JP4603044B2 - 光ディスク及びＣｕ合金記録層用スパッタリングターゲット - Google Patents

光ディスク及びＣｕ合金記録層用スパッタリングターゲット Download PDF

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Publication number
JP4603044B2
JP4603044B2 JP2007523348A JP2007523348A JP4603044B2 JP 4603044 B2 JP4603044 B2 JP 4603044B2 JP 2007523348 A JP2007523348 A JP 2007523348A JP 2007523348 A JP2007523348 A JP 2007523348A JP 4603044 B2 JP4603044 B2 JP 4603044B2
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JP
Japan
Prior art keywords
recording layer
zns
alloy
sputtering target
addition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2007523348A
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English (en)
Japanese (ja)
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JPWO2007004344A1 (ja
Inventor
賢次 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
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JX Nippon Mining and Metals Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B7/2433—Metals or elements of Groups 13, 14, 15 or 16 of the Periodic Table, e.g. B, Si, Ge, As, Sb, Bi, Se or Te
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP2007523348A 2005-07-04 2006-04-07 光ディスク及びＣｕ合金記録層用スパッタリングターゲット Expired - Fee Related JP4603044B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005195318 2005-07-04
JP2005195318 2005-07-04
PCT/JP2006/307434 WO2007004344A1 (ja) 2005-07-04 2006-04-07 光ディスク及びCu合金記録層用スパッタリングターゲット

Publications (2)

Publication Number Publication Date
JPWO2007004344A1 JPWO2007004344A1 (ja) 2009-01-22
JP4603044B2 true JP4603044B2 (ja) 2010-12-22

Family

ID=37604220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007523348A Expired - Fee Related JP4603044B2 (ja) 2005-07-04 2006-04-07 光ディスク及びＣｕ合金記録層用スパッタリングターゲット

Country Status (5)

Country Link
EP (1) EP1900540B1 (enExample)
JP (1) JP4603044B2 (enExample)
CN (1) CN101218106B (enExample)
TW (1) TW200706674A (enExample)
WO (1) WO2007004344A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012117853A1 (ja) * 2011-03-01 2012-09-07 Jx日鉱日石金属株式会社 銅チタン合金製スパッタリングターゲット、同スパッタリングターゲットを用いて形成した半導体配線並びに同半導体配線を備えた半導体素子及びデバイス
CN103774100A (zh) * 2012-10-22 2014-05-07 中环股份有限公司 溅镀靶材及可写录光记录媒体
JP5594618B1 (ja) * 2013-02-25 2014-09-24 三菱マテリアル株式会社 スパッタリングターゲット及びその製造方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56124136A (en) * 1980-02-01 1981-09-29 Thomson Csf Reversible memory structure
JPS57140845A (en) * 1981-02-25 1982-08-31 Toshiba Corp Alloy for color tone storing element
JPS60186825A (ja) * 1984-03-07 1985-09-24 Hitachi Ltd 情報の記録・消去方法
JPS61194658A (ja) * 1985-02-22 1986-08-29 Hitachi Ltd 情報記録媒体
JPS62247060A (ja) * 1986-04-17 1987-10-28 Mitsubishi Electric Corp 光情報記録媒体
JPH0256746A (ja) * 1988-08-19 1990-02-26 Matsushita Electric Ind Co Ltd 情報担体ディスク
JPH0569671A (ja) * 1991-09-13 1993-03-23 Nec Corp 多値光記録媒体およびその読み出し装置
JP2002172861A (ja) * 2000-12-06 2002-06-18 Ricoh Co Ltd 光情報記録媒体
JP2004079022A (ja) * 2002-08-12 2004-03-11 Tdk Corp 光記録媒体及び光記録方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW468179B (en) * 1998-08-05 2001-12-11 Matsushita Electric Industrial Co Ltd Optical recording medium

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56124136A (en) * 1980-02-01 1981-09-29 Thomson Csf Reversible memory structure
JPS57140845A (en) * 1981-02-25 1982-08-31 Toshiba Corp Alloy for color tone storing element
JPS60186825A (ja) * 1984-03-07 1985-09-24 Hitachi Ltd 情報の記録・消去方法
JPS61194658A (ja) * 1985-02-22 1986-08-29 Hitachi Ltd 情報記録媒体
JPS62247060A (ja) * 1986-04-17 1987-10-28 Mitsubishi Electric Corp 光情報記録媒体
JPH0256746A (ja) * 1988-08-19 1990-02-26 Matsushita Electric Ind Co Ltd 情報担体ディスク
JPH0569671A (ja) * 1991-09-13 1993-03-23 Nec Corp 多値光記録媒体およびその読み出し装置
JP2002172861A (ja) * 2000-12-06 2002-06-18 Ricoh Co Ltd 光情報記録媒体
JP2004079022A (ja) * 2002-08-12 2004-03-11 Tdk Corp 光記録媒体及び光記録方法

Also Published As

Publication number Publication date
CN101218106A (zh) 2008-07-09
TWI312814B (enExample) 2009-08-01
EP1900540A4 (en) 2009-02-18
EP1900540A1 (en) 2008-03-19
WO2007004344A1 (ja) 2007-01-11
JPWO2007004344A1 (ja) 2009-01-22
EP1900540B1 (en) 2010-03-03
TW200706674A (en) 2007-02-16
CN101218106B (zh) 2010-05-26

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