TWI312814B - - Google Patents

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Publication number
TWI312814B
TWI312814B TW095113343A TW95113343A TWI312814B TW I312814 B TWI312814 B TW I312814B TW 095113343 A TW095113343 A TW 095113343A TW 95113343 A TW95113343 A TW 95113343A TW I312814 B TWI312814 B TW I312814B
Authority
TW
Taiwan
Prior art keywords
alloy
zns
recording layer
layer
recording
Prior art date
Application number
TW095113343A
Other languages
English (en)
Chinese (zh)
Other versions
TW200706674A (en
Inventor
Kenji Sato
Original Assignee
Nippon Mining Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co filed Critical Nippon Mining Co
Publication of TW200706674A publication Critical patent/TW200706674A/zh
Application granted granted Critical
Publication of TWI312814B publication Critical patent/TWI312814B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B7/2433—Metals or elements of Groups 13, 14, 15 or 16 of the Periodic Table, e.g. B, Si, Ge, As, Sb, Bi, Se or Te
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
TW095113343A 2005-07-04 2006-04-14 Optical disk, and sputtering target for cu alloy recording layer TW200706674A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005195318 2005-07-04

Publications (2)

Publication Number Publication Date
TW200706674A TW200706674A (en) 2007-02-16
TWI312814B true TWI312814B (enExample) 2009-08-01

Family

ID=37604220

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095113343A TW200706674A (en) 2005-07-04 2006-04-14 Optical disk, and sputtering target for cu alloy recording layer

Country Status (5)

Country Link
EP (1) EP1900540B1 (enExample)
JP (1) JP4603044B2 (enExample)
CN (1) CN101218106B (enExample)
TW (1) TW200706674A (enExample)
WO (1) WO2007004344A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012117853A1 (ja) * 2011-03-01 2012-09-07 Jx日鉱日石金属株式会社 銅チタン合金製スパッタリングターゲット、同スパッタリングターゲットを用いて形成した半導体配線並びに同半導体配線を備えた半導体素子及びデバイス
CN103774100A (zh) * 2012-10-22 2014-05-07 中环股份有限公司 溅镀靶材及可写录光记录媒体
JP5594618B1 (ja) * 2013-02-25 2014-09-24 三菱マテリアル株式会社 スパッタリングターゲット及びその製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475270A1 (fr) * 1980-02-01 1981-08-07 Thomson Csf Structure de memoire reversible, a inscription thermo-optique et lecture optique, et procede d'inscription et d'effacement de cette structure
JPS5938291B2 (ja) * 1981-02-25 1984-09-14 株式会社東芝 色調記憶素子用合金
JPH066393B2 (ja) * 1984-03-07 1994-01-26 株式会社日立製作所 情報の記録・消去方法
JPS61194658A (ja) * 1985-02-22 1986-08-29 Hitachi Ltd 情報記録媒体
JPS62247060A (ja) * 1986-04-17 1987-10-28 Mitsubishi Electric Corp 光情報記録媒体
JPH0256746A (ja) * 1988-08-19 1990-02-26 Matsushita Electric Ind Co Ltd 情報担体ディスク
JPH0569671A (ja) * 1991-09-13 1993-03-23 Nec Corp 多値光記録媒体およびその読み出し装置
TW468179B (en) * 1998-08-05 2001-12-11 Matsushita Electric Industrial Co Ltd Optical recording medium
JP2002172861A (ja) * 2000-12-06 2002-06-18 Ricoh Co Ltd 光情報記録媒体
JP2004079022A (ja) * 2002-08-12 2004-03-11 Tdk Corp 光記録媒体及び光記録方法

Also Published As

Publication number Publication date
CN101218106A (zh) 2008-07-09
EP1900540A4 (en) 2009-02-18
JP4603044B2 (ja) 2010-12-22
EP1900540A1 (en) 2008-03-19
WO2007004344A1 (ja) 2007-01-11
JPWO2007004344A1 (ja) 2009-01-22
EP1900540B1 (en) 2010-03-03
TW200706674A (en) 2007-02-16
CN101218106B (zh) 2010-05-26

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MM4A Annulment or lapse of patent due to non-payment of fees