄液のpH)
Hs<5 且つ Hs/He<0.6 ・・・・・・(2)
(Hs:最初の洗浄液のpH,He:最後の洗浄液のpH)
Rs<0.1 MΩ・cm 且つRs/Re<0.2 ・・・・・・(3)(Rs:最初の洗浄液の比抵抗値,Re:最後の洗浄液の比抵抗値)
Claims (10)
- 少なくとも1回のガラス基板を研磨する研磨工程と、前記研磨工程後のガラス基板を洗浄する洗浄工程とを有するガラス基板の洗浄方法において、前記洗浄工程が、Si元素溶出量の異なる、2種類以上の洗浄液を用いてガラス基板をスクラブ洗浄する工程のみからなり、Si元素溶出量の最も高い洗浄液を最初に、かつSi元素溶出量の最も低い洗浄液を最後に、使用して洗浄することを特徴とするガラス基板の製造方法。
- 該Si元素溶出量の値に従い、該2種類以上の洗浄液を、該値が高い順に使用して洗浄することを特徴とする請求項1に記載のガラス基板の製造方法。
- 前記2種類以上の洗浄液を用いてガラス基板をスクラブ洗浄する工程が、一つの洗浄装置を使用して洗浄液の種類を順に切り替えることで行われることを特徴とする請求項1に記載のガラス基板の製造方法。
- 前記2種類以上の洗浄液がいずれも洗剤を含む洗浄液であり、前記洗剤の成分が実質的に同一で濃度のみが異なる、該2種類以上の洗浄液を、濃度が高い順に使用して洗浄することを特徴とする請求項3に記載のガラス基板の製造方法。
- 該洗浄液はフッ化水素酸であることを特徴とする請求項4に記載のガラス基板の製造方法。
- 該最初の洗浄液がアルカリ性又は酸性であり、該最後の洗浄液が弱酸性又は中性であることを特徴とする請求項1に記載のガラス基板の製造方法。
- 該最初の洗浄液の比抵抗値が、該最後の洗浄液のそれよりも小さいことを特徴とする請求項1に記載のガラス基板の製造方法。
- 該洗浄液を連続的に切り換えて洗浄することを特徴とする請求項4記載のガラス基板の製造方法。
- 該洗浄液を段階的に切り換えて洗浄することを特徴とする請求項4記載のガラス基板の製造方法。
- 請求項1に記載のガラス基板の製造方法によって製造されたガラス基板上に磁気記録層を形成することを特徴とする磁気ディスクの製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2008523649A JP5083212B2 (ja) | 2006-07-03 | 2007-06-27 | ガラス基板の洗浄方法、製造方法およびそれを用いた磁気ディスク |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006183082 | 2006-07-03 | ||
JP2006183082 | 2006-07-03 | ||
PCT/JP2007/062864 WO2008004468A1 (fr) | 2006-07-03 | 2007-06-27 | Procédé de nettoyage et procédé de production d'un substrat de verre, et disque magnétique utilisant ce substrat de verre |
JP2008523649A JP5083212B2 (ja) | 2006-07-03 | 2007-06-27 | ガラス基板の洗浄方法、製造方法およびそれを用いた磁気ディスク |
Publications (2)
Publication Number | Publication Date |
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JPWO2008004468A1 JPWO2008004468A1 (ja) | 2009-12-03 |
JP5083212B2 true JP5083212B2 (ja) | 2012-11-28 |
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JP2008523649A Active JP5083212B2 (ja) | 2006-07-03 | 2007-06-27 | ガラス基板の洗浄方法、製造方法およびそれを用いた磁気ディスク |
Country Status (3)
Country | Link |
---|---|
US (1) | US8113017B2 (ja) |
JP (1) | JP5083212B2 (ja) |
WO (1) | WO2008004468A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008004468A1 (fr) * | 2006-07-03 | 2008-01-10 | Konica Minolta Opto, Inc. | Procédé de nettoyage et procédé de production d'un substrat de verre, et disque magnétique utilisant ce substrat de verre |
JPWO2008004469A1 (ja) * | 2006-07-03 | 2009-12-03 | コニカミノルタオプト株式会社 | ガラス基板の洗浄方法、製造方法およびそれを用いた磁気ディスク |
JP4623211B2 (ja) * | 2006-07-03 | 2011-02-02 | コニカミノルタオプト株式会社 | 情報記録媒体用ガラス基板の製造方法およびそれを用いる磁気ディスク |
