CN101218106B - 光盘及Cu合金记录层用溅射靶 - Google Patents

光盘及Cu合金记录层用溅射靶 Download PDF

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Publication number
CN101218106B
CN101218106B CN2006800244989A CN200680024498A CN101218106B CN 101218106 B CN101218106 B CN 101218106B CN 2006800244989 A CN2006800244989 A CN 2006800244989A CN 200680024498 A CN200680024498 A CN 200680024498A CN 101218106 B CN101218106 B CN 101218106B
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CN
China
Prior art keywords
recording layer
zns
alloy
addition
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2006800244989A
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English (en)
Chinese (zh)
Other versions
CN101218106A (zh
Inventor
佐藤贤次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
Original Assignee
Nippon Mining and Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining and Metals Co Ltd filed Critical Nippon Mining and Metals Co Ltd
Publication of CN101218106A publication Critical patent/CN101218106A/zh
Application granted granted Critical
Publication of CN101218106B publication Critical patent/CN101218106B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B7/2433—Metals or elements of Groups 13, 14, 15 or 16 of the Periodic Table, e.g. B, Si, Ge, As, Sb, Bi, Se or Te
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
CN2006800244989A 2005-07-04 2006-04-07 光盘及Cu合金记录层用溅射靶 Expired - Fee Related CN101218106B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005195318 2005-07-04
JP195318/2005 2005-07-04
PCT/JP2006/307434 WO2007004344A1 (ja) 2005-07-04 2006-04-07 光ディスク及びCu合金記録層用スパッタリングターゲット

Publications (2)

Publication Number Publication Date
CN101218106A CN101218106A (zh) 2008-07-09
CN101218106B true CN101218106B (zh) 2010-05-26

Family

ID=37604220

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800244989A Expired - Fee Related CN101218106B (zh) 2005-07-04 2006-04-07 光盘及Cu合金记录层用溅射靶

Country Status (5)

Country Link
EP (1) EP1900540B1 (enExample)
JP (1) JP4603044B2 (enExample)
CN (1) CN101218106B (enExample)
TW (1) TW200706674A (enExample)
WO (1) WO2007004344A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012117853A1 (ja) * 2011-03-01 2012-09-07 Jx日鉱日石金属株式会社 銅チタン合金製スパッタリングターゲット、同スパッタリングターゲットを用いて形成した半導体配線並びに同半導体配線を備えた半導体素子及びデバイス
CN103774100A (zh) * 2012-10-22 2014-05-07 中环股份有限公司 溅镀靶材及可写录光记录媒体
JP5594618B1 (ja) * 2013-02-25 2014-09-24 三菱マテリアル株式会社 スパッタリングターゲット及びその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1244009A (zh) * 1998-08-05 2000-02-09 松下电器产业株式会社 光学记录媒体

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475270A1 (fr) * 1980-02-01 1981-08-07 Thomson Csf Structure de memoire reversible, a inscription thermo-optique et lecture optique, et procede d'inscription et d'effacement de cette structure
JPS5938291B2 (ja) * 1981-02-25 1984-09-14 株式会社東芝 色調記憶素子用合金
JPH066393B2 (ja) * 1984-03-07 1994-01-26 株式会社日立製作所 情報の記録・消去方法
JPS61194658A (ja) * 1985-02-22 1986-08-29 Hitachi Ltd 情報記録媒体
JPS62247060A (ja) * 1986-04-17 1987-10-28 Mitsubishi Electric Corp 光情報記録媒体
JPH0256746A (ja) * 1988-08-19 1990-02-26 Matsushita Electric Ind Co Ltd 情報担体ディスク
JPH0569671A (ja) * 1991-09-13 1993-03-23 Nec Corp 多値光記録媒体およびその読み出し装置
JP2002172861A (ja) * 2000-12-06 2002-06-18 Ricoh Co Ltd 光情報記録媒体
JP2004079022A (ja) * 2002-08-12 2004-03-11 Tdk Corp 光記録媒体及び光記録方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1244009A (zh) * 1998-08-05 2000-02-09 松下电器产业株式会社 光学记录媒体

Also Published As

Publication number Publication date
CN101218106A (zh) 2008-07-09
TWI312814B (enExample) 2009-08-01
EP1900540A4 (en) 2009-02-18
JP4603044B2 (ja) 2010-12-22
EP1900540A1 (en) 2008-03-19
WO2007004344A1 (ja) 2007-01-11
JPWO2007004344A1 (ja) 2009-01-22
EP1900540B1 (en) 2010-03-03
TW200706674A (en) 2007-02-16

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: JX NIPPON MINING + METALS CORPORATION

Free format text: FORMER NAME: NIPPON MINING + METALS CO., LTD.

CP03 Change of name, title or address

Address after: Tokyo, Japan

Patentee after: JX Nippon Mining & Metals Corp.

Address before: Tokyo, Japan

Patentee before: Nippon Mining & Metals Co.,Ltd.

CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: Tokyo, Japan

Patentee after: JX NIPPON MINING & METALS Corp.

Address before: Tokyo, Japan

Patentee before: JX Nippon Mining & Metals Corp.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100526