US9312141B2 (en) | 2013-11-21 | 2016-04-12 | HGST Netherlands B.V. | Vapor phase chemical mechanical polishing of magnetic recording disks |
CN103990624B (zh) * | 2014-05-28 | 2016-08-31 | 深圳市汉东电子玻璃清洗设备有限公司 | 清洗机 |
CN108790280B (zh) * | 2018-06-04 | 2021-04-09 | 义乌市义心科技有限责任公司 | 一种用于纸箱生产的瓦楞纸粘合压辊 |
CN111613526B (zh) * | 2020-06-04 | 2021-05-11 | 无锡亚电智能装备有限公司 | 一种基于晶圆优化排布的清洗方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000132829A (ja) * | 1998-08-19 | 2000-05-12 | Hoya Corp | 磁気記録媒体用ガラス基板、磁気記録媒体及びそれらの製造方法 |
JP2000140778A (ja) * | 1998-11-10 | 2000-05-23 | Hitachi Plant Eng & Constr Co Ltd | ガラス基板の洗浄液及び洗浄方法 |
JP2001087722A (ja) * | 1999-09-22 | 2001-04-03 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2002074653A (ja) * | 2000-08-30 | 2002-03-15 | Hoya Corp | 情報記録媒体用ガラス基板の製造方法及び情報記録媒体用ガラス基板並びに情報記録媒体の製造方法及び情報記録媒体 |
JP2002352422A (ja) * | 2001-05-25 | 2002-12-06 | Nippon Sheet Glass Co Ltd | 情報記録媒体用ガラス基板及びその製造方法 |
JP2003228824A (ja) * | 2002-02-05 | 2003-08-15 | Hitachi Ltd | 磁気ディスクガラス基板の洗浄方法 |
JP2006119624A (ja) * | 2004-09-22 | 2006-05-11 | Hoya Corp | マスクブランクス用基板,マスクブランクス,露光用マスク及び半導体装置,並びにそれらの製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6553788B1 (en) * | 1999-02-23 | 2003-04-29 | Nippon Sheet Glass Co., Ltd. | Glass substrate for magnetic disk and method for manufacturing |
JP2000311336A (ja) | 1999-04-28 | 2000-11-07 | Nippon Sheet Glass Co Ltd | 磁気ディスク用基板の作製方法、その方法により得られた磁気ディスク用基板及び磁気記録媒体 |
JP2001316133A (ja) | 2000-04-28 | 2001-11-13 | Nippon Sheet Glass Co Ltd | ガラス基板の製造方法およびガラス基板、ならびにそのガラス基板を用いた情報記録装置 |
JP2001344743A (ja) | 2000-05-31 | 2001-12-14 | Asahi Techno Glass Corp | ガラス基板の製造方法及びガラス基板の強化処理装置 |
JP2002008223A (ja) * | 2000-06-21 | 2002-01-11 | Mitsui Mining & Smelting Co Ltd | 磁気記録媒体用ガラス基板の製造方法 |
US6428396B2 (en) | 2000-06-29 | 2002-08-06 | Hoya Corporation | Method of producing a substrate for an information recording medium and method of producing an information recording medium |
JP3740552B2 (ja) | 2001-04-27 | 2006-02-01 | Tdk株式会社 | 磁石の製造方法 |
JP4785274B2 (ja) | 2001-05-29 | 2011-10-05 | 日本板硝子株式会社 | ガラス物品およびそれを用いた磁気記録媒体用ガラス基板 |
JP2003036566A (ja) | 2001-07-26 | 2003-02-07 | Sony Corp | 記録媒体に含まれる金属含有層の溶出方法および記録媒体のリサイクル方法 |
JP2003146667A (ja) | 2001-11-15 | 2003-05-21 | Matsushita Electric Ind Co Ltd | 成形用金型の製造方法および製造装置 |
US20050074635A1 (en) | 2002-03-19 | 2005-04-07 | Nippon Sheet Glass Co., Ltd. | Information recording medium and method of manufacturing glass substrate for the information recording medium, and glass substrate for the information recording medium, manufactured using the method |
JP2003346316A (ja) | 2002-03-19 | 2003-12-05 | Nippon Sheet Glass Co Ltd | 情報記録媒体並びに該情報記録媒体用ガラス基板の製造方法および該方法によって製造された情報記録媒体用ガラス基板 |
JP4795614B2 (ja) * | 2002-10-23 | 2011-10-19 | Hoya株式会社 | 情報記録媒体用ガラス基板及びその製造方法 |
US7255943B2 (en) | 2003-05-14 | 2007-08-14 | Hoya Corporation | Glass substrate for a magnetic disk, magnetic disk, and methods of producing the glass substrate and the magnetic disk |
US7566673B2 (en) * | 2003-10-31 | 2009-07-28 | Konica Minolta Opto, Inc. | Glass substrate for an information recording medium and information recording medium employing it |
JP4039381B2 (ja) * | 2004-03-25 | 2008-01-30 | コニカミノルタオプト株式会社 | ガラス組成物を用いた情報記録媒体用ガラス基板及びこれを用いた情報記録媒体 |
US20070123046A1 (en) * | 2005-10-31 | 2007-05-31 | Applied Materials, Inc. | Continuous in-line monitoring and qualification of polishing rates |
WO2008004468A1 (fr) * | 2006-07-03 | 2008-01-10 | Konica Minolta Opto, Inc. | Procédé de nettoyage et procédé de production d'un substrat de verre, et disque magnétique utilisant ce substrat de verre |
-
2007
- 2007-06-27 WO PCT/JP2007/062864 patent/WO2008004468A1/ja active Application Filing
- 2007-06-27 JP JP2008523649A patent/JP5083212B2/ja active Active
- 2007-07-02 US US11/824,775 patent/US8113017B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000132829A (ja) * | 1998-08-19 | 2000-05-12 | Hoya Corp | 磁気記録媒体用ガラス基板、磁気記録媒体及びそれらの製造方法 |
JP2000140778A (ja) * | 1998-11-10 | 2000-05-23 | Hitachi Plant Eng & Constr Co Ltd | ガラス基板の洗浄液及び洗浄方法 |
JP2001087722A (ja) * | 1999-09-22 | 2001-04-03 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2002074653A (ja) * | 2000-08-30 | 2002-03-15 | Hoya Corp | 情報記録媒体用ガラス基板の製造方法及び情報記録媒体用ガラス基板並びに情報記録媒体の製造方法及び情報記録媒体 |
JP2002352422A (ja) * | 2001-05-25 | 2002-12-06 | Nippon Sheet Glass Co Ltd | 情報記録媒体用ガラス基板及びその製造方法 |
JP2003228824A (ja) * | 2002-02-05 | 2003-08-15 | Hitachi Ltd | 磁気ディスクガラス基板の洗浄方法 |
JP2006119624A (ja) * | 2004-09-22 | 2006-05-11 | Hoya Corp | マスクブランクス用基板,マスクブランクス,露光用マスク及び半導体装置,並びにそれらの製造方法 |
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WO2008004468A1 (fr) | 2008-01-10 |
JPWO2008004468A1 (ja) | 2009-12-03 |
US8113017B2 (en) | 2012-02-14 |
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